公开(公告)号：US20240212966A1

公开(公告)日：2024-06-27

申请号：US18391808

申请日：2023-12-21

Applicant: Hitachi High-Tech Corporation

Inventor： Tomoya IGARI ,  Masahiro FUKUTA ,  Takshi DOI

IPC: H01J37/073 ,  H01J37/28

CPC classification number: H01J37/073 ,  H01J37/28 ,  H01J2237/06316 ,  H01J2237/06375 ,  H01J2237/2817

Abstract: Provided are a charged particle gun and a charged particle beam apparatus that can reduce instability in the amount of emitted charged particles and deviation in the charged particle trajectory when the amount of charged particle beams is increased. A charged particle gun includes a charged particle source that generates a charged particle, an electrode portion that includes an extraction electrode for extracting a charged particle beam from the charged particle source, a voltage introduction unit that introduces voltage to the electrode portion, and a temperature adjustment unit that adjusts a temperature of the electrode portion. The temperature adjustment unit is configured to adjust the temperature of the electrode portion based on a change in a state of the electrode portion.

公开(公告)号：US20240194442A1

公开(公告)日：2024-06-13

申请号：US18065438

申请日：2022-12-13

Applicant: FEI Company

Inventor： Branislav Straka ,  Jan Lásko ,  Libor Novák ,  Vojtêch Mahel ,  Radek Smolka ,  Petr Glajc

IPC: H01J37/28 ,  H01J37/141 ,  H01J37/244 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/141 ,  H01J37/244 ,  H01J37/265 ,  H01J2237/24475

Abstract: Charged particle microscopy systems, sensors, and techniques are provided. A charged particle sensor can include a housing, configured to be incorporated into a scanning electron microscope (SEM). The charged particle sensor can include a detector cell, mechanically coupled with the housing. The detector cell can include an acceptor layer including a semiconducting material characterized by a bandgap equal to or greater than about 2.0 eV. The acceptor layer can define a first surface and a second surface opposing the first surface. The detector cell can include a first conducting layer disposed on the first surface, a second conducting layer disposed on the second surface, a first contact, electrically coupled with the first conducting layer, and a second contact, electrically coupled with the second conducting layer.

公开(公告)号：US20240192192A1

公开(公告)日：2024-06-13

申请号：US18531852

申请日：2023-12-07

Applicant: SUMITOMO RUBBER INDUSTRIES, LTD. ,  NEC Corporation

Inventor： Wakana ITO ,  Takashi KONDO ,  Yoshio ISHIZAWA ,  Naoto SAKAMOTO ,  Hiroki NAKAMURA

IPC: G01N33/44 ,  G01N21/898 ,  H01J37/28

CPC classification number: G01N33/445 ,  G01N21/898 ,  H01J37/28

Abstract: An analysis method for a rubber composition includes the followings: (1) acquiring input data generated from a microscopic image obtained by image-capturing a rubber composition with a microscope, the microscopic image showing a formulation contained in the rubber composition; (2) inputting the input data to a trained machine learning model; and (3) deriving output data from the trained machine learning model. The output data is data defining a region that appears in the microscopic image corresponding to the formulation.

公开(公告)号：US20240177964A1

公开(公告)日：2024-05-30

申请号：US18283499

申请日：2021-03-26

Applicant: Hitachi High-Tech Corporation

Inventor： Heita KIMIZUKA ,  Natsuki TSUNO ,  Yasuhiro SHIRASAKI ,  Minami UCHIHO

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/228 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2448 ,  H01J2237/2809

Abstract: An object of the present disclosure is to provide a charged particle beam system capable of obtaining information about a sample by using a feature amount on an observed image caused by light interference, light diffraction, light standing waves, and the like caused by irradiating a sample with light, and the like. In the charged particle beam system according to the present disclosure, a first feature amount resulting from the light interference, the light diffraction, or the light standing wave generated by irradiating the sample with light is extracted from the observed image of the sample, and a second feature amount of the sample is obtained by using the first feature amount (see FIG. 6).

公开(公告)号：US20240161999A1

公开(公告)日：2024-05-16

申请号：US18054880

申请日：2022-11-11

Applicant: FEI Company

Inventor： Rudolf Geurink ,  Hugo Cornelis Van Leeuwen ,  Gerard Nicolass Anne Van Veen ,  Pleun Dona ,  Stephan Kujawa ,  Maarten Bischoff

IPC: H01J37/18 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/18 ,  H01J37/20 ,  H01J37/226 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/2802

Abstract: The present disclosure relates to a charged particle microscope in which in-situ thermal laser epitaxy can be performed and the product analysed, methods of performing in-situ thermal laser epitaxy and analysis within the charged particle microscope and the combination of at least one cartridge and a laser for use in a charged-particle microscope to provide in-situ thermal laser epitaxy and analysis are also described.

公开(公告)号：US20240153738A1

公开(公告)日：2024-05-09

申请号：US17983225

申请日：2022-11-08

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Yehuda Zur

IPC: H01J37/28 ,  H01J37/22

CPC classification number: H01J37/28 ,  H01J37/222 ,  H01J2237/2815

Abstract: A method of determining the depth of a hole milled into a first region of a sample, the method comprising: positioning the sample in a processing chamber having a charged particle beam column; depositing material directly over a top surface of the sample in a second region of the sample adjacent to the first region; milling the hole in the first region of the sample using a charged particle beam generated by the charged particle beam column, wherein the hole abuts the material deposited over the top surface and includes a sidewall that extends from a bottom surface of the hole to an interface between the deposited material and the top surface of the sample; and using stereoscopic measurement techniques to calculate the depth of the hole based on distance measurements between a first point along an interface between the material and the top surface and a second point along a bottom surface of the hole.

公开(公告)号：US11978610B2

公开(公告)日：2024-05-07

申请号：US17436655

申请日：2020-02-27

Applicant: COXEM CO., LTD

Inventor： Jun Hee Lee

IPC: H01J37/28 ,  H01J37/20

CPC classification number: H01J37/28 ,  H01J37/20 ,  H01J2237/2801

Abstract: A scanning electron microscope according to the present invention enables a column to be detached from a sample installation unit, thereby addressing issues related to the column, such as simple calibration related to the column, tilt of a beam, replacement of consumables, etc., by replacing the entire column. As such, the scanning electron microscope has the advantage of being simply and easily repaired and maintained.

公开(公告)号：US11972922B2

公开(公告)日：2024-04-30

申请号：US18126322

申请日：2023-03-24

Applicant: ASML Netherlands B.V.

Inventor： Hermanus Adrianus Dillen ,  Wim Tjibbo Tel ,  Willem Louis Van Mierlo

IPC: H01J37/28 ,  H01J37/22

CPC classification number: H01J37/28 ,  H01J37/222 ,  H01J2237/2826

Abstract: A method for calibrating a scanning charged particle microscope, such as a scanning electron microscope (SEM), is provided. The method includes dividing a wafer into a plurality of regions; preparing, on each of the plurality of regions, a pattern including a first periodic structure interleaved with a second periodic structure, the first and second periodic structures having an induced offset; determining an actual pitch the first and second periodic structures and thereby determining actual induced offset on each of the plurality of regions; selecting a plurality of regions from among the plurality of regions; measuring, by the SEM, a pitch of first and second periodic structures on each of the plurality of regions; and performing linearity calibration on the SEM based on the determining and the measuring.

公开(公告)号：US11967496B2

公开(公告)日：2024-04-23

申请号：US17580917

申请日：2022-01-21

Applicant: Fluidigm Canada Inc. ,  University of Ottawa

Inventor： Paul Corkum ,  Alexander V. Loboda

IPC: H01J49/04 ,  G01N33/68 ,  G02B21/33 ,  H01J37/20 ,  H01J37/28 ,  H01J49/00 ,  H01J49/02 ,  H01J49/06 ,  H01J49/10 ,  H01J49/14 ,  H01J49/16 ,  H01J49/40

CPC classification number: H01J49/0463 ,  G01N33/6848 ,  G01N33/6851 ,  G02B21/33 ,  H01J37/20 ,  H01J37/28 ,  H01J49/0004 ,  H01J49/0031 ,  H01J49/025 ,  H01J49/0418 ,  H01J49/067 ,  H01J49/105 ,  H01J49/142 ,  H01J49/161 ,  H01J49/164 ,  H01J49/40

Abstract: The present invention relates to the high resolution imaging of samples using imaging mass spectrometry (IMS) and to the imaging of biological samples by imaging mass cytometry (IMC™) in which labelling atoms are detected by IMS. LA-ICP-MS (a form of IMS in which the sample is ablated by a laser, the ablated material is then ionised in an inductively coupled plasma before the ions are detected by mass spectrometry) has been used for analysis of various substances, such as mineral analysis of geological samples, analysis of archaeological samples, and imaging of biological substances. However, traditional LA-ICP-MS systems and methods may not provide high resolution. Described herein are methods and systems for high resolution IMS and IMC.

公开(公告)号：US11959735B2

公开(公告)日：2024-04-16

申请号：US16747942

申请日：2020-01-21

Applicant: Hitachi High-Technologies Corporation

Inventor： Naoya Nakai ,  Yuichi Shimoda ,  Makoto Suzuki

IPC: G01B11/06 ,  H01J37/20 ,  H01J37/28

CPC classification number: G01B11/0608 ,  H01J37/20 ,  H01J37/28

Abstract: An object of the present disclosure is to propose a height measuring device which performs height measurement with high accuracy at each height with a relatively simple configuration even when the sample surface height changes greatly. A height measuring device which includes a projection optical system configured to project a light ray onto an object to be measured and a detection optical system including a detection element configured to detect a reflected light ray from the object to be measured, where the projection optical system includes a light splitting element (103) which splits a trajectory of the light ray with which the object to be measured is irradiated into a plurality of parts, and thus it is possible to project a light ray to a predetermined position even when the object to be measured is located at a plurality of heights, is proposed.