公开(公告)号：US20230282442A1

公开(公告)日：2023-09-07

申请号：US18079074

申请日：2022-12-12

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Andreas Schmaunz ,  Gero Walter ,  Bernd Stenke ,  Gerald Schmid

IPC: H01J37/16 ,  H01J37/10

CPC classification number: H01J37/16 ,  H01J37/10 ,  H01J2237/006 ,  H01J2237/0492 ,  H01J2237/166

Abstract: The invention relates to a gas reservoir (3000) for receiving a precursor (3035). The gas reservoir (3000) has a gas-receiving unit (3004) which is arranged in a first receiving unit (3002) of a basic body (3001), and a sliding unit (3007) which is arranged movably in a second receiving unit (3003) of the basic body (3001). The gas-receiving unit (3004) has a movable closure unit (3006) for opening or closing a gas outlet opening (3005) of the gas-receiving unit (3004). In a first position of the sliding unit (3007), both a first opening (3009) of a sliding-unit line device (3008) is fluidically connected to a first basic body opening (3011) and a second opening (3010) of the sliding-unit line device (3008) is fluidically connected to a second basic body opening (3012). In the second position of the sliding unit (3007), both the first opening (3009) is arranged at an inner wall (3015) of the second receiving unit (3003) and the second opening (3010) is arranged at the movable closure unit (3006).

公开(公告)号：US20230154719A1

公开(公告)日：2023-05-18

申请号：US18155684

申请日：2023-01-17

Applicant: ASML Netherlands B.V.

Inventor： Laura DINU-GURTLER ,  Eric Petrus HOGERVORST ,  Jurgen VAN SOEST

IPC: H01J37/04 ,  G03F7/20 ,  H01J37/10 ,  H01J37/244 ,  H01J37/317 ,  H01L21/263

CPC classification number: H01J37/04 ,  G03F7/70016 ,  H01J37/10 ,  H01J37/244 ,  H01J37/3175 ,  H01L21/263 ,  H01J2237/061

Abstract: The disclosed embodiments relate to a charged particle source module for generating and emitting a charged particle beam, such as an electron beam, comprising: a frame including a first frame part, a second frame part, and one or more rigid support members which are arranged between said first frame part and said second frame part; a charged particle source arrangement for generating a charged particle beam, such as an electron beam, wherein said charged particle source arrangement, such as an electron source, is arranged at said second frame part; and a power connecting assembly arranged at said first frame part, wherein said charged particle source arrangement is electrically connected to said connecting assembly via electrical wiring.

公开(公告)号：US20190180973A1

公开(公告)日：2019-06-13

申请号：US16210531

申请日：2018-12-05

Applicant: FEI Company

Inventor： Alexander Henstra

IPC: H01J37/10 ,  H01J49/06 ,  H01J49/44 ,  H01J37/26 ,  H01J37/22 ,  H01J37/147 ,  H01J37/21

CPC classification number: H01J37/10 ,  H01J37/05 ,  H01J37/147 ,  H01J37/21 ,  H01J37/226 ,  H01J37/263 ,  H01J37/265 ,  H01J49/063 ,  H01J49/44 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/24485 ,  H01J2237/2802

Abstract: A method of using a Transmission Charged Particle Microscope comprising:A specimen holder, for holding a specimen;A source, for producing a beam of charged particles;An illuminator, for directing said beam so as to irradiate the specimen;An imaging system, for receiving a flux of charged particles transmitted through the specimen and directing it onto a sensing device;A controller, for controlling at least some operational aspects of the microscope, in which method the sensing device is chosen to be an EELS/EFTEM module comprising:An entrance plane;An image plane, where in EELS mode an EELS spectrum is formed and in EFTEM mode an EFTEM image is formed;A slit plane between said entrance plane and image plane, where in EFTEM mode an energy dispersed focus is formed;A dispersing device, between said entrance plane and slit plane, for dispersing an incoming beam into an energy-dispersed beam with an associated dispersion direction;A first series of quadrupoles between said dispersing device and slit plane;A second series of quadrupoles between said slit plane and image plane, which dispersing device and quadrupoles are arranged along an optical axis, whereby, for a Cartesian coordinate system (X,Y,Z) in which said optical axis is disposed along Z, said dispersion direction is defined as being parallel to X,comprising the following steps:In said first quadrupole series, exciting one or more quadrupoles so as to deflect an off-axis non-dispersive YZ ray leaving said dispersing device onto a path paraxial to said optical axis from said slit plane to said image plane;In said second quadrupole series, exciting either: (a) A single quadrupole; or (b) A pair of adjacent quadrupoles, so as to focus said energy-dispersed beam onto said image plane.

公开(公告)号：US20190057834A1

公开(公告)日：2019-02-21

申请号：US15980399

申请日：2018-05-15

Applicant: Government of the United States of America, as Represented by the Secretary of Commerce

Inventor： Lawrence H. Friedman ,  Wen-Li WU

IPC: H01J37/147 ,  H01J37/20 ,  H01J37/22 ,  H01J37/06 ,  H01J37/10 ,  G01B15/04

CPC classification number: H01J37/1471 ,  G01B15/04 ,  G01B2210/56 ,  H01J37/06 ,  H01J37/10 ,  H01J37/20 ,  H01J37/22

Abstract: An electron reflectometer includes: a sample stage; a source that produces source electrons; a source collimator; and an electron detector that receives collimated reflected electrons.

公开(公告)号：US20180330912A1

公开(公告)日：2018-11-15

申请号：US15975959

申请日：2018-05-10

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Volker Drexel ,  Bernd Hafner

IPC: H01J37/147 ,  H01J37/09 ,  H01J37/10

CPC classification number: H01J37/1472 ,  H01J37/09 ,  H01J37/10 ,  H01J37/1471 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/0653 ,  H01J2237/083 ,  H01J2237/152

Abstract: A particle source for producing a particle beam includes a particle emitter, a first plate, a first deflector and a second plate with an aperture. The first plate has a smaller aperture, downstream of which a first beam is formed, and a larger aperture, downstream of which a second beam is formed. A controller sets the deflection angle of the deflector so that in a first mode of operation that particles of the first beam pass through the aperture in the second plate and form the particle beam produced by the particle source. The controller sets the deflection angle so that in a second mode of operation that particles of the second beam pass through the aperture in the second plate and form the particle beam produced by the particle source.

公开(公告)号：US20180308658A1

公开(公告)日：2018-10-25

申请号：US15935409

申请日：2018-03-26

Applicant: Hitachi High-Tech Science Corporation

Inventor： Shinichi MATSUBARA ,  Yoshimi KAWANAMI ,  Hiroyasu SHICHI

IPC: H01J37/08 ,  H01J37/28 ,  H01J37/153 ,  H01J37/10 ,  H01J37/147 ,  H01J37/22

CPC classification number: H01J37/08 ,  H01J37/10 ,  H01J37/147 ,  H01J37/153 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/0807 ,  H01J2237/0822 ,  H01J2237/1532

Abstract: According to an embodiment of the present invention, an ion beam apparatus switches between an operation mode of performing irradiation with an ion beam most including H3+ ions and an operation mode of performing irradiation with an ion beam most including ions heavier than the H3+.

公开(公告)号：US09997327B1

公开(公告)日：2018-06-12

申请号：US15372536

申请日：2016-12-08

Applicant: JEOL Ltd.

Inventor： Hidetaka Sawada ,  Yu Jimbo ,  Masashi Shimizu

IPC: H01J37/00 ,  H01J37/153 ,  H01J37/26 ,  H01J37/22 ,  H01J37/10 ,  H01J37/147

CPC classification number: H01J37/153 ,  H01J37/10 ,  H01J37/1474 ,  H01J37/22 ,  H01J37/26 ,  H01J2237/1534 ,  H01J2237/182

Abstract: There is provided a liner tube capable of reducing the effects of magnetic field variations on an electron beam. The liner tube (10) is disposed inside the electron optical column (2) of an electron microscope (100). The interior of the tube (10) forms a path for the electron beam (EB). The liner tube (10) has a first cylindrical member (110) that is made of copper, gold, silver, or an alloy consisting principally of one of these metals.

公开(公告)号：US20180158644A1

公开(公告)日：2018-06-07

申请号：US15371557

申请日：2016-12-07

Applicant: KLA-Tencor Corporation

Inventor： Xinrong Jiang ,  Christopher Sears

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/10

CPC classification number: H01J37/1474 ,  H01J37/10 ,  H01J37/28 ,  H01J2237/1508 ,  H01J2237/28

Abstract: An electron-optical system for performing electron microscopy is disclosed. The system includes an electron beam source configured to generate a primary electron beam. The system includes a source lens, a condenser lens and an objective lens disposed along an optical axis. The system includes a first Wien filter disposed along the optical axis and a second Wien filter disposed along the optical axis. The first Wien filter and the second Wien filter are disposed between the source lens and the objective lens. The first Wien filter is configured to correct chromatic aberration in the primary beam. The system also includes a detector assembly configured to detect electrons emanating from the surface of the sample.

公开(公告)号：US09941093B2

公开(公告)日：2018-04-10

申请号：US14992049

申请日：2016-01-11

Applicant: Mapper Lithography IP B.V.

Inventor： Johan Joost Koning ,  David Johannes van den Bergen

IPC: H01J37/02 ,  G03F7/20 ,  H01J37/20 ,  H01J37/30 ,  H01J37/317 ,  B01J19/12 ,  H01J37/10

CPC classification number: H01J37/023 ,  B01J19/12 ,  G03F7/708 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70891 ,  G03F7/709 ,  G03F7/70975 ,  H01J37/10 ,  H01J37/20 ,  H01J37/3007 ,  H01J37/3177

Abstract: The invention relates to a target processing unit (10) comprising a vacuum chamber (30) for accommodating a target to be processed, a projection column (46) within the vacuum chamber for generating a beam and projecting the beam towards the target, and a first conduit arrangement (26,36,37,60) for connecting the projection column to external equipment (22). The vacuum chamber can comprise a positioning system (114) for supporting the target, and a second conduit arrangement (110) distinct from the first conduit arrangement for connecting the positioning system to external equipment, wherein the positioning system is moveably arranged with respect to the projection column, and wherein the positioning system and the projection column occupy spatially distinct portions of the vacuum chamber. The first conduit arrangement extends through an upper side of the vacuum chamber, and the second conduit arrangement extends through a lower side of the vacuum chamber.

公开(公告)号：US09837245B2

公开(公告)日：2017-12-05

申请号：US14657234

申请日：2015-03-13

Applicant: Ho Seob Kim ,  Byeng Jin Kim ,  Do Jin Seong

Inventor： Ho Seob Kim ,  Byeng Jin Kim ,  Do Jin Seong

IPC: G21K5/10 ,  H01J37/26 ,  H01J37/20 ,  H01J37/10 ,  H02N2/00 ,  H02N2/02

CPC classification number: H01J37/261 ,  H01J37/10 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/10 ,  H01J2237/20207 ,  H01J2237/20228 ,  H01J2237/20235 ,  H01J2237/20264 ,  H01J2237/2602 ,  H02N2/006 ,  H02N2/026

Abstract: Disclosed herein is a micro stage using a piezoelectric element that can be reliably operated even in a vacuum environment. In a particle column requiring a high precision, for example, a microelectronic column, the micro stage can be used as a stage with micro or nano degree precision for alignment of parts of the column, or for moving a sample, and so on.