Abstract:
To provide an aberration correction configuration that can realize both an aberration correction function for a long focus and an aberration correction function for a short focus. While having a conventional aberration correction apparatus configuration that has two rotationally symmetric lenses arranged between two multiple lenses, three rotationally symmetric lenses are disposed between an objective lens and a multiple lens instead of the conventional arrangement in which two rotationally symmetric lenses are disposed therebetween. When using the objective lens with a long focal length, aberrations are corrected using two rotationally symmetric lenses among three rotationally symmetric lenses disposed between the objective lens and the multiple lens. When using the objective lens with a short focal length, e.g. for high resolution observation, aberrations are corrected using two rotationally symmetric lenses of a different combination to those used for a long focus, among the three rotationally symmetric lenses disposed between the objective lens and the multiple lens.
Abstract:
The charged-particle beam system includes a non-axisymmetric diode forms a non-axisymmetric beam having an elliptic cross-section. A focusing element utilizes a magnetic field for focusing and transporting the non-axisymmetric beam, wherein the non-axisymmetric beam is approximately matched with the channel of the focusing element.
Abstract:
The charged-particle beam system includes a non-axisymmetric diode forms a non-axisymmetric beam having an elliptic cross-section. A focusing element utilizes a magnetic field for focusing and transporting the non-axisymmetric beam, wherein the non-axisymmetric beam is approximately matched with the channel of the focusing element.
Abstract:
A thin flat disc with an orifice or orifices to size and control electron and other charged particulate beams. The disc is made of electrically conductive chemical vapor deposition (CVD) diamond. In addition the disc contains one or more high precision fine to ultra-fine orifices.
Abstract:
A charged particle optical system, e.g. an energy or mass analyzer or a lens system, has a plurality of corrector electrodes (20 to 23) spaced apart across a particle beam passing from a monoenergetic source (4) to a focus (6) and dividing the beam into individual portions with central trajectories (30,31,32) the connector electrodes being electrically biassed to deflect the particles of the beam so as to reduce the aberration caused by portions with central trajectories intersecting the optical axis at different distances from the desired focus.
Abstract:
A means is provided for compensating for spherical aberration in charged particle beam devices. The means includes a sextupole positioned between two focusing lenses.
Abstract:
PROBLEM TO BE SOLVED: To provide an aberration correcting structure enabling both a long-focus aberration correcting function and a short-focus aberration correcting function. SOLUTION: By using a conventional aberration corrector structure disposing two rotation-symmetry lenses between two multi-pole lenses, this aberration corrector disposes three rotation symmetry lenses between an objective lens and the multi-pole lens instead of the conventional arrangement in which two rotationally symmetric lenses are disposed therebetween. When the focal length of the objective lens is long, a set of two of the three rotation symmetry lenses disposed between the objective lens and the multi-pole lens is used for correction of aberration. Further, when the focal length of the objective lens is short for high resolution observation, etc, another set of two of the three rotation symmetry lenses disposed between the objective lens and the multi-pole lens which is different from the set of two rotation symmetry lenses used for longer focal length is used for correction of aberration. COPYRIGHT: (C)2010,JPO&INPIT