公开(公告)号：DE69611053D1

公开(公告)日：2001-01-04

申请号：DE69611053

申请日：1996-04-09

Applicant: IBM

Inventor： COLGAN EVAN GEORGE ,  HARPER JAMES MICKELL EDWIN ,  KAUFMAN FRANK BENJAMIN ,  MANNI MARGARET PAGGY ,  MELCHER ROBERT LEE ,  SPEIDELL JAMES LOUIS

IPC: G02F1/1335 ,  G02F1/1339 ,  G02F1/1343 ,  G02F1/136 ,  G02F1/1362 ,  G02F1/1368

Abstract: A reflective spatial light modulator array is described incorporating liquid crystal devices, mirrors, a semiconductor substrate, electrical circuits, and a reflector/absorber layer for blocking light. The invention overcomes the problem of shielding light from semiconductor devices, high optical throughput and contrast, pixel storage capacitance to hold the voltage across the liquid crystal device and precise control of the liquid crystal device thickness without spacers obscuring the mirrors.

公开(公告)号：DE69024263D1

公开(公告)日：1996-02-01

申请号：DE69024263

申请日：1990-03-07

Applicant: IBM

Inventor： CARR JEFFREY WILLIAM ,  DAVID LAWRENCE DANIEL ,  GUTHRIE WILLIAM LESLIE ,  KAUFMAN FRANK BENJAMIN ,  PATRICK WILLIAM JOHN ,  RODBELL KENNETH PARKER ,  PASCO ROBERT WILLIAM ,  NENADIC ANTON

IPC: C09G1/02 ,  H01L21/306 ,  H01L21/48 ,  H01L21/302

Abstract: Disclosed is a method of chem-mech polishing an electronic component substrate. The method includes the following steps; obtaining a substrate having at least two features thereon or therein which have a different etch rate with respect to a particular etchant; and contacting the substrate with a polishing pad while contacting the substrate with a slurry containing the etchant wherein the slurry includes abrasive particles, a transition metal chelated salt and a solvent for the salt. The chem-mech polishing causes the at least two features to be substantially coplanar. Also disclosed is the chem-mech polishing slurry.

公开(公告)号：DE3373560D1

公开(公告)日：1987-10-15

申请号：DE3373560

申请日：1983-11-24

Applicant: IBM

Inventor： CHAO VIVIAN WEI-WEN ,  KAUFMAN FRANK BENJAMIN ,  KRAMER STEVEN ROBERT ,  LIN BURN JENG

IPC: G03F7/26 ,  G03F7/038 ,  G03F7/095 ,  G03F7/20 ,  H01L21/027 ,  G03F7/10 ,  G03F7/02

公开(公告)号：DE2961095D1

公开(公告)日：1982-01-07

申请号：DE2961095

申请日：1979-03-16

Applicant: IBM

Inventor： BERKENBLIT MELVIN ,  GREEN DENNIS CLINTON ,  KAUFMAN FRANK BENJAMIN ,  REISMAN ARNOLD

IPC: C23F1/10 ,  H01L21/306 ,  H01L21/308 ,  C09K13/00

公开(公告)号：DE2627828A1

公开(公告)日：1977-01-27

申请号：DE2627828

申请日：1976-06-22

Applicant: IBM

Inventor： ENGLER EDWARD MARTIN ,  KAUFMAN FRANK BENJAMIN ,  SCOTT BRUCE ALBERT

IPC: G03C1/73 ,  G03C1/675 ,  G03C1/72 ,  G03C5/56 ,  G03G5/026 ,  H05K1/09 ,  H05K3/10

Abstract: A method of optically printing conductive characters using charge transfer compounds is provided. The method is characterized by depositing an organic pi electron donor compound dissolved in a halogenated hydrocarbon (halocarbon) on a suitable substrate and selectively exposing the so coated substrate to actinic radiation to obtain a permanent, highly conductive, image.