公开(公告)号：US20240377252A1

公开(公告)日：2024-11-14

申请号：US18292507

申请日：2022-07-22

Applicant: NATIONAL UNIVERSITY OF SINGAPORE

Inventor： Zi Heng LIM ,  Yi QI ,  Senthil Kumar ANANTHARAJAN ,  Chengkuo LEE ,  Guangya ZHOU

IPC: G01J3/02 ,  G01J3/12 ,  G01J3/28

Abstract: Infrared spectrometer and method of performing infrared spectrometry. In one embodiment, the method comprises the steps of providing a first single pixel detector sensitive to infrared light in a first spectral range; providing an entrance slit for receiving an infrared light signal; disposing a moveable encoding mask between the entrance slit and the first single pixel detector for encoding based multiplexing, the moveable encoding mask comprising at least three adjacent coding sections along an encoding moving direction thereof, each coding section comprising the same coding pattern in a cyclic manner such that a last encoding step of one encoding section is the same as a first encoding step in a next encoding section step; disposing a dispersion and imaging optics between the entrance slit and the moveable encoding mask for dispersing the infrared signal and for imaging the dispersed infrared signal onto the moveable encoding mask; disposing a collection optics between the moveable encoding mask and the first single pixel detector for collecting an encoding based multiplexed version of the infrared signal onto the first single pixel photodetector; selectively allowing only one of at least first and second bands within the first spectral range to be imaged onto respective ones of the coding sections excluding a first coding section along the encoding moving direction of the moveable encoding mask, in a starting position of the moveable encoding mask; and moving the moveable encoding mask in the encoding moving direction for the encoding based multiplexing.

公开(公告)号：US12140857B2

公开(公告)日：2024-11-12

申请号：US18225404

申请日：2023-07-24

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Inventor： Chih-Cheng Chen ,  ShinAn Ku ,  Ting-Hao Hsu ,  Hsin-Chang Lee

IPC: G03F1/22 ,  G01B11/22 ,  G01B11/24 ,  G01J3/02

Abstract: A method of scanning a substrate and determining scratches of the substrate includes transmitting a converging beam of light that comprises multiple wavelengths to the substrate. Each wavelength of the multiple wavelengths focuses at a different distance in a focus interval around and including a surface of the substrate. The method also includes receiving reflected light from the surface of the substrate and determining a height or depth of the surface of the substrate based on a wavelength of the reflected light a highest intensity.

公开(公告)号：US12140776B2

公开(公告)日：2024-11-12

申请号：US18231940

申请日：2023-08-09

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Kazumasa Murakami ,  Tatsuya Ogino ,  Shinsuke Okada

IPC: G02B27/10 ,  G01J3/02 ,  G02B6/12 ,  G02B27/14

Abstract: A spectroscopic module includes M beam splitters that are arranged along an X direction, where M is a natural number of 2 or more; M bandpass filters disposed on one side in a Z direction with respect to the M beam splitters, each of the M bandpass filters facing each of the M beam splitters; a light detector disposed on the one side in the Z direction with respect to the M bandpass filters and includes M light receiving regions, each of the M light receiving regions facing each of the M bandpass filters; a first support body supporting the M beam splitters; and a second support body supporting the M bandpass filters. Each of N beam splitters among the M beam splitters has a plate shape and has a thickness of 1 mm or less, where N is a natural number of 2 to M.

公开(公告)号：US12124172B2

公开(公告)日：2024-10-22

申请号：US17634702

申请日：2020-08-05

Applicant: ASML Holding N.V.

Inventor： Alexander Kremer

IPC: G03F7/20 ,  G01J3/02 ,  G01J3/44 ,  G03F7/00

CPC classification number: G03F7/70558 ,  G01J3/021 ,  G01J3/0291 ,  G01J3/4406 ,  G03F7/7085

Abstract: The present disclosure provides an ultraviolet radiation control system and a related method for control an ultraviolet radiation in a lithographic apparatus. The ultraviolet radiation control system comprises a housing; a conversion crystal (540), disposed on or in the housing, configured to convert an ultraviolet radiation to a fluorescent radiation; a plurality of photodetectors (550) configured to detect an intensity of a scattered portion of the fluorescent radiation; and at least one diffusive surface (545), disposed on or in the conversion crystal, configured to increase the intensity of the scattered portion of the fluorescent radiation.

公开(公告)号：US12123827B2

公开(公告)日：2024-10-22

申请号：US17501600

申请日：2021-10-14

Applicant: TAMRON CO., LTD.

Inventor： Jie Li ,  Shunya Fukui

IPC: G01N21/33 ,  G01J3/02 ,  G01J3/42

CPC classification number: G01N21/33 ,  G01J3/0205 ,  G01J3/42

Abstract: In a plasmonic structure, a first conductor layer, a dielectric layer, and a second conductor layer are stacked in this order. The second conductor layer includes a plurality of conductor patterns that is two-dimensionally and periodically arranged, each of the plurality of conductor patterns having a circular shape or a regular polygonal shape. A diameter D of a circle circumscribed on each of the plurality of conductor patterns satisfies 200 nm≤D≤800 nm. A thickness g of the dielectric layer and the diameter D satisfy 0.3≤g/D≤0.6.

公开(公告)号：US12111211B2

公开(公告)日：2024-10-08

申请号：US18323463

申请日：2023-05-25

Applicant: VIAVI Solutions Inc.

Inventor： Michael Klimek

IPC: G01J3/28 ,  G01J3/02

CPC classification number: G01J3/2823 ,  G01J3/0294 ,  G01J3/2803 ,  G01J2003/2826

Abstract: An optical device may comprise an array of sensor elements that includes a plurality of pixels and a multispectral filter disposed on the array of sensor elements. The multispectral filter may be configured to pass a first transmission percentage of light of a particular spectral range to a first set of pixels of the plurality of pixels and pass a second transmission percentage of light of the particular spectral range to a second set of pixels of the plurality of pixels.

公开(公告)号：US12111210B2

公开(公告)日：2024-10-08

申请号：US17859912

申请日：2022-07-07

Applicant: Apple Inc.

Inventor： Mark Alan Arbore ,  Thomas C. Greening ,  Yongming Tu

IPC: G01J3/02 ,  G01J3/10 ,  G01J3/18 ,  G01J3/32 ,  G01J3/45 ,  G02B6/293 ,  G02B6/42 ,  G02B27/10 ,  G02F1/21

CPC classification number: G01J3/0297 ,  G01J3/10 ,  G01J3/108 ,  G01J3/1809 ,  G01J3/32 ,  G01J3/45 ,  G02B6/2938 ,  G02B6/4215 ,  G02B27/10 ,  G01J2003/102 ,  G02F1/212

Abstract: Configurations for light source modules and methods for mitigating coherent noise are disclosed. The light source modules may include multiple light source sets, each of which may include multiple light sources. The light emitted by the light sources may be different wavelengths or the same wavelength depending on whether the light source module is providing redundancy of light sources, increased power, coherent noise mitigation, and/or detector mitigation. In some examples, the light source may emit light to a coupler or a multiplexer, which may then be transmitted to one or more multiplexers. In some examples, the light source modules provide one light output and in other examples, the light source modules provide two light outputs. The light source modules may provide light with approximately zero loss and the wavelengths of light may be close enough to spectroscopically equivalent respect to a sample and far enough apart to provide coherent noise mitigation.

公开(公告)号：US12104957B2

公开(公告)日：2024-10-01

申请号：US17620408

申请日：2020-06-25

Applicant: Protea Ltd

Inventor： Chris Daw ,  Robin Hutchinson

IPC: G01J3/427 ,  G01J3/02 ,  G01J3/10 ,  G01J3/12 ,  G01N21/33 ,  G01N21/3504 ,  G01N33/00 ,  G01N21/31

CPC classification number: G01J3/427 ,  G01J3/0218 ,  G01J3/108 ,  G01J3/12 ,  G01N21/33 ,  G01N21/3504 ,  G01N33/0037 ,  G01N33/0042 ,  G01J2003/102 ,  G01J2003/1213 ,  G01N2021/3155 ,  G01N2201/08

Abstract: The invention relates to a photometer (30) for analysing the composition of a sample gas. The photometer comprises an infra-red (IR) source (20) configured to direct a first plurality of pulses (40) of IR radiation through the sample gas to an IR detector (26), at least two of the first plurality of pulses being of different wavelength. The photometer further comprises an ultraviolet (UV) source (32) configured to generate a second plurality of pulses (38) of UV radiation for conveyance to a UV detector (36), at least two of the second plurality of pulses being of different wavelength. A path selection arrangement (22, 42-50) is configured to selectively convey different ones of the second plurality of pulses (38) to one of the sample gas and the UV detector (36). The photometer further comprises processing circuitry coupled to the IR source (20), the UV source (32), the IR detector (26), the UV detector (36) and the path selection arrangement (22, 42-50). The processing circuitry is configured to (i) select the wavelength to be used for a given UV pulse of the second plurality of pulses (38), (ii) receive a plurality of detection signals from each of the IR detector (26) and the UV detector (36) and (iii) based on the detection signals, determine a concentration of at least one component of the sample gas. A method for analysing the composition of a sample gas is also disclosed.

公开(公告)号：US12104954B2

公开(公告)日：2024-10-01

申请号：US17844919

申请日：2022-06-21

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Suyeon Lee ,  Unjeong Kim ,  Hojung Kim

IPC: G01J3/32 ,  G01J3/02 ,  G01J3/10 ,  G01J3/28 ,  G01N21/01 ,  G01N21/17 ,  G01N21/25 ,  G01N21/31 ,  G01N21/33

CPC classification number: G01J3/32 ,  G01J3/0213 ,  G01J3/10 ,  G01J3/2803 ,  G01J3/2823 ,  G01N21/255 ,  G01N21/314 ,  G01N21/33 ,  G01J2003/2813 ,  G01J2003/2826 ,  G01N2021/0168 ,  G01N2021/1765 ,  G01N2021/317 ,  G01N2201/0221

Abstract: An apparatus for detecting an ultraviolet blocking material includes a light receiver configured to acquire detection light from a target object; a spectrum signal generator configured to generate spectrum signals based on the detection light; and a processor configured to: select a reference wavelength from a range from about 290 nm to about 400 nm, and detect an ultraviolet blocking material based on a first spectrum signal of a first wavelength less than the reference wavelength and a second spectrum signal of a second wavelength greater than the reference wavelength, the first spectrum signal and the second spectrum signal being generated by the spectrum signal generator.

公开(公告)号：US12098957B2

公开(公告)日：2024-09-24

申请号：US17694682

申请日：2022-03-15

Applicant: CaiPu Technology (Zhejiang) Co., Ltd.

Inventor： Kun Yuan ,  Yang Zhang ,  Jian Wang

IPC: G01J3/52 ,  G01J3/02 ,  G01J3/10 ,  G01J3/46 ,  G01N21/47 ,  G01R33/02 ,  G01R33/07

CPC classification number: G01J3/524 ,  G01J3/0229 ,  G01J3/0251 ,  G01J3/0267 ,  G01J3/0272 ,  G01J3/0291 ,  G01J3/10 ,  G01J3/46 ,  G01J3/465 ,  G01N21/4738 ,  G01N21/474 ,  G01J2003/467 ,  G01R33/02 ,  G01R33/072

Abstract: Disclosed are a colorimeter and a reflectivity measuring method based on a multichannel spectrum. The colorimeter includes a main unit and a calibration box, wherein the main unit includes an integrating sphere, a light source and a main sensor, a detection hole is formed in one side of a top of the integrating sphere, a light-through hole is formed in a side of the integrating sphere, and a measuring port is formed in a bottom of the integrating sphere, the light source is arranged outside the light-through hole, and the main sensor is arranged outside the detection hole; the calibration box includes a housing and a white board arranged at a top of the housing, the white board is correspondingly matched with the measuring port, and the calibration box is connected with the main unit; the sensor is a multichannel spectral sensor.