公开(公告)号：US11810753B2

公开(公告)日：2023-11-07

申请号：US17500842

申请日：2021-10-13

Applicant: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

Inventor： Dominik Ehberger ,  John Breuer ,  Matthias Firnkes

IPC: H01J37/244 ,  H01J37/22 ,  H01J37/153 ,  G06T7/00 ,  H01J37/10

CPC classification number: H01J37/244 ,  G06T7/0002 ,  H01J37/153 ,  H01J37/222 ,  G06T2207/10061 ,  G06T2207/10148 ,  H01J37/10 ,  H01J2237/24578

Abstract: A method of determining aberrations of a charged particle beam (11) focused by a focusing lens (120) toward a sample (10) in a charged particle beam system is described. The method includes: (a) taking one or more images of the sample at one or more defocus settings to provide one or more taken images (h1...N); (b) simulating one or more images of the sample taken at the one or more defocus settings based on a set of beam aberration coefficients (iC) and a focus image of the sample to provide one or more simulated images; (c) comparing the one or more taken images and the one or more simulated images for determining a magnitude (Ri) of a difference therebetween; and (d) varying the set of beam aberration coefficients (iC) to provide an updated set of beam aberration coefficients (i+1C) and repeating (b) and (c) using the updated set of beam aberration coefficients (i+1C) in an iterative process for minimizing said magnitude (Ri). Alternatively, in (b), one or more beam cross sections may be simulated, and, in (c) the simulated beam cross sections may be compared with one or more retrieved beam cross sections retrieved from the one or more taken images for determining a magnitude (Ri) of a difference therebetween. Further, a charged particle beam system for imaging and/or inspecting a sample that is configured for any of such methods is provided.

公开(公告)号：US20230343549A1

公开(公告)日：2023-10-26

申请号：US18027191

申请日：2021-10-26

Applicant: Hitachi High-Tech Corporation

Inventor： Masahiro FUKUTA ,  Tomoyo SASAKI ,  Makoto SUZUKI ,  Masashi WADA ,  Hiroshi NISHIHAMA

IPC: H01J37/147 ,  G01N23/2251 ,  H01J37/10 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/244 ,  G01N23/2251 ,  H01J37/10 ,  H01J37/1474 ,  H01J37/28 ,  G01N2223/505 ,  H01J2237/0492 ,  H01J2237/2443 ,  H01J2237/24495

Abstract: The present invention overcomes a trade-off between throughput, SNR, and spatial resolution in a charged particle beam device. Accordingly, a computer 18 sets at least one of a charged particle optical system and a detection system so as to modulate the intensity of signal charged particles or an electromagnetic wave detected by a detector 12 at a prescribed frequency. The charged particle optical system scans a specimen with a charged particle beam. The computer 18 generates an image or a signal profile by associating an irradiation position of the charged particle beam with a DC component of a signal acquired through synchronous detection of a detection signal from the detector at the irradiation position with a reference signal having a prescribed frequency.

公开(公告)号：US20230290605A1

公开(公告)日：2023-09-14

申请号：US18020989

申请日：2021-06-09

Applicant: HAMAMATSU PHOTONICS K.K. ,  NuFlare Technology, Inc.

Inventor： Tomohiko HIRANO ,  Hiroyuki TAKETOMI ,  Motohiro SUYAMA ,  Wataru MATSUDAIRA ,  Akihiro KAGEYAMA ,  Kota IWASAKI ,  Taku YAMADA

IPC: H01J37/06 ,  H01J37/10

CPC classification number: H01J37/06 ,  H01J37/10 ,  H01J2237/026

Abstract: A photoelectric surface electron source includes a glass substrate configured to receive laser light incident from a substrate back surface to emit the laser light from a substrate main surface, a photoelectric surface provided on the substrate main surface and configured to receive the laser light and emit a photoelectron, a lens array disposed on the substrate back surface and including a plurality of microlenses for condensing the laser light toward the photoelectric surface, and a light shielding portion provided on the glass substrate. The light shielding portion has a back surface-side light shielding layer provided on a back surface-side light shielding surface interposed between the plurality of microlenses on the substrate back surface, and a main surface-side light shielding layer provided on a main surface-side light shielding surface.

公开(公告)号：US11742176B2

公开(公告)日：2023-08-29

申请号：US17536288

申请日：2021-11-29

Applicant: JEOL Ltd.

Inventor： Kazuki Yagi ,  Yoshiki Oyama

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/26 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/147 ,  H01J37/265 ,  H01J2237/2802

Abstract: A transmission electron microscope includes a control unit that: determines an excitation amount of a second illumination system lens based on an excitation amount of first illumination system lens such that the second illumination system lens satisfies a first optical condition; and determines a control amount of a first deflector and a control amount of a second deflector based on the excitation amount of the second illumination system lens such that the first deflector and the second deflector satisfy a second optical condition. The first optical condition is for a convergence angle of the electron beam to be constant even if the excitation amount of the first illumination system lens has changed, and the second optical condition is for an illuminating position of the electron beam and an illuminating angle of the electron beam to be constant even if the excitation amount of the first illumination system lens has changed.

公开(公告)号：US11740546B2

公开(公告)日：2023-08-29

申请号：US17653665

申请日：2022-03-07

Applicant: NuFlare Technology, Inc.

Inventor： Tsubasa Nanao ,  Hiroshi Matsumoto

IPC: H01J37/302 ,  H01J37/317 ,  H01J37/10 ,  G03F1/20 ,  G03F7/00

CPC classification number: G03F1/20 ,  G03F7/70641 ,  H01J37/10 ,  H01J37/302 ,  H01J37/3177 ,  H01J2237/1532 ,  H01J2237/21

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes an objective lens adjusting focus positions of multiple beams, an astigmatism correction element correcting astigmatism of the multiple beams, an inspection aperture allowing one of the multiple beams to pass therethrough, a deflector deflecting the multiple beams and causing the multiple beams to scan over the inspection aperture, a current detector detecting beam currents of the individual multiple beams after passing through the inspection aperture, a beam image formation unit forming a beam image based on the detected beam currents, a feature amount calculation unit generating a first waveform and a second waveform by adding brightnesses of the beam image in a first direction and in a second direction, and calculating a first and a second feature amounts from the first and the second waveforms, and a parameter calculation unit calculating an exciting parameter that is to be set for the astigmatism correction element based on the first feature amount and the second feature amount.

公开(公告)号：US20230241650A1

公开(公告)日：2023-08-03

申请号：US18079071

申请日：2022-12-12

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Andreas Schmaunz ,  Gero Walter ,  Bernd Stenke ,  Gerald Schmid

IPC: B08B5/00 ,  H01J37/10 ,  H01J37/244 ,  H01J37/28

CPC classification number: B08B5/00 ,  H01J37/10 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/2448 ,  H01J2237/24475 ,  H01J2237/024 ,  F16K31/06

Abstract: A gas feed device includes a feed unit that feeds a gaseous state of a first precursor and/or a gaseous state of a second precursor, a first line device that conducts the gaseous state of the first precursor to the feed unit and a second line device that conducts the gaseous state of the second precursor to the feed unit. A first valve is arranged between the first line device and the feed unit. A second valve is arranged between the second line device and the feed unit. A control valve is connected to the first valve and is arranged between the first valve and the feed unit. The control valve is connected to the second valve and is arranged between the second valve and the feed unit. The first valve, the second valve and/or the control valve may be magnetic valve(s).

公开(公告)号：US11705304B2

公开(公告)日：2023-07-18

申请号：US17373716

申请日：2021-07-12

Applicant: ASML Netherlands B.V.

Inventor： Shuai Li ,  Weiming Ren ,  Xuedong Liu ,  Juying Dou ,  Xuerang Hu ,  Zhongwei Chen

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/20 ,  H01J37/244

CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/20 ,  H01J37/244 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/04924 ,  H01J2237/04926 ,  H01J2237/04928 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.

公开(公告)号：US20190196070A1

公开(公告)日：2019-06-27

申请号：US16094839

申请日：2017-04-06

Applicant: RIKEN

Inventor： Ken HARADA ,  Keiko SHIMADA ,  Kodai NIITSU

IPC: G02B5/18 ,  H01J37/244 ,  H01J37/20 ,  H01J37/10 ,  H01J37/26

CPC classification number: G02B5/1876 ,  G01N23/04 ,  G02B5/18 ,  H01J37/10 ,  H01J37/20 ,  H01J37/244 ,  H01J37/26 ,  H01J37/295 ,  H01J2237/2482

Abstract: The density difference of particle beam irradiation with two optical statuses is produced utilizing a diffraction effect, within the same field of vision, such that a diffraction grating manufactured with a material which passes through a particle beam is provided on the upper side of a specimen and on the lower side of the irradiation optical system. Further, a region wider than the opening region of the diffraction grating is irradiated with the particle beam to produce the density difference of the particle beam emitted to the specimen , by superposing the particle beam, Bragg-diffracted with the opening region , and the particle beam, transmitted through the outer peripheral part of the opening region without being diffracted, with each other, and emitting the beam to the specimen .

公开(公告)号：US20180337019A1

公开(公告)日：2018-11-22

申请号：US15824047

申请日：2017-11-28

Applicant: JEOL Ltd.

Inventor： Ryusuke Sagawa

IPC: H01J37/28 ,  H01J37/26 ,  H01J37/147 ,  H01J37/10 ,  H01J37/244

CPC classification number: H01J37/28 ,  G01N23/20058 ,  G01N2223/0565 ,  G01N2223/102 ,  G01N2223/3302 ,  G01N2223/418 ,  H01J37/10 ,  H01J37/1475 ,  H01J37/1477 ,  H01J37/244 ,  H01J37/265 ,  H01J2237/2446 ,  H01J2237/2802 ,  H01J2237/2803

Abstract: There is provided a scanning transmission electron microscope capable of producing plural types of STEM (scanning transmission electron microscopy) images using a single detector. The electron microscope (100) has an electron source (10) emitting an electron beam, a scanning deflector (13) for scanning the beam over a sample (S), an objective lens (14) for focusing the beam, an imager (22) placed at a back focal plane of the objective lens (14) or at a plane conjugate with the back focal plane, and a scanned image generator (40) for generating scanned images on the basis of images captured by the imager. The scanned image generator (40) operates to form electron diffraction patterns from the electron beam passing through positions on the sample by the scanning of the electron beam, to capture the electron diffraction patterns by the imager so that plural images are produced, to integrate the intensity of each pixel over an integration region that is set based on the size of an image of a transmitted wave in a respective one of the produced images for each of the produced images such that the signal intensity at each position on the sample is found, and to generate the scanned images on the basis of the signal intensities at the positions on the sample.

公开(公告)号：US20180076002A1

公开(公告)日：2018-03-15

申请号：US15719820

申请日：2017-09-29

Applicant: NuFlare Technology, Inc.

Inventor： Takahito NAKAYAMA ,  Takanao Touya

IPC: H01J37/04 ,  B82Y40/00 ,  H01J37/317 ,  B82Y10/00 ,  H01J37/10

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/10 ,  H01J37/3174 ,  H01J2237/30461 ,  H01J2237/31776

Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.