公开(公告)号：US20120235036A1

公开(公告)日：2012-09-20

申请号：US13420731

申请日：2012-03-15

Applicant: Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

Inventor： Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

IPC: G01N23/225

CPC classification number: H01J37/073 ,  G01N23/22 ,  G01N23/223 ,  G01N23/2251 ,  G01N2223/611 ,  H01J1/34 ,  H01J37/09 ,  H01J37/10 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/0048 ,  H01J2237/022 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/045 ,  H01J2237/0458 ,  H01J2237/0473 ,  H01J2237/0492 ,  H01J2237/061 ,  H01J2237/06333 ,  H01J2237/166 ,  H01J2237/186 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/2448 ,  H01J2237/2482 ,  H01J2237/2485 ,  H01J2237/2817 ,  H01J2237/2855 ,  H01J2237/2857

Abstract: An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

Abstract translation: 用于使用光束检查检查对象的表面的检查装置包括能够产生电荷粒子或电磁波之一作为光束的光束发生器，能够将所述光束引导并照射到被检查对象的主光学系统 在工作室内，能够包括第一可移动数值孔径的二次光学系统和检测从检查对象产生的二次电荷粒子的第一检测器，通过第一可移动数值孔径的二次电荷粒子，能够 基于由所述第一检测器检测到的次级电荷粒子形成图像; 以及第二检测器，其布置在第一可移动数值孔径和第一检测器之间，并且检测在从检查对象生成的次级充电颗粒的交叉位置处的位置和形状。

公开(公告)号：US20120119085A1

公开(公告)日：2012-05-17

申请号：US13383546

申请日：2010-07-02

Applicant: Tatsuaki Ishijima ,  Osamu Nasu ,  Muneyuki Fukuda ,  Takeyoshi Ohashi ,  Hiromasa Yamanashi ,  Takuji Miyamoto ,  Kei Sakai

Inventor： Tatsuaki Ishijima ,  Osamu Nasu ,  Muneyuki Fukuda ,  Takeyoshi Ohashi ,  Hiromasa Yamanashi ,  Takuji Miyamoto ,  Kei Sakai

IPC: G01N23/225 ,  H01J37/28

CPC classification number: H01J37/28 ,  G01R29/24 ,  H01J37/20 ,  H01J37/266 ,  H01J37/268 ,  H01J2237/2002 ,  H01L22/12

Abstract: The present invention has an object to perform specimen charge measurement or focusing at a high speed and with high precision also for a specimen in which fixed charge and induced charge may be mixedly present.As one mode to achieve the object, there are proposed a specimen potential measuring method and a device to implement the method characterized in that when specimen potential information obtained by a first specimen potential measuring device disposed outside a specimen chamber or specimen potential information beforehand obtained is equal to or more than a predetermined threshold value or is more than the threshold value, measurement of specimen potential is selectively conducted by use of a second specimen potential measuring device in the specimen chamber.

Abstract translation: 本发明的目的是对于可以混合存在固定电荷和感应电荷的样本，以高速和高精度进行样本电荷测量或聚焦。 作为实现该目的的一种模式，提出了一种试样电位测量方法和一种实现该方法的装置，其特征在于，当设置在试样室外的第一试样电位测量装置或预先获得的试样电势信息获得的试样电位信息为 等于或大于预定阈值或大于阈值时，通过使用样本室中的第二样本电位测量装置选择性地进行样本电位的测量。

公开(公告)号：US20120025103A1

公开(公告)日：2012-02-02

申请号：US12847167

申请日：2010-07-30

Applicant: Pushkarraj V. Deshmukh ,  Jeffrey J. Gronsky ,  Paul E. Fischione

Inventor： Pushkarraj V. Deshmukh ,  Jeffrey J. Gronsky ,  Paul E. Fischione

IPC: G01N21/00 ,  G01N23/00

CPC classification number: G01N21/0303 ,  H01J37/20 ,  H01J37/228 ,  H01J2237/2002 ,  H01J2237/2003 ,  H01J2237/206 ,  H01J2237/2065

Abstract: An in situ optical specimen holder is disclosed which may be utilized for imaging and analysis during dynamic experimentation. This holder assembly includes a set of focusing and reflection optics along with an environmental cell. Electromagnetic radiation can be used to optically excite the specimen in the presence or absence of fluid. A highly reflective mirror may be used to focus the radiation on to the specimen without the presence of any heating components within the cell. The spot size of the irradiation at the specimen surface can be varied, thus exciting only a specific region on the specimen. The window type cell provides a variable fluid path length ranging from the specimen thickness to 500 μm. The holder has the provision to continuously circulate fluids over the specimen. The pressure within the cell can be regulated by controlling the flow rate of the fluids and the speed of the pumps.

Abstract translation: 公开了一种在动态实验中可用于成像和分析的原位光学样本保持器。 该支架组件包括一组聚焦和反射光学器件以及环境细胞。 在存在或不存在流体的情况下，电磁辐射可用于光学激发样品。 可以使用高反射镜来将辐射聚焦在样品上，而不会在电池内存在任何加热组分。 样品表面的照射点尺寸可以变化，从而仅激发样品上的特定区域。 窗型细胞提供从样品厚度到500μm的可变流体路径长度。 支架具有使流体在试样上连续循环的条件。 可以通过控制流体的流量和泵的速度来调节电池内的压力。

公开(公告)号：US08087309B2

公开(公告)日：2012-01-03

申请号：US12471095

申请日：2009-05-22

Applicant: Tracy Earl Kelley ,  John D. May ,  Vladimir Oleshko ,  Chariclea Scordilis-Kelley

Inventor： Tracy Earl Kelley ,  John D. May ,  Vladimir Oleshko ,  Chariclea Scordilis-Kelley

IPC: G01N1/00

CPC classification number: G01N1/28 ,  G01N2035/00277 ,  H01J37/20 ,  H01J49/0409 ,  H01J2237/2002 ,  H01J2237/2005 ,  H01J2237/25 ,  H01J2237/26

Abstract: A hermetic sample holder for use in performing microanalysis of a sample under a controlled atmosphere environment. The sample holder comprises a sample holder body with a sample cavity to receive the sample and a cover movably mounted to the holder body between an open position to allow access to the cavity and a closed position to seal the cavity. The cover is secured in and released from the closed position at least in part by a pressure differential between the cavity and the ambient atmosphere. The cover may be biased toward the open position. The cover may be pivotally mounted about an axis that is perpendicular to a sealing surface of the cover and/or movable in a direction along the pivot axis. A valve may be provided to allow direct evacuation of the cavity to create a pressure differential. An adjustable clamp may be located in the cavity to secure the sample.

Abstract translation: 一种用于在受控气氛环境下对样品进行微量分析的密封样品架。 样品保持器包括具有样品腔以容纳样品的样品保持器主体和可移动地安装到保持器主体的敞开位置以允许进入腔体的封闭位置和密封腔体的盖子。 至少部分地通过空腔和环境大气之间的压力差将盖子固定在关闭位置并从其释放。 盖子可能偏向打开位置。 盖可以围绕垂直于盖的密封表面的轴线枢转地安装和/或可沿着枢转轴线的方向移动。 可以设置阀以允许空腔的直接抽空以产生压力差。 可调节的夹具可以位于腔体中以固定样品。

公开(公告)号：US07923686B2

公开(公告)日：2011-04-12

申请号：US12330128

申请日：2008-12-08

Applicant: Kurio Fukushima

Inventor： Kurio Fukushima

IPC: H01J37/26

CPC classification number: H01J37/18 ,  H01J37/09 ,  H01J37/20 ,  H01J37/26 ,  H01J2237/006 ,  H01J2237/0451 ,  H01J2237/0455 ,  H01J2237/0458 ,  H01J2237/182 ,  H01J2237/188 ,  H01J2237/2002 ,  H01J2237/206 ,  H01J2237/24465 ,  H01J2237/24475 ,  H01J2237/2605 ,  H01J2237/2614

Abstract: An apparatus which permits high-angle annular dark-field (HAADF) imaging comprises an electron gun, a specimen chamber in which a specimen is set, a gas cylinder for supplying environmental gas around the surface of the specimen through both a gas flow rate controller and a gas nozzle, a vacuum pump for evacuating the inside of the specimen chamber, an objective lens including upper and lower polepieces, a detector for detecting electrons transmitted through the specimen, a display device for displaying a transmission image of the specimen, orifice plates having minute holes, holders supporting the orifice plates, a drive mechanism for driving the holders, and a motion controller. The orifice plates can be moved in a direction crossing the optical axis of the beam on the upper and lower surfaces of the upper and lower polepieces of the objective lens.

Abstract translation: 允许高角度环形暗场（HAADF）成像的装置包括电子枪，其中设置有样本的样本室，用于通过气体流量控制器通过样品的表面周围提供环境气体的气瓶 以及气体喷嘴，用于抽空试样室内部的真空泵，包括上下杆的物镜，用于检测通过试样的电子的检测器，用于显示试样的透射图像的显示装置，孔板 具有微孔，支撑孔板的支架，用于驱动保持器的驱动机构和运动控制器。 孔板可以在与物镜的上下极的上表面和下表面上的光束的光轴交叉的方向上移动。

公开(公告)号：US20100288728A1

公开(公告)日：2010-11-18

申请号：US12810915

申请日：2008-12-10

Applicant: Young Ki Han ,  Young Soo Seo

Inventor： Young Ki Han ,  Young Soo Seo

IPC: C23F1/02 ,  C23F1/12 ,  C23F1/08 ,  C23C16/00 ,  C23C16/50 ,  B08B6/00

CPC classification number: H01J37/20 ,  H01J37/3244 ,  H01J37/32449 ,  H01J2237/2002 ,  H01J2237/20235

Abstract: There are provided an apparatus and method for processing a substrate. By using the apparatus and method, plasma processing can be individually performed on each of edge and rear regions of a substrate in a single chamber. The apparatus includes a chamber providing a reaction space; a stage installed in the chamber; a plasma shielding unit installed opposite to the stage in the chamber; a support unit for supporting a substrate between the stage and the plasma shielding unit; a first supply pipe provided at the stage to supply a reaction or non-reaction gas to one surface of the substrate; and second and third supply pipes provided at the plasma shielding unit, the second supply pipe supplying a reaction gas to the other surface of the substrate, the third supply pipe supplying a non-reaction gas to the other surface.

Abstract translation: 提供了一种用于处理基板的装置和方法。 通过使用该装置和方法，可以在单个室中对基板的边缘区域和后部区域各自进行等离子体处理。 该装置包括提供反应空间的室; 安装在室内的舞台; 等离子体屏蔽单元，其安装在所述室中与所述台相对; 支撑单元，用于在所述载物台和所述等离子体屏蔽单元之间支撑基板; 设置在所述阶段以将反应或非反应气体供应到所述基板的一个表面的第一供给管; 以及设置在所述等离子体屏蔽单元处的第二和第三供应管，所述第二供应管向所述基板的另一表面供应反应气体，所述第三供应管向另一表面供应非反应气体。

公开(公告)号：US20100102223A1

公开(公告)日：2010-04-29

申请号：US12460166

申请日：2009-07-14

Applicant: Michael Albiez ,  Wolfram Buhler

Inventor： Michael Albiez ,  Wolfram Buhler

IPC: G01N23/00

CPC classification number: G01N23/2251 ,  H01J37/026 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/0044 ,  H01J2237/006 ,  H01J2237/2002 ,  H01J2237/2809

Abstract: A method for treating a surface of an object and a device suitable in particular for performing this method provide for examining the surface of the object with the aid of a particle beam to counteract the charge buildup on the object. A gas is supplied to convey the charge away from the surface and/or to neutralize it.

Abstract translation: 用于处理物体的表面的方法和特别适用于执行该方法的装置提供了借助于粒子束来检查物体的表面以抵消物体上的电荷累积的方法。 供应气体以将电荷从表面输送和/或中和。

公开(公告)号：US20090283696A1

公开(公告)日：2009-11-19

申请号：US12467550

申请日：2009-05-18

Applicant: Chih-Yuan Tang

Inventor： Chih-Yuan Tang

IPC: G21K5/10

CPC classification number: H01J37/20 ,  H01J2237/2002 ,  H01J2237/2004

Abstract: A pre-cryogenic electron microscope specimen holder is disclosed. The pre-cryogenic electron microscope specimen holder includes a specimen holding member and a cryogenic energy storing member. The cryogenic energy storing member further includes a liquid gas storing trench formed therein to store the liquid gas. The cryogenic energy storing member is disposed under the specimen holding member to further supply the cryogenic energy to the specimen to extend the observation time for the specimen in an electron microscope.

Abstract translation: 公开了一种预低温电子显微镜样品架。 预低温电子显微镜试样架包括试样保持构件和低温储能构件。 低温储能部件还包括形成在其中的用于储存液体气体的液体气体存储沟槽。 低温储能构件设置在试样保持构件的下方，以进一步向试样供给低温能量，以在电子显微镜中延长试样的观察时间。

公开(公告)号：US07408175B2

公开(公告)日：2008-08-05

申请号：US11783780

申请日：2007-04-12

Applicant: Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

Inventor： Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

IPC: H01J37/18

CPC classification number: H01J37/222 ,  G01N23/225 ,  G01N23/2251 ,  H01J37/06 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0216 ,  H01J2237/082 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2813 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L2224/48227 ,  H01L2924/01019 ,  H01L2924/01025 ,  H01L2924/01057 ,  H01L2924/01067 ,  H01L2924/01078 ,  H01L2924/10253 ,  H01L2924/12032 ,  H01L2924/3025 ,  H01L2924/00

Abstract: A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate “S” to be inspected into an inspection chamber 23-1; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26-1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20-1 and guiding it to a detecting system 35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU 37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.

Abstract translation: 本发明的基板检查装置1-1（图1）执行以下步骤：将要检查的基板“S”运送到检查室23-1中; 在所述检查室中保持真空; 将所述检查室与振动隔离; 通过至少一个自由度的阶段26-1连续地移动所述衬底; 照射具有指定宽度的电子束; 帮助所述电子束经由一次电子光学系统10-1到达所述衬底的表面; 通过二次电子光学系统20-1捕获从所述衬底发射的二次电子并将其引导到检测系统35-1; 基于由所述检测系统获得的二次电子束的检测信号，在图像处理系统中形成二次电子图像; 基于由所述图像处理系统形成的二次电子图像检测所述基板中的缺陷位置; 通过CPU37-1指示和/或存储所述衬底中的所述缺陷位置; 并将完全检查的基板从检查室中取出。 因此，可以以高水平的精度和效率以及更高的生产量连续地执行基板上的缺陷检查。

公开(公告)号：US07304302B1

公开(公告)日：2007-12-04

申请号：US11215745

申请日：2005-08-29

Applicant: Peter Nunan ,  Muhran Nasser-Ghodsi ,  Mark Borowicz ,  Rudy F. Garcia ,  Tzu Chin Chuang ,  Herschel Marchman ,  David Soltz

Inventor： Peter Nunan ,  Muhran Nasser-Ghodsi ,  Mark Borowicz ,  Rudy F. Garcia ,  Tzu Chin Chuang ,  Herschel Marchman ,  David Soltz

IPC: H01J37/21

CPC classification number: H01J37/28 ,  H01J37/20 ,  H01J2237/002 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/2001 ,  H01J2237/2002 ,  H01J2237/2065 ,  H01J2237/2067 ,  H01J2237/2817

Abstract: Various systems configured to reduce distortion of a resist during a metrology process are provided. The systems include an electron beam metrology tool configured to measure one or more characteristics of one or more resist features formed on a specimen. The electron beam metrology tool may be configured as a scanning electron microscope. The resist may be designed for exposure at a wavelength of about 193 nm. One system includes a cooling subsystem configured to alter a temperature of the specimen during measurements by the tool such that the resist feature(s) are not substantially distorted during the measurements. Another system includes a drying subsystem that is configured to reduce moisture proximate the specimen during measurements by the electron beam metrology tool such that the resist feature(s) are not substantially distorted during the measurements. An additional system may include both the cooling subsystem and the drying subsystem.

Abstract translation: 提供了在计量过程中减少抗蚀剂失真的各种系统。 该系统包括电子束计量工具，其被配置为测量形成在样本上的一个或多个抗蚀剂特征的一个或多个特性。 电子束计量工具可以被配置为扫描电子显微镜。 抗蚀剂可以设计用于在约193nm的波长下曝光。 一个系统包括一个冷却子系统，该冷却子系统被配置成在由该工具进行的测量期间改变样品的温度，使得抗蚀剂特征在测量期间基本上不失真。 另一种系统包括干燥子系统，该干燥子系统被配置为通过电子束计量工具在测量期间减少靠近样本的水分，使得抗蚀剂特征在测量期间基本上不失真。 另外的系统可以包括冷却子系统和干燥子系统。