公开(公告)号：US20140060736A1

公开(公告)日：2014-03-06

申请号：US14075647

申请日：2013-11-08

Applicant: Micron Technology, Inc.

Inventor： Dan B. Millward ,  Donald L. Westmoreland ,  Gurtej S. Sandhu

IPC: H01J37/02

CPC classification number: H01J37/02 ,  B81C1/00031 ,  B81C2201/0149 ,  B81C2201/0198 ,  B82Y30/00 ,  G03F7/0002 ,  G03F7/265 ,  Y10T428/24 ,  Y10T428/24149 ,  Y10T428/24174 ,  Y10T428/2438

Abstract: Methods for fabricating sublithographic, nanoscale microstructures arrays including openings and linear microchannels utilizing self-assembling block copolymers, and films and devices formed from these methods are provided. In some embodiments, the films can be used as a template or mask to etch openings in an underlying material layer.

Abstract translation: 提供了使用自组装嵌段共聚物制造包括开口和线性微通道的亚光刻纳米尺度微结构阵列的方法，以及由这些方法形成的膜和器件。 在一些实施例中，膜可以用作模板或掩模来蚀刻下层材料层中的开口。

公开(公告)号：US20130256558A1

公开(公告)日：2013-10-03

申请号：US13433748

申请日：2012-03-29

Applicant: Christian DIETL ,  Gerald SCHMID ,  Bernd SCHINDLER ,  Gerd BENNER ,  Thilo MANDLER ,  Marco MATIJEVIC

Inventor： Christian DIETL ,  Gerald SCHMID ,  Bernd SCHINDLER ,  Gerd BENNER ,  Thilo MANDLER ,  Marco MATIJEVIC

IPC: B01D53/22 ,  H01J37/02

CPC classification number: H01J37/26 ,  H01J2237/002 ,  H01J2237/022 ,  H01J2237/028 ,  H01J2237/0453

Abstract: An apparatus for contaminants being deposited thereon in a particle beam device, and also the particle beam device including the apparatus, are provided. This apparatus may be an anticontaminator. The apparatus according to the system described herein may include at least one cooling unit. The cooling unit may provide at least one cooled surface on which contaminants in a particle beam device are deposited. The apparatus according to the system described herein may further include at least one aperture unit. The aperture unit may be arranged at a motion device for moving the aperture unit relative to the cooling unit. Furthermore, the aperture unit may have at least one aperture opening. The cooling unit may be connected to the aperture unit by at least one first flexible thermal conductor.

Abstract translation: 提供了一种用于在粒子束装置中沉积污染物的装置，以及包括该装置的粒子束装置。 该装置可以是抗贴片机。 根据本文描述的系统的装置可以包括至少一个冷却单元。 冷却单元可以提供至少一个冷却表面，颗粒束装置中的污染物沉积在该冷却表面上。 根据本文描述的系统的装置还可以包括至少一个孔单元。 孔单元可以布置在用于相对于冷却单元移动孔单元的运动装置。 此外，孔单元可以具有至少一个孔口。 冷却单元可以由至少一个第一柔性热导体连接到孔单元。

公开(公告)号：US20130248705A1

公开(公告)日：2013-09-26

申请号：US13600980

申请日：2012-08-31

Applicant: Hiroyuki HAYASHI

Inventor： Hiroyuki HAYASHI

IPC: H01J37/02

CPC classification number: H01J37/02 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/2446 ,  H01J2237/24485 ,  H01J2237/24564

Abstract: In accordance with an embodiment, a defect inspection apparatus includes a charged beam irradiation unit, a detection unit, an energy filter, and an inspection unit. The charged beam irradiation unit generates a charged beam and irradiates a sample including a pattern as an inspection target thereon with the generated charged beam. The detection unit detects secondary charged particles or reflected charged particles generated from the sample by irradiation of the charged beam and outputs a signal. The energy filter is arranged between the detection unit and the sample to selectively allow the secondary charged particles or the reflected charged particles with energy associated with an applied voltage to pass therethrough. The inspection unit applies voltages different from each other to the energy filter and outputs information concerning a defect of the pattern from an intensity difference between signals obtained under application voltage different from each other.

Abstract translation: 根据实施例，缺陷检查装置包括带电束照射单元，检测单元，能量过滤器和检查单元。 充电光束照射单元产生带电光束，并且利用所产生的带电束将包括作为检查对象的图案的样本照射。 检测单元通过照射带电波束来检测从样品产生的二次带电粒子或反射带电粒子，并输出信号。 能量过滤器布置在检测单元和样品之间，以选择性地允许具有与施加电压相关联的能量通过的二次带电粒子或反射带电粒子。 检查单元向能量滤波器施加彼此不同的电压，并且从根据施加电压彼此不同获得的信号之间的强度差输出关于图案的缺陷的信息。

公开(公告)号：US20130248699A1

公开(公告)日：2013-09-26

申请号：US13804380

申请日：2013-03-14

Applicant: JEOL LTD.

Inventor： Masaki Mukai

IPC: H01J37/02

CPC classification number: H01J37/023 ,  H01J37/05 ,  H01J37/26 ,  H01J2237/057 ,  H01J2237/21 ,  H01J2237/248 ,  H01J2237/2802

Abstract: There is provided a method of adjusting a transmission electron microscope to facilitate an adjustment for bringing a focal plane of an electron beam exiting a two-stage filter type monochromator into coincidence with an achromatic plane. The method starts with obtaining a transmission electron microscope image including interference fringes of the electron beam that are generated by an aperture located behind the monochromator. The focal plane of the beam exiting the monochromator is brought into coincidence with the achromatic plane by adjusting the intensity of an electrostatic lens, the intensities of the electric and magnetic fields produced by at least one of two energy filters, or astigmatism generated in the monochromator based on an intensity distribution of the interference fringes in the obtained transmission electron microscope image.

Abstract translation: 提供了一种调节透射电子显微镜以便于使离开两级滤光器型单色仪的电子束的焦平面与无色平面一致的调整的方法。 该方法从获得透射电子显微镜图像开始，包括由位于单色仪后面的孔产生的电子束的干涉条纹。 离开单色仪的光束的焦平面通过调节静电透镜的强度，由两个能量过滤器中的至少一个产生的电场和磁场的强度或在单色仪中产生的像散而与无色平面一致 基于获得的透射电子显微镜图像中的干涉条纹的强度分布。

公开(公告)号：US20130206983A1

公开(公告)日：2013-08-15

申请号：US13441473

申请日：2012-04-06

Applicant: Gung-Chian Yin ,  Te-Hui Lee

Inventor： Gung-Chian Yin ,  Te-Hui Lee

IPC: H01J37/28 ,  H01J37/02

CPC classification number: H01J37/3045 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/20292 ,  H01J2237/24578

Abstract: A positioning system for precise stage is provided. It includes a designed pattern on a stage; an electron beam column generating a focused electron beam to scan the designed pattern and produce electron signal; an electron detection unit to detect the electronic signal; and a control unit converting the electron signal to a clock signal to determine the relative position of the electron beam column and the designed pattern, so as to adjust the displacement of the stage. A nanometer scale positioning method for a precise stage is provided, which can resolve the problem of mechanical drift of the stage when the stage is multi-axis positioning or rotating.

Abstract translation: 提供了一种精确级的定位系统。 它包括舞台上的设计图案; 产生聚焦电子束以扫描设计图案并产生电子信号的电子束列; 电子检测单元，用于检测电子信号; 以及控制单元，将电子信号转换为时钟信号，以确定电子束列和设计图案的相对位置，以便调整平台的位移。 提供了一种精确级的纳米级定位方法，可以解决舞台多轴定位或旋转时舞台机械漂移的问题。

公开(公告)号：US20130032714A1

公开(公告)日：2013-02-07

申请号：US13641211

申请日：2011-04-12

Applicant: Shinya Kitayama ,  Satoshi Tomimatsu ,  Tsuyoshi Onishi

Inventor： Shinya Kitayama ,  Satoshi Tomimatsu ,  Tsuyoshi Onishi

IPC: H01J37/02

CPC classification number: H01J37/3056 ,  H01J37/304 ,  H01J2237/208 ,  H01J2237/31745

Abstract: There is provided an apparatus and a method capable of preparing a standardized probe without need for working skill of probe processing. According to the present invention, a probe shape generation process of detecting a probe shape based on the probe incoming current detected by a probe current detection unit, a probe tip coordinate extraction process of detecting a tip position of the probe from the probe shape, a probe contour line extraction process of generating a probe contour line obtained by approximating a contour of the probe from the tip position of the probe and the probe shape, a probe center line extraction process of generating a center line and a vertical line of the probe from the probe contour line, a processing pattern generation process of generating a processing pattern based on the probe tip position, the probe center line, the probe vertical line, and a preset shape and dimension of a probe acute part, and an ion beam termination process of performing, based on the processing pattern, termination of ion-beam processing are performed.

Abstract translation: 提供了一种能够准备标准化探针而不需要探头处理工作技能的装置和方法。 根据本发明，根据由探针电流检测单元检测到的探针入射电流来检测探针形状的探针形状生成处理，从探针形状检测探针的末端位置的探针尖端坐标提取处理， 探针轮廓线提取处理，其生成通过从探针的尖端位置和探针形状近似探针的轮廓而获得的探针轮廓线;探针中心线提取处理，用于产生探针的中心线和垂直线 探针轮廓线，基于探针尖端位置，探针中心线，探针垂直线以及探针尖锐部分的预设形状和尺寸产生处理图案的处理图案生成处理以及离子束终止处理 基于处理模式执行离子束处理的终止。

公开(公告)号：US08198610B2

公开(公告)日：2012-06-12

申请号：US12582140

申请日：2009-10-20

Applicant: Richard F. McRay

Inventor： Richard F. McRay

IPC: G21K5/10 ,  H01J37/02

CPC classification number: H01J37/09 ,  H01J37/3171 ,  H01J2237/0455

Abstract: An ion implanter and an ion implant method are disclosed. The ion implanter has an aperture assembly with a variable aperture and is located between an ion source of an ion beam and a holder for holding a wafer. At least one of the size and the shape of the variable aperture is adjustable. The ion beam may be flexibly shaped by the variable aperture, so that the practical implantation on the wafer can be controllably adjusted without modifying an operation of both the ion source and mass analyzer or applying a magnetic field to modify the ion beam. An example of the aperture assembly has two plates, each having an opening formed on its edge such that a variable aperture is formed by a combination of these openings. By respectively moving the plates, the size and the shape of the variable aperture can be changed.

Abstract translation: 公开了一种离子注入机和离子注入方法。 离子注入机具有可变孔径的孔组件，并且位于离子束的离子源和用于保持晶片的保持器之间。 可变孔径的尺寸和形状中的至少一个是可调节的。 离子束可以由可变孔径柔性地形成，从而可以可控地调节晶片上的实际注入，而不改变离子源和质量分析仪的操作或施加磁场来修改离子束。 孔组件的一个例子有两个板，每个板在其边缘上形成一个开口，使得通过这些开口的组合形成可变孔。 通过分别移动板，可以改变可变孔径的尺寸和形状。

公开(公告)号：US20100193472A1

公开(公告)日：2010-08-05

申请号：US12732818

申请日：2010-03-26

Applicant: Martin D. Tabat ,  Matthew C. Gwinn ,  Robert K. Becker ,  Avrum Freytsis ,  Michael Graf

Inventor： Martin D. Tabat ,  Matthew C. Gwinn ,  Robert K. Becker ,  Avrum Freytsis ,  Michael Graf

IPC: H01J37/317 ,  H01J37/02 ,  H01J37/305 ,  C23F1/02 ,  C23C14/48

CPC classification number: H01J37/08 ,  C23C14/221 ,  C23C16/513 ,  H01J37/305 ,  H01J37/317 ,  H01J2237/0812 ,  H01J2237/0822 ,  H01J2237/0825 ,  H01J2237/0827

Abstract: A gas cluster ion beam (GCIB) processing system using multiple nozzles for forming and emitting at least one GCIB and methods of operating thereof are described. The GCIB processing system may be configured to treat a substrate, including, but not limited to, doping, growing, depositing, etching, smoothing, amorphizing, or modifying a layer thereupon. Furthermore, the GCIB processing system may be operated to produce a first GCIB and a second GCIB, and to irradiate a substrate simultaneously and/or sequentially with the first GCIB and second GCIB.

Abstract translation: 描述了使用多个喷嘴形成和发射至少一个GCIB的气体簇离子束（GCIB）处理系统及其操作方法。 GCIB处理系统可以被配置为处理衬底，包括但不限于掺杂，生长，沉积，蚀刻，平滑化，非晶化或修饰其上的层。 此外，可以操作GCIB处理系统以产生第一GCIB和第二GCIB，并且与第一GCIB和第二GCIB同时和/或顺序地照射基板。

公开(公告)号：US20100181479A1

公开(公告)日：2010-07-22

申请号：US12459078

申请日：2009-06-25

Applicant: Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares

Inventor： Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares

IPC: H01J3/00 ,  H01J37/02 ,  H01J37/26 ,  H01J37/30

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical to element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

Abstract translation: 粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成 在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

公开(公告)号：US20080302963A1

公开(公告)日：2008-12-11

申请号：US12177733

申请日：2008-07-22

Applicant: Mamoru NAKASUJI ,  Nobuharu NOJI ,  Tohru SATAKE ,  Toshifumi KIMBA ,  Hirosi SOBUKAWA ,  Tsutomu KARIMATA ,  Shin OOWADA ,  Shoji YOSHIKAWA ,  Mutsumi SAITO

Inventor： Mamoru NAKASUJI ,  Nobuharu NOJI ,  Tohru SATAKE ,  Toshifumi KIMBA ,  Hirosi SOBUKAWA ,  Tsutomu KARIMATA ,  Shin OOWADA ,  Shoji YOSHIKAWA ,  Mutsumi SAITO

IPC: H01J37/02

CPC classification number: G01N23/225 ,  H01J37/06 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817

Abstract: An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam source, and projecting an image of a secondary electron beam emitted by the irradiation of the primary electron beam, and a detector for detecting the secondary electron beam image projected by the electron-optical system; specifically, the electron beam apparatus comprises beam generating means 2004 for irradiating an electron beam having a particular width, a primary electron-optical system 2001 for leading the beam to reach the surface of a substrate 2006 under testing, a secondary electron-optical system 2002 for trapping secondary electrons generated from the substrate 2006 and introducing them into an image processing system 2015, a stage 2003 for transportably holding the substrate 2006 with a continuous degree of freedom equal to at least one, a testing chamber for the substrate 2006, a substrate transport mechanism for transporting the substrate 2006 into and out of the testing chamber, an image processing analyzer 2015 for detecting defects on the substrate 2006, a vibration isolating mechanism for the testing chamber, a vacuum system for holding the testing chamber at a vacuum, and a control system 2017 for displaying or storing positions of defects on the substrate 2006.

Abstract translation: 诸如基于片材束的测试装置的电子束装置具有电子光学系统，用于用来自电子束源的一次电子束照射待测物体，并且投射通过照射的二次电子束的图像 一次电子束和用于检测由电子 - 光学系统投影的二次电子束图像的检测器; 具体地，电子束装置包括用于照射具有特定宽度的电子束的光束产生装置2004，用于引导光束到达正在测试的基底2006的表面的初级电子 - 光学系统2001，二次电子光学系统2002 用于捕获从衬底2006产生的二次电子并将它们引入到图像处理系统2015中，用于以等于至少一个的连续自由度可移动地保持衬底2006的阶段2003，用于衬底2006的测试室，衬底 用于将基板2006输送到测试室中的传送机构，用于检测基板2006上的缺陷的图像处理分析器2015，用于测试室的隔振机构，用于将测试室保持在真空的真空系统，以及 用于在基板2006上显示或存储缺陷位置的控制系统2017。