公开(公告)号：US09583306B2

公开(公告)日：2017-02-28

申请号：US14964274

申请日：2015-12-09

Applicant: Hermes Microvision Inc.

Inventor： Shuai Li

IPC: G21K5/04 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28 ,  H01J37/145 ,  H01J37/21

CPC classification number: H01J37/1478 ,  H01J37/145 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/063 ,  H01J2237/1035 ,  H01J2237/12 ,  H01J2237/14 ,  H01J2237/1508 ,  H01J2237/1534 ,  H01J2237/1536 ,  H01J2237/2801 ,  H01J2237/2811

Abstract: A scanning electron microscope (SEM) with a swing objective lens (SOL) reduces the off-aberrations to enhance the image resolution, and extends the e-beam scanning angle. The scanning electron microscope comprises a charged particle source, an accelerating electrode, and a swing objective lens system including a pre-deflection unit, a swing deflection unit and an objective lens, all of them are rotationally symmetric with respect to an optical axis. The upper inner-face of the swing deflection unit is tilted an angle θ to the outer of the SEM and its lower inner-face is parallel to the optical axis. A distribution for a first and second focusing field of the swing objective lens is provided to limit the off-aberrations and can be performed by a single swing deflection unit. Preferably, the two focusing fields are overlapped by each other at least 80 percent.

Abstract translation: 具有摆动物镜（SOL）的扫描电子显微镜（SEM）减小了偏差以提高图像分辨率，并且扩展了电子束扫描角度。 扫描电子显微镜包括带电粒子源，加速电极和包括预偏转单元，摆动偏转单元和物镜的摆动物镜系统，它们都相对于光轴旋转对称。 摆动偏转单元的上部内表面与SEM的外侧倾斜角度θ，其下部内表面平行于光轴。 提供了用于摆动物镜的第一和第二聚焦场的分布以限制偏差并且可以由单个摆动偏转单元执行。 优选地，两个聚焦场彼此重叠至少80％。

公开(公告)号：US09520266B2

公开(公告)日：2016-12-13

申请号：US14455878

申请日：2014-08-09

Applicant: Hitachi High-Technologies Corporation

Inventor： Kaori Shirahata ,  Yasunari Sohda ,  Makoto Sakakibara ,  Daisuke Bizen ,  Hajime Kawano ,  Hideyuki Kazumi

IPC: H01J37/244 ,  H01J37/22 ,  H01J37/10 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/244 ,  G01B2210/56 ,  H01J37/10 ,  H01J37/147 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/2448 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: Pattern critical dimension measurement equipment includes an electron source configured to generate a primary electron beam, a deflector configured to deflect the primary electron beam emitted from the electron source, a focusing lens configured to focus the primary electron beam deflected by the deflector, a decelerator configured to decelerate the primary electron beam that irradiates the sample, a first detector located between the electron source and the focusing lens, the first detector being configured to detect electrons at part of azimuths of electrons generated from the sample upon irradiation of the sample with the primary electron beam, and a second detector located between the electron source and the first detector, the second detector being configured to detect electrons at substantially all azimuths of the electrons generated from the sample.

Abstract translation: 图案关键尺寸测量设备包括被配置为产生一次电子束的电子源，被配置为使从电子源发射的一次电子束偏转的偏转器，配置成聚焦由偏转器偏转的一次电子束的聚焦透镜， 使照射样品的一次电子束减速，位于电子源和聚焦透镜之间的第一检测器，第一检测器被配置为在样品照射样品时与主要样品一起检测从样品产生的电子方位角的一部分处的电子 电子束和位于电子源和第一检测器之间的第二检测器，第二检测器被配置为在从样品产生的电子的基本上所有的方位角处检测电子。

公开(公告)号：US09478389B2

公开(公告)日：2016-10-25

申请号：US14422374

申请日：2013-07-01

Applicant: Hitachi High-Technologies Corporation

Inventor： Tsunenori Nomaguchi ,  Toshihide Agemura

IPC: H01J37/10 ,  H01J37/28 ,  H01J37/147 ,  H01J37/22 ,  H01J37/305 ,  H01J37/317 ,  H01J37/26 ,  H01J37/141 ,  H01J37/16 ,  H01J37/30

CPC classification number: H01J37/10 ,  H01J37/1413 ,  H01J37/1471 ,  H01J37/16 ,  H01J37/222 ,  H01J37/261 ,  H01J37/265 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/305 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/0245 ,  H01J2237/032 ,  H01J2237/12 ,  H01J2237/31745

Abstract: The present invention provides a composite charged particle beam device which is provided with two or more charged particle beam columns and enables high-resolution observation while a sample is placed at the position of a cross point. The present invention has the following configuration. A composite charged particle beam device is provided with a plurality of charged particle beam columns (101a, 102a), and is characterized in that a sample (103) is disposed at the position of an intersection point (171) where the optical axes of the plurality of columns intersect, a component (408a, 408b) that forms the tip of an objective lens of the charged particle beam column (102a) is detachable, and by replacing the component (408a, 408b), the distance between the intersection point (171) and the tip of the charge particle beam column can be changed.

Abstract translation: 本发明提供了一种复合带电粒子束装置，其具有两个或更多个带电粒子束柱，并且当将样品放置在交叉点的位置时能够进行高分辨率观察。 本发明具有以下结构。 复合带电粒子束装置设置有多个带电粒子束柱（101a，102a），其特征在于，样品（103）设置在交叉点（171）的位置， 多个列相交，形成带电粒子束列（102a）的物镜的尖端的部件（408a，408b）是可拆卸的，并且通过更换部件（408a，408b），交点 171），并且可以改变电荷粒子束柱的尖端。

公开(公告)号：US20160233048A1

公开(公告)日：2016-08-11

申请号：US14615602

申请日：2015-02-06

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Shengwu Chang ,  Kristen S. Rounds ,  William Leavitt ,  Michael St. Peter

IPC: H01J37/08 ,  H01J37/10 ,  H01J37/317

CPC classification number: H01J37/08 ,  H01J37/3171 ,  H01J2237/024 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/04924

Abstract: An apparatus to control an ion beam for treating a substrate. The apparatus may include a fixed electrode configured to conduct the ion beam through a fixed electrode aperture and to apply a fixed electrode potential to the ion beam, a ground electrode assembly disposed downstream of the fixed electrode. The ground electrode assembly may include a base and a ground electrode disposed adjacent the fixed electrode and configured to conduct the ion beam through a ground electrode aperture, the ground electrode being reversibly movable along a first axis with respect to the fixed electrode between a first position and a second position, wherein a beam current of the ion beam at the substrate varies when the ground electrode moves between the first position and second position.

Abstract translation: 控制用于处理基板的离子束的装置。 该装置可以包括固定电极，其被配置为使离子束通过固定电极孔并且将固定电极电位施加到离子束，设置在固定电极下游的接地电极组件。 接地电极组件可以包括基部和邻近固定电极设置的接地电极，并且被配置为使离子束通过接地电极孔，接地电极可相对于固定电极的第一轴线在第一位置 以及第二位置，其中当所述接地电极在所述第一位置和所述第二位置之间移动时，所述衬底处的离子束的束电流变化。

公开(公告)号：US20160196952A1

公开(公告)日：2016-07-07

申请号：US14916529

申请日：2014-05-16

Applicant: HIitachi High-Technologies Corporation

Inventor： Hiroaki MATSUMOTO ,  Takeshi SATO ,  Yoshifumi TANIGUCHI ,  Ken HARADA

IPC: H01J37/10 ,  H01J37/147 ,  H01J37/05 ,  H01J37/285

CPC classification number: H01J37/10 ,  G01N23/20058 ,  G01N2223/418 ,  H01J37/04 ,  H01J37/05 ,  H01J37/09 ,  H01J37/147 ,  H01J37/1472 ,  H01J37/153 ,  H01J37/24 ,  H01J37/244 ,  H01J37/26 ,  H01J37/261 ,  H01J37/28 ,  H01J37/285 ,  H01J37/295 ,  H01J2237/21 ,  H01J2237/2614

Abstract: The present invention relates to a lens-less Foucault method wherein a transmission electron microscope objective lens (5) is turned off, an electron beam crossover (11, 13) is matched with a selected area aperture (65), and the focal distance of a first imaging lens (61) can be changed to enable switching between a sample image observation mode and a sample diffraction pattern observation mode, characterized in that a deflector (81) is disposed in a stage following the first imaging lens (61), and conditions for an irradiating optical system (4) can be fixed after conditions for the imaging optical system have been determined. This allows a lens-less Foucault method to be implemented in a common general-use transmission electron microscope with no magnetic shielding lens equipped, without burdening the operator.

Abstract translation: 本发明涉及一种无透镜Foucault方法，其中透射电子显微镜物镜（5）被关闭，电子束交叉（11,13）与所选区域孔径（65）匹配，并且焦距 可以改变第一成像透镜（61）以在样本图像观察模式和样本衍射图案观察模式之间切换，其特征在于，偏转器（81）设置在跟随第一成像透镜（61）的阶段中，以及 可以在确定成像光学系统的条件之后固定照射光学系统（4）的条件。 这样就可以在没有磁屏蔽透镜的公共通用透射电子显微镜中实现无镜头福柯方法，而不会对操作者造成负担。

公开(公告)号：US20160126058A1

公开(公告)日：2016-05-05

申请号：US14891494

申请日：2014-03-12

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yusuke OMINAMI ,  Taku SAKAZUME ,  Sukehiro ITO

IPC: H01J37/22 ,  H01J37/26 ,  H01J37/20 ,  H01J37/10

CPC classification number: H01J37/22 ,  G01N23/046 ,  G01N2223/3307 ,  G01N2223/418 ,  H01J37/10 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/26 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/047 ,  H01J2237/10 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/2443 ,  H01J2237/2445 ,  H01J2237/24578 ,  H01J2237/2611 ,  H01J2237/2802

Abstract: An electron microscope has a large depth of focus in comparison with an optical microscope. Thus, information is superimposed on one image in the direction of depth. Therefore, it is necessary to accurately specify the three-dimensional position and density of a structure in a specimen so as to observe the three-dimensional structure of the interior of the specimen by using the electron microscope. Furthermore, a specimen that is observed with the optical microscope on a slide glass is not put into a TEM device of the related art. Thus, performing three-dimensional internal structure observation with the electron microscope on a location that is observed with the optical microscope requires very cumbersome preparation of the specimen. By controlling a vector parameter that defines the interrelationship between a primary charged particle beam and the specimen and by irradiation with the primary charged particle beam with a plurality of different vector parameters, images of transmitted charged particles of the specimen that correspond to each of the vector parameters are obtained. Irradiation with the primary charged particle beam is performed on the specimen that is arranged either directly or through a predetermined member on a detector which detects charged particles transmitted through or scattered by the interior of the specimen.

Abstract translation: 与光学显微镜相比，电子显微镜具有较大的聚焦深度。 因此，信息在深度方向上叠加在一个图像上。 因此，必须准确地确定试样中的结构的三维位置和密度，以便通过电子显微镜观察试样内部的三维结构。 此外，用幻灯片玻璃上的光学显微镜观察的样品没有放入现有技术的TEM器件中。 因此，在用光学显微镜观察的位置上用电子显微镜进行三维内部结构观察需要非常繁琐的样品制备。 通过控制限定初级带电粒子束和样本之间的相互关系的矢量参数以及通过用多个不同矢量参数照射初级带电粒子束的样本的透射带电粒子对应于每个矢量的图像 获得参数。 对于直接或通过检测器上的预定部件布置的试样进行照射，该检测器检测通过样本内部传播或散射的带电粒子。

公开(公告)号：US20160111251A1

公开(公告)日：2016-04-21

申请号：US14975314

申请日：2015-12-18

Applicant: CARL ZEISS MICROSCOPY GMBH ,  APPLIED MATERIALS ISRAEL LTD.

Inventor： Rainer KNIPPELMEYER ,  Oliver KIENZLE ,  Thomas KEMEN ,  Heiko MUELLER ,  Stephan UHLEMANN ,  Maximilian HAIDER ,  Antonio CASARES ,  Steven ROGERS

IPC: H01J37/30 ,  H01J37/317 ,  H01J37/10

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

Abstract translation: 粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成 在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

公开(公告)号：US09263234B2

公开(公告)日：2016-02-16

申请号：US14479648

申请日：2014-09-08

Applicant: Mapper Lithography IP B.V.

Inventor： Johan Joost Koning ,  David Johannes van den Bergen

IPC: H01J37/10 ,  H01J37/30 ,  G03F7/20 ,  H01J37/20 ,  H01J37/317 ,  B01J19/12

CPC classification number: H01J37/023 ,  B01J19/12 ,  G03F7/708 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70891 ,  G03F7/709 ,  G03F7/70975 ,  H01J37/10 ,  H01J37/20 ,  H01J37/3007 ,  H01J37/3177

Abstract: The invention relates to a projection lens assembly for directing a beam toward a target. This assembly includes a lens support body (52) that spans a plane (P), and has a connection region (58) and a lateral edge (56). The lens support body is arranged for insertion into a frame (42) of a processing unit along an insertion direction (X) parallel with the plane (P). The projection lens assembly includes conduits (60-64) emanating from the connection region, and a conduit guiding body (70-81) for accommodating the conduits. The guiding body includes a first guiding portion (72) for guiding the conduits from the connection region, along the plane to a lateral region (B) beyond the lateral edge. The guiding body also includes a second guiding portion (78) for guiding the conduits from the lateral region (B) toward a tilted edge (79) of the conduit guiding body.

Abstract translation: 本发明涉及一种用于将光束导向目标的投影透镜组件。 该组件包括跨越平面（P）的透镜支撑体（52），并且具有连接区域（58）和侧边缘（56）。 透镜支撑体被布置成沿着与平面（P）平行的插入方向（X）插入到处理单元的框架（42）中。 投影透镜组件包括从连接区域发出的导管（60-64）和用于容纳导管的导管引导体（70-81）。 引导体包括用于将管道从连接区域沿着该平面引导到超过侧边缘的横向区域（B）的第一引导部分（72）。 引导体还包括用于将导管从侧向区域（B）引导到导管引导体的倾斜边缘（79）的第二引导部分（78）。

公开(公告)号：US09263232B2

公开(公告)日：2016-02-16

申请号：US14395263

申请日：2013-04-11

Applicant: Hitachi High-Technologies Corporation

Inventor： Yusuke Ominami ,  Shinsuke Kawanishi ,  Tomohisa Ohtaki ,  Masahiko Ajima ,  Sukehiro Ito

IPC: H01J37/26 ,  G21K5/04 ,  H01J37/16 ,  H01J37/18 ,  H01J37/28 ,  H01J37/09 ,  H01J37/10 ,  H01J37/147

CPC classification number: H01J37/261 ,  H01J37/09 ,  H01J37/10 ,  H01J37/147 ,  H01J37/16 ,  H01J37/18 ,  H01J37/28 ,  H01J2237/0245 ,  H01J2237/043 ,  H01J2237/063 ,  H01J2237/10 ,  H01J2237/162 ,  H01J2237/164 ,  H01J2237/2003 ,  H01J2237/2448 ,  H01J2237/2602 ,  H01J2237/2605

Abstract: A charged particle beam device (1) includes a charged particle optical lens barrel (10), a support housing (20) equipped with the charged particle optical lens barrel (10) thereon, and an insertion housing (30) inserted in the support housing (20). A first aperture member (15) is disposed in the vicinity of the center of the magnetic field of an objective lens, and a second aperture member (15) is disposed so as to externally close an opening part provided at the upper side of the insertion housing (30). Further, when a primary charged particle beam (12) is irradiated to a sample (60) arranged under the lower side of the second aperture member (31), secondary charged particles thus emitted are detected by a detector (16).

Abstract translation: 带电粒子束装置（1）包括带电粒子光学透镜镜筒（10），在其上装有带电粒子光学透镜镜筒（10）的支撑壳体（20）和插入支撑壳体 （20）。 第一孔径构件（15）设置在物镜的磁场的中心附近，并且第二孔径构件（15）设置成外部封闭设置在插入件的上侧的开口部分 住房（30）。 此外，当将初级带电粒子束（12）照射到布置在第二孔径构件（31）的下侧下方的样品（60）时，由检测器（16）检测如此发射的二次带电粒子。

公开(公告)号：US09236222B2

公开(公告)日：2016-01-12

申请号：US14732239

申请日：2015-06-05

Applicant: Sumitomo Heavy Industries Ion Technology Co., Ltd.

Inventor： Takanori Yagita ,  Mitsuaki Kabasawa

IPC: H01J37/317 ,  H01J37/147 ,  H01J37/10

CPC classification number: H01J37/3171 ,  H01J37/147 ,  H01J37/1474

Abstract: An ion implantation apparatus includes a beam scanning unit and a beam parallelizing unit arranged downstream thereof. The beam scanning unit has a scan origin in a central part of the scanning unit on a central axis of an incident ion beam. The beam parallelizing unit has a focal point of a parallelizing lens at the scan origin. The ion implantation apparatus is configured such that a focal position of the incident beam into the scanning unit is located upstream of the scan origin along the central axis of the incident beam. The focal position of the incident beam into the scanning unit is adjusted to be at a position upstream of the scan origin along the central axis of the incident beam such that a divergence phenomenon caused by the space charge effect in an exiting ion beam from the parallelizing unit is compensated.

Abstract translation: 离子注入装置包括光束扫描单元和布置在其下游的光束并行化单元。 光束扫描单元在入射离子束的中心轴上的扫描单元的中心部分具有扫描原点。 光束平行化单元具有在扫描原点处的平行化透镜的焦点。 离子注入装置被构造成使得入射到扫描单元中的入射光束的焦点位置沿着入射光束的中心轴线位于扫描原点的上游。 将入射光束到扫描单元中的焦点位置被调整为沿着入射光束的中心轴的扫描原点的上游位置，使得由离开的离子束中的空间电荷效应引起的发散现象来自并联 单位得到补偿。