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公开(公告)号：US20100102227A1
公开(公告)日：2010-04-29
申请号：US12257304
申请日：2008-10-23
Applicant: ZHONGWEI CHEN , WEIMING REN , JOE WANG , XUEDONG LIU , JUYING DOU , FUMIN HE , FENG CAO , YAN REN , XIAOLI GUO , WEI HE , QINGPO XI
Inventor： ZHONGWEI CHEN , WEIMING REN , JOE WANG , XUEDONG LIU , JUYING DOU , FUMIN HE , FENG CAO , YAN REN , XIAOLI GUO , WEI HE , QINGPO XI
CPC classification number: H01J37/073 , H01J37/244 , H01J37/28 , H01J2237/06341 , H01J2237/24592
Abstract: The present invention relates to a charged particle beam apparatus which employs a scanning electron microscope for sample inspection and defect review.The present invent provides solution of improving imaging resolution by utilizing a field emission cathode tip with a large tip radius, applying a large accelerating voltage across ground potential between the cathode and anode, positioning the beam limit aperture before condenser lens, utilizing condenser lens excitation current to optimize image resolution, applying a high tube bias to shorten electron travel time, adopting and modifying SORIL objective lens to ameliorate aberration at large field of view and under electric drifting and reduce the urgency of water cooling objective lens while operating material analysis.The present invent provides solution of improving throughput by utilizing fast scanning ability of SORIL and providing a large voltage difference between sample and detectors.
Abstract translation: 本发明涉及采用扫描电子显微镜进行样品检查和缺陷检查的带电粒子束装置。 本发明提供了通过利用具有大的尖端半径的场致发射阴极尖端来提高成像分辨率的解决方案，在阴极和阳极之间的地电位上施加大的加速电压，将光束极限孔定位在聚光透镜之前，利用聚光透镜激发电流 优化图像分辨率，应用高管偏压缩短电子行进时间，采用和修正SORIL物镜，以改善大视野和电漂移下的像差，并减少水冷物镜在操作材料分析时的紧迫性。 本发明提供了通过利用SORIL的快速扫描能力并在样品和检测器之间提供大的电压差来提高产量的解决方案。
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公开(公告)号：US07414249B2
公开(公告)日：2008-08-19
申请号：US11289863
申请日：2005-11-30
Applicant: Kenneth H. Purser , Norman L. Turner
Inventor： Kenneth H. Purser , Norman L. Turner
CPC classification number: H01J37/05 , H01J37/1472 , H01J37/3171 , H01J2237/055 , H01J2237/057 , H01J2237/152 , H01J2237/31701
Abstract: A method and apparatus satisfying growing demands for improving the intensity of implanting ions that impact a semiconductor wafer as it passes under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes for combating the disruptive effects of ion-beam induced space-charge forces. The design of the novel optical elements makes possible: (1) Focusing of a ribbon ion beam as the beam passes through uniform or non-uniform magnetic fields; (2) Reduction of the losses of ions comprising a d.c. ribbon beam to the magnetic poles when a ribbon beam is deflected by a magnetic field.
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公开(公告)号：US4380703A
公开(公告)日：1983-04-19
申请号：US183946
申请日：1980-09-04
Applicant: Reinhold Schmitt
Inventor： Reinhold Schmitt
IPC: H01J37/147 , G21K1/093 , H01J37/24 , H01J37/305 , H01L21/027 , H03K6/02 , H01J3/20
Abstract: In an exemplary embodiment, a command value signal is supplied to a magnetic deflection control loop which operates based on measurement of deflection coil current. A signal proportional to the rate of change of deflection magnetic field is supplied to one input of a differential amplifier, and a signal in accordance with the rate of change of the command value signal is connected with a second input of the differential amplifier. Any error between the rate of change signals as sensed by the differential amplifier is used as an auxiliary control of the deflection magnetic field, whereby eddy current influences are overcome. The system is particularly useful for precision control of an electron beam writer in the manufacture of semiconductor integrated circuits.
Abstract translation: 在示例性实施例中，指令值信号被提供给基于偏转线圈电流的测量而工作的磁偏转控制回路。 与偏转磁场的变化率成比例的信号被提供给差分放大器的一个输入，并且根据指令值信号的变化率的信号与差分放大器的第二输入端相连。 由差分放大器感测到的变化率信号之间的任何误差被用作偏转磁场的辅助控制，从而克服了涡流影响。 该系统在半导体集成电路的制造中对电子束写入器的精确控制特别有用。
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公开(公告)号：US3594207A
公开(公告)日：1971-07-20
申请号：US3594207D
申请日：1969-05-01
Applicant: FORD MOTOR CO
Inventor： ALLIE WILLIAM JR , MARSH RICHARD H
CPC classification number: C09K11/7701 , H01J9/2271
Abstract: THIS INVENTION RELATES TO A PROCESS FOR THE PREPARATION OF THE ACTIVE FACE OF A CATHODE RAY TUBE EMPLOYING AS THE PHOSPHOR EUROPIUM DOPED YTTRIUM OXIDE OR GADOLINIUM OXIDE. THE YTTRIUM OXIDE OR GADOLINIUM OXIDE IS PROTECTED DURING MANUFACTURE BY A FLUORIDE COATING DEPOSITED FROM A BUFFERED SUSPENSION.
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公开(公告)号：US3506870A
公开(公告)日：1970-04-14
申请号：US3506870D
申请日：1968-03-27
Applicant: MACHLETT LAB INC
Inventor： SINGER BARRY M , JOHNSON CARL T
CPC classification number: H01J21/18 , H01J19/34 , H01J2893/0003
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Patent Agency Ranking46.发明授权
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公开(公告)号：US20220068589A1
公开(公告)日：2022-03-03
申请号：US17383353
申请日：2021-07-22
Applicant: ASML Netherlands B.V.
Inventor： Shuai LI
IPC: H01J37/143 , H01J37/28 , H01J3/20 , H01J37/063 , H01J37/065 , H01J37/14 , H01J37/09
Abstract: This invention provides a charged particle source, which comprises an emitter and means fo generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.
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公开(公告)号：US10468227B2
公开(公告)日：2019-11-05
申请号：US16042871
申请日：2018-07-23
Applicant: Hermes Microvision, Inc.
Inventor： Shuai Li
IPC: H01J37/143 , H01J37/28 , H01J3/20 , H01J37/063 , H01J37/065 , H01J37/14 , H01J37/09
Abstract: This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.
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公开(公告)号：US20190057833A1
公开(公告)日：2019-02-21
申请号：US16042871
申请日：2018-07-23
Applicant: Hermes Microvision, Inc.
Inventor： Shuai LI
IPC: H01J37/143 , H01J37/28 , H01J37/09 , H01J3/20 , H01J37/065 , H01J37/14 , H01J37/063
CPC classification number: H01J37/143 , H01J3/20 , H01J37/063 , H01J37/065 , H01J37/09 , H01J37/14 , H01J37/28 , H01J2237/0453 , H01J2237/063 , H01J2237/06308 , H01J2237/06375 , H01J2237/0653 , H01J2237/083 , H01J2237/141 , H01J2237/1415 , H01J2237/2806 , H01J2237/2817
Abstract: This invention provides a charged particle source, which comprises an emitter and means fo generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.
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公开(公告)号：US09812283B2
公开(公告)日：2017-11-07
申请号：US15404440
申请日：2017-01-12
Applicant: Hermes Microvision Inc.
Inventor： Shuai Li
IPC: H01J37/143 , H01J37/28 , H01J3/20 , H01J37/09
CPC classification number: H01J37/143 , H01J3/20 , H01J37/063 , H01J37/065 , H01J37/09 , H01J37/14 , H01J37/28 , H01J2237/0453 , H01J2237/063 , H01J2237/06308 , H01J2237/06375 , H01J2237/0653 , H01J2237/083 , H01J2237/141 , H01J2237/1415 , H01J2237/2806 , H01J2237/2817
Abstract: This invention provides a charged particle source, which comprises an emitter and means of generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.
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