Abstract:
The present invention relates to a tin precursor represented by chemical formula 1. The tin precursor has an advantage that the addition of separate sulfur is not needed in the process of manufacturing a thin film and can form a high quality tin sulfide thin film by improving the thermal stability and volatility. In chemical formula 1, each of R1 and R2 is independently a C1-C10 linear or branched alkyl group; each of R3 and R4 is independently a C1-C10 linear or branched alkyl group or a C1-C10 alkyl fluoride group; and n is 1-3.
Abstract:
The present invention relates to a magnesium oxide precursor which is denoted by chemical formula 1. The magnesium oxide precursor is thermally stable and highly volatile to obtain a thin film which contains high quality magnesium oxide.
Abstract:
The present invention relates to a novel preparation method of a benzoporphyrin derivative and the fabrication of an organic thin-film transistor thereby. The novel preparation method of the benzoporphyrin derivative by the present invention remarkably reduces the number of production processes compare to existing preparation method of the benzoporphyrin derivative for economically obtaining the benzoporphyrin derivative which is a target compound. The process is simplified and the facility and production costs for applying the printing method are reduced by dissolving the benzoporphyrin derivative in more than two kinds of mixed organic solvent with different boiling points, and fabricating the organic thin-film transistor using the printing method.
Abstract:
PURPOSE: A method for forming a thin film including Sb with an atomic layer deposition method is provided to improve productivity by forming the thin film including Sb at low temperatures through an atomic layer deposition process using a Sb precursor. CONSTITUTION: A substrate is prepared in a vacuum chamber. A Sb precursor material is prepared. A source gas is prepared by the Sb precursor material. A reactive gas including a hydrogen gas is prepared. A purge gas is prepared. A metal precursor gas is prepared by a metal precursor material. A thin film of a Sb-metal monolayer is formed on the substrate by successively supplying the source gas, the reactive gas, the purge gas, and the metal precursor gas to the vacuum chamber.
Abstract:
PURPOSE: A method for fabricating an Sb-Te-based thermoelectric thin film is provided to obtain an Sb-Te-based thermoelectric material having an excellent ZT value by using a low temperature chemical deposition method without a thermal process or a post process. CONSTITUTION: An Sb deposition layer is formed on the upper part of a substrate. An Sb precursor is supplied to a chamber. The inside of the chamber is purged by using a purge gas. A reaction gas is supplied to the purged chamber. The inside of the chamber is purged by using the purge gas.
Abstract:
본 발명은 수계 용매를 이용한 CuInSe 2 입자의 제조방법에 관한 것으로, 상세하게, 본 발명에 따른 제조방법은 물 및 초산(CH 3 COOH)의 혼합 용매에 구리 분말, 인듐 분말 및 셀레늄 분말을 포함하는 금속분말 원료를 혼합하여 반응액을 제조하고, 오토클레이브를 이용하여 상기 반응액을 반응시켜 CuInSe 2 입자를 제조하는 방법에 관한 것이다.
Abstract:
PURPOSE: A manufacturing method of a nano-sized glass frit is provided to obtain high producibility in low costs by using a solution method, and to easily control the size and composition for a solar cell electrode. CONSTITUTION: A manufacturing method of a nano-sized glass frit comprises: a step of manufacturing glass frit nanoparticles by using a sol-gel synthesis method; and a step of mixing the glass frit nanoparticles, metallic nanoparticles, and organic vehicles. An electrode for a solar cell comprises a semiconductor substrate, an antireflection film formed on the substrate, a first conductive layer which is formed by spreading the conductive ink on the antireflective film, and a second conductive film formed of a conductive metal, on the first conductive layer. [Reference numerals] (AA) Raw material; (BB) Basic catalyst; (CC) React; (DD) Wash; (EE) Glass frit nanoparticles
Abstract:
본 발명은 변형된 글리콜레이트를 사용한 신규의 갈륨 글리콜레이트 화합물 및 그 제조 방법에 관한 것으로, 하기 화학식 1로 표시되는 갈륨 글리콜레이트 화합물에 관한 것이며, 본 발명에 따른 갈륨 글리콜레이트 화합물은 금속 산화물 박막 및 금속 산화물 나노입자 형성을 위한 전구체로 사용되며, 수분에 덜 민감하고 보관이 용이하며 열적 안정성이 우수한 특성이 있다.