Charged particle beam radiation apparatus
    61.
    发明授权
    Charged particle beam radiation apparatus 有权
    带电粒子束辐射装置

    公开(公告)号:US08803411B2

    公开(公告)日:2014-08-12

    申请号:US13812700

    申请日:2011-06-15

    Abstract: In an accelerating tube which uses a conductive insulator, there is a possibility that the dopant concentration on a surface of the conductive insulator becomes non-uniform so that the surface resistance of the conductive insulator becomes non-uniform. Accordingly, a circumferential groove is formed on the inner surface of the conductive insulator accelerating tube in plural stages, and metal is metalized along inner portions of the grooves. When the resistance of a specific portion on the surface of the accelerating tube differs from the resistance of an area around the specific portion, the potential of the metalized region on the inner surface of the accelerating tube becomes a fixed value and hence, the potential distribution on the inner surface of the accelerating tube in the vertical direction can be maintained substantially equal without regard to the circumferential direction.

    Abstract translation: 在使用导电绝缘体的加速管中,导电绝缘体的表面上的掺杂剂浓度有可能变得不均匀,使得导电绝缘体的表面电阻变得不均匀。 因此,在导电绝缘体加速管的内表面上形成有多个周向槽,并且金属沿着槽的内部被金属化。 当加速管表面上的特定部分的电阻与特定部分周围的区域的电阻不同时,加速管内表面上的金属化区域的电位变为固定值,因此电位分布 在加速管的内表面上,在垂直方向上可以保持基本上相等于圆周方向。

    OZONE AND PLASMA GENERATION USING ELECTRON BEAM TECHNOLOGY
    62.
    发明申请
    OZONE AND PLASMA GENERATION USING ELECTRON BEAM TECHNOLOGY 审中-公开
    使用电子束技术的臭氧和等离子体生成

    公开(公告)号:US20130284587A1

    公开(公告)日:2013-10-31

    申请号:US13993594

    申请日:2011-12-16

    Applicant: Kaveh Bakhtari

    Inventor: Kaveh Bakhtari

    Abstract: This invention proposes, among other things, systems and methods for providing ozone generators or plasma generators that generate an electric field in an electron generation chamber that is separate from a reaction chamber. An electron beam emitter in an electron generation chamber is configured to emit a beam of electrons and is separated from the reaction chamber by an electron permeable barrier that provides a window through which the beam of electrons passes. The electrons are accelerated to the required energy in the electron generation chamber and transmitted through the barrier to the reaction chamber, where an input gas source introduces an input gas into the reaction chamber. The input gas may react with the beam of electrons inside the reaction chamber to form an output gas comprising a plasma or a concentration of ozone, and the output gas passes from the reaction chamber to a wafer processing chamber.

    Abstract translation: 本发明尤其提出了用于提供在与反应室分离的电子发生室中产生电场的臭氧发生器或等离子体发生器的系统和方法。 电子发生室中的电子束发射器被配置为发射电子束,并且通过电子可透过屏障与反应室分离,所述电子透过屏障提供电子束通过的窗口。 电子被加速到电子发生室中所需的能量,并通过势垒传递到反应室,其中输入气体源将输入气体引入反应室。 输入气体可以与反应室内的电子束反应形成包含等离子体或浓度的臭氧的输出气体,并且输出气体从反应室通到晶片处理室。

    ION IMPLANTATION WITH CHARGE AND DIRECTION CONTROL
    63.
    发明申请
    ION IMPLANTATION WITH CHARGE AND DIRECTION CONTROL 有权
    离子植入与充电和方向控制

    公开(公告)号:US20130140987A1

    公开(公告)日:2013-06-06

    申请号:US13308614

    申请日:2011-12-01

    Abstract: The present disclosure provides for various advantageous methods and apparatus of controlling electron emission. One of the broader forms of the present disclosure involves an electron emission element, comprising an electron emitter including an electron emission region disposed between a gate electrode and a cathode electrode. An anode is disposed above the electron emission region, and a voltage set is disposed above the anode. A first voltage applied between the gate electrode and the cathode electrode controls a quantity of electrons generated from the electron emission region. A second voltage applied to the anode extracts generated electrons. A third voltage applied to the voltage set controls a direction of electrons extracted through the anode.

    Abstract translation: 本公开提供了控制电子发射的各种有利的方法和装置。 本公开的更广泛形式之一涉及电子发射元件,其包括电子发射器,其包括设置在栅电极和阴极之间的电子发射区。 阳极设置在电子发射区域的上方,并且在阳极上设置电压组。 施加在栅电极和阴极之间的第一电压控制从电子发射区产生的电子量。 施加到阳极的第二电压提取产生的电子。 施加到电压组的第三电压控制通过阳极提取的电子的方向。

    Electron beam exposure system
    64.
    再颁专利
    Electron beam exposure system 有权
    电子束曝光系统

    公开(公告)号:USRE44240E1

    公开(公告)日:2013-05-28

    申请号:US12189817

    申请日:2008-08-12

    Abstract: The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising: a beamlet generator for generating a plurality of electron beamlets; a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet; a controller, connected to the modulation array for individually controlling the modulators, an adjustor, operationally connected to each modulator, for individually adjusting the control signal of each modulator; a focusing electron optical system comprising an array of electrostatic lenses wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, and a target holder for holding a target with its exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical system.

    Abstract translation: 本发明涉及一种用于将图案转印到目标表面上的电子束曝光装置,包括:用于产生多个电子束的小波发生器; 用于接收所述多个电子子束的调制阵列,包括用于调制电子束的强度的多个调制器; 连接到用于单独控制调制器的调制阵列的控制器,可操作地连接到每个调制器的调节器,用于单独调整每个调制器的控制信号; 一种聚焦电子光学系统,包括静电透镜阵列,其中每个透镜将由所述调制阵列传输的相应单独的子束聚焦成小于300nm的横截面,以及用于将其曝光表面保持在其上的靶保持器 其图案将在聚焦电子光学系统的第一焦平面中转印。

    Electron source for linear accelerators
    65.
    发明申请
    Electron source for linear accelerators 审中-公开
    线性加速器的电子源

    公开(公告)号:US20120229024A1

    公开(公告)日:2012-09-13

    申请号:US13045124

    申请日:2011-03-10

    CPC classification number: H01J25/34 H01J3/02 H01J23/075 H05H9/048 H05H2007/084

    Abstract: The present invention provides an electron gun comprising a cathode, for generating electrons; an anode; an intermediate electrode, located between the cathode and the anode; and a controller. The controller applies an electrical potential to said intermediate electrode, analysing a resultant electrical parameter to determine the integrity of said intermediate electrode; and controls the electron gun to emit a pulse of electrons.

    Abstract translation: 本发明提供一种电子枪,其包括用于产生电子的阴极; 阳极; 位于阴极和阳极之间的中间电极; 和控制器。 控制器向所述中间电极施加电势,分析所得的电参数以确定所述中间电极的完整性; 并控制电子枪发射电子脉冲。

    ELECTRON BEAM GENERATING APPARATUS
    66.
    发明申请
    ELECTRON BEAM GENERATING APPARATUS 有权
    电子束发生装置

    公开(公告)号:US20120133281A1

    公开(公告)日:2012-05-31

    申请号:US13122109

    申请日:2010-08-10

    CPC classification number: H01J3/02

    Abstract: An apparatus for generating an electron beam is disclosed to reduce emittance of an electron beam. The apparatus includes: a housing including a rear portion where an electron beam is generated, a front portion having an electron beam discharge hole for discharging the electron beam to the exterior, and a side portion connecting the rear portion and the front portion, the side portion having a first hole and an opposite side portion, facing the first hole, having a second hole in order to reduce asymmetry of an electric field caused by the first hole; and a waveguide installed on the side portion to supply an electromagnetic wave to the interior of the housing through the first hole, wherein the electron beam is generated by laser incident to the interior of the housing and accelerated by the electromagnetic wave supplied to the interior of the housing.

    Abstract translation: 公开了一种用于产生电子束的装置,以减少电子束的发射。 该装置包括:壳体,其包括产生电子束的后部,具有用于将电子束排出到外部的电子束排出孔的前部和连接后部和前部的侧部, 具有第一孔和与第一孔相对的相对侧部的部分具有第二孔,以减少由第一孔引起的电场的不对称性; 以及安装在所述侧部上的波导,以通过所述第一孔向所述壳体的内部提供电磁波,其中所述电子束通过入射到所述壳体的内部的激光产生并且被提供给所述壳体内部的电磁波加速 住房。

    NON-AXISYMMETRIC CHARGED-PARTICLE BEAM SYSTEM
    67.
    发明申请
    NON-AXISYMMETRIC CHARGED-PARTICLE BEAM SYSTEM 失效
    非轴对称粒子束系统

    公开(公告)号:US20080191144A1

    公开(公告)日:2008-08-14

    申请号:US11968833

    申请日:2008-01-03

    CPC classification number: H01J27/02 G21K1/093 H01J3/02 H01J3/12 H01J3/20 H01J29/64

    Abstract: The charged-particle beam system includes a non-axisymmetric diode forms a non-axisymmetric beam having an elliptic cross-section. A focusing element utilizes a magnetic field for focusing and transporting the non-axisymmetric beam, wherein the non-axisymmetric beam is approximately matched with the channel of the focusing element.

    Abstract translation: 带电粒子束系统包括非轴对称二极管形成具有椭圆截面的非轴对称束。 聚焦元件利用磁场来聚焦和传送非轴对称光束,其中非轴对称光束与聚焦元件的通道近似匹配。

    Electron beam directed energy device and methods of using same

    公开(公告)号:US20070029497A1

    公开(公告)日:2007-02-08

    申请号:US11187519

    申请日:2005-07-22

    Applicant: Michael Retsky

    Inventor: Michael Retsky

    Abstract: A method and apparatus is disclosed for an electron beam directed energy device. The device consists of an electron gun with one or more electron beams. The device includes one or more accelerating plates with holes aligned for beam passage. The plates may be flat or preferably shaped to direct each electron beam to exit the electron gun at a predetermined orientation. In one preferred application, the device is located in outer space with individual beams that are directed to focus at a distant target to be used to impact and destroy missiles. The aimings of the separate beams are designed to overcome Coulomb repulsion. A method is also presented for directing the beams to a target considering the variable terrestrial magnetic field. In another preferred application, the electron beam is directed into the ground to produce a subsurface x-ray source to locate and/or destroy buried or otherwise hidden objects including explosive devices.

Patent Agency Ranking