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    Anchoring inserts, electrode assemblies, and plasma processing chambers
    91.
    发明授权
    Anchoring inserts, electrode assemblies, and plasma processing chambers 有权
    锚固插件，电极组件和等离子体处理室

    公开(公告)号：US09023177B2

    公开(公告)日：2015-05-05

    申请号：US13443307

    申请日：2012-04-10

    Applicant: Randall Hardin ,  Jonathan Keihl ,  Duane Lytle

    Inventor： Randall Hardin ,  Jonathan Keihl ,  Duane Lytle

    IPC: F16B21/00 ,  H01L21/306 ,  C23F1/00 ,  H01J37/04 ,  C23C16/44 ,  C23C16/455 ,  H01J37/32

    CPC classification number: H01J37/04 ,  C23C16/4401 ,  C23C16/45565 ,  H01J37/3255 ,  H01J37/32605 ,  H01J37/32724 ,  H01J2237/032

    Abstract: A showerhead electrode is provided where backside inserts are positioned in backside recesses formed along the backside of the electrode. The backside inserts comprise a tool engaging portion. The tool engaging portion is formed such that the backside insert further comprises one or more lateral shielding portions between the tool engaging portion and the threaded outside diameter to prevent a tool engaged with the tool engaging portion of the backside insert from extending beyond the threaded outside diameter of the insert. Further, the tool engaging portion of the backside insert comprises a plurality of torque-receiving slots arranged about the axis of rotation of the backside insert. The torque-receiving slots are arranged to avoid on-axis rotation of the backside insert via opposing pairs of torque-receiving slots.

    Abstract translation: 提供了一种喷头电极，其中后侧插入件位于沿着电极的背面形成的背面凹部中。 后侧插入件包括工具接合部分。 工具接合部分形成为使得后侧插入件还包括在工具接合部分和螺纹外径之间的一个或多个横向遮蔽部分，以防止与后侧插入件的工具接合部分接合的工具延伸超出螺纹外径 的插入。 此外，后侧插入件的工具接合部分包括围绕后侧插入件的旋转轴线布置的多个扭矩接收槽。 扭矩接收槽布置成避免背面插入件经由相对的扭矩接收槽对的轴向旋转。

    Electrostatic lens assembly
    96.
    发明授权
    Electrostatic lens assembly 有权
    静电透镜组件

    公开(公告)号：US07872239B2

    公开(公告)日：2011-01-18

    申请号：US12181171

    申请日：2008-07-28

    Applicant: Pavel Adamec ,  Carlo Salvesen ,  Ivo Liska

    Inventor： Pavel Adamec ,  Carlo Salvesen ,  Ivo Liska

    IPC: H01J37/28 ,  H01J37/244 ,  G01R31/305

    CPC classification number: H01J37/12 ,  H01J37/145 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/121 ,  H01J2237/1405 ,  H01J2237/28

    Abstract: A lens assembly having an electrostatic lens component for a charged particle beam system is provided. The assembly includes: a first electrode having a conically shaped portion, a second electrode having a conically shaped portion, and a first insulator having a conically shaped portion, wherein the first insulator comprises two extending portions towards each of its ends, and wherein the two extending portions are formed to generate a gap between the insulator and each of the adjacent electrodes.

    Abstract translation: 提供一种具有用于带电粒子束系统的静电透镜部件的透镜组件。 组件包括：具有锥形部分的第一电极，具有锥形部分的第二电极和具有锥形部分的第一绝缘体，其中第一绝缘体包括朝向其每个端部的两个延伸部分，并且其中两个 形成延伸部分以在绝缘体和每个相邻电极之间产生间隙。

    Ion beam inspection apparatus, ion beam inspecting method, semiconductor manufacturing apparatus, and ion source apparatus
    97.
    发明授权
    Ion beam inspection apparatus, ion beam inspecting method, semiconductor manufacturing apparatus, and ion source apparatus 有权
    离子束检查装置，离子束检查方法，半导体制造装置和离子源装置

    公开(公告)号：US07807985B2

    公开(公告)日：2010-10-05

    申请号：US12080999

    申请日：2008-04-08

    Applicant: Masaaki Itoh

    Inventor： Masaaki Itoh

    IPC: G21K5/10

    CPC classification number: H01J37/08 ,  H01J27/024 ,  H01J37/22 ,  H01J37/3171 ,  H01J2237/032 ,  H01J2237/1501 ,  H01J2237/2482

    Abstract: The central axis of a source head and an extraction electrode is aligned on a line, and confirmed by a laser beam whether the line is coaxial with the ion beam axis. Thus, a light emitting unit that emits the laser beam on the ion beam axis is fitted to a housing instead of the source head, and a reflector that reflects the laser beam is fitted to the extraction electrode. A light emitting apparatus also has a function of detecting the laser beam to detect the laser beam that is reflected by the reflector, and sends the intensity of the detected laser beam to a control unit. The extraction electrode is positionally adjusted so that the intensity of the laser beam becomes maximum, whereby the ion beam axis can coincide with the central axes of the ion source and the extraction electrode.

    Abstract translation: 源极头和引出电极的中心轴在一条直线上对齐，并通过激光束确认线是否与离子束轴线同轴。 因此，将发射离子束轴上的激光束的发光单元装配到壳体而不是源头，并且将反射激光束的反射器安装到引出电极。 发光装置还具有检测激光束以检测由反射器反射的激光束的功能，并将检测到的激光束的强度发送到控制单元。 位置调整引出电极，使得激光束的强度变得最大，从而离子束轴可以与离子源和引出电极的中心轴重合。

    Arc chamber for an ion implantation system
    98.
    发明授权
    Arc chamber for an ion implantation system 有权
    用于离子注入系统的电弧室

    公开(公告)号：US07679070B2

    公开(公告)日：2010-03-16

    申请号：US11772822

    申请日：2007-07-02

    Applicant: Jung-Chi Chen

    Inventor： Jung-Chi Chen

    IPC: H01J37/317 ,  H01J37/08 ,  H01J27/08

    CPC classification number: H01J37/08 ,  H01J27/14 ,  H01J37/023 ,  H01J2237/032 ,  H01J2237/038

    Abstract: An arc chamber for an ion implantation system includes an exit aperture positioned at a wall of the arc chamber, filaments respectively positioned at two opposing sides within the arc chamber, and repeller structures respectively positioned at two opposing walls within the arc chamber between the filaments and the arc chamber. The repeller structure includes a repeller substrate with a screw axis for fitting the repeller structure to the arc chamber, an insulator positioned underneath the repeller substrate providing an electrical isolation between the repeller substrate and the arc chamber, and a conductive spacer covering a portion of the insulator positioned in between the insulator and the arc chamber.

    Abstract translation: 用于离子注入系统的电弧室包括位于电弧室的壁处的出口孔，分别位于电弧室内的两个相对侧的细丝和分别位于电弧室内的两个相对的壁之间的排斥结构， 电弧室。 反射器结构包括具有用于将反射器结构装配到电弧室的螺旋轴线的排斥衬底，位于推斥层衬底下方的绝缘体，其提供了在该斥力衬底和电弧室之间的电隔离，以及覆盖部分 绝缘体位于绝缘体和电弧室之间。

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