公开(公告)号：SG157349A1

公开(公告)日：2009-12-29

申请号：SG2009037490

申请日：2009-06-02

Applicant: ASML NETHERLANDS BV

Inventor： AARTS IGOR MATHEUS PETRONELLA ,  GEERKE JOHAN HENDRIK ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  DE JONG FREDERIK EDUARD ,  VAN DE GRIFT MARC

Abstract: ITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A detection method for detecting a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate or on a substrate table and preferably extends over a length of at least 50x the width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table in a first direction and measuring along that first direction a property of the extended pattern. The property can be a result of a physical property of the extended pattern in a second direction perpendicular to the first direction. In a next step a calibration of the substrate table position can be derived from the measured position of the extended pattern.

公开(公告)号：SG136117A1

公开(公告)日：2007-10-29

申请号：SG2007025513

申请日：2007-04-05

Applicant: ASML NETHERLANDS BV

Inventor： WIJCKMANS MAURICE ,  CUIJPERS MARTINUS AGNES WILLEM ,  DE JONG FREDERIK EDUARD ,  VAN GOMPEL EDWIN AUGUSTINUS MA ,  JANSEN ROB ,  KUSTERS GERARDUS ADRIANUS ANTO ,  CADEE THEODORUS PETRUS MARIA ,  SMEETS MARTIN FRANS PIERRE ,  VAN DER MEULEN FRITS ,  SIMONS WILHELMUS FRANCISCUS JO ,  LEENDERS MARTINUS HENDRIKUS AN ,  OTTENS JOOST JEROEN ,  VAN BAREN MARTIJN