公开(公告)号：US08742344B2

公开(公告)日：2014-06-03

申请号：US14026385

申请日：2013-09-13

Applicant: Ebara Corporation

Inventor： Masahiro Hatakeyama ,  Yasushi Toma ,  Shoji Yoshikawa ,  Kiwamu Tsukamoto

IPC: G01N23/00 ,  G21K7/00

CPC classification number: H01J37/22 ,  G01N23/2251 ,  G01N2223/204 ,  G01N2223/611 ,  H01J3/024 ,  H01J37/075 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/2448 ,  H01J2237/2806

Abstract: An inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The primary optical system includes a photoelectron generator having a photoelectronic surface. The base material of the photoelectronic surface is made of material having a higher thermal conductivity than the thermal conductivity of quartz. A central portion of the inspection object is provided with a central flat portion 390. The periphery of the central flat portion 390 is provided with peripheral flat portion 392 via a step 391. The periphery of the step 391 is provided with an electric field correction plate 400. A surface voltage equivalent to a surface voltage applied to the inspection object is applied to an electrode 401 on the electric field correction plate 400.

Abstract translation: 检查装置包括：用于产生任何带电粒子和电磁波作为光束的光束产生装置; 主光学系统，其将光束引导到保持在工作室中的检查对象中，并用该光束照射检查对象; 第二光学系统，其检测从检查对象发生的次级带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。 主光学系统包括具有光电子表面的光电子发生器。 光电子表面的基材由具有比石英热导率更高的导热性的材料制成。 检查对象的中央部设置有中央平坦部390.中央平坦部390的周边经由台阶391设置有周边平坦部392.台阶部391的外周设有电场校正板 将与施加到检查对象的表面电压等效的表面电压施加到电场校正板400上的电极401。

公开(公告)号：US10002740B2

公开(公告)日：2018-06-19

申请号：US15667040

申请日：2017-08-02

Applicant: EBARA CORPORATION

Inventor： Masahiro Hatakeyama ,  Ryo Tajima ,  Kenichi Suematsu ,  Kenji Watanabe ,  Yasushi Toma ,  Kenji Terao ,  Takeshi Murakami

IPC: H01J37/05 ,  H01J37/147 ,  H01J37/141 ,  H01J37/26 ,  H01J37/244

CPC classification number: H01J37/05 ,  H01J37/12 ,  H01J37/141 ,  H01J37/147 ,  H01J37/244 ,  H01J37/26 ,  H01J37/29 ,  H01J2237/0268 ,  H01J2237/16 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/2817

Abstract: An electron beam inspection device includes: a primary electron optical system that irradiates the surface of a sample with an electron beam; and a secondary electron optical system that gathers secondary electrons emitted from the sample and forms an image on the sensor surface of a detector. An electron image of the surface of the sample is obtained from a signal detected by the detector, and the sample is inspected. A cylindrical member that is formed with conductors stacked as an inner layer and an outer layer, and an insulator stacked as an intermediate layer is provided inside a lens tube into which the secondary electron optical system is incorporated. An electron orbital path is formed inside the cylindrical member, and the members constituting the secondary electron optical system are arranged outside the cylindrical member.

公开(公告)号：US20160307726A1

公开(公告)日：2016-10-20

申请号：US15195665

申请日：2016-06-28

Applicant: EBARA CORPORATION

Inventor： Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

IPC: H01J37/09 ,  G01N23/225 ,  H01J37/28 ,  H01J37/22 ,  H01J37/10

CPC classification number: H01J37/073 ,  G01N23/22 ,  G01N23/223 ,  G01N23/2251 ,  G01N2223/611 ,  H01J1/34 ,  H01J37/09 ,  H01J37/10 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/0048 ,  H01J2237/022 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/045 ,  H01J2237/0458 ,  H01J2237/0473 ,  H01J2237/0492 ,  H01J2237/061 ,  H01J2237/06333 ,  H01J2237/166 ,  H01J2237/186 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/2448 ,  H01J2237/2482 ,  H01J2237/2485 ,  H01J2237/2817 ,  H01J2237/2855 ,  H01J2237/2857

Abstract: An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

Abstract translation: 用于使用光束检查检查对象的表面的检查装置包括能够产生电荷粒子或电磁波之一作为光束的光束发生器，能够将所述光束引导并照射到被检查对象的主光学系统 在工作室内，能够包括第一可移动数值孔径的二次光学系统和检测从检查对象产生的二次电荷粒子的第一检测器，通过第一可移动数值孔径的二次电荷粒子，能够 基于由所述第一检测器检测到的次级电荷粒子形成图像; 以及第二检测器，其布置在第一可移动数值孔径和第一检测器之间，并且检测在从检查对象生成的次级充电颗粒的交叉位置处的位置和形状。

公开(公告)号：US20140014848A1

公开(公告)日：2014-01-16

申请号：US13946198

申请日：2013-07-19

Applicant: EBARA CORPORATION

Inventor： Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

IPC: G01N23/22 ,  G01N23/223

CPC classification number: H01J37/073 ,  G01N23/22 ,  G01N23/223 ,  G01N23/2251 ,  G01N2223/611 ,  H01J1/34 ,  H01J37/09 ,  H01J37/10 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/0048 ,  H01J2237/022 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/045 ,  H01J2237/0458 ,  H01J2237/0473 ,  H01J2237/0492 ,  H01J2237/061 ,  H01J2237/06333 ,  H01J2237/166 ,  H01J2237/186 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/2448 ,  H01J2237/2482 ,  H01J2237/2485 ,  H01J2237/2817 ,  H01J2237/2855 ,  H01J2237/2857

Abstract: An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

Abstract translation: 用于使用光束检查检查对象的表面的检查装置包括能够产生电荷粒子或电磁波之一作为光束的光束发生器，能够将所述光束引导并照射到被检查对象的主光学系统 在工作室内，能够包括第一可移动数值孔径的二次光学系统和检测从检查对象产生的二次电荷粒子的第一检测器，通过第一可移动数值孔径的二次电荷粒子，能够 基于由所述第一检测器检测到的次级电荷粒子形成图像; 以及第二检测器，其布置在第一可移动数值孔径和第一检测器之间，并且检测在从检查对象生成的次级充电颗粒的交叉位置处的位置和形状。

公开(公告)号：US10157722B2

公开(公告)日：2018-12-18

申请号：US15195665

申请日：2016-06-28

Applicant: EBARA CORPORATION

Inventor： Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

IPC: H01J37/09 ,  H01J37/073 ,  G01N23/2251 ,  H01J37/20 ,  H01J37/26 ,  H01J37/28 ,  H01J37/29 ,  G01N23/22 ,  G01N23/223 ,  H01J37/10 ,  H01J37/22

Abstract: An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

公开(公告)号：US08946629B2

公开(公告)日：2015-02-03

申请号：US14258607

申请日：2014-04-22

Applicant: Ebara Corporation

Inventor： Masahiro Hatakeyama ,  Yasushi Toma ,  Shoji Yoshikawa ,  Kiwamu Tsukamoto

IPC: G01N23/00 ,  G21K7/00 ,  H01J37/28

CPC classification number: H01J37/22 ,  G01N23/2251 ,  G01N2223/204 ,  G01N2223/611 ,  H01J3/024 ,  H01J37/075 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/2448 ,  H01J2237/2806

Abstract: An inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The primary optical system includes a photoelectron generator having a photoelectronic surface. The base material of the photoelectronic surface is made of material having a higher thermal conductivity than the thermal conductivity of quartz.

Abstract translation: 检查装置包括：用于产生任何带电粒子和电磁波作为光束的光束产生装置; 主光学系统，其将光束引导到保持在工作室中的检查对象中，并用该光束照射检查对象; 第二光学系统，其检测从检查对象发生的次级带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。 主光学系统包括具有光电子表面的光电子发生器。 光电子表面的基材由具有比石英热导率更高的导热性的材料制成。