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公开(公告)号:FR2969392B1
公开(公告)日:2013-02-08
申请号:FR1060638
申请日:2010-12-16
Applicant: ST MICROELECTRONICS SA , ST MICROELECTRONICS CROLLES 2
Inventor: MAZOYER PASCALE , HALIMAOUI AOMAR
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公开(公告)号:FR2969392A1
公开(公告)日:2012-06-22
申请号:FR1060638
申请日:2010-12-16
Applicant: ST MICROELECTRONICS SA , ST MICROELECTRONICS CROLLES 2
Inventor: MAZOYER PASCALE , HALIMAOUI AOMAR
Abstract: Boîtier, comprenant un corps (1) comportant un premier élément (10) en silicium et un deuxième élément (20) en silicium poreux, au moins une première cavité (31) ménagée dans le silicium poreux, une première zone de contact électriquement conductrice (41) électriquement couplée à au moins une partie (310) d'au moins une paroi interne de ladite au moins une première cavité (31), une deuxième zone de contact électriquement conductrice (42) électriquement couplée à une portion (320) dudit deuxième élément (20) différente des parois internes de ladite au moins une première cavité (31), les deux zones de contact (41, 42) étant mutuellement électriquement isolées.
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公开(公告)号:WO2007093741A3
公开(公告)日:2007-11-22
申请号:PCT/FR2007050798
申请日:2007-02-14
Applicant: ST MICROELECTRONICS CROLLES 2 , MAZOYER PASCALE , BOSSU GERMAIN
Inventor: MAZOYER PASCALE , BOSSU GERMAIN
IPC: H01L29/792 , H01L21/336 , H01L29/06
CPC classification number: H01L29/7841 , H01L29/0653 , H01L29/1054 , H01L29/1083 , H01L29/665 , H01L29/66636 , H01L29/66833 , H01L29/792 , H01L29/7923
Abstract: The invention concerns a MOS transistor comprising a conductive extension (10) of its source region, isolated from its substrate, and extending partly under its channel.
Abstract translation: 本发明涉及一种MOS晶体管,其包括其源极区的导电延伸部分(10),与其衬底隔离并部分地在其沟道下方延伸。
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公开(公告)号:FR2889356A1
公开(公告)日:2007-02-02
申请号:FR0552307
申请日:2005-07-26
Applicant: ST MICROELECTRONICS CROLLES 2
Inventor: VILLARET ALEXANDRE , MAZOYER PASCALE , RANICA ROSSELLA
IPC: H01L21/8242
Abstract: L'invention concerne une cellule mémoire à un transistor MOS formé dans une région de corps flottant (1) isolée sur sa face inférieure par une jonction. Une région (41) du même type de conductivité que la région de corps flottant mais plus fortement dopée que celle-ci est disposée sous la région de drain (10) du transistor MOS.
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公开(公告)号:JP2004158860A
公开(公告)日:2004-06-03
申请号:JP2003375156
申请日:2003-11-05
Applicant: St Microelectronics Sa , エスティマイクロエレクトロニクス エスエー
Inventor: MAZOYER PASCALE , VILLARET ALEXANDRE , SKOTNICKI THOMAS
IPC: H01L21/8247 , H01L27/115 , H01L29/788 , H01L29/792
CPC classification number: B82Y10/00 , G11C2216/08 , H01L29/788 , H01L29/7881 , H01L29/7888
Abstract: PROBLEM TO BE SOLVED: To realize a single transistor memory cell having the characteristics of a conventional SRAM and a flash memory. SOLUTION: In the memory circuit including at least one memory cell made of a single transistor, an insulating layer is formed between the gate and the channel regions of the transistor so that the insulating layer is parallel with each of the surfaces of the regions; a continuum of potential wells which are arranged with certain distances separated from the gate and the channel region, is formed in the insulating layer. Since the potential wells can include charges, two memory states concerning the memory cell state, i.e. "0"state, and "1" state can be defined by moving the charges to a first entrapping region direction next to the source region, or a second entrapping region direction next to the drain region. COPYRIGHT: (C)2004,JPO
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公开(公告)号:WO03017362A8
公开(公告)日:2003-04-03
申请号:PCT/FR0202887
申请日:2002-08-14
Applicant: ST MICROELECTRONICS SA , MAZOYER PASCALE , CAILLAT CHRISTIAN
Inventor: MAZOYER PASCALE , CAILLAT CHRISTIAN
IPC: H01L21/28 , H01L21/768 , H01L21/8242 , H01L27/108
CPC classification number: H01L27/10852 , H01L27/10888
Abstract: The invention concerns an integrated circuit comprising a substrate (1), at least a capacitor (9) arranged above the substrate (1) and provided with a first electrode (5), a second electrode (8), and a dielectric (7) arranged between the two electrodes, at least a connecting feedthrough between the substrate (1) and a conductive level located above the capacitor (9), and a dielectric material covering the substrate (1) and enclosing the capacitor (9) and the feedthrough. The feedthrough comprises a first portion (18) arranged between the substrate and the lower level of the first electrode, a second portion (6) arranged between the lower level of the first electrode and the upper level of the first electrode, and a third portion (12) in contact with the first electrode and flush with said conductive level, the second portion being made of the same material as the first electrode of the capacitor.
Abstract translation: 本发明涉及一种集成电路,该集成电路包括衬底(1),布置在衬底(1)上方并且设置有第一电极(5),第二电极(8)和电介质(7)的至少一个电容器(9) 布置在所述两个电极之间,所述衬底(1)和位于所述电容器(9)上方的导电层之间的至少一个连接馈通,以及覆盖所述衬底(1)并封闭所述电容器(9)和所述馈通的介电材料。 馈通包括布置在基板与第一电极的下层之间的第一部分(18),布置在第一电极的下层与第一电极的上层之间的第二部分(6),以及第三部分 (12)与所述第一电极接触并与所述导电层平齐,所述第二部分由与所述电容器的第一电极相同的材料制成。
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公开(公告)号:FR2828764B1
公开(公告)日:2004-01-23
申请号:FR0110868
申请日:2001-08-16
Applicant: ST MICROELECTRONICS SA
Inventor: MALLARDEAU CATHERINE , MAZOYER PASCALE , PIAZZA MARC
IPC: H01L21/02 , H01L21/8242 , H01L27/108
Abstract: This integrated circuit comprises a capacitor ( 23 ) formed above a substrate ( 1 ) inside a first cavity in a dielectric and comprising a first electrode, a second electrode, a thin dielectric layer placed between the two electrodes, and a structure ( 7 ) for connection to the capacitor. The connection structure is formed at the same level as the capacitor in a second cavity narrower than the first cavity, the said second cavity being completely filled by an extension of at least one of the electrodes of the capacitor.
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公开(公告)号:FR2824423A1
公开(公告)日:2002-11-08
申请号:FR0105881
申请日:2001-05-02
Applicant: ST MICROELECTRONICS SA
Inventor: MAZOYER PASCALE , CAILLAT CHRISTIAN
IPC: H01L21/02 , H01L21/314 , H01L23/522 , H01L21/71 , H01L21/768
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公开(公告)号:FR2857150A1
公开(公告)日:2005-01-07
申请号:FR0307960
申请日:2003-07-01
Applicant: ST MICROELECTRONICS SA
Inventor: JACQUET FRANCOIS , CANDELLIER PHILIPPE , CERUTTI ROBIN , CORONEL PHILIPPE , MAZOYER PASCALE
IPC: G11C11/405 , H01L27/06 , H01L27/108 , H01L27/12 , G11C11/401 , H01L21/8242
Abstract: The unit has a pair of cells (C1, C2) for storing two independent bits and including field effect transistors with grid (4, 14), respectively. A channel is arranged in a source zone (102), and the two transistors are arranged in between the source zone and a drain zone. An electrode of single polarization (24) is arranged between intermediate portions (1, 11) of the two transistors. An independent claim is also included for a method for manufacturing an integrated DRAM on a surface of a substrate.
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公开(公告)号:FR2784798A1
公开(公告)日:2000-04-21
申请号:FR9813034
申请日:1998-10-14
Applicant: ST MICROELECTRONICS SA
Inventor: CIAVATTI JEROME , MAZOYER PASCALE
IPC: H01L21/8242
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