Abstract:
An ion beam manipulator including a suppression electrode, a ground electrode connected to the suppression electrode in a parallel, spaced-apart relationship therewith by three electrically insulating connectors, the connectors being spaced 120 degrees apart from one another around a circumference of the suppression electrode and the ground electrode, a plurality of linkages extending from the electrically insulating connectors, at least one of the linkages including a pair of parallel support arms connected at a first end to a corresponding one of the electrically insulating connecters by a first pair of universal joints and connected at a second end to a bracket by a second pair of universal joints, and a drive shaft extending from the bracket, the drive shaft coupled to an actuator configured to extend and retract the drive shaft along a longitudinal axis of the drive shaft.
Abstract:
An insulation structure of high voltage electrodes includes an insulator having an exposed surface and a conductor portion, which includes a joint region in contact with the insulator, and a heat-resistant portion provided, along at least part of an edge of the joint region, in such a manner as to be adjacent to the exposed surface of the insulator. The heat-resistant portion is formed of an electrically conductive material whose melting point is higher than that of the conductor portion. The heat-resistant portion may be so provided as to have a gap between the insulator and the exposed surface.
Abstract:
The filament clamp assembly has a pair of clamps to hold the connecting leads of a filament. Each clamp employs a locking pin within a longitudinally disposed bore that is moved into clamping engagement with a filament lead by rotation of a locking nut that moves a stud with a camming surface into the clamp to lift the locking pin via the camming surface.
Abstract:
According to one embodiment, an X-ray tube includes an anode target, a cathode including a filament and a convergence electrode which includes a groove portion, and an envelope. The groove portion includes a pair of first bottom surfaces which are located in the same plane as the filament and between which the filament is interposed in a width direction of the groove portion, and a pair of second bottom surfaces between which the filament and the pair of first bottom surfaces are interposed in a length direction of the groove portion and which are located closer to an opening of the groove portion than the pair of first bottom surfaces.
Abstract:
The present disclosure relates to a charged particle beam system comprising a charged particle beam source, a charged particle column, a sample chamber, a plurality of electrically powered devices arranged within or at either one of the charged particle column, the charged particle beam source and the sample chamber, and at least one first converter to convert an electrical AC voltage power into an electrical DC voltage. The first converter is positioned at a distance from either of the charged particle beam source, the charged particle column and the charged particle chamber, and all elements of the plurality of electrically powered devices, when operated during operation of the charged particle beam source, are configured to be exclusively powered by the DC voltage provided by the converter.
Abstract:
The disclosure relates to a method of operating a gas field ion beam system in which the gas field ion beam system comprises an external housing, an internal housing, arranged within the external housing, an electrically conductive tip arranged within the internal housing, a gas supply for supplying one or more gases to the internal housing, the gas supply having a tube terminating within the internal housing, and an extractor electrode having a hole to permit ions generated in the neighborhood of the tip to pass through the hole into the external housing. The method comprises the step of regularly heating the external housing, the internal housing, the electrically conductive tip, the tube and the extractor electrode to a temperature of above 100° C.
Abstract:
The present disclosure relates to a gas field ion source having a gun housing, an electrically conductive gun can base attached to the gun housing, an inner tube mounted to the gun can base, the inner tube being made of an electrically isolating ceramic, an electrically conductive tip attached to the inner tube, an outer tube mounted to the gun can base, the outer tube being made of an electrically isolating ceramic, and an extractor electrode attached to the outer tube. The extractor electrode can have an opening for the passage of ions generated in proximity to the electrically conductive tip.
Abstract:
The invention relates to an assembly, preferably for use in a lithography system or a microscopy system, for providing an accurately aligned stack of two or more modules in a stacking direction. Each of the two or more modules comprises three support members. The assembly comprises a frame comprising three planar alignment surfaces which extend in the stacking direction and which are angularly off-set with respect to each other. In addition each of the three support members of each one of the two or more modules, when arranged in said frame, abuts against a corresponding one of the three alignment surfaces. The frame is provided with an opening between two of the three planar alignment surfaces for inserting a module in the assembly, said two planar alignment surfaces on either side of the opening are arranged at least partially facing said opening.
Abstract:
An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.
Abstract:
A substrate plasma-processing apparatus for plasma-processing a surface of an electrode of an organic light emitting device. The substrate plasma-processing apparatus may adjust the distance between a first electrode and a substrate and adjust the distance between a second electrode and the substrate.