SYSTEM AND METHOD FOR GENERATING MULTI-CHANNEL TUNABLE ILLUMINATION FROM A BROADBAND SOURCE

    公开(公告)号:SG11201900804WA

    公开(公告)日:2019-03-28

    申请号:SG11201900804W

    申请日:2017-08-09

    Abstract: A metrology system includes an illumination source to generate an illumination beam, a multi-channel spectral filter, a focusing element to direct illumination from the single optical column to a sample, and at least one detector to capture the illumination collected from the sample. The multi-channel spectral filter includes two or more filtering channels having two or more channel beam paths. The two or more filtering channels filter illumination propagating along the two or more channel beam paths based on two or more spectral transmissivity distributions. The multi-channel spectral filter further includes a channel selector to direct at least a portion of the illumination beam into at least one selected filtering channel to filter the illumination beam. The multi-channel spectral filter further includes at least one beam combiner to combine illumination from the two or more filtering channels to a single optical column.

    LOCALIZED TELECENTRICITY AND FOCUS OPTIMIZATION FOR OVERLAY METROLOGY

    公开(公告)号:SG11202005972UA

    公开(公告)日:2020-11-27

    申请号:SG11202005972U

    申请日:2019-04-05

    Abstract: An overlay metrology tool providing site-by-site alignment includes a controller coupled to a telecentric imaging system. The controller may receive two or more alignment images of an overlay target on a sample captured at two or more focal positions by the imaging system, generate alignment data indicative of an alignment of the overlay target within the imaging system based on the alignment images, set the alignment images as measurement images when the alignment of the overlay target is within selected alignment tolerances, direct the imaging system to adjust the alignment of the overlay target in the imaging system and further receive one or more measurement images from the imaging system when the alignment of the overlay target is outside the selected alignment tolerances, and determine overlay between two or more layers of the sample based on at least one of the measurement images.

    SYSTEMS AND METHODS FOR METROLOGY WITH LAYER-SPECIFIC ILLUMINATION SPECTRA

    公开(公告)号:SG11201907747XA

    公开(公告)日:2019-10-30

    申请号:SG11201907747X

    申请日:2018-03-28

    Abstract: PUBLISHEDUNDER THE PATENT COOPERATION TREATY (PCT) IiiimmomiolollmonolomolmomEmmomoun () International Publication Number WO 2018/187108 Al WIPO I PCT (12) INTERNATIONAL APPLICATION (19) World Intellectual Property Organization International Bureau (43) International Publication Date 11 October 2018 (11.10.2018) (51) International Patent Classification: HO1L 21/66 (2006.01) (21) International Application Number: PCT/US2018/024702 (22) International Filing Date: 28 March 2018 (28.03.2018) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 62/481,685 05 April 2017 (05.04.2017) US 15/608,766 30 May 2017 (30.05.2017) US (71) Applicant: KLA-TENCOR CORPORATION [US/US]; Legal Department, One Technology Drive, Milpitas, Cali- fornia 95035 (US). (72) Inventors: MANASSEN, Amnon; 10 Golda Meir Street, 34892 Haifa (IL). NEGRI, Dania; Ha'Alon Street 38/1, 36811 Nesher (IL). HILL, Andrew V.; 2112 Los Ange- les Avenue, Berkeley, California 94707 (US). BACHAR, Ohad; 29 He'elah Street, 36576 Timrat (IL). LEV- INSKI, Vladimir; Hermon 9, 23100 Migdal HaEmek (IL). PASKOVER, Yuri; 32A Seora Str, 30560 Binyamina (IL). (74) Agent: MCANDREWS, Kevin et al.; KLA-Tencor Corp., Legal Department, One Technology Drive, Milpitas, Cali- fornia 95035 (US). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, (54) Title: SYSTEMS AND METHODS FOR METROLOGY WITH LAYER-SPECIFIC ILLUMINATION SPECTRA 126 CONTROLLER 128 PROCESSORS 130 MEMORY 100 122 108 40111111111110- 104 —120 102 n 124 114 V 112 110 106 116 1-1 cc O N cc 00 O O FIG.1 (57) : A metrology system includes an image device and a controller. The image device includes a spectrally-tunable illumi- nation device and a detector to generate images of a sample having metrology target elements on two or more sample layers based on radiation emanating from the sample in response to illumination from the spectrally-tunable illumination device. The controller determines layer-specific imaging configurations of the imaging device to image the metrology target elements on the two or more sample layers within a selected image quality tolerance in which each layer-specific imaging configuration includes an illumination spectrum from the spectrally-tunable illumination device. The controller further receives one or more images of the metrology target elements on the two or more sample layers generated using the layer-specific imaging configurations. The controller further provides a metrology measurement based on the one or more images of the metrology target elements on the two or more sample layers. [Continued on next page] WO 2018/187108 Al MIDEDIMOMOIDEIREEMOMOHOMOIDIMMIOMMIS MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3))

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