公开(公告)号：US09255863B2

公开(公告)日：2016-02-09

申请号：US14473637

申请日：2014-08-29

Applicant: Lee H. Angros

Inventor： Lee H. Angros

IPC: B05C9/14 ,  B01L3/00 ,  B05D1/20 ,  G01N1/30 ,  B01L99/00 ,  B05C1/02 ,  B05C11/02 ,  B05C13/02 ,  B05D1/02 ,  B05D7/00 ,  B01L3/02 ,  B05C9/06 ,  B05D1/28

CPC classification number: G01N1/30 ,  B01L3/0258 ,  B01L3/508 ,  B01L99/00 ,  B01L2200/12 ,  B01L2300/0822 ,  B01L2300/16 ,  B01L2300/161 ,  B05C1/025 ,  B05C9/06 ,  B05C9/14 ,  B05C11/028 ,  B05C13/02 ,  B05D1/02 ,  B05D1/20 ,  B05D1/28 ,  B05D7/5483 ,  B05D2252/04 ,  G01N2001/305 ,  Y10T156/179 ,  Y10T156/1798

Abstract: An apparatus and method for producing a coated analytic substrate using a compact and portable automated instrument located in the laboratory setting at the point of use which can consistently produce one or a plurality of coated analytic substrates “on demand” for using the analytic substrate immediately after coating, preferably without a step of rinsing the coated analytic substrate before use. The apparatus preferably uses applicator cartridges having a reservoir containing the coating compositions used to form the coatings. Preferably the cartridges are removable and interchangeable to facilitate the production of individual analytic substrates having different coatings or different coating patterns. These coated analytic substrates have superior specimen adhesion characteristics due to the improved quality of the coatings applied by the coating apparatus and due to the quickness with which the coated analytic substrates can be used in the lab after production.

Abstract translation: 使用位于实验室设置中的紧凑且便携式的自动化仪器来生产涂覆的分析基底的装置和方法，其可以在“使用”上一致地产生一个或多个涂覆的分析基底，以便立即使用分析底物 优选在使用前没有漂洗涂覆的分析底物的步骤。 该设备优选地使用具有包含用于形成涂层的涂料组合物的储存器的涂布器盒。 优选地，盒是可移除的和可互换的，以便于生产具有不同涂层或不同涂层图案的各个分析基底。 这些涂布的分析基材由于涂覆设备施加的涂层质量的提高以及涂层分析基材在生产后可以在实验室中使用的快速性而具有优异的样品粘附特性。

公开(公告)号：US09214363B2

公开(公告)日：2015-12-15

申请号：US13937833

申请日：2013-07-09

Applicant: TOKYO ELECTRON LIMITED

Inventor： Hideharu Kyouda ,  Taro Yamamoto

IPC: B05C11/02 ,  H01L21/67 ,  G03F7/11 ,  G03F7/16 ,  G03F7/20

CPC classification number: H01L21/67017 ,  G03F7/11 ,  G03F7/168 ,  G03F7/2041 ,  G03F7/70341 ,  H01L21/67051 ,  H01L21/6715

Abstract: Disclosed is a technique for preventing a water-repellent protective film formed on a resist film from peeling off during immersion exposure. A resist film is formed on the front surface of a substrate and then the peripheral edge portion of the resist film is removed. Before forming a water-repellent protective film onto the resist film, an adhesion-improving fluid, preferably hexamethyldisilazane gas, for improving the adhesion of the water-repellent protective film, is supplied to the region from which the resist film is removed.

Abstract translation: 公开了一种防止在浸渍曝光期间形成在抗蚀剂膜上的防水保护膜被剥离的技术。 在基板的前表面上形成抗蚀剂膜，然后除去抗蚀剂膜的周边部分。 在抗蚀剂膜上形成防水保护膜之前，为了提高防水性保护膜的粘附性，提供了粘附改善液，优选六甲基二硅氮烷气体，其中除去抗蚀剂膜的区域。

公开(公告)号：US09162247B2

公开(公告)日：2015-10-20

申请号：US13448526

申请日：2012-04-17

Applicant: Kousuke Yoshihara ,  Koji Takayanagi ,  Shinichi Hatakeyama ,  Kohei Kawakami

Inventor： Kousuke Yoshihara ,  Koji Takayanagi ,  Shinichi Hatakeyama ,  Kohei Kawakami

IPC: B05C11/00 ,  B05C13/02 ,  B05C5/00 ,  B05C11/02 ,  B05D1/00 ,  H01L21/67 ,  G03F7/16 ,  B05D3/12 ,  H01L21/00 ,  H01L51/00

CPC classification number: H01L21/0337 ,  B05C11/023 ,  B05D1/005 ,  G03F7/162 ,  G06F19/00 ,  H01L21/0271 ,  H01L21/6715 ,  H01L51/0003 ,  H01L2224/03418

Abstract: A coating treatment apparatus supplying a coating solution to a front surface of a rotated substrate and diffusing the supplied coating solution to an outer periphery side of the substrate to thereby apply the coating solution on the front surface of the substrate includes: a substrate holding part holding a substrate; a rotation part rotating the substrate held on the substrate holding part; a supply part supplying a coating solution to a front surface of the substrate held on the substrate holding part; and an airflow control plate provided at a predetermined position above the substrate held on the substrate holding part for locally changing an airflow above the substrate rotated by the rotation part at an arbitrary position.

Abstract translation: 一种涂布处理装置，其将涂布溶液供给到旋转的基板的前表面，并将供给的涂布溶液扩散到基板的外周侧，从而将涂布液涂布在基板的前表面上，包括：保持基板 底物; 旋转部，旋转保持在所述基板保持部上的所述基板; 供给部，其向保持在所述基板保持部的所述基板的前表面供给涂布液; 以及气流控制板，其设置在保持在所述基板保持部上的所述基板上方的预定位置，用于在任意位置局部地改变由所述旋转部旋转的所述基板上方的气流。

公开(公告)号：US20150273514A1

公开(公告)日：2015-10-01

申请号：US14432106

申请日：2014-02-28

Applicant: LG CHEM, LTD.

Inventor： Won Chan Park ,  Jung Hyun Yeo ,  Ye Hoon Im

IPC: B05C9/10 ,  B05C11/02 ,  B05C5/02

CPC classification number: B05C9/10 ,  B05C5/005 ,  B05C5/008 ,  B05C5/0245 ,  B05C5/0254 ,  B05C11/02 ,  B05C11/10

Abstract: The present application relates to a slot die coating apparatus and, more particularly, to a slot die coating apparatus which can ensure the coating stability of a substrate film by reducing pressure oscillations within a vacuum chamber when slot die coating is carried out. The slot die coating apparatus according to the present application can effectively dampen pressure oscillations within a vacuum chamber by connecting a pressure oscillation reducing tank to the vacuum chamber and thus can ensure the coating stability of a substrate film, resulting in a reduction in the proportion of defective products.

Abstract translation: 本发明涉及一种槽模涂布装置，更具体地说，涉及一种槽模涂布装置，其可以通过在进行狭缝模涂时减小真空室内的压力振荡来确保基片膜的涂层稳定性。 根据本申请的槽模涂布装置可以通过将压力振荡还原槽连接到真空室来有效地抑制真空室内的压力振荡，从而可以确保基材膜的涂布稳定性，导致比例降低 有缺陷的产品。

公开(公告)号：US09138735B2

公开(公告)日：2015-09-22

申请号：US14294190

申请日：2014-06-03

Applicant: Johnson Matthey Public Limited Company

Inventor： Dale Albert Roberts ,  Andrew Michael Bortz ,  Daniel L. Troland ,  Richard Peter Rose ,  R. Bradford Fortner

IPC: B01J37/02 ,  B01D53/94 ,  B05D7/22 ,  B05D7/24 ,  F01N3/20 ,  B05C7/04 ,  B05C7/02 ,  B05C11/02 ,  B05D3/02 ,  B05D3/04 ,  B65D6/10

CPC classification number: B05C7/04 ,  B01J35/04 ,  B01J37/0215 ,  B01J37/0234 ,  B05C7/02 ,  B05C11/02 ,  B05C11/023 ,  B05C13/00 ,  B05D3/0245 ,  B05D3/0493 ,  B05D7/22 ,  B05D2254/04 ,  B65D7/22

Abstract: A method of coating a substrate with a liquid comprising a catalyst component, the method comprising: (a) holding the substrate vertically, thereby defining upper and lower ends thereof, wherein the vertical substrate comprises a plurality of channels that are open at said upper and lower ends; (b) continuously introducing the liquid into the substrate by pushing or injecting the liquid through the open ends of the channels at the lower end of the substrate with a piston; and (c) after the lower end of the substrate has been partly filled with the liquid in step (b), applying a vacuum to the open ends of the channels at the upper end of the substrate while continuing to introduce the liquid into the substrate.

Abstract translation: 一种用包含催化剂组分的液体涂覆基材的方法，所述方法包括：（a）垂直地保持所述基材，由此限定其上端和下端，其中所述垂直基材包括在所述上部开口的多个通道， 下端 （b）通过用活塞将基板的下端的通道的开口端推入或注入液体，将液体连续引入基板; 和（c）在步骤（b）中在衬底的下端部分地填充有液体之后，在衬底的上端处的通道的开口端施加真空，同时继续将液体引入衬底 。

公开(公告)号：US20150223596A1

公开(公告)日：2015-08-13

申请号：US14179895

申请日：2014-02-13

Applicant: The Boeing Company

Inventor： Richard Philip Topf ,  Cris Howard Garcia ,  Ilya Sedler

IPC: A46B13/04 ,  B05C17/00 ,  B05C1/06 ,  B05C11/02 ,  A46B11/00 ,  B05D1/28

CPC classification number: B05B11/3026 ,  A46B11/001 ,  A46B13/04 ,  A46B13/06 ,  B05B3/14 ,  B05B11/3057 ,  B05C1/06 ,  B05C11/02 ,  B05C17/00 ,  B05C17/002 ,  B05D1/02

Abstract: A method and apparatus for applying a fluid onto a number of surfaces. The apparatus comprises a structure, an applicator associated with the structure, a first control device associated with the structure, and a second control device associated with the structure. Applying a first force to the first control device causes the applicator to move relative to a center axis of the applicator. Applying a second force to the second control device causes the fluid to be delivered from a fluid dispensing system to the applicator.

Abstract translation: 一种用于将流体施加到多个表面上的方法和装置。 该装置包括结构，与结构相关联的施加器，与该结构相关联的第一控制装置，以及与该结构相关联的第二控制装置。 对第一控制装置施加第一力使得施加器相对于施加器的中心轴线移动。 向第二控制装置施加第二力使得流体从流体分配系统递送到施用器。

公开(公告)号：US09016231B2

公开(公告)日：2015-04-28

申请号：US13956958

申请日：2013-08-01

Applicant: Tokyo Electron Limited

Inventor： Yuichiro Inatomi

IPC: B05C11/02 ,  G03F7/40 ,  H01L21/027 ,  H01L21/67

CPC classification number: B05C11/023 ,  G03F7/40 ,  H01L21/0273 ,  H01L21/67028 ,  H01L21/67051

Abstract: A solvent vapor is made to adhere efficiently to the surface of a resist pattern without using an ultraviolet irradiation process to improve processing accuracy, to reduce processing time and to suppress the diffusion of the solvent outside a substrate processing system. The surface of a resist pattern R formed on a semiconductor wafer W by an exposure process and a developing process is coated with water molecules m. A solvent vapor of a water-soluble solvent, such as NMP, is spouted on the surface of the resist pattern R coated with the water molecules m. A surface layer of the resist pattern R is swollen by the solvent vapor combined with the water molecules m to achieve a smoothing process. The water molecules m and the solvent s remaining on the resist pattern R on the wafer W after the smoothing process are removed by drying.

Abstract translation: 使溶剂蒸气有效地粘附到抗蚀剂图案的表面上，而不使用紫外线照射工艺来提高加工精度，减少加工时间并抑制溶剂扩散到基板处理系统外部。 通过曝光工艺和显影工艺在半导体晶片W上形成的抗蚀剂图案R的表面涂覆有水分子m。 水溶性溶剂如NMP的溶剂蒸气喷射在涂有水分子m的抗蚀剂图案R的表面上。 抗蚀剂图案R的表面层通过与水分子m结合的溶剂蒸气而溶胀以实现平滑处理。 通过干燥除去平滑处理后的水分子m和残留在晶片W上的抗蚀剂图案R上的溶剂。

公开(公告)号：US20140366797A1

公开(公告)日：2014-12-18

申请号：US14269605

申请日：2014-05-05

Applicant: Panasonic Corporation

Inventor： Isao HORIE ,  Hideki UCHIDA ,  Hiroki KOBAYASHI ,  Masayuki MANTANI

IPC: B05C11/02

CPC classification number: B41F15/42

Abstract: A paste supply apparatus includes a paste pot including a tubular container which stores paste and which includes a bottom portion provided with a through hole and a movable inner lid provided in the tubular container, and a pot holder which holds the paste pot in a state in which the through hole of the paste pot is directed downward such that lateral expansion of the tubular container is suppressed and downward movement of the tubular container thereof is regulated. The paste supply apparatus further includes a paste ejecting device which presses the inner lid of the paste pot and which ejects the paste in the tubular container from the through hole.

Abstract translation: 糊剂供给装置包括：糊状罐，其包括管状容器，该管状容器存储膏状物，并且包括设置有通孔的底部和设置在管状容器中的可动内侧盖;以及盆保持器， 其中糊罐的通孔向下指向，使得管状容器的横向膨胀被抑制，并且管状容器的向下运动被调节。 糊剂供给装置还包括：膏状喷出装置，其压入糊罐的内盖，并从管状容器的通孔喷出膏状物。

公开(公告)号：US20140335699A1

公开(公告)日：2014-11-13

申请号：US13891644

申请日：2013-05-10

Applicant: INFINEON TECHNOLOGIES AG

Inventor： Karl Pilch ,  Hans Leitner ,  Michael Kalin

IPC: B05C11/02 ,  B05D1/00 ,  H01L21/02 ,  B05D3/00

CPC classification number: B05B12/02 ,  B05B13/02 ,  B05C11/02 ,  B05D1/002 ,  B05D3/007 ,  H01L21/02282 ,  H01L21/67109 ,  H01L21/6715 ,  H01L21/6835 ,  H01L2221/68327 ,  Y10T156/10

Abstract: Various embodiments relate to application of a fluid to a substrate. The fluid is locally heated, for example, to obtain a desired thickness profile.

Abstract translation: 各种实施例涉及将流体施加到基底。 例如，将流体局部加热以获得所需的厚度分布。

公开(公告)号：US08883263B2

公开(公告)日：2014-11-11

申请号：US13282033

申请日：2011-10-26

Applicant: Kenichi Yasuda ,  Kimio Yukawa ,  Ryousuke Shimizu ,  Noriaki Horikawa

Inventor： Kenichi Yasuda ,  Kimio Yukawa ,  Ryousuke Shimizu ,  Noriaki Horikawa

IPC: C23C14/00 ,  B05C11/02 ,  B05D3/12 ,  B05D3/02 ,  B05D7/04 ,  B29D11/00 ,  B05D1/26 ,  B05C11/10 ,  B05C5/02 ,  G02B1/11 ,  G02B5/30 ,  B05D3/06

CPC classification number: B05C5/0283 ,  B05C11/1039 ,  B05D1/26 ,  B05D3/0209 ,  B05D3/0254 ,  B05D3/067 ,  B05D7/04 ,  B05D2252/02 ,  B29D11/00788 ,  B29D11/00903 ,  G02B1/11 ,  G02B5/3083

Abstract: A coated film manufacturing method and a coating machine are provided which can prevent deformation of a die coater due to evaporation of a coating liquid and prevent surface deficiency occurring when starting the coating. A coating machine is prepared which includes a die coater having a manifold, a slot communicating with the manifold, and a lip face formed at an end of the slot, a heat-insulating plate being disposed in a region below the lip face of the die coater and having a tapered top end portion, and a depressurizing chamber being disposed upstream in a web conveying direction from the die coater. The coating machine is made to stand by at a position for forming a clearance greater than a predetermined clearance between the coating machine and the web at the time of coating while flowing the coating liquid from the die coater.

Abstract translation: 提供一种涂膜制造方法和涂布机，其能够防止由于涂布液的蒸发引起的涂布机的变形，并且防止在开始涂布时发生表面缺陷。 一种涂布机，其包括具有歧管的模具涂布机，与歧管连通的狭槽以及形成在槽的端部的唇面，绝热板设置在模具的唇面下方的区域中 涂布机，并具有锥形顶端部分，并且减压室设置在从模涂机的卷筒纸输送方向的上游。 在使涂布液从模涂机上流动的同时，使涂布机在涂布时在用于形成间隙大于涂布机和纸幅之间的预定间隙的位置处于待机状态。