公开(公告)号：AU2003296188A1

公开(公告)日：2004-07-29

申请号：AU2003296188

申请日：2003-12-24

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  FUJIWARA KOUICHI ,  KOBAYASHI EIICHI ,  SHIMOKAWA TSUTOMU ,  NAKAMURA ATSUSHI ,  YONEDA EIJI ,  WANG YONG

IPC: C08F4/00 ,  G03F7/004 ,  G03F7/039

公开(公告)号：DE60102028D1

公开(公告)日：2004-03-25

申请号：DE60102028

申请日：2001-04-05

Applicant: JSR CORP

Inventor： IWASAWA HARUO ,  SHIMOKAWA TSUTOMU ,  AKIHIRO HAYASHI ,  NISHIYAMA SATORU

IPC: C08G77/42 ,  C07F7/08 ,  C08G77/14 ,  C08G77/24 ,  C08L83/06 ,  C08L83/08 ,  G03F7/004 ,  G03F7/075 ,  C08G77/04 ,  C08L83/04 ,  C08L83/14 ,  C07F7/04 ,  C07F7/21 ,  G03F7/039

Abstract: A novel polysiloxane having the following structural units (I) and/or (II) and the structural unit (III), wherein A and A are an acid-dissociable monovalent organic group, R is hydrogen, monovalent (halogenated) hydrocarbon, halogen, or amino, R is monovalent (halogenated) hydrocarbon group, or halogen. A method of preparing such a polysiloxane, a silicon-containing alicyclic compound providing this polysiloxane, and a radiation-sensitive resin composition comprising this polysiloxane are also provided. The polysiloxane is useful as a resin component for a resist material, effectively senses radiation with a short wavelength, exhibits high transparency to radiation and superior dry etching properties, and excels in basic resist properties required for resist materials such as high sensitivity, resolution, developability, etc.

公开(公告)号：AU2258302A

公开(公告)日：2002-06-24

申请号：AU2258302

申请日：2001-12-06

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  BESSHO NOBUO ,  KUMANO ATSUSHI ,  SHIMOKAWA TSUTOMU ,  YAMADA KENJI

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  C08L101/00 ,  G03F7/38 ,  G03F7/36

Abstract: A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) astabilizer. By exposing this composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion decompose to create a refractive index difference between the exposed portion and an unexposed portion, thereby forming a pattern having different refractive indices.

公开(公告)号：DE60323577D1

公开(公告)日：2008-10-30

申请号：DE60323577

申请日：2003-07-30

Applicant: JSR CORP

Inventor： SUGITA HIKARU ,  KONNO KEIJI ,  TANAKA MASATO ,  SHIMOKAWA TSUTOMU

IPC: C07C33/38 ,  C07C69/608 ,  C07C69/00 ,  C08F232/08 ,  G03F7/09

Abstract: Novel compounds acetoxymethylacenaphthylene and hydroxymethylacenaphthyleneare disclosed. A polymer prepared from these novel compounds containing a structural unit of the formula (3), wherein R is a hydrogen atom and R and R individually represent a monovalent atom or a monovalent organic group is also disclosed. The polymer is suitable as a component for an antireflection film-forming composition exhibiting a high antireflection effect and not causing intermixing with a resist film.

公开(公告)号：SG125883A1

公开(公告)日：2006-10-30

申请号：SG200004850

申请日：2000-09-16

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  MURATA KIYOSHI ,  ISHII HIROYUKI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/027 ,  G03F7/004 ,  G03F7/039

Abstract: A radiation-sensitive resin composition comprising (A) a resin containing an acid-dissociable group which is insoluble or scarcely soluble in alkali and becomes alkali soluble when the acid-dissociable group dissociates, comprising the following recurring unit (I), recurring unit (II), and at least one of the recurring units (III-1) and (III-2), and (B) a photoacid generator. The radiation-sensitive resin composition is suitable for use as a chemically-amplified resist showing sensitivity to active radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser, exhibiting superior dry etching resistance without being affected by types of etching gas, having high radiation transmittance, exhibiting excellent basic characteristics as a resist such as sensitivity, resolution, and pattern shape, possessing excellent storage stability as a composition, and exhibiting sufficient adhesion to substrates.

公开(公告)号：DE60025297T2

公开(公告)日：2006-08-17

申请号：DE60025297

申请日：2000-09-14

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  MURATA KIYOSHI ,  ISHII HIROYUKI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/027 ,  G03F7/039 ,  G03F7/004

Abstract: A radiation-sensitive resin composition comprising (A) a resin containing an acid-dissociable group which is insoluble or scarcely soluble in alkali and becomes alkali soluble when the acid-dissociable group dissociates, comprising the following recurring unit (I), recurring unit (II), and at least one of the recurring units (III-1) and (III-2), and (B) a photoacid generator. The radiation-sensitive resin composition is suitable for use as a chemically-amplified resist showing sensitivity to active radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser, exhibiting superior dry etching resistance without being affected by types of etching gas, having high radiation transmittance, exhibiting excellent basic characteristics as a resist such as sensitivity, resolution, and pattern shape, possessing excellent storage stability as a composition, and exhibiting sufficient adhesion to substrates.

公开(公告)号：DE60025297D1

公开(公告)日：2006-03-30

申请号：DE60025297

申请日：2000-09-14

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  MURATA KIYOSHI ,  ISHII HIROYUKI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/027 ,  G03F7/039 ,  G03F7/004

Abstract: A radiation-sensitive resin composition comprising (A) a resin containing an acid-dissociable group which is insoluble or scarcely soluble in alkali and becomes alkali soluble when the acid-dissociable group dissociates, comprising the following recurring unit (I), recurring unit (II), and at least one of the recurring units (III-1) and (III-2), and (B) a photoacid generator. The radiation-sensitive resin composition is suitable for use as a chemically-amplified resist showing sensitivity to active radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser, exhibiting superior dry etching resistance without being affected by types of etching gas, having high radiation transmittance, exhibiting excellent basic characteristics as a resist such as sensitivity, resolution, and pattern shape, possessing excellent storage stability as a composition, and exhibiting sufficient adhesion to substrates.

公开(公告)号：CA2387716A1

公开(公告)日：2002-03-07

申请号：CA2387716

申请日：2001-08-24

Applicant: JSR CORP

Inventor： BESSHO NOBUO ,  SHIMOKAWA TSUTOMU ,  YAMADA KENJI ,  KUMANO ATSUSHI ,  NISHIMURA ISAO

IPC: C08L67/00 ,  C08L69/00 ,  C08L83/14 ,  G02B1/04 ,  G02B5/18 ,  G02B6/124 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G02B3/00 ,  C08L101/00 ,  G03H1/02 ,  G02B6/12 ,  G03F7/36

Abstract: A composition having a refractive index sensitively changeable by a radiatio n which comprises (A) a decomposable compound, (B) a non-decomposable compound having a refractive index lower than that of the decomposable compound (A), (C) a radiation-sensitive decomposing agent, and (D) a stabilizer. The irradiation of the composition with a radiation ray via a mask decomposes th e above (C) and (A) components in a irradiated portion, resulting in the occurrence of the difference in refractive index between an irradiated porti on and a non-irradiated portion, which leads to the formation of a pattern havi ng regions of different refractive indexes.

公开(公告)号：DE60236710D1

公开(公告)日：2010-07-29

申请号：DE60236710

申请日：2002-04-25

Applicant: JSR CORP

Inventor： NAGAI TOMOKI ,  NUMATA JUN ,  KOBAYASHI EIICHI ,  SHIMOKAWA TSUTOMU

IPC: G03F7/004 ,  G03F7/039 ,  C08F12/24 ,  H01L21/027

公开(公告)号：AU2002222583B2

公开(公告)日：2006-06-15

申请号：AU2002222583

申请日：2001-12-06

Applicant: JSR CORP

Inventor： SHIMOKAWA TSUTOMU ,  BESSHO NOBUO ,  KUMANO ATSUSHI ,  NISHIMURA ISAO ,  YAMADA KENJI

IPC: C08L101/00 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

Abstract: A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) astabilizer. By exposing this composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion decompose to create a refractive index difference between the exposed portion and an unexposed portion, thereby forming a pattern having different refractive indices.