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    High probe current imaging device
    11.
    发明专利
    High probe current imaging device 有权
    高探头电流成像装置

    公开(公告)号：JP2006253123A

    公开(公告)日：2006-09-21

    申请号：JP2006031380

    申请日：2006-02-08

    Applicant: Ict Integrated Circuit Testing Ges Fuer Halbleiterprueftechnik Mbh ,  アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー

    Inventor： DEGENHARDT RALF

    IPC: H01J37/153

    CPC classification number: H01J37/28 ,  H01J37/153

    Abstract: PROBLEM TO BE SOLVED: To provide an imaging device (a device according to an aberration correction device) for a charge particle beam device as an electron microscope or the like used for the inspection and measurement of a semiconductor, in which a small deviation beam with a high probe current is formed to improve the resolution and throughput in EDX analysis, WDX analysis, or defect inspection. SOLUTION: The high prove current imaging device has a first lens 1 and a second lens 3 respectively disposed in the upper stream of the first opening 6 and the lower stream of the second opening 7 of a Wien filter 2 provided with 2xm pole elements, the intermediate imaging plane Z 1 of the first lens 1 is placed between the first opening 6 and the first lens 1, and the intermediate object plane Z 3 of the second lens 3 is placed between the second opening 7 and the second lens 3, and an image formed in the Z 1 is transferred to the Z 3 by removing the dispersion with the Wien filter. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种用于电荷显微镜等的用于电子显微镜等的用于半导体检查和测量的成像装置（根据像差校正装置的装置），其中小型 形成具有高探针电流的偏转光束，以提高EDX分析，WDX分析或缺陷检查中的分辨率和吞吐量。 解决方案：高电流成像装置具有分别设置在第一开口6的上游流中的第一透镜1和第二透镜3以及设置有2×m极的维恩滤光器2的第二开口7的下游流 元件，第一透镜1的中间成像平面Z 1 放置在第一开口6和第一透镜1之间，第二透镜1的中间物体平面Z 3 透镜3被放置在第二开口7和第二透镜3之间，并且通过用维恩去除分散体将形成在Z 1 中的图像转移到Z 3 过滤。 版权所有（C）2006，JPO＆NCIPI

    HIGH BRIGHTNESS ELECTRON GUN WITH MOVING CONDENSER LENS
    13.
    发明专利
    HIGH BRIGHTNESS ELECTRON GUN WITH MOVING CONDENSER LENS 审中-公开

    公开(公告)号：JP2013254736A

    公开(公告)日：2013-12-19

    申请号：JP2013119000

    申请日：2013-06-05

    Applicant: INTEGRATED CIRCUIT TESTING

    Inventor： FROSIEN JUERGEN

    IPC: H01J37/141 ,  H01J37/04 ,  H01J37/073 ,  H01J37/147

    Abstract: PROBLEM TO BE SOLVED: To provide a high brightness, a small virtual size, low aberrations, and good alignment, in an electron beam system.SOLUTION: A condenser lens arrangement (320) for an electron beam system is disclosed. The condenser lens arrangement includes: a magnetic condenser lens (321) adapted for generating a magnetic condenser lens field, the condenser lens having a symmetry axis (350); and a magnetic deflector (322) adapted for generating a magnetic deflector field. The magnetic deflector is configured so that the superposition of the magnetic condenser lens field and the magnetic deflector field results in an optical axis of the condenser lens arrangement being movable relative to the symmetry axis (350). Further, an electron beam optical system including a condenser lens arrangement and a method for moving a condenser lens are disclosed.

    Device and method for improving contrast of charge particle beam device checking sample
    14.
    发明专利
    Device and method for improving contrast of charge particle beam device checking sample 有权
    用于改善充电颗粒束装置检查样品对比度的装置和方法

    公开(公告)号：JP2012221942A

    公开(公告)日：2012-11-12

    申请号：JP2011183390

    申请日：2011-08-25

    Applicant: Ict Integrated Circuit Testing Ges Fuer Halbleiterprueftechnik Mbh ,  アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー

    Inventor： ADAMEC PAVEL

    IPC: H01J37/244 ,  H01J37/28

    CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/2449 ,  H01J2237/245

    Abstract: PROBLEM TO BE SOLVED: To provide a charged beam device with improved contrast.SOLUTION: A charged particle beam device checking a sample has a charged particle beam source (5) for generating primary charged particle beam (7), objective lens devices (40, 45) for directing the primary charged particle beam on the sample (3), a deceleration field type device for accelerating secondary charged particles emitted from the sample, and first detector devices (15, 150) having a center opening (16) and including at least two orientation detector segments detecting secondary particles. The objective lens device is constituted so that particles having different angles, at which they are emitted from the sample, exhibit a crossover at a substantially identical distance from the sample between the objective lens and the detector device, and an aperture (100) provided between the objective lens and a crossover (90) has an opening smaller than a center opening of the detector device (15).

    Abstract translation: 要解决的问题：提供具有改善的对比度的带电束装置。 检测样品的带电粒子束装置具有用于产生初级带电粒子束（7）的带电粒子束源（5），用于将初级带电粒子束引导到样品上的物镜装置（40,45） （3），用于加速从样品发射的二次带电粒子的减速场型装置和具有中心开口（16）并且包括检测次级粒子的至少两个取向检测器段的第一检测器装置（15,150）。 物镜装置被构造成使得它们从样品发射的具有不同角度的颗粒在与物镜和检测器装置之间的样品基本相同的距离处呈现出交叉，以及设置在物镜之间的孔（100） 物镜和交叉（90）具有小于检测器装置（15）的中心开口的开口。 版权所有（C）2013，JPO＆INPIT

    Gas electric field ion source of dual mode
    16.
    发明专利
    Gas electric field ion source of dual mode 有权
    双模气体电场离子源

    公开(公告)号：JP2010114082A

    公开(公告)日：2010-05-20

    申请号：JP2009253386

    申请日：2009-11-04

    Applicant: Ict Integrated Circuit Testing Ges Fuer Halbleiterprueftechnik Mbh ,  アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー

    Inventor： FROSIEN JUERGEN ,  WINKLER DIETER

    IPC: H01J27/26 ,  H01J37/08 ,  H01J37/28 ,  H01J37/317

    Abstract: PROBLEM TO BE SOLVED: To provide an ion beam device of a single column which enables observation and processing of a sample. SOLUTION: This focusing ion beam device focuses the ion beam drawn out from a gas electric field ion source and irradiates it to a sample 24, and processes and observes the sample. The ion source is equipped with an emitter chip 13 which forms an ion, a heating means 15 that heats the ion, gas introduction ports 110, 112 that introduce the first gas and at least one of the second gases, and a controller 172 that switches a first emitter chip temperature and a second emitter chip temperature in order to form the ion beam of either gas. The first gas is a light gas and used for an observation mode, and the second gas of at least one is a heavy gas (inert gas, reactive gas) and used for a sputtering mode (in case of the inert gas) or a reaction mode (in case of reactive gas). COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供能够观察和处理样品的单柱离子束装置。

    解决方案：该聚焦离子束装置将从气体电场离子源引出的离子束聚焦，并将其照射到样品24，并处理并观察样品。 离子源配备有形成离子的发射极芯片13，加热离子的加热装置15，引入第一气体和至少一个第二气体的气体引入口110,112，以及开关 第一发射极芯片温度和第二发射极芯片温度，以便形成任一气体的离子束。 第一气体是轻质气体，用于观察模式，至少一种气体是重质气体（惰性气体，反应性气体），用于溅射模式（在惰性气体的情况下）或反应 模式（在反应气体的情况下）。 版权所有（C）2010，JPO＆INPIT

    Charged particle beam irradiating device, and method for operating charged particle beam irradiating device
    18.
    发明专利
    Charged particle beam irradiating device, and method for operating charged particle beam irradiating device 有权
    充电颗粒光束照射装置和操作充电颗粒光束辐射装置的方法

    公开(公告)号：JP2009117394A

    公开(公告)日：2009-05-28

    申请号：JP2009048243

    申请日：2009-03-02

    Applicant: Ict Integrated Circuit Testing Ges Fuer Halbleiterprueftechnik Mbh ,  イツェーテー インテグレイテッド サーキット テスティング ゲゼルシャフト フュール ハルブライタープリュッフテヒニク ミット ベシュレンクテル ハフツング

    Inventor： ZHOU FAN ,  ADAMEC PAVEL ,  FROSIEN JUERGEN ,  VISHNIPOLSKY JIMMY

    IPC: H01J37/073 ,  H01J27/26 ,  H01J37/08

    CPC classification number: H01J37/073 ,  H01J2237/022 ,  H01J2237/06325

    Abstract: PROBLEM TO BE SOLVED: To provide a method for operating a charged particle beam irradiating device including a cold cathode field emitter having an emitter surface, especially an electron beam irradiating device. SOLUTION: The method includes the steps of: (a) placing the cold cathode field emitter in a vacuum, the cold cathode field emitter exhibiting a high initial irradiation current and a lower stable mean irradiation current under a given electric extraction field; (b) applying the given electric extraction field to the cold cathode field emitter for irradiating electrons from the emitter surface so that the irradiating current of the cold cathode field emitter becomes higher than the stable mean irradiation current; (c) performing a cleaning process by applying at least one heating pulse for heating the emitter surface to a temperature , thereby the cleaning process is performed before the irradiation current of the cold cathode field emitter is declined to a lower stable mean irradiation value; and (d) repeating the cleaning process (c) to keep the irradiation current of the cold cathode field emitter continuously exceeding the substantially stable irradiation value. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 解决问题的方法：提供一种包括具有发射极表面的冷阴极场发射体，特别是电子束照射装置的带电粒子束照射装置的操作方法。 该方法包括以下步骤：（a）将冷阴极场发射体放置在真空中，在给定的电提取场下，冷阴极场发射体表现出高的初始照射电流和较低的稳定平均照射电流; （b）将给定的电提取场施加到冷阴极场发射器，用于从发射极表面照射电子，使得冷阴极场发射体的照射电流高于稳定的平均照射电流; （c）通过将至少一个加热脉冲施加到发射器表面的温度进行清洁处理，从而在冷阴极场发射体的照射电流下降到较低的稳定平均照射值之前执行清洁处理; 和（d）重复清洁处理（c）以使冷阴极场发射体的照射电流连续超过基本稳定的照射值。 版权所有（C）2009，JPO＆INPIT

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