公开(公告)号：US10037862B2

公开(公告)日：2018-07-31

申请号：US15163401

申请日：2016-05-24

Applicant: Carl Zeiss Microscopy, LLC

Inventor： Sybren J. Sijbrandij ,  John A. Notte, IV ,  Raymond Hill

IPC: H01J37/05 ,  H01J37/244

CPC classification number: H01J37/05 ,  H01J37/244 ,  H01J2237/2443 ,  H01J2237/24435 ,  H01J2237/2445 ,  H01J2237/2448 ,  H01J2237/24495 ,  H01J2237/24564

Abstract: A charged particle detecting device includes: a holding structure; a first charged particle detector at the terminal portion of the holding structure; a second charged particle detector at the terminal portion of the holding structure; a detector head at the terminal portion of the holding structure; and a first electrode which is transmissive for the first and second species of charged particles covering an entrance opening of the detector head.

公开(公告)号：US20180211813A1

公开(公告)日：2018-07-26

申请号：US15933121

申请日：2018-03-22

Applicant: Exogenesis Corporation

Inventor： Sean R. Kirkpatrick ,  Richard C. Svrluga

IPC: H01J37/05 ,  H05H3/02 ,  H01J37/317 ,  H01J37/147

CPC classification number: H01J37/05 ,  A61F2/82 ,  A61F2/90 ,  A61F2240/001 ,  A61F2250/0068 ,  H01J37/147 ,  H01J37/317 ,  H01J37/3171 ,  H01J2237/0041 ,  H01J2237/0812 ,  H01J2237/15 ,  H05H3/02 ,  Y10T428/24355 ,  Y10T428/24479 ,  Y10T428/30

Abstract: A medical device for surgical implantation adapted to serve as a drug delivery system has one or more drug loaded holes with barrier layers to control release or elution of the drug from the holes or to control inward diffusion of fluids into the holes. The barrier layers are non-polymers and are formed from the drug material itself by beam processing. The holes may be in patterns to spatially control drug delivery. Flexible options permit combinations of drugs, variable drug dose per hole, multiple drugs per hole, temporal control of drug release sequence and profile. Methods for forming such a drug delivery system are also disclosed. Gas cluster ion beam and/or accelerated Neutral Beam derived from an accelerated gas cluster ion beam may be employed.

公开(公告)号：US10002740B2

公开(公告)日：2018-06-19

申请号：US15667040

申请日：2017-08-02

Applicant: EBARA CORPORATION

Inventor： Masahiro Hatakeyama ,  Ryo Tajima ,  Kenichi Suematsu ,  Kenji Watanabe ,  Yasushi Toma ,  Kenji Terao ,  Takeshi Murakami

IPC: H01J37/05 ,  H01J37/147 ,  H01J37/141 ,  H01J37/26 ,  H01J37/244

CPC classification number: H01J37/05 ,  H01J37/12 ,  H01J37/141 ,  H01J37/147 ,  H01J37/244 ,  H01J37/26 ,  H01J37/29 ,  H01J2237/0268 ,  H01J2237/16 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/2817

Abstract: An electron beam inspection device includes: a primary electron optical system that irradiates the surface of a sample with an electron beam; and a secondary electron optical system that gathers secondary electrons emitted from the sample and forms an image on the sensor surface of a detector. An electron image of the surface of the sample is obtained from a signal detected by the detector, and the sample is inspected. A cylindrical member that is formed with conductors stacked as an inner layer and an outer layer, and an insulator stacked as an intermediate layer is provided inside a lens tube into which the secondary electron optical system is incorporated. An electron orbital path is formed inside the cylindrical member, and the members constituting the secondary electron optical system are arranged outside the cylindrical member.

公开(公告)号：US09905391B2

公开(公告)日：2018-02-27

申请号：US14826007

申请日：2015-08-13

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang

IPC: H01J1/50 ,  H01J37/05

CPC classification number: H01J37/05 ,  H01J2237/057 ,  H01J2237/12 ,  H01J2237/14

Abstract: A selectively configurable system for directing an electron beam with a limited energy spread to a sample includes an electron source to generate an electron beam having an energy spread including one or more energies, an aperture having an on-axis opening and an off-axis opening, a first assembly of one or more electron lenses with selectively configurable focal powers positioned to collect the beam from the source and direct the beam to the aperture, a second assembly of one or more selectively configurable electron lenses positioned to collect the beam, a sample stage, and an electron inspection sub-system including electron optics positioned to direct the beam onto one or more samples. The first assembly includes an off-axis electron lens for interacting with the beam at an off-axis position and introducing spatial dispersion to the beam when configured with a nonzero focal power, thus filtering the energy spread.

公开(公告)号：US20180040452A1

公开(公告)日：2018-02-08

申请号：US15667040

申请日：2017-08-02

Applicant: EBARA CORPORATION

Inventor： Masahiro HATAKEYAMA ,  Ryo TAJIMA ,  Kenichi SUEMATSU ,  Kenji WATANABE ,  Yasushi TOMA ,  Kenji TERAO ,  Takeshi MURAKAMI

IPC: H01J37/05 ,  H01J37/147 ,  H01J37/141

CPC classification number: H01J37/05 ,  H01J37/141 ,  H01J37/147 ,  H01J37/244 ,  H01J37/26 ,  H01J37/29

Abstract: An electron beam inspection device includes: a primary electron optical system that irradiates the surface of a sample with an electron beam; and a secondary electron optical system that gathers secondary electrons emitted from the sample and forms an image on the sensor surface of a detector. An electron image of the surface of the sample is obtained from a signal detected by the detector, and the sample is inspected. A cylindrical member that is formed with conductors stacked as an inner layer and an outer layer, and an insulator stacked as an intermediate layer is provided inside a lens tube into which the secondary electron optical system is incorporated. An electron orbital path is formed inside the cylindrical member, and the members constituting the secondary electron optical system are arranged outside the cylindrical member.

公开(公告)号：US20170352519A1

公开(公告)日：2017-12-07

申请号：US15602761

申请日：2017-05-23

Applicant: Infineon Technologies AG

Inventor： Roland Rupp ,  Andre Brockmeier

IPC: H01J37/05 ,  H01J37/317

CPC classification number: H01J37/05 ,  H01J37/3171 ,  H01J2237/057 ,  H01J2237/31701

Abstract: A method of producing an implantation ion energy filter, suitable for processing a power semiconductor device. In one example, the method includes creating a preform having a first structure; providing an energy filter body material; and structuring the energy filter body material by using the preform, thereby establishing an energy filter body having a second structure.

公开(公告)号：US20170263415A1

公开(公告)日：2017-09-14

申请号：US15529281

申请日：2014-11-26

Applicant: Hitachi, Ltd.

Inventor： Daisuke BIZEN ,  Hideo MORISHITA ,  Michio HATANO ,  Hiroya OHTA

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/10 ,  H01J37/285 ,  H01J37/28 ,  H01J37/05

CPC classification number: H01J37/263 ,  H01J37/05 ,  H01J37/10 ,  H01J37/1472 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J37/285 ,  H01J2237/0473 ,  H01J2237/0475 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/24485 ,  H01J2237/2806 ,  H01J2237/2823

Abstract: To provide a scanning electron microscope having an electron spectroscopy system to attain high spatial resolution and a high secondary electron detection rate under the condition that energy of primary electrons is low, the scanning electron microscope includes: an objective lens 105; primary electron acceleration means 104 that accelerates primary electrons 102; primary electron deceleration means 109 that decelerates the primary electrons and irradiates them to a sample 106; a secondary electron deflector 103 that deflects secondary electrons 110 from the sample to the outside of an optical axis of the primary electrons; a spectroscope 111 that disperses secondary electrons; and a controller that controls application voltage to the objective lens, the primary electron acceleration means and the primary electron deceleration means so as to converge the secondary electrons to an entrance of the spectroscope.

公开(公告)号：US09687810B2

公开(公告)日：2017-06-27

申请号：US15178958

申请日：2016-06-10

Applicant: XYLECO, INC.

Inventor： Marshall Medoff

IPC: B01J19/08 ,  B01J19/10 ,  B01J19/12 ,  C10L9/00 ,  H01J37/04 ,  H01J37/05 ,  C10L5/44

CPC classification number: B01J19/081 ,  B01J19/085 ,  B01J19/10 ,  B01J19/12 ,  B01J2219/0879 ,  B01J2219/12 ,  C10L1/02 ,  C10L5/44 ,  C10L9/00 ,  C10L2200/0469 ,  C10L2290/26 ,  C10L2290/36 ,  C12P3/00 ,  C12P7/02 ,  H01J37/04 ,  H01J37/05 ,  Y02E50/30

Abstract: Materials such as biomass (e.g., plant biomass, animal biomass, and municipal waste biomass) and hydrocarbon-containing materials are processed to produce useful products, such as fuels. For example, systems are described that can use feedstock materials, such as cellulosic and/or lignocellulosic materials and/or starchy materials, or oil sands, oil shale, tar sands, bitumen, and coal to produce altered materials such as fuels (e.g., ethanol and/or butanol). The processing includes exposing the materials to an ion beam.

公开(公告)号：US09679739B2

公开(公告)日：2017-06-13

申请号：US14978089

申请日：2015-12-22

Applicant: Axcelis Technologies, Inc.

Inventor： Edward C. Eisner ,  Bo H. Vanderberg

IPC: H01J37/00 ,  H01J37/12 ,  H01J37/05 ,  H01J37/147 ,  H01J37/20 ,  H01J37/30 ,  H01J37/317

CPC classification number: H01J37/12 ,  H01J37/05 ,  H01J37/1472 ,  H01J37/20 ,  H01J37/30 ,  H01J37/3171 ,  H01J2237/31705

Abstract: A system and method are provided for implanting ions at low energies into a workpiece. An ion source configured to generate an ion beam is provided, wherein a mass resolving magnet is configured to mass resolve the ion beam. The ion beam may be a ribbon beam or a scanned spot ion beam. A mass resolving aperture positioned downstream of the mass resolving magnet filters undesirable species from the ion beam. A combined electrostatic lens system is positioned downstream of the mass analyzer, wherein a path of the ion beam is deflected and contaminants are generally filtered out of the ion beam, while concurrently decelerating and parallelizing the ion beam. A workpiece scanning system is further positioned downstream of the combined electrostatic lens system, and is configured to selectively translate a workpiece in one or more directions through the ion beam, therein implanting ions into the workpiece.

公开(公告)号：US09679738B2

公开(公告)日：2017-06-13

申请号：US14916529

申请日：2014-05-16

Applicant: Hitachi High-Technologies Corporation

Inventor： Hiroaki Matsumoto ,  Takeshi Sato ,  Yoshifumi Taniguchi ,  Ken Harada

IPC: H01J47/00 ,  H01J37/10 ,  H01J37/295 ,  H01J37/04 ,  H01J37/26 ,  G01N23/20 ,  H01J37/09 ,  H01J37/147 ,  H01J37/153 ,  H01J37/24 ,  H01J37/244 ,  H01J37/28 ,  H01J37/05 ,  H01J37/285

CPC classification number: H01J37/10 ,  G01N23/20058 ,  G01N2223/418 ,  H01J37/04 ,  H01J37/05 ,  H01J37/09 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/24 ,  H01J37/244 ,  H01J37/26 ,  H01J37/261 ,  H01J37/28 ,  H01J37/285 ,  H01J37/295 ,  H01J2237/21 ,  H01J2237/2614

Abstract: The present invention relates to a lens-less Foucault method wherein a transmission electron microscope objective lens (5) is turned off, an electron beam crossover (11, 13) is matched with a selected area aperture (65), and the focal distance of a first imaging lens (61) can be changed to enable switching between a sample image observation mode and a sample diffraction pattern observation mode, characterized in that a deflector (81) is disposed in a stage following the first imaging lens (61), and conditions for an irradiating optical system (4) can be fixed after conditions for the imaging optical system have been determined. This allows a lens-less Foucault method to be implemented in a common general-use transmission electron microscope with no magnetic shielding lens equipped, without burdening the operator.