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    Scanning electron microscope
    12.
    发明授权
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号：US09478389B2

    公开(公告)日：2016-10-25

    申请号：US14422374

    申请日：2013-07-01

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Tsunenori Nomaguchi ,  Toshihide Agemura

    IPC: H01J37/10 ,  H01J37/28 ,  H01J37/147 ,  H01J37/22 ,  H01J37/305 ,  H01J37/317 ,  H01J37/26 ,  H01J37/141 ,  H01J37/16 ,  H01J37/30

    CPC classification number: H01J37/10 ,  H01J37/1413 ,  H01J37/1471 ,  H01J37/16 ,  H01J37/222 ,  H01J37/261 ,  H01J37/265 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/305 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/0245 ,  H01J2237/032 ,  H01J2237/12 ,  H01J2237/31745

    Abstract: The present invention provides a composite charged particle beam device which is provided with two or more charged particle beam columns and enables high-resolution observation while a sample is placed at the position of a cross point. The present invention has the following configuration. A composite charged particle beam device is provided with a plurality of charged particle beam columns (101a, 102a), and is characterized in that a sample (103) is disposed at the position of an intersection point (171) where the optical axes of the plurality of columns intersect, a component (408a, 408b) that forms the tip of an objective lens of the charged particle beam column (102a) is detachable, and by replacing the component (408a, 408b), the distance between the intersection point (171) and the tip of the charge particle beam column can be changed.

    Abstract translation: 本发明提供了一种复合带电粒子束装置，其具有两个或更多个带电粒子束柱，并且当将样品放置在交叉点的位置时能够进行高分辨率观察。 本发明具有以下结构。 复合带电粒子束装置设置有多个带电粒子束柱（101a，102a），其特征在于，样品（103）设置在交叉点（171）的位置， 多个列相交，形成带电粒子束列（102a）的物镜的尖端的部件（408a，408b）是可拆卸的，并且通过更换部件（408a，408b），交点 171），并且可以改变电荷粒子束柱的尖端。

    ELECTRON GUN SUPPORTING MEMBER AND ELECTRON GUN APPARATUS
    15.
    发明申请
    ELECTRON GUN SUPPORTING MEMBER AND ELECTRON GUN APPARATUS 有权
    电子枪支持会员和电子枪设备

    公开(公告)号：US20160064174A1

    公开(公告)日：2016-03-03

    申请号：US14833447

    申请日：2015-08-24

    Applicant: NuFlare Technology, Inc.

    Inventor： Nobuo MIYAMOTO

    IPC: H01J29/02 ,  H01J29/48

    CPC classification number: H01J29/025 ,  H01J3/027 ,  H01J3/38 ,  H01J29/02 ,  H01J29/485 ,  H01J29/92 ,  H01J29/96 ,  H01J37/065 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/061 ,  H01J2237/31776

    Abstract: An electron gun supporting member includes an insulating supporting member configured such that its one end is connected to a predetermined member having a ground potential and other end is connected to a high-voltage electrode to which a high potential being a negative high potential for emitting electrons from an electron source is applied, so as to support the high-voltage electrode, and a metal film formed in a partial region, which contacts neither the high-voltage electrode nor the predetermined member, on the outer surface of the insulating supporting member.

    Abstract translation: 电子枪支撑构件包括绝缘支撑构件，其构造成使得其一端连接到具有接地电位的预定构件，并且另一端连接到高电压电极，高电位是用于发射电子的负高电位 施加电子源，以便在绝缘支撑构件的外表面上支撑高压电极和形成在部分区域中的金属膜，其也不与高压电极或预定构件接触。

    ANALYSIS APPARATUS AND ANALYSIS METHOD
    17.
    发明申请
    ANALYSIS APPARATUS AND ANALYSIS METHOD 有权
    分析装置和分析方法

    公开(公告)号：US20150255247A1

    公开(公告)日：2015-09-10

    申请号：US14482652

    申请日：2014-09-10

    Applicant: KABUSHIKI KAISHA TOSHIBA

    Inventor： Takeshi MURAKAMI

    IPC: H01J37/26 ,  H01J37/28

    CPC classification number: H01J37/26 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/032 ,  H01J2237/24415 ,  H01J2237/2445 ,  H01J2237/2801

    Abstract: In accordance with an embodiment, an analysis apparatus includes a secondary electron optical system, at least one detector, and a composition analysis unit. The secondary electron optical system includes a charged particle beam source and a lens. The charged particle beam source generates a charged particle beam and irradiates a sample with it. The lens controls a focal position and a trajectory of the charged particle beam using an electric field or a magnetic field. The detector detects a characteristic X-ray from the sample. The composition analysis unit analyzes a composition of a material constituting the sample from the detected characteristic X-ray. Each detector is arranged in such a manner that at least part of a detection surface thereof is placed on the same plane as an exit surface of the secondary electron optical system, or placed on the charged particle beam side of the same plane.

    Abstract translation: 根据实施例，分析装置包括二次电子光学系统，至少一个检测器和组成分析单元。 二次电子光学系统包括带电粒子束源和透镜。 带电粒子束源产生带电粒子束并照射样品。 透镜使用电场或磁场控制带电粒子束的焦点位置和轨迹。 检测器检测来自样品的特征X射线。 组分分析单元从检测到的特征X射线分析构成样品的材料的组成。 每个检测器被布置成使得其检测表面的至少一部分被放置在与二次电子光学系统的出射表面相同的平面上，或者放置在同一平面的带电粒子束侧上。

    INSULATION STRUCTURE OF HIGH VOLTAGE ELECTRODES FOR ION IMPLANTATION APPARATUS
    18.
    发明申请
    INSULATION STRUCTURE OF HIGH VOLTAGE ELECTRODES FOR ION IMPLANTATION APPARATUS 有权
    用于离子植入装置的高压电极的绝缘结构

    公开(公告)号：US20140291543A1

    公开(公告)日：2014-10-02

    申请号：US14229038

    申请日：2014-03-28

    Applicant: SEN Corporation

    Inventor： Masateru Sato ,  Hiroshi Matsushita

    IPC: H01J37/08 ,  H01J37/317 ,  H01J37/30

    CPC classification number: H01J37/3171 ,  H01J37/248 ,  H01J2237/032 ,  H01J2237/036 ,  H01J2237/038 ,  H01J2237/08

    Abstract: An insulation structure of high voltage electrodes includes an insulator having an exposed surface and a conductor portion, which includes a joint region in contact with the insulator, and a heat-resistant portion provided, along at least part of an edge of the joint region, in such a manner as to be adjacent to the exposed surface of the insulator. The heat-resistant portion is formed of an electrically conductive material whose melting point is higher than that of the conductor portion. The heat-resistant portion may be so provided as to have a gap between the insulator and the exposed surface.

    Abstract translation: 高电压电极的绝缘结构包括具有暴露表面的绝缘体和导体部分，导体部分包括与绝缘体接触的接合区域，以及沿着接合区域的边缘的至少一部分设置的耐热部分， 以与绝缘体的暴露表面相邻的方式。 耐热部由熔点高于导体部的导电性材料形成。 耐热部分可以设置成在绝缘体和暴露表面之间具有间隙。

    ELECTROSTATIC LENS ARRAY
    19.
    发明申请
    ELECTROSTATIC LENS ARRAY 失效
    静电镜片阵列

    公开(公告)号：US20130341526A1

    公开(公告)日：2013-12-26

    申请号：US13915834

    申请日：2013-06-12

    Applicant: Canon Kabushiki Kaisha

    Inventor： Yasuo Ohashi

    IPC: H01J3/18

    CPC classification number: H01J3/18 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/027 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/032 ,  H01J2237/1205 ,  H01J2237/28

    Abstract: Provided is an electrostatic lens array, including multiple substrates arranged with intervals, each of the multiple substrates having an aperture for passing a charged particle beam, in which: in a travelling direction of the charged particle beam, a peripheral contour line formed by any one of surfaces of the multiple substrates other than an upper surface of a most upstream substrate and a lower surface of a most downstream substrate has a protruding portion protruding from a peripheral contour line of one of the upper surface of the most upstream substrate and the lower surface of the most downstream substrate; and a position of the protruding portion is defined by a position regulating member, whereby parallelism is adjustable so that a surface including the protruding portion is parallel to a surface to be irradiated with the charged particle beam after passing through the aperture.

    Abstract translation: 本发明提供一种静电透镜阵列，其包括间隔布置的多个基板，所述多个基板中的每一个具有用于使带电粒子束通过的孔，其中：在带电粒子束的行进方向上，由任何一个形成的周边轮廓线 多个基板的除了最上游基板的上表面和最下游基板的下表面以外的多个基板的表面具有从最上游基板的上表面和下游表面的上表面的周边轮廓线突出的突出部 的最下游底物; 并且突出部的位置由位置限制构件限定，由此平行度是可调节的，使得包括突出部分的表面平行于穿过孔之后被带电粒子束照射的表面。

    DECELERATION LENS
    20.
    发明申请
    DECELERATION LENS 有权
    减光镜

    公开(公告)号：US20120001087A1

    公开(公告)日：2012-01-05

    申请号：US13167399

    申请日：2011-06-23

    Applicant: Svetlana Radovanov ,  Jason Schaller ,  Richard M. White ,  Kevin R. Verrier ,  James Blanchette ,  Bon-Woong Koo ,  Eric d. Hermanson ,  Kevin Daniels

    Inventor： Svetlana Radovanov ,  Jason Schaller ,  Richard M. White ,  Kevin R. Verrier ,  James Blanchette ,  Bon-Woong Koo ,  Eric d. Hermanson ,  Kevin Daniels

    IPC: H01J3/14

    CPC classification number: H01J37/12 ,  H01J37/3171 ,  H01J2237/0213 ,  H01J2237/032 ,  H01J2237/0475

    Abstract: A system and method are disclosed for controlling an ion beam. A deceleration lens is disclosed for use in an ion implanter. The lens may include a suppression electrode, first and second focus electrodes, and first and second shields. The shields may be positioned between upper and lower portions of the suppression electrode. The first and second shields are positioned between the first focus electrode and an end station of the ion implanter. Thus positioned, the first and second shields protect support surfaces of said first and second focus electrodes from deposition of back-streaming particles generated from said ion beam. In some embodiments, the first and second focus electrodes may be adjustable to enable the electrode surfaces to be adjusted with respect to a direction of the ion beam. By adjusting the angle of the focus electrodes, parallelism of the ion beam can be controlled. Other embodiments are described and claimed.

    Abstract translation: 公开了用于控制离子束的系统和方法。 公开了用于离子注入机的减速透镜。 透镜可以包括抑制电极，第一和第二聚焦电极以及第一和第二屏蔽。 屏蔽件可以位于抑制电极的上部和下部之间。 第一和第二屏蔽件位于离子注入机的第一聚焦电极和端电极之间。 如此定位，第一和第二屏蔽件保护所述第一和第二聚焦电极的支撑表面不会沉积从所述离子束产生的回流颗粒。 在一些实施例中，第一和第二聚焦电极可以是可调节的，以使电极表面相对于离子束的方向被调整。 通过调整聚焦电极的角度，可以控制离子束的平行度。 描述和要求保护其他实施例。

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