Abstract:
PROBLEM TO BE SOLVED: To obtain an active FET body device capable of balancing high-speed electric charges, decreasing off-current, and increasing on-current. SOLUTION: This embodiment comprises a silicon substrate 2, a silicon dioxide layer 3, a monocrystal silicon layer 4, a silicon dioxide layer 5, a spacer 13 of N+ doped polysilicon, a conformal layer 15 of a conductive diffusion preventing substance, a metal silicide layer 16, a CVD silicon dioxide layer 17, an insulator spacer 18, a silicon oxide layer 19, and a polysilicon 21. In an off-state, a gate contact with a body holds the body at a low word line level. In this state, a threshold takes a larger value. In addition to a voltage added to the N+ part 13 of a gate conductor, a potential from the body to a source rises. As a result, if the device is turned on, Vt lowers. By the effects of a dynamic Vt fall accompanied by a low off-current, this embodiment is suitable for a device using a very low voltage.
Abstract:
PROBLEM TO BE SOLVED: To increase the threshold voltage of an FET element after switched from a floating state to a biased state by changing a bulk CMOS element to an element within a silicon substrate on an insulator. SOLUTION: A unit cell 1 includes an SOINMOS transistor 60, and its main body or an isolated SOI substrate region 62 is connected to main-body-device transistor switches 64 and 66. The switch 64 is connected to a reference signal 74. When operated by a control signal 80 applied to a gate 78, the switch 64 supplies the signal 74 to the main body 62 of the transistor 60. The main body 62 is connected to a reference signal 76 via a switch 66, and the switch 66 is operated by a control signal 84 supplied to a gate 80. In an active switching state, the threshold voltage level is low, and in a standby state, it is high.
Abstract:
PROBLEM TO BE SOLVED: To provide a high performance/high band width RAM bus architecture that reduces the waiting time through the use of standard synchronous DRAM (SDRAM) chips. SOLUTION: The high performance/high band width memory bus architecture and module contain the standard synchronous DRAM(SDRAM) chips 12, and reduce the waiting time and the number of pins. Four bus pins detach an input command from data and establish a parallel system operation. An independent memory operation can be improved compared to a regular SDRAM operation by maintaining a 'packet'-type transaction. In the architecture, the bus is divided into command input and data input, which are detached from output data.
Abstract:
PROBLEM TO BE SOLVED: To provide a high-band DRAM which can be used for an error detecting application. SOLUTION: A DRAM array 140 is divided into two or more subarrays 142, 144, 146, and 148. The subarrays are arranged in addressable lines and rows. When the DRAMs are programmed in a normal mode, the burst length becomes '8' and all address spaces of the DRAMs can be utilized for data storage. When the DRAMs are programmed for error detection (ECC mode), the burst length becomes '9' and the array is reconstituted at the part of the array which gives the ninth byte. The address spaces of the DRAMs are reduced by 1/8 in the ECC mode. It is preferable that all nine locations exist on the same page. Each page is divided into eight equal parts. In the normal mode, all of, the eight parts are assigned to the storage of data and, in the FCC mode, seven of the eights parts are assigned to the storage of data and the remaining one part is assigned to the storage of check bits.
Abstract:
PROBLEM TO BE SOLVED: To prevent read-out disturbance from an unselected cell by reading out a written word value stored on a storage node by means of a read transistor via a diode between bit lines. SOLUTION: When a write transistor Tw0 in a gain cell 20 is operated by a write-in word line WLW0, a value of a write-in bit line BLW0 is stored on the storage node SN0. When a read-out word line WLR0 is enabled to work, the read transistor Tr0 to be connected with the storage node SN0 in this case is connected via the diode D0 to a read-out bit line BLR0, so as to read out the stored value. The diode D0 is capable of preventing conductivity in the reverse direction of the read transistor Tr0, thus preventing disturbance from another cell, and also decreasing capacitance of the bit line. The same is the case with the other memory cells.
Abstract:
PROBLEM TO BE SOLVED: To provide a switched body SOI CMOS circuit which is provided with an FET element for increasing a FET element threshold voltage. SOLUTION: A circuit having an SOI element is connected with a body bias voltage, via a switch for selectively connecting a body bias voltage signal with an SOI element body. An NMOS or PMOS SOI element is used as the switched body SOI element. An FET is used as a switch. A gate terminal of the SOI element is connected with an FET element. A gate of the SOI element controls the FET switch connection of the body bias voltage signal to the SOI element, and adjusts a threshold value voltage of the SOI element. A logic circuit including the SOI element and a fabrication process for the SOI element are similarly disclosed. COPYRIGHT: (C)2004,JPO
Abstract:
PROBLEM TO BE SOLVED: To individually set a chip and to achieve a compact semiconductor package with a high-integration technique by equipping a plurality of independent chips that are electrically connected and function completely and chip-on- chip part connection/interconnection for electrically connecting the chips to an external circuit. SOLUTION: Chip-on-chip parts 10 include a first chip 30, a second chip 40, and chip-on-chip part connection 20. An active region 35 of the first chip 30 is electrically connected to an active region 45 of the second chip 40 via solder ball connection 50 or electrical connection between chips. Also, the chip- on-chip part connection 20 is a solder column 22 that is connected to the first chip 30, and the solder column 22 can connect the chip-on-chip parts 10 to an external circuit via a substrate, thus achieving a reliable, compact semiconductor package with high-integration technique and at the same time improving thermal performance.
Abstract:
PROBLEM TO BE SOLVED: To improve sense characteristics of a IC memory. SOLUTION: Two bit lines whose respective bit lines have a right half and left half and plural similar memory cells connected to respective halves of respective bit lines are included in a column of an integrated memory circuit. One of memory cells connected to respective lines is used as a reference and the other cells are used for data storage. Respective halves of respective bit lines are connected to a sense node of a sense amplifier latch via independently controlled transistor switches SW1-SW4. The switch SW1 is turned on and the SW2 is turned off in order to read data from a first half of a first bit line 204. Respective switches SW3, SW4 of a second bit line 206 are turned on. Nearly same effective loads are provided in respective halves of respective bit lines 204-206. Therefore, the load applied to a first sense node 214 is the nearly half of the load applied to a second sense mode 224. The output of a memory element is selected so that a reference potential becomes the nearly middle of the potential in the half of the bit line connected to the memory element storing a high value and low value.
Abstract:
BU9-89-027 A method is described for selectively masking sidewall regions of a concave surface formed in a semiconductor body, the method comprising the steps of: forming a conformal layer of masking material on a sidewall of the concave structure; emplacing in the concave structure, a selectively removable material that partially fills the concave structure, an upper surface of the material determining the edge of a region of the concave structure to be masked; removing a portion of the conformal layer above the upper surface of the selectively removable material; and removing the selectively removable material to leave a region of remaining conformal material as a mask.
Abstract:
Use of a residual charge bleed-off diode connected to the gate of an FET device in a Read Only Storage (ROS) is disclosed. The ROS is personalized by cutting selected gate leads in an array of FETs with a laser beam. Experience has shown that static electric charges on the lead due to handling prior to cutting become isolated at the gate after the gate lead is cut, producing an unpredictable conduction state for the FET instead of a solid off-state as desired. By providing a bleed-off diode which remains connected to the FET gate after the cut is made, the charges are allowed to leak away from those FETs whose gates have been cut while, at the same time, preventing the voltage of the FET gate from floating. The diode is oriented so as to offer a high impedance to current flowing from the gate node when the gate is biased for FET conduction. This minimizes the effect of the diode on circuit speed when the gate remains connected with the balance of the read only storage circuitry. If the gate and diode have been selectively severed from the balance of the read only storage circuitry, in the course of programming the storage, any residual charge on the gate is conducted through the diode by virtue of its reverse bias leakage or forward biased conduction state, depending upon the polarity of the residual charge on the gate.