公开(公告)号：US20160358743A1

公开(公告)日：2016-12-08

申请号：US15176147

申请日：2016-06-07

Applicant: Purdue Research Foundation

Inventor： Liang Pan ,  Xianfan Xu

IPC: H01J37/10 ,  H01J37/12 ,  H01J37/317 ,  H01J37/06

CPC classification number: H01J37/10 ,  G02B5/008 ,  H01J37/06 ,  H01J37/073 ,  H01J37/12 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2201/342 ,  H01J2237/0492 ,  H01J2237/062 ,  H01J2237/06333 ,  H01J2237/202 ,  H01J2237/20221

Abstract: A system for generating an electron beam array, comprising a light source, a first substrate having a plurality of plasmonic lenses mounted thereon, the plasmonic lenses configured to received light from the light source and produce an electron emission, and a plurality of electrostatic microlenses configured to focus the electron emissions into a beam for focusing on a wafer substrate. A light source modulator and digital micro mirror may be included which captures light from the light source and projects light beamlets on the plasmonic lenses.

Abstract translation: 一种用于产生电子束阵列的系统，包括光源，具有安装在其上的多个等离子体透镜的第一基板，所述等离子体激元被配置为接收来自光源的光并产生电子发射，以及多个静电微透镜配置 将电子发射聚焦到用于聚焦在晶片衬底上的光束。 可以包括光源调制器和数字微反射镜，其捕获来自光源的光并将等离子体透镜上的光束投射。

公开(公告)号：US20160307726A1

公开(公告)日：2016-10-20

申请号：US15195665

申请日：2016-06-28

Applicant: EBARA CORPORATION

Inventor： Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

IPC: H01J37/09 ,  G01N23/225 ,  H01J37/28 ,  H01J37/22 ,  H01J37/10

CPC classification number: H01J37/073 ,  G01N23/22 ,  G01N23/223 ,  G01N23/2251 ,  G01N2223/611 ,  H01J1/34 ,  H01J37/09 ,  H01J37/10 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/0048 ,  H01J2237/022 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/045 ,  H01J2237/0458 ,  H01J2237/0473 ,  H01J2237/0492 ,  H01J2237/061 ,  H01J2237/06333 ,  H01J2237/166 ,  H01J2237/186 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/2448 ,  H01J2237/2482 ,  H01J2237/2485 ,  H01J2237/2817 ,  H01J2237/2855 ,  H01J2237/2857

Abstract: An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

Abstract translation: 用于使用光束检查检查对象的表面的检查装置包括能够产生电荷粒子或电磁波之一作为光束的光束发生器，能够将所述光束引导并照射到被检查对象的主光学系统 在工作室内，能够包括第一可移动数值孔径的二次光学系统和检测从检查对象产生的二次电荷粒子的第一检测器，通过第一可移动数值孔径的二次电荷粒子，能够 基于由所述第一检测器检测到的次级电荷粒子形成图像; 以及第二检测器，其布置在第一可移动数值孔径和第一检测器之间，并且检测在从检查对象生成的次级充电颗粒的交叉位置处的位置和形状。

公开(公告)号：US20160268929A1

公开(公告)日：2016-09-15

申请号：US14657234

申请日：2015-03-13

Applicant: Ho Seob KIM ,  Byeng Jin KIM ,  Do Jin SEONG

Inventor： Ho Seob KIM ,  Byeng Jin KIM ,  Do Jin SEONG

IPC: H02N2/02 ,  H01J37/10 ,  H01J37/26 ,  H01J37/20

CPC classification number: H01J37/261 ,  H01J37/10 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/10 ,  H01J2237/20207 ,  H01J2237/20228 ,  H01J2237/20235 ,  H01J2237/20264 ,  H01J2237/2602 ,  H02N2/006 ,  H02N2/026

Abstract: Disclosed herein is a micro stage using a piezoelectric element that can be reliably operated even in a vacuum environment. In a particle column requiring a high precision, for example, a microelectronic column, the micro stage can be used as a stage with micro or nano degree precision for alignment of parts of the column, or for moving a sample, and so on.

Abstract translation: 这里公开了使用即使在真空环境中也可靠地运行的压电元件的微型平台。 在需要高精度的微粒子柱（例如微电子柱）中，微型载物台可以用作具有微量级或纳米级精度的阶段，用于校准塔的部分或用于移动样品等。

公开(公告)号：US20160225581A1

公开(公告)日：2016-08-04

申请号：US15022436

申请日：2014-10-31

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Takashi KUBO ,  Hiroyuki KOBAYASHI

IPC: H01J37/22 ,  H01J37/10 ,  H01J37/26

CPC classification number: H01J37/222 ,  H01J37/10 ,  H01J37/22 ,  H01J37/261 ,  H01J37/263 ,  H01J2237/045 ,  H01J2237/103 ,  H01J2237/221 ,  H01J2237/248 ,  H01J2237/2602

Abstract: To improve the workability of the task of adjusting the position of a limit field diaphragm. An electron microscope provided with an image-capturing means for capturing an image of an observation visual field prior to insertion of a limit field diaphragm as a map image, a recording means for recording the map image, an extraction means for capturing an image of the observation visual field after insertion of the limit field diaphragm and extracting the outline of the diaphragm, a drawing means for drawing the outline on the map image, and a display means for displaying the image drawn by the drawing means.

Abstract translation: 提高调节极限场隔膜位置任务的可操作性。 一种具有图像捕获装置的电子显微镜，其用于在作为地图图像的极限场光阑插入之前捕获观察视野的图像，用于记录地图图像的记录装置，用于拍摄图像的图像的提取装置 插入极限视场光阑并提取光阑的轮廓之后的观察视野，用于在地图图像上绘制轮廓的绘图装置，以及显示由绘图装置绘制的图像的显示装置。

公开(公告)号：US09336992B2

公开(公告)日：2016-05-10

申请号：US14746277

申请日：2015-06-22

Applicant: Sumitomo Heavy Industries Ion Technology Co., Ltd.

Inventor： Yoshitaka Amano

IPC: H01J37/00 ,  H01J37/317 ,  H01J37/10 ,  H01J37/244

CPC classification number: H01J37/3171 ,  H01J37/10 ,  H01J37/244 ,  H01J2237/038 ,  H01J2237/1202 ,  H01J2237/16

Abstract: An ion implantation apparatus includes: a lens electrode unit including a plurality of electrode sections for parallelizing an ion beam; and a vacuum unit that houses the lens electrode unit in a vacuum environment. The vacuum unit includes: a first vacuum container having a first conductive container wall; a second vacuum container having a second conductive container wall; and an insulating container wall that allows the first vacuum container and the second vacuum container to communicate with each other and that insulates the first conductive container wall from the second conductive container wall. An insulating member is provided that insulates at least one electrode section of the lens electrode unit from at least one of the first conductive container wall and the second conductive container wall, and the insulating member is housed in the vacuum environment together with the lens electrode unit.

Abstract translation: 离子注入装置包括：透镜电极单元，包括用于使离子束平行化的多个电极部分; 以及在真空环境中容纳透镜电极单元的真空单元。 真空单元包括：具有第一导电容器壁的第一真空容器; 具有第二导电容器壁的第二真空容器; 以及允许第一真空容器和第二真空容器彼此连通并使第一导电容器壁与第二导电容器壁绝缘的绝缘容器壁。 提供了一种绝缘构件，其将透镜电极单元的至少一个电极部分与第一导电容器壁和第二导电容器壁中的至少一个绝缘，并且绝缘构件与透镜电极单元一起容纳在真空环境中 。

公开(公告)号：US09324540B2

公开(公告)日：2016-04-26

申请号：US14407117

申请日：2013-04-12

Applicant: Hitachi High-Technologies Corporation

Inventor： Ichiro Tachibana ,  Naomasa Suzuki

IPC: H01J37/26 ,  G21K5/04 ,  H01J37/21 ,  H01J37/28 ,  H01J37/10 ,  H01J37/147

CPC classification number: H01J37/21 ,  H01J37/10 ,  H01J37/147 ,  H01J37/263 ,  H01J37/28 ,  H01J37/3178 ,  H01J2237/04756 ,  H01J2237/0492 ,  H01J2237/063 ,  H01J2237/10 ,  H01J2237/15 ,  H01J2237/21 ,  H01J2237/244 ,  H01J2237/2602 ,  H01J2237/281

Abstract: When a signal electron is detected by energy selection by combining and controlling retarding and boosting for observation of a deep hole, etc., the only way for focus adjustment is to use a change in magnetic field of an objective lens. However, since responsiveness of the change in magnetic field is poor, throughput reduces. A charged particle beam device includes: an electron source configured to generate a primary electron beam; an objective lens configured to focus the primary electron beam; a deflector configured to deflect the primary electron beam; a detector configured to detect a secondary electron or a reflection electron generated from a sample by irradiation of the primary electron beam; an electrode having a hole through which the primary electron beam passes; a voltage control power supply configured to apply a negative voltage to the electrode; and a retarding voltage control power supply configured to generate an electric field, which decelerates the primary electron beam, on the sample by applying the negative voltage to the sample, wherein the charged particle beam device performs focus adjustment while an offset between the voltage applied to the electrode and the voltage applied to the sample is being kept constant.

Abstract translation: 当通过组合并控制用于观察深孔等的延迟和升压来进行能量选择来检测信号电子时，聚焦调整的唯一方式是使用物镜的磁场变化。 然而，由于磁场变化的响应性差，吞吐量降低。 带电粒子束装置包括：电子源，被配置为产生一次电子束; 配置成聚焦一次电子束的物镜; 偏转器，被配置为偏转所述一次电子束; 检测器，被配置为通过一次电子束的照射来检测从样品产生的二次电子或反射电子; 具有一次电子束通过的孔的电极; 电压控制电源，被配置为向所述电极施加负电压; 以及延迟电压控制电源，被配置为通过向样本施加负电压来产生使样品上的一次电子束减速的电场，其中带电粒子束装置执行焦点调整，同时施加到 施加到样品的电极和电压保持恒定。

公开(公告)号：US20160035533A1

公开(公告)日：2016-02-04

申请号：US14800098

申请日：2015-07-15

Applicant: Hermes Microvision Inc.

Inventor： Weiming Ren ,  Joe Wang ,  Shuai Li ,  Zhongwei Chen

IPC: H01J37/05 ,  H01J37/28 ,  H01J37/10

CPC classification number: H01J37/05 ,  H01J37/10 ,  H01J37/12 ,  H01J37/244 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/057 ,  H01J2237/12 ,  H01J2237/14

Abstract: This invention provides two methods for improving performance of an energy-discrimination detection device with an energy filter of reflective type for a charged particle beam. The first method employs a beam-adjusting means to improve the energy-discrimination power, and the second method uses an electron-multiplication means to enhance the image signal without noise raise. A LVSEM with such an improved energy-discrimination detection device can provide variant high-contrast images of interested features on a specimen surface for multiple application purposes.

Abstract translation: 本发明提供了两种用于利用带电粒子束的反射型能量滤波器来改善能量鉴别检测装置的性能的方法。 第一种方法采用光束调节装置来提高能量鉴别能力，第二种方法使用电子倍增装置来增强图像信号而没有噪声提高。 具有这种改进的能量鉴别检测装置的LVSEM可以在样本表面上提供用于多种应用目的的感兴趣特征的变体高对比度图像。

公开(公告)号：US20150332888A1

公开(公告)日：2015-11-19

申请号：US14653138

申请日：2014-02-14

Applicant: LAWRENCE LIVERMORE NATIONAL SECURITY, LLC

Inventor： Bryan W. REED ,  William J. DEHOPE ,  Glenn HUETE ,  Thomas B. LAGRANGE ,  Richard M. SHUTTLESWORTH

IPC: H01J37/073 ,  H01J37/10 ,  H01J37/147 ,  H01J37/21

CPC classification number: H01J37/073 ,  H01J37/10 ,  H01J37/147 ,  H01J37/21 ,  H01J37/22 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/06333 ,  H01J2237/10 ,  H01J2237/15 ,  H01J2237/2626 ,  H01J2237/2802

Abstract: An electron microscope is disclosed which has a laser-driven photocathode and an arbitrary waveform generator (AWG) laser system (“laser”). The laser produces a train of temporally-shaped laser pulses each being of a programmable pulse duration, and directs the laser pulses to the laser-driven photocathode to produce a train of electron pulses. An image sensor is used along with a deflector subsystem. The deflector subsystem is arranged downstream of the target but upstream of the image sensor, and has a plurality of plates. A control system having a digital sequencer controls the laser and a plurality of switching components, synchronized with the laser, to independently control excitation of each one of the deflector plates. This allows each electron pulse to be directed to a different portion of the image sensor, as well as to enable programmable pulse durations and programmable inter-pulse spacings.

Abstract translation: 公开了一种具有激光驱动光电阴极和任意波形发生器（AWG）激光系统（“激光”）的电子显微镜。 激光器产生一系列时间成形的激光脉冲，每个激光脉冲具有可编程脉冲持续时间，并将激光脉冲引导到激光驱动的光电阴极以产生一系列电子脉冲。 图像传感器与偏转器子系统一起使用。 偏转器子系统布置在目标的下游，但是在图像传感器的上游，并且具有多个板。 具有数字定序器的控制系统控制激光器和与激光器同步的多个开关部件，以独立地控制每个偏转板的激励。 这允许每个电子脉冲被引导到图像传感器的不同部分，以及使能可编程脉冲持续时间和可编程脉冲间隔。

公开(公告)号：US20150235801A1

公开(公告)日：2015-08-20

申请号：US14422423

申请日：2013-08-07

Applicant: Hitachi High-Technologies Corporation

Inventor： Hisanao Akima ,  Takaho Yoshida

IPC: H01J37/153 ,  H01J37/10 ,  H01J37/26

CPC classification number: H01J37/153 ,  H01J37/10 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/216 ,  H01J2237/2614

Abstract: In aberration measurement, a focus or an inclination angle of a beam is changed to extract a characteristic amount from plural images of an electron microscope, so that an aberration coefficient indicating the size and direction of aberration is obtained. However, when the aberration is extremely large, the electron microscope images are greatly distorted, which causes difficulties in extraction of the feature amount.A charged-particle-beam device includes a charged-particle-beam source, a charged-particle optical system that irradiates a specimen with charged particles emitted from the charged-particle-beam source, an aberration corrector that corrects an aberration of the charged-particle optical system, a control unit that controls the charged-particle optical system and the aberration corrector, a through-focus imaging unit that obtains plural Ronchigrams in which a focal position of the charged-particle optical system is changed, and an aberration calculation unit that divides the obtained Ronchigram into plural local areas, and calculates the amount of the aberration based on line focuses detected in the local areas.

Abstract translation: 在像差测量中，改变光束的焦点或倾斜角度以从电子显微镜的多个图像中提取特征量，从而获得表示像差的尺寸和方向的像差系数。 然而，当像差非常大时，电子显微镜图像被极大地变形，这导致特征量的提取困难。 带电粒子束装置包括带电粒子束源，从带电粒子束源发射的带电粒子照射样本的带电粒子光学系统，校正带电粒子束的像差的像差校正器， 粒子光学系统，控制带电粒子光学系统和像差校正器的控制单元，获得其中改变带电粒子光学系统的焦点位置的多个Ronchigram的通过焦点成像单元，以及像差计算单元 将所获得的Ronchigram分割成多个局部区域，并且基于在局部区域中检测到的线焦点来计算像差量。

公开(公告)号：US20150090895A1

公开(公告)日：2015-04-02

申请号：US14479648

申请日：2014-09-08

Applicant: Mapper Lithography IP B.V.

Inventor： Johan Joost Koning ,  David Johannes van den Bergen

IPC: H01J37/30 ,  B01J19/12 ,  H01J37/10

CPC classification number: H01J37/023 ,  B01J19/12 ,  G03F7/708 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70891 ,  G03F7/709 ,  G03F7/70975 ,  H01J37/10 ,  H01J37/20 ,  H01J37/3007 ,  H01J37/3177

Abstract: The invention relates to a projection lens assembly for directing a beam toward a target. This assembly includes a lens support body (52) that spans a plane (P), and has a connection region (58) and a lateral edge (56). The lens support body is arranged for insertion into a frame (42) of a processing unit along an insertion direction (X) parallel with the plane (P). The projection lens assembly includes conduits (60-64) emanating from the connection region, and a conduit guiding body (70-81) for accommodating the conduits. The guiding body includes a first guiding portion (72) for guiding the conduits from the connection region, along the plane to a lateral region (B) beyond the lateral edge. The guiding body also includes a second guiding portion (78) for guiding the conduits from the lateral region (B) toward a tilted edge (79) of the conduit guiding body.

Abstract translation: 本发明涉及一种用于将光束导向目标的投影透镜组件。 该组件包括跨越平面（P）的透镜支撑体（52），并具有连接区域（58）和侧边缘（56）。 透镜支撑体被布置成沿着与平面（P）平行的插入方向（X）插入到处理单元的框架（42）中。 投影透镜组件包括从连接区域发出的导管（60-64）和用于容纳导管的导管引导体（70-81）。 引导体包括用于将导管从连接区域沿着该平面引导到超过侧边缘的横向区域（B）的第一引导部分（72）。 引导体还包括用于将管道从侧向区域（B）引导到导管引导体的倾斜边缘（79）的第二引导部分（78）。