公开(公告)号：US09224576B2

公开(公告)日：2015-12-29

申请号：US14165573

申请日：2014-01-27

Applicant: Carl Zeiss Microscopy GmbH ,  Applied Materials Israel, Ltd.

Inventor： Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares ,  Steven Rogers

IPC: G21K5/10 ,  H01J37/08 ,  H01J37/30 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/28 ,  H01J37/317 ,  H01J37/14 ,  H01J37/10

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

Abstract translation: 粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成 在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

公开(公告)号：US09171694B2

公开(公告)日：2015-10-27

申请号：US14532805

申请日：2014-11-04

Applicant: KLA-Tencor Corporation

Inventor： Christopher Sears

IPC: H01J37/147 ,  H01J37/141 ,  H01J37/12 ,  H01J37/153 ,  H01J37/10

CPC classification number: H01J37/1472 ,  H01J37/10 ,  H01J37/1471 ,  H01J37/153 ,  H01J2237/10 ,  H01J2237/1508 ,  H01J2237/1516 ,  H01J2237/2448 ,  H01J2237/2449 ,  H01J2237/2602 ,  H01J2237/28

Abstract: An electron beam device for inspecting a target substrate or specimen thereon includes a beam separator with an asymmetric quadrupole electrostatic deflector for improving field uniformity for a single direction of deflection. The asymmetric quadrupole electrostatic deflector includes two orthogonal electrode plates spanning roughly 60 degrees and two electrode plates spanning roughly 120 degrees, the two latter plates defining a unidirectional deflection field. The device generates a primary electron beam and focuses the primary electron beam along an optical axis into the target substrate. Secondary electrons detected at the target substrate are focused into a secondary electron beam. The beam separator with asymmetric quadrupole electrostatic deflector deflects the secondary electron beam away from the axis of the primary electron beam in the direction of deflection and into a detector array.

Abstract translation: 用于检查目标衬底或样本的电子束装置包括具有不对称四极静电偏转器的光束分离器，用于改善单个偏转方向的场均匀性。 不对称四极静电偏转器包括跨越大约60度的两个正交电极板和跨越大约120度的两个电极板，后两个板限定单向偏转场。 器件产生一次电子束，并将一次电子束沿光轴聚焦到目标衬底中。 在目标衬底处检测到的二次电子被聚焦成二次电子束。 具有不对称四极静电偏转器的光束分离器使二次电子束在偏转方向上偏离一次电子束的轴线并且进入检测器阵列。

公开(公告)号：US20150179394A1

公开(公告)日：2015-06-25

申请号：US14404115

申请日：2013-04-22

Applicant: Hitachi High-Technologies Corporation

Inventor： Tsutomu Saito ,  Kenji Aoki

IPC: H01J37/10 ,  H01J37/26

CPC classification number: H01J37/10 ,  H01J37/09 ,  H01J37/18 ,  H01J37/26 ,  H01J2237/103

Abstract: A preferred aim of the present invention is to provide a charged particle beam device having a high differential exhaust performance while maintaining a large dynamic range of an irradiation current by effectively arranging an aperture for differential pumping (111) and an objective final aperture (110). The present invention has features that a lens barrel including therein an optical system of the charged particle beam device (100) includes a first space (106) having a first degree of vacuum and a second space (105) having a degree of vacuum higher than the first degree of vacuum, and that the objective final aperture (110) is arranged in the second space (105).

Abstract translation: 本发明的优选目的是提供一种具有高差分排气性能的带电粒子束装置，同时通过有效地布置差分泵浦（111）和目标最终孔径（110）的孔径来保持辐射电流的大动态范围， 。 本发明的特征在于，其中包括带电粒子束装置（100）的光学系统的镜筒包括具有第一真空度的第一空间（106）和具有高于 第一真空度，并且目标最终孔（110）布置在第二空间（105）中。

公开(公告)号：US20150155133A1

公开(公告)日：2015-06-04

申请号：US14560845

申请日：2014-12-04

Applicant: Hermes Microvision Inc.

Inventor： Zhongwei Chen ,  Jack Jau ,  Weiming Ren

IPC: H01J37/26 ,  H01J37/22 ,  H01J37/20 ,  H01J37/10 ,  H01J37/14

CPC classification number: H01J37/28 ,  H01J37/026 ,  H01J37/10 ,  H01J37/14 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/261 ,  H01J37/285 ,  H01J37/292 ,  H01J2237/04926 ,  H01J2237/1405 ,  H01J2237/24475 ,  H01J2237/24495 ,  H01J2237/24528 ,  H01J2237/2801 ,  H01J2237/2804 ,  H01J2237/2806 ,  H01J2237/2814

Abstract: The present invention provides apparatuses to inspect small particles on the surface of a sample such as wafer and mask. The apparatuses provide both high detection efficiency and high throughput by forming Dark-field BSE images. The apparatuses can additionally inspect physical and electrical defects on the sample surface by form SE images and Bright-field BSE images simultaneously. The apparatuses can be designed to do single-beam or even multiple single-beam inspection for achieving a high throughput.

公开(公告)号：US20150021474A1

公开(公告)日：2015-01-22

申请号：US13960393

申请日：2013-08-06

Applicant: Matthias FIRNKES ,  Stefan LANIO ,  Gerald SCHÖNECKER ,  Dieter WINKLER

Inventor： Matthias FIRNKES ,  Stefan LANIO ,  Gerald SCHÖNECKER ,  Dieter WINKLER

IPC: H01J37/21 ,  H01J37/147 ,  H01J37/10

CPC classification number: H01J37/21 ,  H01J37/10 ,  H01J37/147 ,  H01J37/244 ,  H01J2237/24592

Abstract: A secondary charged particle detection device for detection of a signal beam is described. The device includes a detector arrangement having at least two detection elements with active detection areas, wherein the active detection areas are separated by a gap (G), a particle optics configured for separating the signal beam into a first portion of the signal beam and into at least one second portion of the signal beam, and configured for focusing the first portion of the signal beam and the at least one second portion of the signal beam. The particle optics includes an aperture plate and at least a first inner aperture openings in the aperture plate, and at least one second radially outer aperture opening in the aperture plate, wherein the first aperture opening has a concave shaped portion, particularly wherein the first aperture opening has a pincushion shape.

Abstract translation: 描述了用于检测信号光束的二次带电粒子检测装置。 该装置包括具有至少两个具有主动检测区域的检测元件的检测器装置，其中主动检测区域由间隙（G）分开，粒子光学器件被配置用于将信号光束分离成信号光束的第一部分并进入 信号光束的至少一个第二部分，并且被配置为聚焦信号光束的第一部分和信号光束的至少一个第二部分。 颗粒光学器件包括孔板和孔板中的至少第一内孔开口和孔板中的至少一个第二径向外孔开口，其中第一孔口具有凹形部分，特别地其中第一孔 开口有枕形。

公开(公告)号：US08710455B2

公开(公告)日：2014-04-29

申请号：US13838785

申请日：2013-03-15

Applicant: Canon Kabushiki Kaisha

Inventor： Takashi Shiozawa

IPC: H01J37/10 ,  H01J49/42 ,  H01J43/20

CPC classification number: H01J37/10 ,  H01J3/18 ,  H01J37/12 ,  H01J2237/038 ,  H01J2237/31774

Abstract: A charged-particle beam lens includes a plate-like anode, a plate-like cathode, and an insulator disposed between the anode and the cathode. The insulator, the anode, and the cathode have a passage portion through which a charged beam is passed. A high-resistance film is formed on an inner side of the insulator, the inner side forming the passage portion, or an outermost side of insulator, and the anode and the cathode are electrically connected together via the high-resistance film. The anode and the high-resistance film, and the cathode and the high-resistance film each contain the same metal or semiconductor element and have different resistant values. This suppresses electric field concentration due to an increase in resistance and poor connection at the interface between the anode and the cathode and the high-resistance film or at the interface between the electroconductive film and the high-resistance film, thus suppressing generation of discharge.

Abstract translation: 带电粒子束透镜包括板状阳极，板状阴极和布置在阳极和阴极之间的绝缘体。 绝缘体，阳极和阴极具有带电束通过的通道部分。 在绝缘体的内侧形成高电阻膜，形成绝缘体的通路部分或最外侧的内侧，并且阳极和阴极通过高电阻膜电连接在一起。 阳极和高电阻膜以及阴极和高电阻膜各自含有相同的金属或半导体元件，并具有不同的电阻值。 由于电阻增加和阳极与阴极与高电阻膜之间的界面或导电膜与高电阻膜之间的界面处的接合不良而抑制电场集中，因此抑制了放电的产生。

公开(公告)号：US08653486B2

公开(公告)日：2014-02-18

申请号：US13713251

申请日：2012-12-13

Applicant: Axcelis Technologies, Inc.

Inventor： Edward C. Eisner

IPC: H01J37/317 ,  H01J37/10

CPC classification number: H01J3/14 ,  G21K5/10 ,  H01J37/302 ,  H01J37/3171 ,  H01J2237/049 ,  H01J2237/30477 ,  H01J2237/30483

Abstract: The present invention relates to a method and apparatus for varying the cross-sectional shape of an ion beam, as the ion beam is scanned over the surface of a workpiece, to generate a time-averaged ion beam having an improved ion beam current profile uniformity. In one embodiment, the cross-sectional shape of an ion beam is varied as the ion beam moves across the surface of the workpiece. The different cross-sectional shapes of the ion beam respectively have different beam profiles (e.g., having peaks at different locations along the beam profile), so that rapidly changing the cross-sectional shape of the ion beam results in a smoothing of the beam current profile (e.g., reduction of peaks associated with individual beam profiles) that the workpiece is exposed to. The resulting smoothed beam current profile provides for improved uniformity of the beam current and improved workpiece dose uniformity.

Abstract translation: 本发明涉及一种用于在离子束在工件的表面上扫描时改变离子束截面形状的方法和装置，以产生具有改进的离子束电流分布均匀性的时间平均离子束 。 在一个实施例中，离子束的横截面形状随着离子束移动穿过工件表面而变化。 离子束的不同横截面形状分别具有不同的光束轮廓（例如，沿着光束轮廓在不同位置处具有峰值），使得快速改变离子束的横截面形状导致光束电流的平滑 工件暴露于的轮廓（例如，减小与各个梁轮廓相关联的峰）。 所得到的平滑光束电流分布提供了改进的束电流均匀性和改进的工件剂量均匀性。

公开(公告)号：US20120273677A1

公开(公告)日：2012-11-01

申请号：US13456944

申请日：2012-04-26

Applicant: Lubomir Tuma ,  Petr Hlavenka ,  Petr Sytar ,  Radek Ceska ,  Bohuslav Sed'a

Inventor： Lubomir Tuma ,  Petr Hlavenka ,  Petr Sytar ,  Radek Ceska ,  Bohuslav Sed'a

IPC: H01J37/26 ,  H01J37/244 ,  H01J37/10

CPC classification number: H01J37/26 ,  H01J37/145 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/04926 ,  H01J2237/2443 ,  H01J2237/24465

Abstract: The invention relates to an in-column back-scattered electron detector, the detector placed in a combined electrostatic/magnetic objective lens for a SEM. The detector is formed as a charged particle sensitive surface, preferably a scintillator disk that acts as one of the electrode faces forming the electrostatic focusing field. The photons generated in the scintillator are detected by a photon detector, such as a photo-diode or a multi-pixel photon detector. The objective lens may be equipped with another electron detector for detecting secondary electrons that are kept closer to the axis. A light guide may be used to offer electrical insulation between the photon detector and the scintillator.

Abstract translation: 本发明涉及一种柱内反向散射电子检测器，该探测器放置在用于SEM的组合静电/磁性物镜中。 检测器形成为带电粒子敏感表面，优选地形成作为形成静电聚焦场的电极面之一的闪烁体盘。 在闪烁体中产生的光子被光子检测器（例如光电二极管或多像素光子检测器）检测。 物镜可以配备有用于检测保持靠近轴线的二次电子的另一电子检测器。 可以使用光导来在光子检测器和闪烁体之间提供电绝缘。

公开(公告)号：US20100200750A1

公开(公告)日：2010-08-12

申请号：US12658476

申请日：2010-02-08

Applicant: Hubert Mantz ,  Rainer Arnold ,  Michael Albiez

Inventor： Hubert Mantz ,  Rainer Arnold ,  Michael Albiez

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/244 ,  H01J37/10

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/222 ,  H01J37/244 ,  H01J37/256

Abstract: A particle beam system comprises a particle beam source 5 for generating a primary particle beam 13, an objective lens 19 for focusing the primary particle beam 13 in an object plane 23; a particle detector 17; and an X-ray detector 47 arranged between the objective lens and the object plane. The X-ray detector comprises plural semiconductor detectors, each having a detection surface 51 oriented towards the object plane. A membrane is disposed between the object plane and the detection surface of the semiconductor detector, wherein different semiconductor detectors have different membranes located in front, the different membranes differing with respect to a secondary electron transmittance.

Abstract translation: 粒子束系统包括用于产生一次粒子束13的粒子束源5，用于将一次粒子束13聚焦在物平面23中的物镜19; 粒子检测器17; 以及布置在物镜和物平面之间的X射线检测器47。 X射线检测器包括多个半导体检测器，每个半导体检测器具有朝向物体平面的检测表面51。 膜位于物体平面和半导体检测器的检测表面之间，其中不同的半导体检测器具有位于前面的不同的膜，不同的膜相对于二次电子透射率不同。

公开(公告)号：US07501638B1

公开(公告)日：2009-03-10

申请号：US11553160

申请日：2006-10-26

Applicant: Fang Zhou

Inventor： Fang Zhou

IPC: H01J37/10 ,  H01J37/147

CPC classification number: H01J9/505 ,  H01J3/06 ,  H01J37/067 ,  Y02W30/828

Abstract: A charged particle beam emitting device includes at least two charged particle beam guns, each of the at least two charged particle beam guns having a separate charged particle emitter with an emitting surface for emitting a respective charged particle beam. The charged particle beam emitting device further includes an aperture element comprising at least one aperture opening and a deflector unit. The deflector unit is adapted for alternatively directing the charged particle beams of the at least two charged particle beam guns on the at least one aperture opening so that, at the same time, one of the at least two charged particle beams is directed on the aperture opening while the respective other charged particle beam of the at least two charged particle beams is deflected from the aperture opening by the deflector unit. At the same time, only one of the two charged particle beam guns is used so that the temporarily unused charged particle beam gun can be subjected to a cleaning procedure. This ensures that the emitting surfaces of both charged particle beam guns can be alternatively and frequently cleaned with minimum interruption of the operation of the charged particle beam device.

Abstract translation: 带电粒子束发射装置包括至少两个带电粒子束枪，所述至少两个带电粒子束枪中的每一个具有分离的带电粒子发射器，具有用于发射相应带电粒子束的发射表面。 带电粒子束发射装置还包括孔元件，该孔元件包括至少一个孔口和偏转器单元。 偏转器单元适于将至少两个带电粒子束枪的带电粒子束交替地引导到至少一个孔口上，使得同时，至少两个带电粒子束中的一个被引导到孔 所述至少两个带电粒子束的相应的其它带电粒子束由所述偏转器单元从所述开口偏转。 同时，仅使用两个带电粒子束枪中的一个，使得临时使用的带电粒子束枪可以进行清洁程序。 这确保了两个带电粒子束枪的发射表面可以以最小的带电粒子束装置的操作中断来交替地和频繁地清洁。