23.
    发明专利
    未知

    公开(公告)号:FR2853454B1

    公开(公告)日:2005-07-15

    申请号:FR0304143

    申请日:2003-04-03

    Abstract: A MOS transistor formed in a silicon substrate (101) comprises: (a) an active zone (100) surrounded by an insulating partition (102); (b) a first conducting strip (103) covering a central strip of the active zone; (c) one or more second conducting strips (105, 106, 107) placed in the active zone plumb with the first strip; (d) some conducting regions (108, 109) placed in two cavities in the insulating partition and joined to the ends of the first and second strips; (e) the surfaces of the silicon opposite the strips and conducting regions are covered with an insulator (130) constituting an oxide grid. An independent claim is also included for the production of this MOS transistor.

    24.
    发明专利
    未知

    公开(公告)号:FR2848724B1

    公开(公告)日:2005-04-15

    申请号:FR0215837

    申请日:2002-12-13

    Abstract: The production of connections buried in an integrated circuit comprises: (a) providing a structure made up of a first support slice stuck in the rear surface of a thin semiconductor slice, one or more integrated circuit elements possibly being realised in or above the thin slice; (b) sticking a second support slice on the structure at the side of the leading surface of the thin slice; (c) eliminating the first support slice; (d) forming some connections between the different zones of the rear surface of the thin slice; (e) sticking a third support slice on the connections; and (f) eliminating the second support slice. An Independent claim is also included for an integrated circuit incorporating some components and produced by the above process.

    26.
    发明专利
    未知

    公开(公告)号:FR2833106B1

    公开(公告)日:2005-02-25

    申请号:FR0115594

    申请日:2001-12-03

    Abstract: The circuit includes a first semiconductor substrate supporting the electronic circuit, and a second substrate carrying an electromechanical component. The two substrates are glued together forming a sealed and protective enclosure for the auxiliary component. The first phase of manufacture includes forming the semiconductor chip (PC) within a first substrate, and forming a cavity in the upper surface of this substrate to accommodate an auxiliary component. A wall remains around the cavity, leaving the cavity as a well. The second phase includes formation of the auxiliary component (CAX) on a second semiconductor substrate (SB2), separate from the first. The second substrate is then turned over and applied to the first substrate as a lid with the auxiliary component hanging within the cavity of the first substrate. The two substrates are glued together forming a sealed and protective enclosure for the auxiliary component.

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