公开(公告)号：NL2007857A

公开(公告)日：2011-12-19

申请号：NL2007857

申请日：2011-11-24

Applicant: ASML NETHERLANDS BV

Inventor： WUISTER SANDER ,  KRIVTSUN VLADIMIR ,  YAKUNIN ANDREI

IPC: G03F7/20

公开(公告)号：NL2005434A

公开(公告)日：2011-06-21

申请号：NL2005434

申请日：2010-10-01

Applicant: ASML NETHERLANDS BV

Inventor： WUISTER SANDER ,  BOEF ARIE ,  KRUIJT-STEGEMAN YVONNE

IPC: G03F7/00

公开(公告)号：NL2005435A

公开(公告)日：2011-05-31

申请号：NL2005435

申请日：2010-10-01

Applicant: ASML NETHERLANDS BV

Inventor： WUISTER SANDER

IPC: G03F7/00

公开(公告)号：NL2005430A

公开(公告)日：2011-05-25

申请号：NL2005430

申请日：2010-09-30

Applicant: ASML NETHERLANDS BV

Inventor： WUISTER SANDER ,  KRUIJT-STEGEMAN YVONNE

IPC: G03F7/00 ,  G03F9/00

公开(公告)号：NL2003875A

公开(公告)日：2010-08-05

申请号：NL2003875

申请日：2009-11-27

Applicant: ASML NETHERLANDS BV

Inventor： WUISTER SANDER ,  DIJKSMAN JOHAN ,  KRUIJT-STEGEMAN YVONNE ,  LAMMERS JEROEN ,  TEMPEL LEENDERT

IPC: G03F7/00 ,  H01L21/30

公开(公告)号：NL2010402A

公开(公告)日：2013-10-01

申请号：NL2010402

申请日：2013-03-06

Applicant: ASML NETHERLANDS BV

Inventor： SINGH HARMEET ,  BANINE VADIM ,  FINDERS JOZEF ,  WUISTER SANDER ,  KOOLE ROELOF ,  PEETERS EMIEL

IPC: G03F7/20

公开(公告)号：NL2007940A

公开(公告)日：2012-06-27

申请号：NL2007940

申请日：2011-12-09

Applicant: ASML NETHERLANDS BV

Inventor： PEETERS EMIEL ,  KETELAARS WILHELMUS ,  DIJKSMAN JOHAN ,  WUISTER SANDER ,  KOOLE ROELOF ,  HEESCH CHRIS

IPC: G03F7/20

Abstract: A method is disclosed involving depositing a neutral orientation template layer onto a substrate after formation of chemical epitaxy or graphoepitaxy features on the substrate, but before deposition and orientation of a self-assemblable polymer. The orientation layer is arranged to bond with the substrate but not with certain features, so that it may be easily removed by vacuum or rinsing with organic solvent. The neutral orientation layer has a chemical affinity to match that of blocks in the self-assemblable polymer so that blocks of differing types wet the neutral orientation layer so that domains in the self-assembled polymer may lie side by side along the substrate surface, with interfaces normal to the substrate surface. The resulting aligned and oriented self-assembled polymer may itself be used as a resist for device lithography of the substrate.

公开(公告)号：NL2005992A

公开(公告)日：2011-09-23

申请号：NL2005992

申请日：2011-01-12

Applicant: ASML NETHERLANDS BV

Inventor： WUISTER SANDER ,  BANINE VADIM ,  BOEF ARIE ,  KRUIJT-STEGEMAN YVONNE ,  RAKHIMOVA TATYANA ,  LOPAEV DMITRIY ,  GLUSHKOV DENNIS ,  YAKUNIN ANDREI ,  KOOLE ROELOF

IPC: G03F7/00

Abstract: An imprint lithography method is disclosed that includes, after imprinting an imprint lithography template into a layer of imprintable medium to form a pattern in that imprintable medium and fixing that pattern to form a patterned layer of imprintable medium, adding etch resistant material (i.e. a hard mask) to a part of the patterned layer of imprintable medium to reduce a difference between an intended topography and an actual topography of that part of the patterned layer of imprintable medium.

公开(公告)号：NL2005975A

公开(公告)日：2011-09-06

申请号：NL2005975

申请日：2011-01-10

Applicant: ASML NETHERLANDS BV

Inventor： BOEF ARIE ,  JEUNINK ANDRE ,  WUISTER SANDER ,  KRUIJT-STEGEMAN YVONNE

IPC: G03F7/00

公开(公告)号：NL2004932A

公开(公告)日：2011-01-31

申请号：NL2004932

申请日：2010-06-21

Applicant: ASML NETHERLANDS BV

Inventor： WUISTER SANDER ,  KRUIJT-STEGEMAN YVONNE

IPC: G03F7/00