公开(公告)号：US20110079710A1

公开(公告)日：2011-04-07

申请号：US12599339

申请日：2008-05-09

Applicant: John Damiano, JR. ,  Stephen E. Mick ,  David P. Nackashi

Inventor： John Damiano, JR. ,  Stephen E. Mick ,  David P. Nackashi

IPC: G06K9/48 ,  G21K1/04 ,  H01L29/66

CPC classification number: H01J37/20 ,  H01J37/26 ,  H01J37/261 ,  H01J2237/188 ,  H01J2237/2001 ,  H01J2237/2002 ,  H01J2237/2003 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/2602 ,  H01J2237/28 ,  H01J2237/2802

Abstract: Electron microscope support structures and methods of making and using same. The support structures are generally constructed using semiconductor materials and semiconductor manufacturing processes. The temperature of the support structure may be controlled and/or gases or liquids may be confined in the observation region for reactions and/or imaging.

Abstract translation: 电子显微镜支撑结构及其制作和使用方法。 支撑结构通常使用半导体材料和半导体制造工艺构造。 可以控制支撑结构的温度和/或气体或液体被限制在观察区域中用于反应和/或成像。

公开(公告)号：US20100122901A1

公开(公告)日：2010-05-20

申请号：US12470689

申请日：2009-05-22

Applicant: Leonard M. Weinstein ,  Karen M. Taminger

Inventor： Leonard M. Weinstein ,  Karen M. Taminger

IPC: C23C14/34

CPC classification number: H01J37/16 ,  H01J37/18 ,  H01J2237/002 ,  H01J2237/006 ,  H01J2237/182 ,  H01J2237/188 ,  H01J2237/2002

Abstract: A system includes a collimated beam source within a vacuum chamber, a condensable barrier gas, cooling material, a pump, and isolation chambers cooled by the cooling material to condense the barrier gas. Pressure levels of each isolation chamber are substantially greater than in the vacuum chamber. Coaxially-aligned orifices connect a working chamber, the isolation chambers, and the vacuum chamber. The pump evacuates uncondensed barrier gas. The barrier gas blocks entry of atmospheric vapor from the working chamber into the isolation chambers, and undergoes supersonic flow expansion upon entering each isolation chamber. A method includes connecting the isolation chambers to the vacuum chamber, directing vapor to a boundary with the working chamber, and supersonically expanding the vapor as it enters the isolation chambers via the orifices. The vapor condenses in each isolation chamber using the cooling material, and uncondensed vapor is pumped out of the isolation chambers via the pump.

Abstract translation: 系统包括在真空室内的准直光束源，可冷凝阻挡气体，冷却材料，泵以及由冷却材料冷却以隔离阻挡气体的隔离室。 每个隔离室的压力水平基本上大于真空室中的压力水平。 同轴对齐的孔连接工作室，隔离室和真空室。 泵排出未凝结的阻挡气体。 阻挡气体阻止大气蒸气从工作室进入隔离室，并且在进入每个隔离室时经历超音速流动膨胀。 一种方法包括将隔离室连接到真空室，将蒸汽引导到与工作室的边界，以及当蒸气通过孔口进入隔离室时使其蒸气膨胀。 蒸汽在每个隔离室中使用冷却材料冷凝，未冷凝的蒸汽通过泵从隔离室泵出。

公开(公告)号：US20100108881A1

公开(公告)日：2010-05-06

申请号：US12264805

申请日：2008-11-04

Applicant: MILOS TOTH ,  Rae Knowles ,  William Ralph Knowles

Inventor： MILOS TOTH ,  Rae Knowles ,  William Ralph Knowles

IPC: G01N23/00 ,  G12B21/00

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/2002 ,  H01J2237/2444 ,  H01J2237/24445 ,  H01J2237/2449 ,  H01J2237/2605 ,  H01J2237/2802

Abstract: A scanning transmission electron microscope operated with the sample in a high pressure environment. A preferred detector uses gas amplification by converting either scattered or unscattered transmitted electrons to secondary electrons for efficient gas amplification.

Abstract translation: 扫描透射电子显微镜在高压环境下与样品一起操作。 优选的检测器通过将散射或未散射的透射电子转换成二次电子来进行气体放大，用于有效的气体放大。

公开(公告)号：US20090242795A1

公开(公告)日：2009-10-01

申请号：US12078223

申请日：2008-03-28

Applicant: Chih-Yu Chao

Inventor： Chih-Yu Chao

IPC: H01J37/20 ,  G21K5/10

CPC classification number: H01J37/20 ,  G01N1/42 ,  H01J2237/2001 ,  H01J2237/2002 ,  H01J2237/2003 ,  H01J2237/2004 ,  H01J2237/26

Abstract: The present invention relates to a cryo-charging specimen holder for the electron microscope, particularly to a cryo-charging specimen holder for the electron microscope to hold various biological materials. The major feature of the invention is to charge the biological specimen and freeze the specimen at low temperature. The ice around the biological sample is also doped, so that after charging the doped ice surrounding the sample has a conductivity level comparable to that of conductor. Therefore, the sample can be embedded by the doped and charged ice obtaining the property of conductor, in order to be observed by the electron microscope.

Abstract translation: 本发明涉及一种用于电子显微镜的低温充电试样架，特别涉及用于电子显微镜保持各种生物材料的低温充电试样架。 本发明的主要特征是对生物样品充电并在低温下冷冻试样。 生物样品周围的冰也被掺杂，因此在充电之后，样品周围的掺杂冰具有与导体相当的导电率。 因此，可以通过掺杂和充电的冰来嵌入样品，获得导体的性质，以便通过电子显微镜观察。

公开(公告)号：US20080308729A1

公开(公告)日：2008-12-18

申请号：US12216160

申请日：2008-06-30

Applicant: Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

Inventor： Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

IPC: G01N23/20

CPC classification number: H01J37/222 ,  G01N23/225 ,  G01N23/2251 ,  H01J37/06 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0216 ,  H01J2237/082 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2813 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L2224/48227 ,  H01L2924/01019 ,  H01L2924/01025 ,  H01L2924/01057 ,  H01L2924/01067 ,  H01L2924/01078 ,  H01L2924/10253 ,  H01L2924/12032 ,  H01L2924/3025 ,  H01L2924/00

Abstract: A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate “S” to be inspected into an inspection chamber 23-1; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26-1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20-1 and guiding it to a detecting system 35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU 37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.

Abstract translation: 本发明的基板检查装置1-1（图1）执行以下步骤：将要检查的基板“S”运送到检查室23-1中; 在所述检查室中保持真空; 将所述检查室与振动隔离; 通过具有至少一个自由度的平台26-1连续移动所述衬底; 照射具有指定宽度的电子束; 帮助所述电子束经由一次电子光学系统10-1到达所述衬底的表面; 通过二次电子光学系统20-1捕获从所述衬底发射的二次电子并将其引导到检测系统35-1; 基于由所述检测系统获得的二次电子束的检测信号，在图像处理系统中形成二次电子图像; 基于由所述图像处理系统形成的二次电子图像检测所述基板中的缺陷位置; 通过CPU37-1指示和/或存储所述衬底中的所述缺陷位置; 并将完全检查的基板从检查室中取出。 因此，可以以高水平的精度和效率以及更高的生产量连续地执行基板上的缺陷检查。

公开(公告)号：US20080041312A1

公开(公告)日：2008-02-21

申请号：US11889339

申请日：2007-08-10

Applicant: Shoichiro Matsuyama ,  Shinji Himori ,  Atsushi Matsuura

Inventor： Shoichiro Matsuyama ,  Shinji Himori ,  Atsushi Matsuura

IPC: C23C16/458

CPC classification number: C23C16/4586 ,  H01J37/20 ,  H01J37/32091 ,  H01J37/32706 ,  H01J2237/2002 ,  H01L21/6833 ,  H01L21/68757

Abstract: [Object]To provide a stage for plasma processing apparatus, the stage being capable of improving uniformity of electric field strength in a plasma so as to enhance an in-plane uniformity of a plasma process to a substrate, and to provide a plasma processing apparatus provided with this stage. [Means for Solving the Problem]A stage 3 for a plasma processing apparatus 2 comprises: a conductive member 31 connected to a radiofrequency power source, the conductive member serving as an electrode for generating a plasma and/or an electrode for drawing ions from a plasma; a dielectric layer 32 covering a central part of an upper surface of the conductive member, for making uniform a radiofrequency electric field applied to a plasma through a substrate to be processed wafer W) placed on the placing surface; and an electrostatic chuck 33 laminated on the dielectric layer 35, the electrostatic chuck having an electrode film embedded therein. The electrode film satisfies δ/z≧1,000 (z; a thickness of the electrode film 35, 6; a skin depth of the electrode film for the electrostatic chuck as to a radiofrequency power supplied from the radiofrequency power source).

Abstract translation: 为了提供等离子体处理装置的载物台，能够提高等离子体的电场强度的均匀性，从而提高等离子体处理对基板的面内均匀性，并且提供等离子体处理装置 提供这个阶段。 解决问题的手段等离子体处理装置2的阶段3包括：连接到射频电源的导电构件31，用作产生等离子体的电极的导电构件和/或用于从 等离子体; 覆盖导电部件的上表面的中心部分的电介质层32，用于使放置在放置面上的待处理晶片W的等离子体的射频电场均匀化; 以及层压在电介质层35上的静电卡盘33，其中嵌有电极膜的静电卡盘。 电极膜满足delta / z> = 1,000（z;电极膜35,6的厚度;静电卡盘的电极膜的表皮深度，从射频电源提供的射频电力）。

公开(公告)号：US20070257212A1

公开(公告)日：2007-11-08

申请号：US11418057

申请日：2006-05-05

Applicant: Blaise Mouttet

Inventor： Blaise Mouttet

IPC: H01J37/302

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/0635 ,  H01J2237/182 ,  H01J2237/2002 ,  H01J2237/30438 ,  H01J2237/31754 ,  H01J2237/31786

Abstract: An array of vertically aligned electron emitting nanotips such as multiwall carbon nanotubes are formed for use as a lithographic stamp. Crosswire addressing is used to generate electron emission from particular nanotips within the array. The nanotip array may be used to cure a resist, produce localized electrochemical reactions, establish localized electrostatic charge distributions, or perform other desirable coating or etching process steps so as to create nanoelectronic circuitry or to facilitate molecular or nanoscale processing.

Abstract translation: 形成垂直排列的电子发射纳米尖端的阵列，例如多壁碳纳米管，用作光刻印模。 交叉线寻址用于从阵列内的特定纳米尖端产生电子发射。 纳米尖端阵列可用于固化抗蚀剂，产生局部电化学反应，建立局部静电电荷分布，或执行其它所需的涂覆或蚀刻工艺步骤，以便产生纳米电子电路或促进分子或纳米级处理。

公开(公告)号：US06855929B2

公开(公告)日：2005-02-15

申请号：US09985324

申请日：2001-11-02

Applicant: Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

Inventor： Toshifumi Kimba ,  Tohru Satake ,  Tsutomu Karimata ,  Kenji Watanabe ,  Nobuharu Noji ,  Takeshi Murakami ,  Masahiro Hatakeyama ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Shoji Yoshikawa ,  Shin Oowada ,  Mutsumi Saito

IPC: G01N23/225 ,  G01Q30/02 ,  H01J37/06 ,  H01J37/073 ,  H01J37/18 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  G01N23/00 ,  G21K7/00

CPC classification number: H01J37/222 ,  G01N23/225 ,  G01N23/2251 ,  H01J37/06 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/0216 ,  H01J2237/082 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2813 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L2224/48227 ,  H01L2924/01019 ,  H01L2924/01025 ,  H01L2924/01057 ,  H01L2924/01067 ,  H01L2924/01078 ,  H01L2924/10253 ,  H01L2924/12032 ,  H01L2924/3025 ,  H01L2924/00

Abstract: A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate “S” to be inspected into an inspection chamber 23-1 maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26-1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20-1 and guiding it to a detecting system 35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU 37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.

Abstract translation: 本发明的基板检查装置1-1（图1）执行以下步骤：将要检查的基板“S”运送到在检查室中保持真空的检查室23-1中; 将所述检查室与振动隔离; 通过具有至少一个自由度的平台26-1连续移动所述衬底; 照射具有指定宽度的电子束; 帮助所述电子束经由一次电子光学系统10-1到达所述衬底的表面; 通过二次电子光学系统20-1捕获从所述衬底发射的二次电子并将其引导到检测系统35-1; 基于由所述检测系统获得的二次电子束的检测信号，在图像处理系统中形成二次电子图像; 基于由所述图像处理系统形成的二次电子图像检测所述基板中的缺陷位置; 通过CPU37-1指示和/或存储所述衬底中的所述缺陷位置; 并将完全检查的基板从检查室中取出。 因此，可以以高水平的精度和效率以及更高的生产量连续地执行基板上的缺陷检查。

公开(公告)号：US06677586B1

公开(公告)日：2004-01-13

申请号：US10272468

申请日：2002-10-08

Applicant: Mehran Nasser-Ghodsi ,  Michael Cull

Inventor： Mehran Nasser-Ghodsi ,  Michael Cull

IPC: G01N23225

CPC classification number: G01N1/32 ,  G01N23/225 ,  H01J37/28 ,  H01J2237/022 ,  H01J2237/2002 ,  H01J2237/2809 ,  H01J2237/2817

Abstract: Methods and apparatus are providing for inspecting a test sample. An electron beam is tuned to cause secondary electron emissions upon scanning a target area. Reactive substances are introduced to etch and remove materials and impurities from the scan target. Residual components are evacuated. In one example, a laser is used to irradiate and area to assist in the removal of residual components with poor vapor pressure.

公开(公告)号：US6130434A

公开(公告)日：2000-10-10

申请号：US316862

申请日：1999-05-21

Applicant: James A. Mitchell ,  Philip J. Palermo

Inventor： James A. Mitchell ,  Philip J. Palermo

IPC: G01Q30/04 ,  G01Q30/08 ,  H01J37/00 ,  H01J37/18 ,  H01J37/20 ,  H01J37/252 ,  H01J37/26 ,  H01J37/28

CPC classification number: G01N23/2204 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/2001 ,  H01J2237/2002 ,  H01J2237/2003 ,  H01J2237/2005 ,  H01J2237/204 ,  H01J2237/206 ,  H01J2237/2605

Abstract: A system is provided for imaging, in an ESE microscope or other variable pressure microscope, a single sample at various time intervals during dissolution of the sample in a liquid. The system includes a sample chamber having a sample well. The sample well includes an first fluid port and a second fluid port for forming a dissolution bath in the sample well. In accordance with the system according to the present invention, the sample chamber is placed into the specimen chamber of the ESE microscope and a sample is deposited into the sample well of the sample chamber. The sample is immersed in a liquid which flows through the sample well via the first and second fluid ports during a dissolution cycle. The liquid is then drained from the sample well via one of the first and second fluid ports during a draining cycle, and then, during an imaging cycle, the sample is imaged by the ESE microscope. The dissolution cycle, the draining cycle, and the imaging cycle all occur while the sample well is inside the specimen chamber of the ESE microscope.