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公开(公告)号：US20120200007A1
公开(公告)日：2012-08-09
申请号：US13449773
申请日：2012-04-18
Applicant: Marcus Straw , Milos Toth , Steven Randolph , Michael Lysaght , Mark Utlaut
Inventor： Marcus Straw , Milos Toth , Steven Randolph , Michael Lysaght , Mark Utlaut
IPC: B29C59/16
CPC classification number: G21G5/00 , B23K26/0624 , B23K26/0661 , B23K26/18 , B23K2101/40 , B23K2101/42 , G03F7/70383 , H01J37/228 , H01J2237/31749
Abstract: An improved method for substrate micromachining. Preferred embodiments of the present invention provide improved methods for the utilization of charged particle beam masking and laser ablation. A combination of the advantages of charged particle beam mask fabrication and ultra short pulse laser ablation are used to significantly reduce substrate processing time and improve lateral resolution and aspect ratio of features machined by laser ablation to preferably smaller than the diffraction limit of the machining laser.
Abstract translation: 一种改进的衬底微加工方法。 本发明的优选实施例提供了利用带电粒子束掩蔽和激光烧蚀的改进方法。 使用带电粒子束掩模制造和超短脉冲激光烧蚀的优点的组合来显着地减少基板处理时间，并且提高通过激光烧蚀加工的特征的横向分辨率和纵横比，优选小于加工激光器的衍射极限。
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公开(公告)号：US20120103945A1
公开(公告)日：2012-05-03
申请号：US13003513
申请日：2009-07-08
Applicant: Marcus Straw , David H. Narum , Milos Toth , Mark Utlaut , Guido Knippels , Gerardus Nicolaas Van Veen
Inventor： Marcus Straw , David H. Narum , Milos Toth , Mark Utlaut , Guido Knippels , Gerardus Nicolaas Van Veen
CPC classification number: B23K26/03 , B23K26/0622 , B23K26/0853 , B23K26/14 , B23K26/1423 , B23K26/348 , H01J2237/2813
Abstract: Laser processing is enhanced by using endpointing or by using a charged particle beam together with a laser. End-pointing uses emissions, such as photons, electrons, ions, or neutral particles, from the substrate to determine when the material under the laser has changed or is about to change. Material removed from the sample can be deflected to avoid deposition onto the laser optics.
Abstract translation: 激光加工通过使用终点或通过与激光一起使用带电粒子束来增强。 端点使用来自衬底的发射，例如光子，电子，离子或中性粒子，以确定激光下的材料何时已经改变或将要改变。 从样品中除去的材料可以偏转，以避免沉积到激光光学器件上。
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公开(公告)号：US20110031394A1
公开(公告)日：2011-02-10
申请号：US12525908
申请日：2008-02-06
Applicant: William Ralph Knowles , Rae Knowles , Milos Toth
Inventor： William Ralph Knowles , Rae Knowles , Milos Toth
IPC: G01N23/00
CPC classification number: H01J37/3056 , H01J37/301 , H01J2237/006 , H01J2237/188 , H01J2237/2003 , H01J2237/2605 , H01J2237/31732 , H01J2237/3174
Abstract: The current invention includes methods and apparatuses for processing, that is, altering and imaging, a sample in a high pressure charged particle beam system. Embodiments of the invention include a cell in which the sample is positioned during high pressure charged particle beam processing. The cell reduces the amount of gas required for processing, thereby allowing rapid introduction, exhaustion, and switching between gases and between processing and imaging modes. Maintaining the processes gases within the cell protects the sample chamber and column from contact with the gases. In some embodiments, the temperature of the cell walls and the sample can be controlled.
Abstract translation: 本发明包括用于处理的方法和装置，即改变和成像高压带电粒子束系统中的样品。 本发明的实施例包括其中样品在高压带电粒子束处理期间被定位的单元。 电池减少处理所需的气体量，从而允许气体之间以及处理和成像模式之间的快速引入，耗尽和切换。 维持过程中的气体保护样品室和色谱柱不与气体接触。 在一些实施方案中，可以控制细胞壁和样品的温度。
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公开(公告)号：US20100224592A1
公开(公告)日：2010-09-09
申请号：US12719619
申请日：2010-03-08
Applicant: MILOS TOTH , Richard J. Young , Alexander Henstra , Alan Frank de Jong , Johannes Jacobus Lambertus Mulders
Inventor： MILOS TOTH , Richard J. Young , Alexander Henstra , Alan Frank de Jong , Johannes Jacobus Lambertus Mulders
IPC: C23F1/00 , H01J37/10 , H01J37/147 , H01J37/305 , C23C16/44 , C23C14/22
CPC classification number: H01J37/3056 , B81C99/0095 , H01J37/045 , H01J37/302 , H01J2237/0432 , H01J2237/04756 , H01J2237/2001 , H01J2237/24535 , H01J2237/30472
Abstract: Electron-beam-induced chemical reactions with precursor gases are controlled by adsorbate depletion control. Adsorbate depletion can be controlled by controlling the beam current, preferably by rapidly blanking the beam, and by cooling the substrate. The beam preferably has a low energy to reduce the interaction volume. By controlling the depletion and the interaction volume, a user has the ability to produce precise shapes.
Abstract translation: 电子束诱导的与前体气体的化学反应是通过吸附物去除控制来控制的。 可以通过控制束电流来控制吸附物消耗，优选地通过快速消隐光束，以及通过冷却衬底来控制。 光束优选具有低能量以减小相互作用体积。 通过控制耗尽和相互作用体积，用户具有产生精确形状的能力。
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公开(公告)号：US07791020B2
公开(公告)日：2010-09-07
申请号：US12059850
申请日：2008-03-31
Applicant: Marek Uncovsky , Milos Toth , William Ralph Knowles
Inventor： Marek Uncovsky , Milos Toth , William Ralph Knowles
IPC: H01J37/244 , H01J37/28 , H01J37/252
CPC classification number: H01J37/244 , H01J37/28 , H01J47/06 , H01J2237/24445 , H01J2237/2448 , H01J2237/2605
Abstract: A novel detector for a charged particle beam system which includes multiple gas amplification stages. The stages are typically defined by conductors to which voltage are applied relative to the sample or to a previous stage. By creating cascades of secondary electrons in multiple stages, the gain can be increased without causing dielectric breakdown of the gas.
Abstract translation: 一种用于带电粒子束系统的新型检测器，其包括多个气体放大级。 这些级通常由相对于样品施加电压的导体或前一级定义。 通过在多级中产生二级电子级联，可以增加增益，而不会导致气体的介质击穿。
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Patent Agency Ranking
公开(公告)号：US20080035861A1
公开(公告)日：2008-02-14
申请号：US11731743
申请日：2007-03-30
Applicant: William Knowles , Milos Toth
Inventor： William Knowles , Milos Toth
IPC: A61N5/00
CPC classification number: G01N23/225 , H01J37/244 , H01J37/28 , H01J2237/2003 , H01J2237/2449 , H01J2237/2608
Abstract: A detector for use with a high pressure SEM, such as an ESEM® environmental SEM from FEI Company, extends the effective detection space above the PLA, thereby increasing secondary signal amplification without increasing working distance or pressure. Embodiments can therefore provide improved resolution and can operate at lower gas pressures.
Abstract translation: 用于高压SEM的检测器，如来自FEI公司的ESEM环境SEM，扩展了PLA上方的有效检测空间，从而在不增加工作距离或压力的情况下增加了二次信号放大。 因此，实施例可以提供改进的分辨率并且可以在较低的气体压力下
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公开(公告)号：US20130068611A1
公开(公告)日：2013-03-21
申请号：US13236587
申请日：2011-09-19
Applicant: Aurelien Philippe Jean Maclou Botman , Milos Toth , Steven Randolph , David H. Narum
Inventor： Aurelien Philippe Jean Maclou Botman , Milos Toth , Steven Randolph , David H. Narum
IPC: C23C14/46
CPC classification number: H01J37/20 , C25D5/003 , C25D5/02 , C25D5/026 , C25D5/04 , C25D17/005 , C25D17/10 , C25D17/12 , C25D21/04 , C25D21/12 , H01J37/18 , H01J37/222 , H01J37/28 , H01J2237/182 , H01J2237/2003 , H01J2237/202 , H01J2237/2801
Abstract: A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.
Abstract translation: 电荷转移机构用于局部沉积或去除小结构的材料。 产生局部电化学电池，而不必将整个工件浸入浴中。 电荷转移机构可以与带电粒子束或激光系统一起使用以修改小结构，例如集成电路或微机电系统。 电荷转移过程可以在空气中或在一些实施方案中在真空室中进行。
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公开(公告)号：US08357894B2
公开(公告)日：2013-01-22
申请号：US12853998
申请日：2010-08-10
Applicant: Milos Toth , Michael R. Scheinfein , Eric Silver , David Narum
Inventor： Milos Toth , Michael R. Scheinfein , Eric Silver , David Narum
IPC: G21K5/04
CPC classification number: G01N23/20033 , H01J37/244 , H01J37/256 , H01J2237/2442
Abstract: An improved microcalorimeter-type energy dispersive x-ray spectrometer provides sufficient energy resolution and throughput for practical high spatial resolution x-ray mapping of a sample at low electron beam energies. When used with a dual beam system that provides the capability to etch a layer from the sample, the system can be used for three-dimensional x-ray mapping. A preferred system uses an x-ray optic having a wide-angle opening to increase the fraction of x-rays leaving the sample that impinge on the detector and multiple detectors to avoid pulse pile up.
Abstract translation: 改进的微量热计式能量色散X射线光谱仪为低电子束能量下样品的实际高空间分辨率X射线成像提供了足够的能量分辨率和通量。 当与提供从样品中蚀刻层的能力的双光束系统一起使用时，该系统可用于三维x射线映射。 优选的系统使用具有广角开口的x射线光学器件来增加离开检测器的样品的X射线的分数，以及多个检测器以避免脉冲堆积。
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公开(公告)号：US08303833B2
公开(公告)日：2012-11-06
申请号：US11766680
申请日：2007-06-21
Applicant: Milos Toth , Noel Smith
Inventor： Milos Toth , Noel Smith
CPC classification number: B05C21/005 , B81C1/00531 , B81C2201/0132 , B81C2201/0143 , H01J37/3053 , H01J37/317 , H01J2237/3174 , H01J2237/31744 , H01J2237/31749
Abstract: A method for fabrication of microscopic structures that uses a beam process, such as beam-induced decomposition of a precursor, to deposit a mask in a precise pattern and then a selective, plasma beam is applied, comprising the steps of first creating a protective mask upon surface portions of a substrate using a beam process such as an electron beam, focused ion beam (FIB), or laser process, and secondly etching unmasked substrate portions using a selective plasma beam etch process. Optionally, a third step comprising the removal of the protective mask may be performed with a second, materially oppositely selective plasma beam process.
Abstract translation: 一种用于制造微结构的方法，其中使用诸如光束引发的前体分解的光束过程，以精确图案沉积掩模，然后选择性等离子体束，包括以下步骤：首先产生保护掩模 使用诸如电子束，聚焦离子束（FIB）或激光工艺的光束过程在衬底的表面部分上，并且其次使用选择性等离子体束蚀刻工艺来蚀刻未掩模的衬底部分。 可选地，包括去除保护掩模的第三步骤可以用第二种，实质上相对地选择的等离子体束工艺进行。
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公开(公告)号：US08299432B2
公开(公告)日：2012-10-30
申请号：US12264805
申请日：2008-11-04
Applicant: Milos Toth , William Ralph Knowles , Rae Knowles, legal representative
Inventor： Milos Toth , William Ralph Knowles
IPC: G01N23/00
CPC classification number: H01J37/244 , H01J37/28 , H01J2237/2002 , H01J2237/2444 , H01J2237/24445 , H01J2237/2449 , H01J2237/2605 , H01J2237/2802
Abstract: A scanning transmission electron microscope operated with the sample in a high pressure environment. A preferred detector uses gas amplification by converting either scattered or unscattered transmitted electrons to secondary electrons for efficient gas amplification.
Abstract translation: 扫描透射电子显微镜在高压环境下与样品一起操作。 优选的检测器通过将散射或未散射的透射电子转换成二次电子来进行气体放大，用于有效的气体放大。
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