公开(公告)号：US20140109641A1

公开(公告)日：2014-04-24

申请号：US14089516

申请日：2013-11-25

Applicant: SUMITOMO ELECTRIC FINE POLYMER, INC.

Inventor： Kazuaki IKEDA ,  Nobutaka MATSUSHITA ,  Yoshimasa SUZUKI

IPC: B23P13/00

CPC classification number: B23P13/00 ,  A47J36/02 ,  A47J36/025 ,  B05D3/0486 ,  B05D3/068 ,  B05D5/083 ,  B05D2701/10 ,  B29C71/04 ,  B32B1/00 ,  B32B15/08 ,  B32B15/18 ,  B32B15/20 ,  B32B27/08 ,  B32B27/281 ,  B32B27/30 ,  B32B27/304 ,  B32B27/322 ,  B32B27/34 ,  B32B2307/306 ,  B32B2307/554 ,  B32B2307/714 ,  B32B2413/00 ,  B32B2439/00 ,  B32B2509/00 ,  C09D127/18 ,  C09D129/10 ,  G03G15/0233 ,  G03G15/0808 ,  G03G2215/16 ,  G03G2215/2048 ,  Y10T428/21 ,  Y10T428/265 ,  Y10T428/3154

Abstract: A fluorocarbon resin composite includes a fluorocarbon resin layer on a base, in which a fluorocarbon resin constituting the fluorocarbon resin layer is crosslinked by electron beam irradiation, and the base has a desired shape obtained by machining. The fluorocarbon resin is composed of a tetrafluoroethylene-perfluoro(alkyl vinyl ether) copolymer, polytetrafluoroethylene, or a mixture of the tetrafluoroethylene-perfluoro(alkyl vinyl ether) copolymer and polytetrafluoroethylene. A fluorocarbon resin composite, cookware, and a roller and a belt for use in office automation equipment are each produced by applying an uncrosslinked fluorocarbon resin on a base, subjecting the fluorocarbon resin to electron beam irradiation in a low-oxygen atmosphere to crosslink the fluorocarbon resin while the temperature of the fluorocarbon resin is maintained at a temperature equal to or higher than the melting point of the fluorocarbon resin, and machining the base into a desired shape. There is also provided methods for producing them.

公开(公告)号：US20130243972A1

公开(公告)日：2013-09-19

申请号：US13889485

申请日：2013-05-08

Applicant: 3M INNOVATIVE PROPERTIES COMPANY

Inventor： JAMES M. NELSON ,  MITCHELL A. F. JOHNSON ,  WILLIAM BLAKE KOLB ,  PATRICK R. FLEMING ,  PAUL E. HUMPAL ,  CHIEU S. NGUYEN ,  CHARLES A. EVERTZ ,  JACK W. LAI ,  MIKHAIL L. PEKUROVSKY

IPC: B05D3/06 ,  B05D3/00

CPC classification number: B05D3/067 ,  B05D1/002 ,  B05D1/005 ,  B05D1/26 ,  B05D3/007 ,  B05D3/0209 ,  B05D3/0486 ,  B05D2254/02 ,  B05D2502/00 ,  B05D2503/00 ,  B05D2504/00 ,  Y10T428/24628

Abstract: A method for coating a work piece with resin including applying a controlled volume of liquid resin to the work piece with an applicator and allowing consecutive streams of resin to meld together to form a self leveling surface. The resin can be actively or passively cured. The work piece can be planar or cylindrical.

Abstract translation: 一种用树脂涂覆工件的方法，包括用施加器将受控体积的液体树脂施加到工件上，并允许连续的树脂流合并形成自流平表面。 可以主动或被动地固化树脂。 工件可以是平面的或圆柱形的。

公开(公告)号：US08440267B2

公开(公告)日：2013-05-14

申请号：US10547725

申请日：2004-03-04

Applicant: Katsuhiro Mori ,  Junji Momoda ,  Naoto Takahashi

Inventor： Katsuhiro Mori ,  Junji Momoda ,  Naoto Takahashi

IPC: C08F2/48

CPC classification number: B05D3/067 ,  B05D1/002 ,  B05D3/0486 ,  B05D5/061 ,  G02B1/105 ,  G02B1/14 ,  G02B1/16

Abstract: A process for efficiently forming a thick coating layer having a uniform thickness on the surface of a base material having a curved surface. The process comprises the steps of forming a coating film having a predetermined thickness by applying a coating agent containing a polymerizable monomer on the curved surface of a base material, and then curing the coating film in an atmosphere of an oxygen concentration of not more than 500 ppm by photo-polymerization while substantially maintaining the uniformity of the thickness of the coating film. Preferably, the photo-polymerization of the coating film is carried out while rotating the base material at a rotational speed of from 20 to 1500 rpm.

Abstract translation: 在具有弯曲表面的基材的表面上有效地形成具有均匀厚度的厚涂层的方法。 该方法包括以下步骤：通过在基材的曲面上涂布含有聚合性单体的涂布剂，形成具有规定厚度的涂膜，然后在氧浓度为500以下的气氛中使涂膜固化 通过光聚合，同时基本上保持涂膜厚度的均匀性。 优选地，在以20-1500rpm的转速旋转基材的同时进行涂膜的光聚合。

公开(公告)号：US20130017401A1

公开(公告)日：2013-01-17

申请号：US13577349

申请日：2011-02-03

Applicant: Daniel Rehage ,  Lars Schrubke ,  Klaus-Dieter Kampmeier

Inventor： Daniel Rehage ,  Lars Schrubke ,  Klaus-Dieter Kampmeier

IPC: B32B15/08 ,  B05D1/02 ,  C23C14/28 ,  B05D3/00

CPC classification number: B05D1/08 ,  A47B88/493 ,  B05D1/10 ,  B05D3/0272 ,  B05D3/0486 ,  B05D3/065 ,  B05D3/12 ,  B05D5/083 ,  B05D7/50 ,  B05D2350/65 ,  B05D2506/10 ,  B05D2506/15 ,  C08L27/18 ,  C08L71/00 ,  C08L2205/02 ,  C09D127/18 ,  F24C15/023 ,  F24C15/168 ,  Y10T428/31678

Abstract: A metal component for one or more of a fitting, a piece of furniture, and a household appliance. The metal component, at least sectionally, has a coating which comprises at least one perfluoroalkoxy copolymer. A method for producing a metal component for one or more of a fitting, a piece of furniture, and a household appliance, wherein the method comprises the following steps: forming the metal component; pretreating the metal component; applying a coating, which coating comprises at least a perfluoroalkoxy copolymer; curing the applied coating; and cooling the coated metal component.

Abstract translation: 用于一个或多个配件，一件家具和家用电器的金属部件。 该金属组分至少在剖面上具有包含至少一种全氟烷氧基共聚物的涂层。 一种用于一件或多件装配件，家具和家用电器的金属部件的制造方法，其中，所述方法包括以下步骤：形成所述金属部件; 预处理金属部件; 施加涂层，该涂层包含至少全氟烷氧基共聚物; 固化涂层; 并冷却涂覆的金属组分。

公开(公告)号：US20130011555A1

公开(公告)日：2013-01-10

申请号：US13557328

申请日：2012-07-25

Applicant: Ikuo SAWADA ,  Kazuyoshi MATSUZAKI ,  Takashi TANAKA ,  Mitsuaki IWASHITA ,  Mizue MUNAKATA

Inventor： Ikuo SAWADA ,  Kazuyoshi MATSUZAKI ,  Takashi TANAKA ,  Mitsuaki IWASHITA ,  Mizue MUNAKATA

IPC: B05D3/04 ,  B05D3/12

CPC classification number: B05D1/005 ,  B05C11/06 ,  B05C11/08 ,  B05D3/0406 ,  B05D3/0486 ,  B05D2203/30 ,  B05D2203/35 ,  G03F7/162 ,  H01L21/67017 ,  H01L21/67023 ,  H01L21/6715

Abstract: The invention is a coating apparatus including: a substrate-holding part that holds a substrate horizontally; a chemical nozzle that supplies a chemical to a central portion of the substrate horizontally held by the substrate-holding part; a rotation mechanism that causes the substrate-holding part to rotate to thereby spread out the chemical on a surface of the substrate by centrifugal force, for coating the whole surface with the chemical; a gas-flow-forming unit that forms a down flow of an atmospheric gas on the surface of the substrate horizontally held by the substrate-holding part; a gas-discharging unit that discharges an atmosphere around the substrate; and a gas nozzle that supplies a laminar-flow-forming gas to the surface of the substrate, the laminar-flow-forming gas having a coefficient of kinematic viscosity larger than that of the atmospheric gas; wherein the atmospheric gas or the laminar-flow-forming gas are supplied to the central portion of the substrate.

Abstract translation: 本发明是一种涂覆装置，包括：水平保持基板的基板保持部; 化学喷嘴，其向由所述基板保持部水平保持的所述基板的中央部供给化学品; 旋转机构，其使基板保持部旋转，由此通过离心力在基板的表面上分散化学品，用化学品涂布整个表面; 气体流动形成单元，其在由所述基板保持部水平保持的所述基板的表面上形成气氛气体的向下流动; 气体排出单元，其排出基板周围的气氛; 以及气体喷嘴，其向所述基板的表面供给层流形成气体，所述层流形成气体的运动粘度系数大于所述气氛气体的系数; 其中所述大气气体或层流形成气体被供应到所述基板的中心部分。

公开(公告)号：US08246759B2

公开(公告)日：2012-08-21

申请号：US12474336

申请日：2009-05-29

Applicant: Norihiro Itoh ,  Jiro Higashijima

Inventor： Norihiro Itoh ,  Jiro Higashijima

IPC: B08B3/00

CPC classification number: H01L21/67051 ,  B05D1/002 ,  B05D3/0486 ,  H01L21/68728 ,  H01L21/68742 ,  H01L21/68792

Abstract: There is provided a substrate processing apparatus capable of stably holding a substrate and properly processing the substrate. The substrate processing apparatus is an apparatus that processes a substrate while rotating the substrate, with a place surface of the substrate being oriented in a horizontal direction. The substrate processing apparatus comprises a table including a rotatable base plate having a plurality of projecting members projected outward, and a rotation driving mechanism that rotates the base plate. The table can rotatably hold the substrate such that the projecting members contact the substrate from below with a gap formed between the substrate and the table. The substrate processing apparatus further comprises a pressure adjusting apparatus including a suction duct line having one end thereof being opened to the gap, and a suction mechanism connected to the other end of the suction duct line.

Abstract translation: 提供了能够稳定地保持基板并适当地处理基板的基板处理装置。 基板处理装置是在基板旋转的同时处理基板的装置，其中基板的位置表面沿水平方向取向。 基板处理装置包括具有向外突出的多个突出部件的旋转基板的台面和使基板旋转的旋转驱动机构。 工作台可旋转地保持基板，使得突出构件从下方接触基板和形成在基板和台之间的间隙。 基板处理装置还包括压力调节装置，该压力调节装置具有其一端与间隙开口的吸入管路线路，以及与吸入管路线路的另一端连接的吸引机构。

公开(公告)号：US20120156380A1

公开(公告)日：2012-06-21

申请号：US13401617

申请日：2012-02-21

Applicant: Yoshiteru Fukutomi ,  Tsuyoshi Mitsuhashi ,  Hiroyuki Ogura ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

Inventor： Yoshiteru Fukutomi ,  Tsuyoshi Mitsuhashi ,  Hiroyuki Ogura ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

IPC: B05D3/02 ,  B05D3/00

CPC classification number: H01L21/67178 ,  B05B14/43 ,  B05B14/44 ,  B05C13/00 ,  B05C13/02 ,  B05D3/0486 ,  G03F7/26 ,  H01L21/67017 ,  H01L21/6715 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67225 ,  H01L23/34 ,  H01L2924/0002 ,  Y10S414/135 ,  H01L2924/00

Abstract: A substrate treating method for treating substrates with a substrate treating apparatus having an indexer section, a treating section and an interface section includes performing resist film forming treatment in parallel on a plurality of stories provided in the treating section and performing developing treatment in parallel on a plurality of stories provided in the treating section.

Abstract translation: 用具有分度器部分，处理部分和界面部分的基板处理装置处理基板的基板处理方法包括在设置在处理部分中的多个故事层并行地进行抗蚀剂膜形成处理，并且在 在治疗部分设置多个故事。

公开(公告)号：US20120145074A1

公开(公告)日：2012-06-14

申请号：US13401644

申请日：2012-02-21

Applicant: Yoshiteru Fukutomi ,  Tsuyoshi Mitsuhashi ,  Hiroyuki Ogura ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

Inventor： Yoshiteru Fukutomi ,  Tsuyoshi Mitsuhashi ,  Hiroyuki Ogura ,  Kenya Morinishi ,  Yasuo Kawamatsu ,  Hiromichi Nagashima

IPC: B05C13/02

CPC classification number: H01L21/67178 ,  B05B14/43 ,  B05B14/44 ,  B05C13/00 ,  B05C13/02 ,  B05D3/0486 ,  G03F7/26 ,  H01L21/67017 ,  H01L21/6715 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67225 ,  H01L23/34 ,  H01L2924/0002 ,  Y10S414/135 ,  H01L2924/00

Abstract: A substrate treating apparatus includes a treating block including a plurality of cells arranged one over another. Each cell has treating units for treating substrates and a single main transport mechanism for transporting the substrates to the treating units. Each cell also has a blowout unit for supplying a clean gas into a transporting space of the main transport mechanism and an exhaust unit for exhausting gas from the transporting space. The blowout unit and the exhaust unit are arranged one over the other in the transporting space to separate the transporting space of each cell from that of another cell.

Abstract translation: 一种基板处理装置，包括处理块，该处理块包括多个彼此排列的单元。 每个电池具有用于处理基板的处理单元和用于将基板输送到处理单元的单个主输送机构。 每个电池还具有用于向主输送机构的输送空间供给清洁气体的吹出单元和用于从输送空间排出气体的排气单元。 喷出单元和排气单元在传送空间中彼此重叠配置，以将每个单元的传送空间与另一个单元的传送空间分开。

公开(公告)号：US20120145073A1

公开(公告)日：2012-06-14

申请号：US13401625

申请日：2012-02-21

Applicant: Yoshiteru Fukutomi ,  Tsuyoshi MITSUHASHI ,  Hiroyuki OGURA ,  Kenya MORINISHI ,  Yasuo KAWAMATSU ,  Hiromichi NAGASHIMA

Inventor： Yoshiteru Fukutomi ,  Tsuyoshi MITSUHASHI ,  Hiroyuki OGURA ,  Kenya MORINISHI ,  Yasuo KAWAMATSU ,  Hiromichi NAGASHIMA

IPC: B05C11/00

CPC classification number: H01L21/67178 ,  B05B14/43 ,  B05B14/44 ,  B05C13/00 ,  B05C13/02 ,  B05D3/0486 ,  G03F7/26 ,  H01L21/67017 ,  H01L21/6715 ,  H01L21/67173 ,  H01L21/67184 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67225 ,  H01L23/34 ,  H01L2924/0002 ,  Y10S414/135 ,  H01L2924/00

Abstract: A substrate treating apparatus includes a treating block including a plurality of cells arranged one over another. Each cell has treating units for treating substrates and a single main transport mechanism disposed in a transporting space for transporting the substrates to the treating units. The treating units include solution treating units and heat-treating units. The solution treating units are arranged at one side of the transporting space, the heat-treating units are arranged at the other side of the transporting space, and the main transport mechanism and the treating units are in substantially the same layout in plan view for the respective cells. The solution treating units are in substantially the same layout in side view for the respective cells, the heat-treating units are in substantially the same layout in side view for the respective cells, and treatments of the substrates carried out in the respective cells are the same.

Abstract translation: 一种基板处理装置，包括处理块，该处理块包括多个彼此排列的单元。 每个单元具有用于处理基板的处理单元和设置在用于将基板输送到处理单元的输送空间中的单个主输送机构。 处理单元包括溶液处理单元和热处理单元。 溶液处理单元布置在传送空间的一侧，热处理单元布置在传送空间的另一侧，主传送机构和处理单元在平面图中基本相同的布局 各自的细胞。 溶液处理单元在各个单元的侧视图中基本相同的布局，热处理单元在各个单元的侧视图中基本相同的布局，并且在各单元中执行的基板的处理是 相同。

公开(公告)号：US20120102780A1

公开(公告)日：2012-05-03

申请号：US13283501

申请日：2011-10-27

Applicant: Daryl J. Bruischat

Inventor： Daryl J. Bruischat

IPC: F26B3/00 ,  F26B21/06

CPC classification number: B05D3/0486 ,  B05C15/00 ,  B05D3/007 ,  B05D7/14 ,  F26B15/12 ,  F26B21/004 ,  F26B21/08 ,  F26B2210/12

Abstract: A drying system for drying a coating applied to an article of manufacture. The drying system includes an enclosable booth having an interior for housing the article of manufacture. The system also includes an air source for blowing air into the booth, means for raising the temperature of the air before entry into the booth, means for lowering the temperature of the air before entry into the booth, means for raising the humidity of the air before entry into the booth, and means for lowering the humidity of the air before entry into the booth. In one embodiment there is included at least one distribution cone which includes a conical member having a plurality of openings formed along the axis thereof. The cones emit air across an article of manufacture within the booth.

Abstract translation: 用于干燥施加到制品上的涂层的干燥系统。 干燥系统包括具有用于容纳制品的内部的可封闭的展位。 该系统还包括用于将空气吹入展位的空气源，用于在进入展位之前提高空气的温度的装置，用于在进入展位之前降低空气的温度的装置，用于提高空气湿度的装置 在进入展位之前，以及在进入展位之前降低空气湿度的方法。 在一个实施例中，包括至少一个分配锥体，其包括具有沿其轴线形成的多个开口的圆锥形构件。 锥体在展位内的制品上排放空气。