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    Particle beam generator
    21.
    发明申请
    Particle beam generator 失效
    粒子束发生器

    公开(公告)号：US20050199820A1

    公开(公告)日：2005-09-15

    申请号：US10518064

    申请日：2003-06-16

    Applicant: Derek Eastham

    Inventor： Derek Eastham

    IPC: G21K1/00 ,  H01J37/06 ,  H01J37/12 ,  H01J37/26 ,  H01J37/28 ,  H01J37/317 ,  H01J3/14 ,  G21K1/08

    CPC classification number: H01J37/063 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/26 ,  H01J37/3174 ,  H01J2237/06375

    Abstract: The source of electrons is a nanotip in a vacuum as used in near field microscopy. The source of ions is a similar nanotip in vacuum supplied with liquid metal (gallium) as in a liquid-metal ion source. Electrons or ions from this nanometre-sized tip are extracted by centralising the tip over an aperture plate and applying a suitable voltage to the tip. The electrons (ions) pass through this plate and are accelerated up to several keV using a nanoscale/microscale accelerating column before being focussed using further microscale (or nanoscale) cylindrical lenses. The final element is an aberration corrected miniature (or sub-miniature) einzel lens which can focus the beam at several millimetres from the end of the instrument.

    Abstract translation: 电子源是在近场显微镜中使用的真空中的纳米尖端。 离子源是与液态金属离子源一样的液态金属（镓）提供的真空中的类似的纳米尖端。 通过将尖端集中在孔板上并向尖端施加适当的电压来提取来自该纳米尺寸尖端的电子或离子。 电子（离子）通过该平板，并使用纳米尺度/微尺度加速柱加速至几keV，然后使用进一步的微米（或纳米级）柱面透镜聚焦。 最后一个元件是像差校正的微型（或亚微型）einzel透镜，可以将光束聚焦在离仪器末端几毫米处。

    Electron beam apparatus and method of controlling same
    22.
    发明授权
    Electron beam apparatus and method of controlling same 有权
    电子束装置及其控制方法

    公开(公告)号：US06753533B2

    公开(公告)日：2004-06-22

    申请号：US10287431

    申请日：2002-11-04

    Applicant: Masaaki Mita

    Inventor： Masaaki Mita

    IPC: H01J31256

    CPC classification number: H01J37/04 ,  H01J37/063 ,  H01J37/073 ,  H01J37/256 ,  H01J2237/04924

    Abstract: An electron beam apparatus is offered which is capable of being used optimally over a wide range of electron beam currents. A method of controlling this apparatus is also offered. The apparatus has an electron emitter for producing an electron beam. The beam is collimated or slightly converged (made a real-image mode beam) by the first condenser lens. As a result, the amount of the electron beam limited by the anode electrode can be reduced to a minimum. The excitation of the first condenser lens is fixed to parallel beam conditions and so movement of the virtual electron source is prevented. This can enhance the axial accuracy.

    Abstract translation: 提供了能够在宽范围的电子束电流下被最佳地使用的电子束装置。 还提供了一种控制该装置的方法。 该装置具有用于产生电子束的电子发射器。 光束被第一聚光透镜准直或略微收敛（制成实像模式光束）。 结果，可以将由阳极电极限制的电子束的量减少到最小。 第一聚光透镜的激发被固定为平行光束条件，从而防止虚拟电子源的移动。 这可以提高轴向精度。

    Illumination system for electron beam lithography tool
    24.
    发明授权
    Illumination system for electron beam lithography tool 有权
    电子束光刻工具照明系统

    公开(公告)号：US06333508B1

    公开(公告)日：2001-12-25

    申请号：US09580530

    申请日：2000-05-30

    Applicant: Victor Katsap ,  Pieter Kruit ,  Daniel Moonen ,  Warren K Waskiewicz

    Inventor： Victor Katsap ,  Pieter Kruit ,  Daniel Moonen ,  Warren K Waskiewicz

    IPC: H01J37302

    CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J3/18 ,  H01J37/063 ,  H01J37/12 ,  H01J37/3174 ,  H01J2237/065 ,  H01J2237/12 ,  H01J2237/1205 ,  H01J2237/3175 ,  H01J2237/31774

    Abstract: A method and apparatus for controlling beam emittance by placing a quadrupole lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a liner tube or drift tube, attachable to an electron gun. The quadrupole lens array may be three or more mesh grids or a combination of grids and continuous foils. The quadrupole lens array forms a multitude of microlenses resembling an optical “fly's eye” lens. The quadrupole lens array splits an incoming solid electron beam into a multitude of subbeams, such that the outgoing beam emittance is different from the incoming beam emittance, while beam total current remains unchanged. The method and apparatus permit independent control of beam current and beam emittance, which is beneficial in a SCALPEL illumination system.

    Abstract translation: 一种通过将四极透镜阵列放置在照明系统部件的漂移空间中来控制光束发射的方法和装置。 照明系统部件可以是可附接到电子枪的电子枪或衬管或漂移管。 四极透镜阵列可以是三个或更多个网格或网格和连续箔片的组合。 四极透镜阵列形成大量类似于光学“飞眼”透镜的微透镜。 四极透镜阵列将输入的固体电子束分裂成多个子束，使得输出光束发射不同于入射光束发射，而光束总电流保持不变。 该方法和装置允许对束电流和光束发射的独立控制，这在SCALPEL照明系统中是有益的。

    Charged particle beam apparatus
    25.
    发明授权
    Charged particle beam apparatus 失效
    带电粒子束装置

    公开(公告)号：US3937958A

    公开(公告)日：1976-02-10

    申请号：US563330

    申请日：1975-03-31

    Applicant: Thomas W. Rusch ,  Jerry A. Sievers

    Inventor： Thomas W. Rusch ,  Jerry A. Sievers

    IPC: G01N23/225 ,  G21K1/087 ,  H01J37/063 ,  H01J37/08 ,  H01J37/26 ,  H05H7/08

    CPC classification number: H01J37/08 ,  G21K1/087 ,  H01J37/063

    Abstract: A charged particle beam (e.g., ions or electrons) apparatus including two electrostatic focusing lenses and an electrode having a diameter limiting aperture positioned between the lenses is further provided with two electrode assemblies which interact with an extractor electrode and with a source of charged particles such that the trajectories of the particles in the beam passing through the second of the two assemblies are substantially parallel. This feature and other disclosed improvements facilitate the production of a substantially monoenergetic beam which under a first set of conditions can be focused to provide a small-diameter, spherical-aberration limited beam and which under another set of conditions, can be focused to provide a high current beam.

    Abstract translation: 包括两个静电聚焦透镜和位于透镜之间的具有直径限制孔的电极的带电粒子束（例如，离子或电子）装置还设置有两个电极组件，其与提取器电极和带电粒子源 通过两个组件中的第二个组件的束中的颗粒的轨迹基本上平行。 该特征和其他公开的改进有助于生产基本单能束，其在第一组条件下可以被聚焦以提供小直径的球面像差受限束，并且在另一组条件下可以聚焦以提供 高电流束。

    Triode electron gun for electron beam machines
    26.
    发明授权
    Triode electron gun for electron beam machines 失效
    电子束机三通电子枪

    公开(公告)号：US3835327A

    公开(公告)日：1974-09-10

    申请号：US42024073

    申请日：1973-11-29

    Applicant: UNITED AIRCRAFT CORP

    Inventor： LAWRENCE G

    IPC: B23K15/00 ,  H01J37/063 ,  H01J37/065 ,  H01J37/30 ,  H01J37/00 ,  G01N23/00

    CPC classification number: H01J37/3005 ,  B23K15/0013 ,  H01J37/063 ,  H01J37/065

    Abstract: A high power electron beam machine for operating on a workpiece is disclosed in which the beam focus is automatically maintained constant without the necessity of lens current variation regardless of changes in beam current. The electron gun assembly for the machine consists of a Rogowski gun having a square ribbon filament recessed from an enlarged filament aperture, and a pin type anode with a reduced height and an increased gap from the bias electrode. The electron gun produces a stationary image or apparent source of electrons even though the beam current or the high voltage operating level of the electron gun is varied. Increased life of the ribbon filament is obtained by using a ribbon filament consistng of tungsten with 3 percent rhenium added thereto.

    Abstract translation: 公开了一种用于在工件上操作的高功率电子束机器，其中束束聚焦自动保持恒定，而不需要透镜电流变化，而不管射束电流的变化如何。 用于机器的电子枪组件由具有从放大的灯丝孔凹入的方形丝带灯丝的罗戈夫斯基枪和具有降低的高度的引脚型阳极和与偏置电极的间隙增加。 即使电子束的射束电流或高电压工作电平发生变化，电子枪也会产生静止的图像或电子源。 通过使用由添加了3％铼的钨组成的丝带来获得带状丝的寿命。

    Electron emission system
    27.
    发明授权
    Electron emission system 失效
    电子发射系统

    公开(公告)号：US3814975A

    公开(公告)日：1974-06-04

    申请号：US15876871

    申请日：1971-07-01

    Applicant: GEN ELECTRIC

    Inventor： WOLFE J ,  LEDGES G ,  GLASCOCK H

    IPC: G11C13/04 ,  H01J1/16 ,  H01J31/60 ,  H01J37/06 ,  H01J37/063 ,  H01J37/073 ,  H01J37/302 ,  H01J19/10

    CPC classification number: H01J37/06 ,  G11C13/04 ,  G11C13/048 ,  H01J1/16 ,  H01J31/60 ,  H01J37/063 ,  H01J37/073 ,  H01J37/302 ,  H01J2237/06316

    Abstract: A storage system for the mass recording and readout of digital data with ultra high resolution. An electron beam structure is provided for forming a beam of extremely small focused spot diameter, on the order of 0.1 microns, and high current density capability, on the order of 1,000 amperes per sq. cm., which records data by scanning over defined areas of the storage medium surface and micromachining elemental portions of said medium as a function of beam modulation. Readout may be subsequently accomplished by similarly scanning the beam at reduced power density and detecting electrons that have been transmitted by or reflected from the storage medium.

    Abstract translation: 一种用于以超高分辨率大量记录和读出数字数据的存储系统。 提供电子束结构，用于形成约0.1微米的极小聚焦光点直径和高电流密度能力的光束，其数量级为每平方厘米1000安培，其通过在限定区域上扫描记录数据 作为光束调制的函数的所述介质的存储介质表面和微加工元素部分。 可以随后通过以降低的功率密度类似地扫描光束并检测已经由存储介质传输或从存储介质反射的电子来实现读出。

    Electron gun with anode segments for beam position detection
    28.
    发明授权
    Electron gun with anode segments for beam position detection 失效
    电子枪与阳极部分用于光束位置检测

    公开(公告)号：US3694687A

    公开(公告)日：1972-09-26

    申请号：US3694687D

    申请日：1970-08-12

    Applicant: COLUMBIA BROADCASTING SYST INC

    Inventor： GLENN WILLIAM ELLIS

    IPC: H01J3/10 ,  H01J37/063 ,  H01J37/065 ,  H01J29/74 ,  H01J29/02 ,  H01J29/82

    CPC classification number: H01J37/063 ,  H01J3/10 ,  H01J37/065

    Abstract: In an electron gun, an anode structure in which the electron beam aperture is defined by four mutually insulated anode segments which may be energized to provide beam centering. In a preferred embodiment, the anode segments are shaped to intercept the beam if it is off-center, and are returned to ground potential through respective resistors thereby being operative automatically to center the beam.

    Abstract translation: 在电子枪中，阳极结构中电子束孔由四个相互绝缘的阳极段限定，阳极段可被激励以提供光束对中。 在一个优选实施例中，如果阳极段偏心，则阳极段被成形为截取光束，并且通过相应的电阻器返回到接地电位，从而自动地使光束中心。

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