公开(公告)号：NL2007630A

公开(公告)日：2011-11-23

申请号：NL2007630

申请日：2011-10-20

Applicant: ASML NETHERLANDS BV

Inventor： SCACCABAROZZI LUIGI ,  BANINE VADIM ,  LUTTIKHUIS BERNARDUS ,  KOOLE ROELOF ,  WONDERGEM HENDRIKUS ,  GRAAT PETRUS

IPC: G03F7/20

公开(公告)号：NL2005464A

公开(公告)日：2011-06-21

申请号：NL2005464

申请日：2010-10-06

Applicant: ASML NETHERLANDS BV

Inventor： SCACCABAROZZI LUIGI ,  BANINE VADIM ,  WAGNER CHRISTIAN

IPC: G01N21/94 ,  G03F7/20

Abstract: A detector detects radiation from a mask to form an image, but the focal plane of the image is in front of the mask. Any particles arranged on the mask will be in focus. However, the pattern on the mask will be out of focus. It is therefore possible to detect the existence and location of particles on a mask having an arbitrary pattern. The depth of field of the detector is small and the focal plane is no further from the surface of the patterning device than two times the depth of field.

公开(公告)号：NL2006692A

公开(公告)日：2011-06-09

申请号：NL2006692

申请日：2011-04-29

Applicant: ASML NETHERLANDS BV

Inventor： VAINIR YURI ,  BANINE VADIM ,  BOEF ARIE ,  SCACCABAROZZI LUIGI

IPC: G03F7/20 ,  H01L21/66

公开(公告)号：NL2004949A

公开(公告)日：2011-02-22

申请号：NL2004949

申请日：2010-06-23

Applicant: ASML NETHERLANDS BV

Inventor： BOEF ARIE ,  BANINE VADIM ,  WUISTER SANDER ,  SCACCABAROZZI LUIGI

IPC: G03F7/00

Abstract: In an aspect, an inspection method for detecting the presence or absence of a defect on an object, the object comprising a recess having a physical depth, is disclosed. The method includes directing radiation at the object, the radiation having a wavelength that is substantially equal to twice an optical depth of the recess, detecting radiation that is re-directed by the object or a defect on the object, and determining the presence or absence of a defect from the re-directed radiation.

公开(公告)号：NL2005021A

公开(公告)日：2011-02-07

申请号：NL2005021

申请日：2010-07-02

Applicant: ASML NETHERLANDS BV

Inventor： BANINE VADIM ,  IVANOV VITALII ,  BOEF ARIE ,  SCACCABAROZZI LUIGI ,  IOSAD NIKOLAY

IPC: G01N21/64 ,  G03F1/00 ,  H01L21/66

公开(公告)号：NL1036769A1

公开(公告)日：2009-10-26

申请号：NL1036769

申请日：2009-03-25

Applicant: ASML NETHERLANDS BV

Inventor： SCACCABAROZZI LUIGI ,  IVANOV VLADIMIR VITALEVICH ,  KOSHELEV KONSTANTIN NIKOLAEVICH ,  MOORS JOHANNES HUBERTUS JOSEPH ,  STEVENS LUCAS HENRICUS JOHANNE ,  ANTSIFEROV PAVEL STANISLAVOVICH ,  KRIVTSUN VLADIMIR MIHAILOVITCH ,  DOROKHIN LEONID ALEXANDROVICH ,  KAMPEN MAARTEN VAN

IPC: G03F7/20