公开(公告)号：DE60143178D1

公开(公告)日：2010-11-18

申请号：DE60143178

申请日：2001-06-15

Applicant: JSR CORP ,  IBM

Inventor： NISHIMURA YUKIO ,  YAMAHARA NOBORU ,  YAMAMOTO MASAFUMI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU ,  ITO HIROSHI

IPC: G03F7/004 ,  C08K5/00 ,  C08L33/06 ,  C08L35/00 ,  C08L45/00 ,  G03F7/039 ,  H01L21/027

公开(公告)号：DE60323577D1

公开(公告)日：2008-10-30

申请号：DE60323577

申请日：2003-07-30

Applicant: JSR CORP

Inventor： SUGITA HIKARU ,  KONNO KEIJI ,  TANAKA MASATO ,  SHIMOKAWA TSUTOMU

IPC: C07C33/38 ,  C07C69/608 ,  C07C69/00 ,  C08F232/08 ,  G03F7/09

Abstract: Novel compounds acetoxymethylacenaphthylene and hydroxymethylacenaphthyleneare disclosed. A polymer prepared from these novel compounds containing a structural unit of the formula (3), wherein R is a hydrogen atom and R and R individually represent a monovalent atom or a monovalent organic group is also disclosed. The polymer is suitable as a component for an antireflection film-forming composition exhibiting a high antireflection effect and not causing intermixing with a resist film.

公开(公告)号：SG125883A1

公开(公告)日：2006-10-30

申请号：SG200004850

申请日：2000-09-16

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  MURATA KIYOSHI ,  ISHII HIROYUKI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/027 ,  G03F7/004 ,  G03F7/039

Abstract: A radiation-sensitive resin composition comprising (A) a resin containing an acid-dissociable group which is insoluble or scarcely soluble in alkali and becomes alkali soluble when the acid-dissociable group dissociates, comprising the following recurring unit (I), recurring unit (II), and at least one of the recurring units (III-1) and (III-2), and (B) a photoacid generator. The radiation-sensitive resin composition is suitable for use as a chemically-amplified resist showing sensitivity to active radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser, exhibiting superior dry etching resistance without being affected by types of etching gas, having high radiation transmittance, exhibiting excellent basic characteristics as a resist such as sensitivity, resolution, and pattern shape, possessing excellent storage stability as a composition, and exhibiting sufficient adhesion to substrates.

公开(公告)号：DE60025297T2

公开(公告)日：2006-08-17

申请号：DE60025297

申请日：2000-09-14

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  MURATA KIYOSHI ,  ISHII HIROYUKI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/027 ,  G03F7/039 ,  G03F7/004

Abstract: A radiation-sensitive resin composition comprising (A) a resin containing an acid-dissociable group which is insoluble or scarcely soluble in alkali and becomes alkali soluble when the acid-dissociable group dissociates, comprising the following recurring unit (I), recurring unit (II), and at least one of the recurring units (III-1) and (III-2), and (B) a photoacid generator. The radiation-sensitive resin composition is suitable for use as a chemically-amplified resist showing sensitivity to active radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser, exhibiting superior dry etching resistance without being affected by types of etching gas, having high radiation transmittance, exhibiting excellent basic characteristics as a resist such as sensitivity, resolution, and pattern shape, possessing excellent storage stability as a composition, and exhibiting sufficient adhesion to substrates.

公开(公告)号：DE60025297D1

公开(公告)日：2006-03-30

申请号：DE60025297

申请日：2000-09-14

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  MURATA KIYOSHI ,  ISHII HIROYUKI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/027 ,  G03F7/039 ,  G03F7/004

Abstract: A radiation-sensitive resin composition comprising (A) a resin containing an acid-dissociable group which is insoluble or scarcely soluble in alkali and becomes alkali soluble when the acid-dissociable group dissociates, comprising the following recurring unit (I), recurring unit (II), and at least one of the recurring units (III-1) and (III-2), and (B) a photoacid generator. The radiation-sensitive resin composition is suitable for use as a chemically-amplified resist showing sensitivity to active radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser, exhibiting superior dry etching resistance without being affected by types of etching gas, having high radiation transmittance, exhibiting excellent basic characteristics as a resist such as sensitivity, resolution, and pattern shape, possessing excellent storage stability as a composition, and exhibiting sufficient adhesion to substrates.

公开(公告)号：CA2387716A1

公开(公告)日：2002-03-07

申请号：CA2387716

申请日：2001-08-24

Applicant: JSR CORP

Inventor： BESSHO NOBUO ,  SHIMOKAWA TSUTOMU ,  YAMADA KENJI ,  KUMANO ATSUSHI ,  NISHIMURA ISAO

IPC: C08L67/00 ,  C08L69/00 ,  C08L83/14 ,  G02B1/04 ,  G02B5/18 ,  G02B6/124 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G02B3/00 ,  C08L101/00 ,  G03H1/02 ,  G02B6/12 ,  G03F7/36

Abstract: A composition having a refractive index sensitively changeable by a radiatio n which comprises (A) a decomposable compound, (B) a non-decomposable compound having a refractive index lower than that of the decomposable compound (A), (C) a radiation-sensitive decomposing agent, and (D) a stabilizer. The irradiation of the composition with a radiation ray via a mask decomposes th e above (C) and (A) components in a irradiated portion, resulting in the occurrence of the difference in refractive index between an irradiated porti on and a non-irradiated portion, which leads to the formation of a pattern havi ng regions of different refractive indexes.

公开(公告)号：DE60236710D1

公开(公告)日：2010-07-29

申请号：DE60236710

申请日：2002-04-25

Applicant: JSR CORP

Inventor： NAGAI TOMOKI ,  NUMATA JUN ,  KOBAYASHI EIICHI ,  SHIMOKAWA TSUTOMU

IPC: G03F7/004 ,  G03F7/039 ,  C08F12/24 ,  H01L21/027

公开(公告)号：AU2002222583B2

公开(公告)日：2006-06-15

申请号：AU2002222583

申请日：2001-12-06

Applicant: JSR CORP

Inventor： SHIMOKAWA TSUTOMU ,  BESSHO NOBUO ,  KUMANO ATSUSHI ,  NISHIMURA ISAO ,  YAMADA KENJI

IPC: C08L101/00 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

Abstract: A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) astabilizer. By exposing this composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion decompose to create a refractive index difference between the exposed portion and an unexposed portion, thereby forming a pattern having different refractive indices.

公开(公告)号：DE60105523T2

公开(公告)日：2005-09-29

申请号：DE60105523

申请日：2001-11-13

Applicant: JSR CORP

Inventor： KAWAGUCHI KAZUO ,  TANAKA MASATO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/004 ,  G03F7/09

Abstract: An anti-reflection coating-forming composition is provided. This composition includes a polymer and a solvent. The polymer has a structural unit represented by the formula (1): wherein R1 is a monovalent atom other than a hydrogen atom or a monovalent group, and n is an integer of 0-4, provided that when n is an integer of 2-4, a plural number of R1's are the same or different; R2 and R3 are each a monovalent atom or group; and X is a bivalent group. The anti-reflection coating formed from this composition has a high antireflective effect, does not generate intermixing with a resist film, and enables a good resist pattern profile excellent in resolution and precision in cooperation with a positive or negative resist.

公开(公告)号：DE60102028T2

公开(公告)日：2004-06-24

申请号：DE60102028

申请日：2001-04-05

Applicant: JSR CORP

Inventor： IWASAWA HARUO ,  SHIMOKAWA TSUTOMU ,  AKIHIRO HAYASHI ,  NISHIYAMA SATORU

IPC: C08G77/42 ,  C07F7/08 ,  C08G77/14 ,  C08G77/24 ,  C08L83/06 ,  C08L83/08 ,  G03F7/004 ,  G03F7/075 ,  C08G77/04 ,  C08L83/04 ,  C08L83/14 ,  C07F7/04 ,  C07F7/21 ,  G03F7/039

Abstract: A novel polysiloxane having the following structural units (I) and/or (II) and the structural unit (III), wherein A and A are an acid-dissociable monovalent organic group, R is hydrogen, monovalent (halogenated) hydrocarbon, halogen, or amino, R is monovalent (halogenated) hydrocarbon group, or halogen. A method of preparing such a polysiloxane, a silicon-containing alicyclic compound providing this polysiloxane, and a radiation-sensitive resin composition comprising this polysiloxane are also provided. The polysiloxane is useful as a resin component for a resist material, effectively senses radiation with a short wavelength, exhibits high transparency to radiation and superior dry etching properties, and excels in basic resist properties required for resist materials such as high sensitivity, resolution, developability, etc.