Abstract:
A contamination detector in accordance with one embodiment of the invention includes a plasma generation system operable to direct an atmospheric plasma discharge towards a surface. The contamination detector further includes a light capture system to capture light generated by interaction of the atmospheric plasma discharge with the surface. The light capture system guides the captured light to an optical detection system configured to detect a contaminant.
Abstract:
An improved optical sensor and methods for measuring the presence of various materials or constituents in a fluid sample uses one or more reactive materials in a fluid environment. The reactive materials have optical properties that change in the presence of one or more target materials that may be present in the environment. One or more optical emitters generate light that is directed to the reactive material(s), and one or more optical detectors receive light from the reactive material(s), and the presence or absence of the target material is determined based on the light received at the optical detector(s). The reactive material(s), emitter(s), and detector(s) are selected based on the desired target material to be sensed.
Abstract:
A spectrophotometer having an optical system for directing a beam of substantially monochromatic excitation light to a liquid sample contained in a well (3) of a well plate for interaction with the sample for absorption or emission measurements to analyse the sample. The optical system includes two apertures (46, 28) for establishing a Kohler illumination region outside the well, that is an excitation beam region between conjugate images (18, 21) of the two apertures. This excitation beam region is then demagnified and imaged (10, 9) into the well (3). The invention provides for the shape of the Kohler illumination region to correspond to the shape of the well space so that all of the liquid sample is uniformly illuminated without the well obstructing any portion of the illuminating excitation beam of light. Advantages of the invention are that the Kohler illumination region of the excitation beam is convenient for insertion of filters (20), apertures and polarisers (19) into the excitation optical system and permits use of small and thus cheaper filters and polarisers. Also the invention provides for accurate absorption or emission measurements from a liquid sample in a well notwithstanding that the sample may only partially fill the well.
Abstract:
Afterglow spectroscopy allows observing light emission of gaseous species in absence of direct plasma light. This absence avoids the creation of a background spectrum obscuring weak emission from trace species. The invention describes a flowing afterglow version monitoring in-situ the cleanup of vacuum tools during pump/purge cycles. The invention also describes an intermittent afterglow version suitable for trace gas analysis at atmospheric pressure.
Abstract:
An apparatus (100) for sequentially analyzing particles such as single cells or single beads, by spectrometry. The apparatus, an elemental flow cytometer, includes means (102) for sequential particle introduction, means (104) to vaporize, atomize and excite or ionize the particles, or an elemental tag associated with an analyte on the particles, and means (106) to analyze the elemental composition of the vaporized, atomized and excited or ionized particles, or an elemental tag associated with the particles. Methods for sequentially analyzing particles such as singe cells or single beads by spectrometry are also described.
Abstract:
The invention provides a method and apparatus for detecting minority gaseous species in a mixture by light-emission spectroscopy by means of an optical spectrometer (8), in which the radiation emitted by a plasma (4) present in the gas mixture for analysis is used and, in the spectrum of said radiation, lines are identified of a majority gaseous species that present amplitudes that are sensitive to the presence of a minority species, and information about the concentration of a minority gaseous species is deduced from the amplitude(s) of said sensitive line(s). This makes it possible to monitor minority gaseous species in real time.
Abstract:
A method and system are presented for monitoring the optical emissions associated a plasma used in integrated circuit fabrication. The optical emissions may be processed by an optical spectrometer to obtain a spectrum. The spectrum may be analyzed to determine the presence of particular disassociated species which are indicative of the presence of a suitable plasma and which may be desired for a deposition, etching, or cleaning process.
Abstract:
The present invention relates to monitoring chemicals in a process chamber using a spectrometer having a plasma generator, based on patterns over time of chemical consumption. The relevant patterns may include a change in consumption, reaching a consumption plateau, absence of consumption, or presence of consumption. In some embodiments, advancing to a next step in forming structures on the workpiece depends on the pattern of consumption meeting a process criteria. In other embodiments, a processing time standard is established, based on analysis of the relevant patterns. Yet other embodiments relate to controlling work on a workpiece, based on analysis of the relevant patterns. The invention may be either a process or a device including logic and resources to carry out a process.
Abstract:
The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.
Abstract:
A pulsed laser is employed for quantitative spectral analysis of halogen-containing, nonmetallic or at most partially metallic materials in combination with an image recorder, a spectrometer and a CCD camera, by detecting, summing and analysing the luminous intensity of at least a volume slice from the expansion cone of the plasma, this making it possible, advantageously, for temperature and density gradients to be measured.