公开(公告)号：AU2002322547A1

公开(公告)日：2003-02-17

申请号：AU2002322547

申请日：2002-07-18

Applicant: LAM RES CORP

Inventor： SCHOEPP ALAN M ,  WILCOXSON MARK H ,  BAILEY III ANDREW D ,  SMITH MICHAEL G R ,  KUTHI ANDRAS

IPC: H05H1/46 ,  H01J37/32 ,  H01L21/3065

Abstract: An antenna arrangement for generating an electric field inside a process chamber is provided. Generally, the antenna arrangement comprises a first loop disposed around an antenna axis. The first loop comprises a first turn with a first turn gap; a second turn with a second turn gap, where the second turn is concentric and coplanar with the first turn and spaced apart from the first turn, and where the antenna axis passes through the center of the first turn and second turn; and a first turn-second turn connector electrically connected between a second end of the first turn and a first end of the second turn comprising a spanning section between and coplanar with the first turn and the second turn and which spans the first turn gap and the second turn gap.

公开(公告)号：MY143289A

公开(公告)日：2011-04-15

申请号：MYPI20051473

申请日：2005-03-31

Applicant: LAM RES CORP

Inventor： RAVKIN MICHAEL ,  LARIOS JOHN M DE ,  KOROLIK MIKHAIL ,  SMITH MICHAEL G R ,  WOODS CARL

IPC: A47L15/00 ,  A47L25/00 ,  B08B1/02 ,  B08B1/04 ,  B08B3/00 ,  B08B3/04 ,  B08B7/00 ,  B08B7/04 ,  H01L21/00

Abstract: A METHOD FOR CLEANING AND DRIYING A FRONT AND A BACK SURFACE OFA SUBSTRATE ( 102) IS PROVIDED. THE METHOD INCLUDES BRUSH SCRUBBING THE BACK SURFACE ( 102B) OF THE SUBSTRATE ( 102) USING A BRUSH SCRUBBING FLUID CHEMISTRY (121). THE METHOD FURTHER INCLUDES APPLYING A FRONT MENISCUS (150) ONTO THE FRONT SURFACE ( 102A) OF THE SUBSTRATE ( 102) UPON COMPLETING THE BRUSH SCRUBBING OF THE BACK SURFACE (102B). THE FRONT MENISCUS (150) INCLUDES A FRONT CLEANING CHEMISTRY THAT IS CHEMICALLY COMPATIBLE WITH THE BRUSH SCRUBBING FLUID CHEMISTRY (121). A METHOD FOR PREPARING A SURFACE OF A SUBSTRATE (102) IS ALSO PROVIDED. THE METHOD INCLUDES SCANNING THE SURFACE OF THE SUBSTRATE BY A MENISCUS ( 150). PREPARING THE SURFACE OF THE SUBSTRATE USING THE MENISCUS (150) (1102). AND PERFORMING A NEXT PREPARATION OPERATION ON THE SURFACE OF THE SUBSTRATE (102) THAT WAS PREPARED WITHOUT PERFORMING A RINSING OPERATION ( 1104).

公开(公告)号：DE602005002782D1

公开(公告)日：2007-11-22

申请号：DE602005002782

申请日：2005-03-30

Applicant: LAM RES CORP

Inventor： WOODS CARL ,  PARKS JOHN ,  SMITH MICHAEL G R

IPC: H01L21/00 ,  B05D1/00 ,  B08B3/00 ,  B08B3/02 ,  B08B3/04 ,  C23C18/16 ,  C25D5/08 ,  C25D5/22 ,  C25D7/12 ,  C25D17/00 ,  C25D21/00 ,  H01L21/02 ,  H01L21/304 ,  H01L21/306

Abstract: An apparatus for generating a fluid meniscus to be formed on a surface of a substrate is provided including a housing where the housing includes a housing surface to be placed proximate to a substrate surface of the substrate. The housing further includes a process configuration receiving region that is surrounded by the housing surface. The apparatus also includes a process configuration insert which has an insert surface where the process configuration insert is defined to fit within the process configuration receiving region of the housing such that the insert surface and the housing surface define a proximity face that can be placed proximate to the substrate surface of the substrate.

公开(公告)号：AT375602T

公开(公告)日：2007-10-15

申请号：AT05251949

申请日：2005-03-30

Applicant: LAM RES CORP

Inventor： WOODS CARL ,  PARKS JOHN ,  SMITH MICHAEL G R

IPC: H01L21/00 ,  B05D1/00 ,  B08B3/00 ,  B08B3/02 ,  B08B3/04 ,  C23C18/16 ,  C25D5/08 ,  C25D5/22 ,  C25D7/12 ,  C25D17/00 ,  C25D21/00 ,  H01L21/02 ,  H01L21/304 ,  H01L21/306

Abstract: An apparatus for generating a fluid meniscus to be formed on a surface of a substrate is provided including a housing where the housing includes a housing surface to be placed proximate to a substrate surface of the substrate. The housing further includes a process configuration receiving region that is surrounded by the housing surface. The apparatus also includes a process configuration insert which has an insert surface where the process configuration insert is defined to fit within the process configuration receiving region of the housing such that the insert surface and the housing surface define a proximity face that can be placed proximate to the substrate surface of the substrate.

公开(公告)号：MY139622A

公开(公告)日：2009-10-30

申请号：MYPI20051482

申请日：2005-04-01

Applicant: LAM RES CORP

Inventor： WOODS CARL ,  SMITH MICHAEL G R ,  PARKS JOHN

IPC: B05D1/00 ,  B08B3/00 ,  B08B3/02 ,  B08B3/04 ,  C23C18/16 ,  C25D5/08 ,  C25D5/22 ,  C25D7/12 ,  C25D17/00 ,  C25D21/00 ,  H01L21/00 ,  H01L21/02 ,  H01L21/304 ,  H01L21/306

Abstract: AN APPARATUS FOR GENERATING A FLUID MENISCUS (116) TO BE FORMED ON A SURFACE OF A SUBSTRATE ( 108) IS PROVIDED INCLUDING A HOUSING (401) WHERE THE HOUSING (401 ) INCLUDES A HOUSING SURFACE (413) TO BE PLACED PROXIMATE TO A SUBSTRATE SURFACE OF THE SUBSTRATE (108).THE HOUSING (401) FURTHER INCLUDES A PROCESS CONFIGURATION RECEIVING REGION (404) THAT IS SURROUNDED BY THE HOUSING SURFACE (413). THE APPARATUS ALSO INCLUDES A PROCESS CONFIGURATION INSERT (403) WHICH HAS AN INSERT SURFACE (415) WHERE THE PROCESS CONFIGURATION INSERT (403) IS DEFINED TO FIT WITHIN THE PROCESS CONFIGURATION RECEIVING REGION (574) OF THE HOUSING (401) SUCH THAT THE INSERT SURFACE (415) AND THE HOUSING SURFACE (413) DEFINE A PROXIMITY FACE (407) THAT CAN BE PLACED PROXIMATE TO THE SUBSTRATE SURFACE OF THE SUBSTRATE 108).

公开(公告)号：DE602005002782T2

公开(公告)日：2008-07-17

申请号：DE602005002782

申请日：2005-03-30

Applicant: LAM RES CORP

Inventor： WOODS CARL ,  PARKS JOHN ,  SMITH MICHAEL G R

IPC: H01L21/00 ,  B05D1/00 ,  B08B3/00 ,  B08B3/02 ,  B08B3/04 ,  C23C18/16 ,  C25D5/08 ,  C25D5/22 ,  C25D7/12 ,  C25D17/00 ,  C25D21/00 ,  H01L21/02 ,  H01L21/304 ,  H01L21/306

Abstract: An apparatus for generating a fluid meniscus to be formed on a surface of a substrate is provided including a housing where the housing includes a housing surface to be placed proximate to a substrate surface of the substrate. The housing further includes a process configuration receiving region that is surrounded by the housing surface. The apparatus also includes a process configuration insert which has an insert surface where the process configuration insert is defined to fit within the process configuration receiving region of the housing such that the insert surface and the housing surface define a proximity face that can be placed proximate to the substrate surface of the substrate.

公开(公告)号：DE602005000450T2

公开(公告)日：2007-12-06

申请号：DE602005000450

申请日：2005-03-29

Applicant: LAM RES CORP

Inventor： WOODS CARL ,  PARKS JOHN ,  SMITH MICHAEL G R ,  GARCIA JAMES P ,  DE LARIOS JOHN M

IPC: B05D3/12 ,  B05C9/02 ,  B05D1/00 ,  H01L21/00 ,  H01L21/02 ,  H01L21/027 ,  H01L21/304 ,  H01L21/306

Abstract: An apparatus for processing a substrate is provided which includes a first manifold module to generate a fluid meniscus on a substrate surface. The apparatus also includes a second manifold module to connect with the first manifold module and also to move the first manifold module into close proximity to the substrate surface to generate the fluid meniscus.

公开(公告)号：DE602005000450D1

公开(公告)日：2007-03-08

申请号：DE602005000450

申请日：2005-03-29

Applicant: LAM RES CORP

Inventor： WOODS CARL ,  PARKS JOHN ,  SMITH MICHAEL G R ,  GARCIA JAMES P ,  DE LARIOS JOHN M

IPC: B05D3/12 ,  B05C9/02 ,  B05D1/00 ,  H01L21/00 ,  H01L21/02 ,  H01L21/027 ,  H01L21/304 ,  H01L21/306

Abstract: An apparatus for processing a substrate is provided which includes a first manifold module to generate a fluid meniscus on a substrate surface. The apparatus also includes a second manifold module to connect with the first manifold module and also to move the first manifold module into close proximity to the substrate surface to generate the fluid meniscus.

公开(公告)号：SG118399A1

公开(公告)日：2006-01-27

申请号：SG200503946

申请日：2005-06-20

Applicant: LAM RES CORP

Inventor： SMITH MICHAEL G R ,  MICHAEL RAVKIN ,  O'DONNELL ROBERT J

IPC: F26B5/04 ,  F26B7/00 ,  F26B13/30 ,  H01L21/00

Abstract: Method for processing a substrate is disclosed which includes generating a first fluid meniscus and a second fluid meniscus at least partially surrounding the first fluid meniscus wherein the first fluid meniscus and the second fluid meniscus are generated on a surface of the substrate.

公开(公告)号：AU2003299889A8

公开(公告)日：2004-09-06

申请号：AU2003299889

申请日：2003-12-23

Applicant: LAM RES CORP

Inventor： KNOP ROBERT ,  THIE WILLIAM ,  BOYD JOHN ,  ANDERSON THOMAS W ,  SMITH MICHAEL G R ,  KUTHI ANDRAS

IPC: B06B1/02 ,  B08B3/10 ,  B08B3/12 ,  H01L21/00 ,  H01L21/302

Abstract: system and method of cleaning a substrate (202) includes a megasonic chamber (206) that includes a transducer (210) and a substrate (202). The transducer (210) is being oriented toward the substrate (202). A variable distance d separates the transducer (210) and the substrate (202). The system (200) also includes a dynamically adjustable RF generator (212) that has an output coupled to the transducer. The dynamically adjustable RF generator (212) can be controlled by a phase comparison of an oscillator output (306) voltage and a phase of an RF generator output voltage. The dynamically adjustable RF generator (212) can also be controlled by monitoring a peak voltage of an output signal and controlling the RF generator to maintain the peak voltage within a predetermined voltage range. The dynamically adjustable RF generator (212) can also be controlled by dynamically controlling a variable DC power supply voltage.