多層配線板
    102.
    发明申请
    多層配線板 审中-公开
    多层接线板

    公开(公告)号:WO2013146931A1

    公开(公告)日:2013-10-03

    申请号:PCT/JP2013/059111

    申请日:2013-03-27

    Abstract:  多層配線板は、少なくとも2層以上の金属箔配線を有し、表面実装型部品を実装する実装面側に配置される第1の金属箔配線層と、実装面の反対側に配置され、絶縁被覆ワイヤが配線されるワイヤ配線層と、第1の金属箔配線層の表面に位置する金属箔配線を、第1の金属箔配線層の内層の金属箔配線及びワイヤ配線層の絶縁被覆ワイヤの少なくとも一方に電気的に接続する導通部を有する第1の層間導通穴とを備え、第1の層間導通穴の穴径が、多層配線板の板厚方向で異なる。

    Abstract translation: 该多层布线基板设置有:第一金属箔布线层,其具有至少两层金属箔布线,并且设置在安装表面安装部件的安装表面侧; 布线层,其布置在安装表面的相反侧上,并且具有布线在其中的绝缘电线; 以及第一中间通孔,具有用于将位于第一金属箔布线层的表面上的金属箔布线电连接到第一金属箔布线层的内层的金属箔布线的导电部分和/ 或布线层的绝缘电线。 第一夹层通孔的直径在多层布线板的板厚度方向上变化。

    METHOD TO MAKE A MULTILAYER CIRCUIT BOARD WITH INTERMETALLIC COMPOUND AND RELATED CIRCUIT BOARDS
    103.
    发明申请
    METHOD TO MAKE A MULTILAYER CIRCUIT BOARD WITH INTERMETALLIC COMPOUND AND RELATED CIRCUIT BOARDS 审中-公开
    制造具有互联化合物和相关电路板的多层电路板的方法

    公开(公告)号:WO2013044002A1

    公开(公告)日:2013-03-28

    申请号:PCT/US2012/056529

    申请日:2012-09-21

    Abstract: A method is for making a multilayer circuit board from circuit board layers, each including a dielectric layer and conductive traces thereon including a first metal. The method includes forming a through-via in a first circuit board layer, plating the through-via with the first metal, and coating a second metal onto the first metal of the first circuit board layer, the plated through-via, and the first metal. The method also includes aligning the first and second circuit board layers together so that the plated through-via of the first circuit board layer is adjacent a feature on the second circuit board layer, and heating and pressing the aligned first and second circuit board layers so as to laminate the dielectric layers together and form an intermetallic compound of the first and second metals bonding adjacent metal portions together.

    Abstract translation: 一种用于从电路板层制造多层电路板的方法,每个电路板包括介电层和其上包括第一金属的导电迹线。 该方法包括在第一电路板层中形成通孔,将通孔与第一金属电镀,并将第二金属涂覆到第一电路板层的第一金属上,镀通孔和第一金属 金属。 该方法还包括将第一和第二电路板层对准在一起,使得第一电路板层的电镀通孔与第二电路板层上的特征相邻,并且加热并压紧对准的第一和第二电路板层 以将电介质层层叠在一起,并将相邻的金属部分结合在一起的第一和第二金属的金属间化合物。

    Wiring substrate
    106.
    发明授权

    公开(公告)号:US11864316B2

    公开(公告)日:2024-01-02

    申请号:US17630630

    申请日:2021-07-16

    Applicant: Fujikura Ltd.

    Abstract: A wiring substrate includes a first insulating layer, a first conductor layer, and a plurality of filled vias. The first insulating layer has a first surface and a second surface positioned on a side opposite to the first surface. The first conductor layer is formed on the first surface of the first insulating layer. The plurality of filled vias are formed inside the first insulating layer. The plurality of filled vias each have a structure in which a via hole penetrating the first insulating layer is filled with a metal. The first conductor layer includes a pad. The pad overlaps the plurality of filled vias in a plan view from a thickness direction of the first insulating layer and is connected to the plurality of filled vias.

    MICRO-GROUND VIAS FOR IMPROVED SIGNAL INTEGRITY FOR HIGH-SPEED SERIAL LINKS

    公开(公告)号:US20230319978A1

    公开(公告)日:2023-10-05

    申请号:US17713347

    申请日:2022-04-05

    Abstract: An information handling system includes a printed circuit board, a surface mount connector including first and second surface mount connector portions, first and second different pairs, and a ground plane. The first and second surface mount connector portions are mounted on the printed circuit board. The first differential pair is located on the first surface mount connector portion, and the second differential pair is located on the second surface mount connector portion. The ground plane is located in between the first and second surface mount connector portions within the printed circuit board. The first ground via is in physical communication with the ground plane and a first ground pad on a surface of the printed circuit board. The second ground via is in physical communication with the ground plane and a second ground pad on the surface of the printed circuit board.

    Wiring substrate and method of manufacturing the wiring substrate

    公开(公告)号:US11683886B2

    公开(公告)日:2023-06-20

    申请号:US17568120

    申请日:2022-01-04

    Abstract: A wiring substrate includes: a base material; a first through-hole and a second through-hole that are formed in the base material; magnetic material that is filled in the first through-hole; a third through-hole that is formed in the magnetic material; a first plating film that covers an inner wall surface of the third through-hole; and a second plating film that covers an inner wall surface of the second through-hole and the first plating film. The first plating film includes a first electroless plating film that is in contact with the inner wall surface of the third through-hole, and a first electrolytic plating film that is laminated on the first electroless plating film.

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