公开(公告)号：US07005636B2

公开(公告)日：2006-02-28

申请号：US10863547

申请日：2004-06-08

Applicant: Hendrik Gezinus Tappel

Inventor： Hendrik Gezinus Tappel

IPC: G01N1/28

CPC classification number: G01N1/32 ,  H01J2237/20 ,  H01J2237/28

Abstract: In the semiconductor industry, microscopic samples are cut out of substrates for purposes of analysis. In the case of a known method, a sample to be cut loose out of a substrate is attached to a sample carrier connected to a manipulator and the sample is cut loose from the substrate. Subsequently, the sample is fixed to a TEM grid and completely separated from the sample carrier.According to the invention, the sample carrier 3 is left in connection with the sample 1 and the sample carrier 3 is separated from the manipulator 4. By making the sample carrier 3 connected to the sample 1 much bigger than the (microscopic) sample 1, and by manipulating the sample carrier 3, manipulation—with the aid of a (macroscopic) manipulator—of the microscopic sample 1 attached thereto becomes easier than manipulating the sample 1 without the sample carrier 3 attached thereto. In addition, a mechanical coupling between manipulator 4 and sample carrier 3 is shown, which enables a great degree of automation.

Abstract translation: 在半导体工业中，为了分析的目的，将微观样品从基材上切下。 在已知方法的情况下，将从基板上松开的样品附着到连接到操纵器的样品载体上，并将样品从基底上松开。 随后，将样品固定在TEM网格上并与样品载体完全分离。

公开(公告)号：US20050285036A1

公开(公告)日：2005-12-29

申请号：US11166370

申请日：2005-06-27

Applicant: Mitsugu Sato ,  Makoto Ezumi ,  Satoru Yamaguchi

Inventor： Mitsugu Sato ,  Makoto Ezumi ,  Satoru Yamaguchi

IPC: G01N23/225 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/265 ,  H01J2237/1501 ,  H01J2237/28 ,  H01J2237/304

Abstract: A charged-particle beam emitting device which includes the following configuration devices so that a lowering in the image resolution will be suppressed even if a primary beam is tilted relative to a sample: A device for causing orbit of the primary beam to pass through off-axes of a plurality of lenses, and controlling off-axis orbit of the primary beam. This device allows the aberration which occurs in the objective lens at the time of beam tilt to be cancelled out by the aberration which occurs in the other lens. Also, there is provided a device for simultaneously modulating excitations of the plurality of lenses including the objective lens.

Abstract translation: 一种带电粒子束发射装置，其包括以下配置装置，使得即使主光束相对于样本倾斜，图像分辨率的降低也将被抑制：用于使一次光束的轨道穿过关闭的装置， 多个透镜的轴，并且控制主光束的离轴轨道。 该装置允许在光束倾斜时在物镜中发生的像差由在另一个透镜中出现的像差抵消。 此外，提供了一种用于同时调制包括物镜的多个透镜的激励的装置。

公开(公告)号：US20050184252A1

公开(公告)日：2005-08-25

申请号：US11059434

申请日：2005-02-16

Applicant: Takashi Ogawa ,  Seiji Morita

Inventor： Takashi Ogawa ,  Seiji Morita

IPC: G01N23/225 ,  H01J37/147 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J37/30 ,  H01J37/317 ,  H01L21/66

CPC classification number: H01J37/3005 ,  H01J37/222 ,  H01J2237/28 ,  H01J2237/3174

Abstract: An image noise removing method in an FIB/SEM complex apparatus of the invention prevents a secondary electron detection signal in an FIB blanking period from affecting pixels of an SEM image by, for example, synchronizing a scanning cycle of an SEM with that of an FIB and optimizes an SEM current with respect to an FIB current value to be used to thereby reduce an influence of a secondary electron excited by the FIB, which is to be superimposed, on the SEM image.

Abstract translation: 本发明的FIB / SEM复合装置中的图像噪声去除方法通过例如使SEM的扫描周期与FIB的扫描周期同步，防止FIB消隐期间的二次电子检测信号影响SEM图像的像素 并且相对于FIB电流值优化SEM电流，以便减少被叠加的FIB激发的二次电子对SEM图像的影响。

公开(公告)号：US06897450B2

公开(公告)日：2005-05-24

申请号：US09978258

申请日：2001-10-15

Applicant: Akira Yonezawa

Inventor： Akira Yonezawa

IPC: H01J37/145 ,  H01J37/28 ,  H01J37/20

CPC classification number: H01J37/145 ,  H01J2237/28

Abstract: A magnetic pole of a magnetic field type lens is divided into a first magnetic pole section that is at ground potential, and a second magnetic pole section facing a sample and to which a negative high voltage is applied, the first magnetic pole section and the second magnetic pole section 212 being electrically insulated from each other, and an electric field type bi-potential lens is made up of an electrode attached to the first magnetic pole section so as to surround an electron beam path. High resolution observation with small chromatic aberration factor Cs, Cc is made possible without forming a positive high voltage section inside an electron beam path of a lens barrel.

Abstract translation: 磁场型透镜的磁极被分成位于地电位的第一磁极部分和面向样品的第二磁极部分，并且施加负的高电压，第一磁极部分和第二磁极部分 磁极部分212彼此电绝缘，并且电场型双电位透镜由附接到第一磁极部分的电极组成以包围电子束路径。 可以在镜筒的电子束路径内形成正高压部分的情况下，可以实现小色差因子Cs，Cc的高分辨率观察。

公开(公告)号：US06884992B1

公开(公告)日：2005-04-26

申请号：US09423155

申请日：1998-04-29

Applicant: Peter Heiland

Inventor： Peter Heiland

IPC: H01J37/22 ,  G02B21/00 ,  H01J37/02 ,  H01J37/147 ,  H01J3/14

CPC classification number: H01J37/02 ,  G02B21/00 ,  H01J2237/0216 ,  H01J2237/28

Abstract: An imaging and raster-mode scanning apparatus has a compensation device for compensating for ambient influences that may degrade the imaging, comprising an electrical filter, and at least one sensor for providing a first signal dependent on the ambient influences the first signal passes through the filter directly and drives an internal actuator and a internal control elements of the apparatus, which has an effect on the imaging and on the image display, in a calibrated state of the apparatus, which comprises a setting of a transfer characteristic of the filter, image degradations are greatly reduced or essentially compensated for. The filter for calibrating the apparatus, has a calibration input and a second signal is applied to the calibration input of the filter.

Abstract translation: 成像和光栅模式扫描装置具有补偿装置，用于补偿可能降低成像的环境影响，包括电过滤器，以及至少一个传感器，用于提供取决于环境的第一信号影响第一信号通过过滤器 直接驱动装置的内部致动器和内部控制元件，其对成像和图像显示具有影响，该装置的校准状态包括滤波器的传送特性的设置，图像劣化 大大减少或基本上被补偿。 用于校准装置的滤波器具有校准输入，并且第二信号被施加到滤波器的校准输入。

公开(公告)号：US06878936B2

公开(公告)日：2005-04-12

申请号：US10619690

申请日：2003-07-16

Applicant: Oliver Kienzle ,  Rainer Knippelmeyer

Inventor： Oliver Kienzle ,  Rainer Knippelmeyer

IPC: G03F7/20 ,  G01N23/00 ,  G01Q10/00 ,  G01Q30/02 ,  G02B21/06 ,  G21K1/08 ,  G21K7/00 ,  H01J29/70 ,  H01J37/04 ,  H01J37/12 ,  H01J37/14 ,  H01J37/141 ,  H01J37/145 ,  H01J37/147 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28 ,  H01J37/30 ,  H01J37/305 ,  H01L21/027

CPC classification number: H01J37/141 ,  H01J37/12 ,  H01J37/14 ,  H01J2237/121 ,  H01J2237/28 ,  H01J2237/3175

Abstract: A particle-optical apparatus is proposed which comprises a particle-optical lens for deflecting a plurality of separate beam-charged particles which is provided by a plurality of finger electrodes provided along an opening of the lens.

Abstract translation: 提出了一种粒子光学装置，其包括用于偏转由沿着透镜的开口设置的多个指状电极提供的多个单独的束带电粒子的粒子光学透镜。

公开(公告)号：US20040135082A1

公开(公告)日：2004-07-15

申请号：US10742901

申请日：2003-12-23

Inventor： Tsuyoshi Inanobe ,  Sho Takami ,  Yoichi Ose ,  Katsuhiro Sasada

IPC: H01J037/28

CPC classification number: H01J37/09 ,  H01J37/16 ,  H01J2237/1405 ,  H01J2237/16 ,  H01J2237/2614 ,  H01J2237/2617 ,  H01J2237/28

Abstract: A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.

Abstract translation: 提供了具有屏蔽性能以防止环境磁场的电子束装置的结构。 电子束装置包括用于容纳用于将电子束会聚在试样上的磁性透镜的反射镜筒和用于容纳样本的试样室，其中具有导电性的非磁性材料用作至少一个反射镜的材料 桶和样品室的主体。 用于镜筒的材料或试样室的主体是铝合金，镜筒的侧壁或试样室的主体的厚度为10mm以上。 厚度小于镜筒侧壁或试样室主体的磁性板设置在镜筒的内侧壁或试样室的主体上。

公开(公告)号：US20040061054A1

公开(公告)日：2004-04-01

申请号：US10470847

申请日：2003-08-27

Inventor： Minoru Kondo ,  Toshimitsu Nagai ,  Atsushi Kibune

IPC: G21K007/00 ,  G01N023/00

CPC classification number: H01J49/025 ,  H01J29/385 ,  H01J37/244 ,  H01J43/04 ,  H01J2237/28

Abstract: In an electron beam detector, a light guide optically couples a fluorescence emitting surface of the compound semiconductor substrate to a light incident surface of the photodetector, and physically connects the compound semiconductor substrate with the photodetector, thereby integrating the compound semiconductor substrate with the photodetector. When the compound semiconductor substrate converts incident electrons to fluorescent light, the light guide guides the fluorescent light to the photodetector, and the photodetector detects the fluorescent light, thereby detecting the incident electrons.

Abstract translation: 在电子束检测器中，导光体将化合物半导体衬底的荧光发射表面光耦合到光电检测器的光入射表面，并将化合物半导体衬底与光电检测器物理连接，从而将化合物半导体衬底与光电检测器集成。 当化合物半导体基板将入射电子转换为荧光时，光导将荧光引导到光电检测器，并且光电检测器检测荧光，从而检测入射电子。

公开(公告)号：US20040056193A1

公开(公告)日：2004-03-25

申请号：US10619690

申请日：2003-07-16

Applicant: LEO Elektronenmikroskopie GmbH

Inventor： Oliver Kienzle ,  Rainer Knippelmeyer

IPC: G01N023/00

CPC classification number: H01J37/141 ,  H01J37/12 ,  H01J37/14 ,  H01J2237/121 ,  H01J2237/28 ,  H01J2237/3175

Abstract: A particle-optical apparatus is proposed which comprises a particle-optical lens for deflecting a plurality of separate beam-charged particles which is provided by a plurality of finger electrodes provided along an opening of the lens.

Abstract translation: 提出了一种粒子光学装置，其包括用于偏转由沿着透镜的开口设置的多个指状电极提供的多个单独的束带电粒子的粒子光学透镜。

公开(公告)号：US06693282B1

公开(公告)日：2004-02-17

申请号：US09596217

申请日：2000-06-19

Applicant: Peter Christiaan Tiemeijer

Inventor： Peter Christiaan Tiemeijer

IPC: H01J3773

CPC classification number: H01J37/063 ,  H01J2237/28

Abstract: An electron source for, for example, an electron microscope cannot exhibit a high brightness and a large beam current at the same time, because the virtual emitter dimension is enlarged by Coulomb repulsion in the electron beam in the case of a large beam current, thus reducing the brightness. In a conventional electron source switching-over could take place from a high brightness to a large beam current by varying the dimension of a beam-limiting diaphragm; however, this is objectionable because the location of such a diaphragm is not readily accessible. In accordance with the invention said switching-over can take place by arranging two lenses 26, 28 in the source, which lenses parallelize In the described circumstances the beam either directly behind the emitter 4 (large current) or directly in front of the diaphragm aperture 32 (high brightness).

Abstract translation: 因为例如电子显微镜的电子源不能同时呈现高亮度和大的电子束电流，因为在大束流电流的情况下，通过电子束中的库仑排斥使虚拟发射极尺寸增大，因此 降低亮度。 在传统的电子源中，通过改变光束限制膜的尺寸，可以从高亮度到大的光束电流进行切换; 然而，这是令人反感的，因为这种隔膜的位置不容易接近。 根据本发明，可以通过在源中布置两个透镜26,28来实现切换，这些透镜是并行的。在所述的情况下，光束直接位于发射器4的后面（大电流）或者直接在光阑孔的前面 32（高亮度）。