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    액 처리 장치 및 액 처리 방법
    21.
    发明授权
    액 처리 장치 및 액 처리 방법 失效
    액처리장치및액처리방법

    公开(公告)号：KR100928596B1

    公开(公告)日：2009-11-26

    申请号：KR1020067020302

    申请日：2003-11-10

    Applicant: 도쿄엘렉트론가부시키가이샤

    Inventor： 가사이시게루 ,  이시바시세이지 ,  야마모토가오루 ,  다나카스미 ,  야나기타니게니치

    IPC: H01L21/02

    CPC classification number: G05D16/208

    Abstract: A fluid treatment apparatus and a fluid treatment method, the apparatus comprising a treatment container (4) having a loading table (8) for loading a treated body (W) thereon, a gas introducing means (10) introducing treatment gas into the treatment container, treatment gas feed systems (14, 16, 18) feeding specified treatment gases, an inert gas feed system (12) feeding inert gas, a vacuum exhaust system (32) in which a pressure regulating valve (36) allowing a valve opening to be varied and a vacuum pump (38) are installed, and a pressure gauge (48), wherein when a treatment in which the partial pressure of the treatment gas is important is performed, the valve opening of the pressure regulating valve (36) is controlled based on the detected values on the pressure gauge (48) while the treatment gas flows at a specified rate and when a treatment in which the partial pressure of the treatment gas is not so important, the valve opening of the pressure regulating valve (36) is fixed to a specified value and, based on the detected values on the pressure gauge (48), the supplied amount of the inert gas is controlled, whereby even when a plurality of types of the treatments in which the ranges of treatment pressures are largely different from each other are performed, the pressure controls of the treatments can be properly performed.

    Abstract translation: 一种流体处理装置和流体处理方法，所述装置包括：处理容器（4），其具有用于在其上装载处理过的物体（W）的装载台（8）;气体引入装置（10），将处理气体引入处理容器 ，供给特定处理气体的处理气体供给系统（14,16,18），供给惰性气体的惰性气体供给系统（12），真空排气系统（32），其中压力调节阀（36）允许阀门开启 （38）和压力计（48），其中当处理气体的分压是重要的处理时，压力调节阀（36）的阀门开度为 基于压力计（48）上的检测值进行控制，同时处理气体以特定的速率流动，并且当处理气体的分压不那么重要的处理时，压力调节阀（36 ）被固定为a 根据压力计（48）的检测值来控制惰性气体的供给量，即使在处理压力的范围大幅不同的多种处理 被执行时，治疗的压力控制可以被适当地执行。

    증착 시스템
    27.
    发明公开
    증착 시스템 有权
    用于热和等离子体增强蒸气沉积的装置和操作方法

    公开(公告)号：KR1020080052956A

    公开(公告)日：2008-06-12

    申请号：KR1020060124784

    申请日：2006-12-08

    Applicant: 도쿄엘렉트론가부시키가이샤

    Inventor： 리이쳉 ,  이시자카다다히로 ,  야마모토가오루 ,  고미아츠시 ,  하라마사미치 ,  후지사토도시아코 ,  파게쟈끄 ,  미즈사와야스시

    IPC: H01L21/02

    Abstract: An apparatus for thermal and plasma enhanced vapor deposition and a method for operating the same are provided to reduce pollution between interfaces of deposited layers and to realize a structure suitable for a vapor deposition and a sample delivery in the same system. A deposition system(101) forms a deposition material on a substrate(125). The deposition system includes a first assembly, a second assembly, a substrate stage(120), and a sealing assembly. The first assembly has a process space(180) where materials are deposited. A second assembly is coupled to the first assembly. The second assembly has a transfer space(182) where the substrate is carried in and out of the deposition system. The substrate stage is connected to the second assembly. The substrate stage supports the substrate to change a size of the process space. The substrate is moved in parallel from a first position in the process space to a second position in the process space by the substrate stage. A sealing assembly has a seal, which controls a gas flow between the process space and the transfer space while the substrate is moved in parallel within the process space.

    Abstract translation: 提供一种用于热和等离子体增强气相沉积的装置及其操作方法，以减少沉积层界面之间的污染，并实现适用于同一系统中气相沉积和样品输送的结构。 沉积系统（101）在衬底（125）上形成沉积材料。 沉积系统包括第一组件，第二组件，衬底台（120）和密封组件。 第一组件具有沉积材料的工艺空间（180）。 第二组件联接到第一组件。 第二组件具有传送空间（182），其中衬底被载入和离开沉积系统。 衬底台连接到第二组件。 衬底台支撑衬底以改变工艺空间的尺寸。 基板从处理空间中的第一位置平行移动到处理空间中的第二位置。 密封组件具有密封件，其在基板在处理空间内平行移动时控制处理空间与传送空间之间的气流。

    기판 상에 증착물을 형성하는 증착 시스템
    28.
    发明公开
    기판 상에 증착물을 형성하는 증착 시스템 失效
    用于热和等离子体增强蒸气沉积的装置和操作方法

    公开(公告)号：KR1020070053142A

    公开(公告)日：2007-05-23

    申请号：KR1020060113812

    申请日：2006-11-17

    Applicant: 도쿄엘렉트론가부시키가이샤

    Inventor： 리이쳉 ,  이시자카다다히로 ,  야마모토가오루 ,  고미아츠시 ,  하라마사미치 ,  후지사토도시아코 ,  파게쟈끄 ,  미즈사와야스시

    IPC: H01L21/02

    CPC classification number: C23C16/45517 ,  C23C16/4401 ,  C23C16/4412 ,  H01J37/32082 ,  H01J37/32495 ,  H01J37/32522

    Abstract: 기판상에서의 기상 증착을 위한 방법, 컴퓨터 판독 가능한 기록 매체 및 시스템은 기상 증착 시스템의 제1 어셈블리를 제1 온도로 유지하고, 기상 증착 시스템의 제2 어셈블리를 상기 제1 온도보다 낮은 감소된 온도로 유지하고, 기판을 제2 어셈블리의 전달 공간으로부터 진공 격리된 제1 어셈블리의 공정 공간 내에 배치하며, 기판상에 재료를 증착한다. 따라서 기상 증착 시스템은 재료 증착을 실행하도록 구성된 공정 공간을 갖는 제1 어셈블리와, 제1 어셈블리에 결합되고 기상 증착 시스템의 내외로 기판을 운반하게 하는 전달 공간을 갖는 제2 어셈블리와, 제2 어셈블리에 접속되어 기판을 지지하도록 구성된 기판 스테이지와, 공정 공간을 전달 공간으로부터 분리하도록 구성된 실링 어셈블리를 포함한다. 제1 어셈블리는 제1 온도로 유지되도록 구성되고, 제2 어셈블리는 제1 온도보다 낮은 감소된 온도로 유지되도록 구성된다.

    액 처리 장치 및 액 처리 방법
    29.
    发明公开
    액 처리 장치 및 액 처리 방법 失效
    流体处理设备和流体处理方法

    公开(公告)号：KR1020060116248A

    公开(公告)日：2006-11-14

    申请号：KR1020067020302

    申请日：2003-11-10

    Applicant: 도쿄엘렉트론가부시키가이샤

    Inventor： 가사이시게루 ,  이시바시세이지 ,  야마모토가오루 ,  다나카스미 ,  야나기타니게니치

    IPC: H01L21/02

    CPC classification number: G05D16/208

    Abstract: A fluid treatment apparatus and a fluid treatment method, the apparatus comprising a treatment container (4) having a loading table (8) for loading a treated body (W) thereon, a gas introducing means (10) introducing treatment gas into the treatment container, treatment gas feed systems (14, 16, 18) feeding specified treatment gases, an inert gas feed system (12) feeding inert gas, a vacuum exhaust system (32) in which a pressure regulating valve (36) allowing a valve opening to be varied and a vacuum pump (38) are installed, and a pressure gauge (48), wherein when a treatment in which the partial pressure of the treatment gas is important is performed, the valve opening of the pressure regulating valve (36) is controlled based on the detected values on the pressure gauge (48) while the treatment gas flows at a specified rate and when a treatment in which the partial pressure of the treatment gas is not so important, the valve opening of the pressure regulating valve (36) is fixed to a specified value and, based on the detected values on the pressure gauge (48), the supplied amount of the inert gas is controlled, whereby even when a plurality of types of the treatments in which the ranges of treatment pressures are largely different from each other are performed, the pressure controls of the treatments can be properly performed.

    Abstract translation: 一种流体处理装置和流体处理方法，该装置包括：处理容器（4），具有用于装载处理体（W）的装载台（8）;气体导入装置（10），将处理气体导入处理容器 ，供给特定处理气体的处理气体供给系统（14,16,18），供给惰性气体的惰性气体供给系统（12），真空排气系统（32），其中压力调节阀（36）允许阀打开 改变并安装真空泵38和压力计48，其中当处理气体的分压重要的处理被执行时，压力调节阀36的阀开度为 当处理气体以规定的速度流动时，基于压力计（48）上的检测值进行控制，并且当处理气体的分压不那么重要的处理时，压力调节阀（36）的开阀 ）被固定为a 规定值，并且基于压力计（48）上的检测值，控制惰性气体的供给量，由此即使处理压力范围大大不同的多种处理方式 可以适当地进行处理的压力控制。

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