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    Insulation structure and insulation method
    34.
    发明授权
    Insulation structure and insulation method 有权
    绝缘结构和绝缘方法

    公开(公告)号：US09281160B2

    公开(公告)日：2016-03-08

    申请号：US14291766

    申请日：2014-05-30

    Applicant: SEN Corporation

    Inventor： Masateru Sato

    IPC: H01J37/08 ,  H01J37/02 ,  H01J27/02 ,  H01J37/317

    CPC classification number: H01J37/08 ,  H01J27/024 ,  H01J37/3171 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/026 ,  H01J2237/032 ,  H01J2237/036 ,  H01J2237/038 ,  H01J2237/08 ,  H01J2237/31701

    Abstract: An insulation structure provided among a plurality of electrodes for extraction of an ion beam from a plasma generating section is provided. The insulation structure includes an insulation member including a first part connected to a first electrode and a second part connected to a second electrode and configured to support the first electrode to the second electrode, a first cover surrounding at least a part of the first part to protect the first part from contamination particles, and a second cover surrounding at least a part of the second part to protect the second part from contamination particles. At least one of the first part and the second part is made of a machinable ceramic or a porous ceramic.

    Abstract translation: 提供了一种绝缘结构，设置在用于从等离子体产生部分提取离子束的多个电极之间。 绝缘结构包括绝缘构件，该绝缘构件包括连接到第一电极的第一部分和连接到第二电极的第二部分，并被配置为将第一电极支撑到第二电极，第一盖围绕第一部分的至少一部分， 保护第一部分免受污染颗粒，以及围绕第二部分的至少一部分的第二盖，以保护第二部分免受污染颗粒。 第一部分和第二部分中的至少一个由可机加工的陶瓷或多孔陶瓷制成。

    Composite Charged Particle Beam Device
    36.
    发明申请
    Composite Charged Particle Beam Device 有权
    复合带电粒子束装置

    公开(公告)号：US20150221468A1

    公开(公告)日：2015-08-06

    申请号：US14422374

    申请日：2013-07-01

    Applicant: Hitachi High-Technologies Corporation

    Inventor： Tsunenori Nomaguchi ,  Toshihide Agemura

    IPC: H01J37/10 ,  H01J37/26

    CPC classification number: H01J37/10 ,  H01J37/1413 ,  H01J37/1471 ,  H01J37/16 ,  H01J37/222 ,  H01J37/261 ,  H01J37/265 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/305 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/0245 ,  H01J2237/032 ,  H01J2237/12 ,  H01J2237/31745

    Abstract: The present invention provides a composite charged particle beam device which is provided with two or more charged particle beam columns and enables high-resolution observation while a sample is placed at the position of a cross point. The present invention has the following configuration. A composite charged particle beam device is provided with a plurality of charged particle beam columns (101a, 102a), and is characterized in that a sample (103) is disposed at the position of an intersection point (171) where the optical axes of the plurality of columns intersect, a component (408a, 408b) that forms the tip of an objective lens of the charged particle beam column (102a) is detachable, and by replacing the component (408a, 408b), the distance between the intersection point (171) and the tip of the charge particle beam column can be changed.

    Abstract translation: 本发明提供了一种复合带电粒子束装置，其具有两个或更多个带电粒子束柱，并且当将样品放置在交叉点的位置时能够进行高分辨率观察。 本发明具有以下结构。 复合带电粒子束装置设置有多个带电粒子束柱（101a，102a），其特征在于，样品（103）设置在交叉点（171）的位置， 多个列相交，形成带电粒子束列（102a）的物镜的尖端的部件（408a，408b）是可拆卸的，并且通过更换部件（408a，408b），交点 171），并且可以改变电荷粒子束柱的尖端。

    MULTI-ELECTRODE STACK ARRANGEMENT
    37.
    发明申请
    MULTI-ELECTRODE STACK ARRANGEMENT 有权
    多电极堆栈布置

    公开(公告)号：US20150137010A1

    公开(公告)日：2015-05-21

    申请号：US14541238

    申请日：2014-11-14

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Willem Henk URBANUS ,  Marco Jan-Jaco WIELAND

    IPC: H01J37/02 ,  H01J37/317 ,  H01J37/30 ,  H01J37/16

    CPC classification number: G21K1/02 ,  G21K5/04 ,  H01J37/026 ,  H01J37/065 ,  H01J37/12 ,  H01J37/16 ,  H01J37/24 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/3174 ,  H01J37/3175 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/04 ,  H01J2237/1215 ,  H01J2237/16 ,  H01J2237/1825 ,  H01J2237/303 ,  H01J2237/30472

    Abstract: The invention relates to an electrode stack (70) comprising stacked electrodes (71-80) for manipulating a charged particle beam along an optical axis (A). Each electrode comprises an electrode body with an aperture for the charged particle beam. The electrode bodies are mutually spaced and the electrode apertures are coaxially aligned along the optical axis. The electrode stack comprises electrically insulating spacing structures (89) between each pair of adjacent electrodes for positioning the electrodes (71-80) at predetermined mutual distances along the axial direction (Z). A first electrode and a second electrode each comprise an electrode body with one or more support portions (86), wherein each support portion is configured to accommodate at least one spacing structure (89). The electrode stack has at least one clamping member (91-91c) configured to hold the support portions (86) of the first and second electrodes, as well as the intermediate spacing structure (89) together.

    Abstract translation: 本发明涉及一种电极堆叠（70），其包括用于沿光轴（A）操纵带电粒子束的堆叠电极（71-80）。 每个电极包括具有用于带电粒子束的孔的电极体。 电极体相互间隔开，并且电极孔沿光轴同轴对准。 电极堆叠包括在每对相邻电极之间的电绝缘间隔结构（89），用于将电极（71-80）沿着轴向方向（Z）定位在预定的相互距离处。 第一电极和第二电极各自包括具有一个或多个支撑部分（86）的电极主体，其中每个支撑部分构造成容纳至少一个间隔结构（89）。 电极堆叠具有至少一个构造成将第一和第二电极的支撑部分（86）以及中间间隔结构（89）保持在一起的夹紧构件（91-91c）。

    MULTI-ELECTRODE COOLING ARRANGEMENT
    38.
    发明申请
    MULTI-ELECTRODE COOLING ARRANGEMENT 有权
    多电极冷却装置

    公开(公告)号：US20150137009A1

    公开(公告)日：2015-05-21

    申请号：US14541236

    申请日：2014-11-14

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Willem Henk URBANUS ,  Marco Jan-Jaco WIELAND

    IPC: H01J37/30 ,  H01J37/24 ,  H01J37/317

    CPC classification number: G21K1/02 ,  G21K5/04 ,  H01J37/026 ,  H01J37/065 ,  H01J37/12 ,  H01J37/16 ,  H01J37/24 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/3174 ,  H01J37/3175 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/04 ,  H01J2237/1215 ,  H01J2237/16 ,  H01J2237/1825 ,  H01J2237/303 ,  H01J2237/30472

    Abstract: The invention relates to a collimator electrode, comprising an electrode body (81) that is provided with a central electrode aperture (82), wherein the electrode body defines an electrode height between two opposite main surfaces, and wherein the electrode body accommodates a cooling conduit (105) inside the electrode body for transferring a cooling liquid (102). The electrode body preferably has a disk shape or an oblate ring shape.The invention further relates to a collimator electrode stack for use in a charged particle beam generator, comprising a first collimator electrode and a second collimator electrode that are each provided with a cooling conduit (105) for transferring the cooling liquid (102), and a connecting conduit (110) for a liquid connection between the cooling conduits of the first and second collimator electrodes.

    Abstract translation: 本发明涉及一种准直器电极，包括设置有中心电极孔（82）的电极体（81），其中电极体限定两个相对的主表面之间的电极高度，并且其中电极体容纳冷却导管 （105），用于传送冷却液（102）。 电极体优选具有盘状或扁圆形状。 本发明还涉及一种用于带电粒子束发生器的准直器电极叠层，其包括第一准直器电极和第二准直器电极，每个准直器电极和第二准直器电极都设置有用于传送冷却液体（102）的冷却导管（105） 连接导管（110）用于第一和第二准直仪电极的冷却管道之间的液体连接。

    Electrode of electrostatic lens and method of manufacturing the same
    39.
    发明授权
    Electrode of electrostatic lens and method of manufacturing the same 有权
    静电透镜电极及其制造方法

    公开(公告)号：US08963099B2

    公开(公告)日：2015-02-24

    申请号：US13862728

    申请日：2013-04-15

    Applicant: Canon Kabushiki Kaisha

    Inventor： Shuji Yamada

    IPC: H01J1/02 ,  H01J3/18 ,  H01J37/317 ,  H01J9/02 ,  H01J37/12 ,  H01J1/46 ,  H01J3/02 ,  H01J9/14

    CPC classification number: H01J1/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J1/46 ,  H01J3/027 ,  H01J3/18 ,  H01J9/02 ,  H01J9/14 ,  H01J37/12 ,  H01J37/317 ,  H01J37/3177 ,  H01J2237/032 ,  H01J2237/1205

    Abstract: An electrode to be used for an electrostatic lens, wherein the electrode at least includes: a first substrate having a first through-hole and a second substrate having a second through-hole; the first substrate having a thickness smaller than the second substrate; the first through-hole having a diameter smaller than the second through-hole; the second substrate having a specific resistance smaller than the first substrate, wherein the first substrate and the second substrate are superimposed so that the first through-hole and the second through-hole are aligned relative to each other. Notching taking place near any of the through-holes in a dry etching process can be reduced, and thus, the through-holes can be formed accurately.

    Abstract translation: 一种用于静电透镜的电极，其中所述电极至少包括：具有第一通孔的第一基板和具有第二通孔的第二基板; 所述第一基板的厚度小于所述第二基板; 所述第一通孔的直径小于所述第二通孔; 所述第二基板具有小于所述第一基板的电阻率，其中所述第一基板和所述第二基板重叠，使得所述第一通孔和所述第二通孔相对于彼此对准。 可以减少在干蚀刻工艺中的任何通孔附近发生的凹陷，因此可以精确地形成通孔。

    FILM DEPOSITION METHOD
    40.
    发明申请
    FILM DEPOSITION METHOD 有权
    膜沉积法

    公开(公告)号：US20140370205A1

    公开(公告)日：2014-12-18

    申请号：US14475783

    申请日：2014-09-03

    Applicant: Tokyo Electron Limited

    Inventor： Hitoshi KATO ,  Hiroyuki KIKUCHI ,  Takeshi KUMAGAI

    IPC: C23C16/458 ,  H01J37/32 ,  C23C16/50

    CPC classification number: C23C16/4581 ,  C23C16/4405 ,  C23C16/4554 ,  C23C16/45551 ,  C23C16/4584 ,  C23C16/50 ,  H01J37/32458 ,  H01J37/32715 ,  H01J37/32733 ,  H01J37/32825 ,  H01J2237/032 ,  H01J2237/201 ,  H01J2237/20214 ,  H01J2237/332 ,  H01L21/0206

    Abstract: A film deposition method using a film deposition apparatus, includes: a film deposition process step in which at least a substrate is mounted on at least one of the circular concave portions and a film is deposited on the substrate; and a particle reducing process step performed before or after the film deposition process step, in which particles in the vacuum chamber are reduced without mounting substrates on the circular concave portions, the particle reducing process step including, a step of supplying a first gas to the vacuum chamber; a step of generating plasma from the first gas by supplying high frequency waves to a plasma generating device provided for the vacuum chamber; and a step of exposing the plurality of circular concave portions, on each of which a substrate is not mounted, to the plasma while rotating the susceptor.

    Abstract translation: 使用成膜装置的成膜方法包括：成膜工序，在至少一个所述圆形凹部上至少安装有基板，在所述基板上淀积薄膜; 以及在成膜处理工序之前或之后进行的粒子还原工序，其中真空室中的颗粒在不将基板安装在圆形凹部上的情况下减少，所述颗粒还原工艺步骤包括：将第一气体供应到 真空室; 通过向设置在真空室中的等离子体产生装置提供高频波而从第一气体产生等离子体的步骤; 以及在旋转所述基座的同时，将其中未安装基板的所述多个圆形凹部暴露于所述等离子体的步骤。

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