FORMATION OF INSULATION LAYER OF SEMICONDUCTOR DEVICE

    公开(公告)号:JPH08236520A

    公开(公告)日:1996-09-13

    申请号:JP28700995

    申请日:1995-11-06

    Abstract: PROBLEM TO BE SOLVED: To harden an SOG film so that any residual substance can not be generated by forming a second insulating film by SOG on a first insulating film on a substrate, operating a low temperature processing and a plasma processing for hardening the second insulating film, and forming a third insulating film. SOLUTION: A first insulating film 5 is formed by forming an oxide film by a PECVD method. The spin coating of SOG substances is operated for flattening the surface so that a second insulating film 7 can be formed. A low temperature thermal processing is executed several times while a temperature is successively increased, and solvent components, volatile organic components, and moisture excluding organic substances used as coupling agent included in the second insulating film 7 are removed. A plasma processing is executed to the second insulating film 7, and residual substances such as Si-OH, H2 O, solvent, and volatile organic substances are removed so that a membranous quality with high elasticity can be formed. A third insulating film 9 is formed so that an insulating layer 11 can be completed. Thus, it is possible to prevent the current/voltage characteristics of the SOG film from being deteriorated.

    GATE FORMATION OF FIELD-EFFECT TRANSISTOR

    公开(公告)号:JPH08186128A

    公开(公告)日:1996-07-16

    申请号:JP31538694

    申请日:1994-12-19

    Abstract: PURPOSE: To reduce the resistance and parasitic capacitance of a fine gate by irradiating the upper and lower parts of the gate with an electron beam having different intensity of energy. CONSTITUTION: A two-dimensional electron gas layer 2, an AlGaAs layer 3 and a doped Schottky layer, i.e., a cap layer 4, are formed sequentially on a substrate 1 followed by formation of ohmic layers 5a, 5b. A resist 6 is then applied to the cap layer 4 and heat treated. Subsequently, a second resist 7 is applied onto the first resist 6 and an exposure step is executed using an electron beam having uneven energy. In order to form a T type gate, first and third electron beams 8a, 8c have energy of such intensity as exposing only the second resist 7 while a second electron beam 8b has energy of such intensity the first and second resists 6, 7 can be exposed entirely.

    OUTPUT BUFFER TYPE ATM SWITCH
    134.
    发明专利

    公开(公告)号:JPH08167909A

    公开(公告)日:1996-06-25

    申请号:JP24347295

    申请日:1995-09-21

    Abstract: PROBLEM TO BE SOLVED: To process high speed data received/outputted to/from each input/ output line without increasing a speed of the switch through decentralized processing by which lots of input cells are sent simultaneously to each output line and through ease of module realization. SOLUTION: The switch is provided with a batcher sorting network(BSN) 401 that arranges N cells received simultaneously through an input line of the switch in the order of smaller to larger cells, an expanded Banyan routing network(EBRN) 402 that provides an output of the arranged cells from the BSN 401 to an output line group to which output lines belong, and an output queuing module 403 that temporarily stores cells outputted from the EBRN 402 to a buffer of a common memory and transmits them to an output terminal.

    FRAME SYNCHRONIZING DEVICE
    135.
    发明专利

    公开(公告)号:JPH08163116A

    公开(公告)日:1996-06-21

    申请号:JP31645094

    申请日:1994-12-20

    Abstract: PURPOSE: To realize the frame synchronization device to demultiplex a time division multiplex signal in parallel from an STM-4C structure of a broad band overall information communication network in compliance with the ITU-T recommendations. CONSTITUTION: A serial parallel conversion circuit 10 and a byte arrangement circuit 30 detect a frame byte from high speed reception data at a transmission rate of 622 Mbps, align bytes based on a detected time and provides an output of frame data as 8-bit parallel data. A synchronizing signal pattern detection circuit 90 and a consecutive pattern confirmation circuit 100 detect frame bytes continuously based on a low speed clock obtained by applying 8 frequency division from an original clock signal at a frequency divider circuit 70 to seek a frame synchronizing signal. As a result, the power consumption is reduced and the amount of the hardware is decreased.

    LOCKING DEVICE FOR OPTICAL FREQUENCY MULTIPLEXING

    公开(公告)号:JPH08163097A

    公开(公告)日:1996-06-21

    申请号:JP6813995

    申请日:1995-03-27

    Abstract: PURPOSE: To maximize the number of multiplexing light sources by enhancing the extinction ratio of an error signal. CONSTITUTION: A center carrier frequency of each light source 13 is dithered by a low frequency signal from each low frequency oscillator 11. Optical signals from the light sources are coupled by a 2×2 photocoupler 15. One output from the photocoupler 15 is sent externally as a final multiplexed output and the other output is fed to an optical fiber filter 17 in a resonance means via a 2×1 photocoupler 16. The optical signal reflected in the filter 17 is converted into an electric signal by a photo detector 18 via the photocoupler 16 and the electric signal is fed to an optical frequency stabilizing controller 19. A PID circuit 20 in the controller 19 detects an error signal, it is converted into a corresponding current by a PSD circuit 21 and the current is applied as a bias to the light sources 13. Since center carrier frequencies f1-fn of the light sources 13 are aligned corresponding to resonance frequencies f1'-fn' of the resonator by repeating the process above, an output that is optical-frequency-multiplexed at an equal interval is obtained.

    FIELD-EFFECT ELEMENT AND FORMATION METHOD OF ITS ELECTRODE

    公开(公告)号:JPH08162636A

    公开(公告)日:1996-06-21

    申请号:JP31538894

    申请日:1994-12-19

    Abstract: PURPOSE: To provide a field-effect element and its electrode forming method capable for forming the electric contacts of an element aligning them automatically, without a contact hole forming process, in a wiring process between electrodes of a kind of silicon, metal or different kinds of metals. CONSTITUTION: Parts of an insulating film 48 on field oxide films 40 and on parts where electrode contacts of wiring electrodes, electrodes of a kind of silicon, electrodes of different kinds of metals are formed are removed, and only parts surrounding the region of a gate electrode, i.e., gate oxide films 48a, 48b are left unremoved. And a substance for wiring electrodes is applied, and the substance is patterned after that and wiring electrodes 49 are formed.

    ARITHMETIC DEVICE OF MULTIVALUED LOGICAL PRODUCT

    公开(公告)号:JPH08148990A

    公开(公告)日:1996-06-07

    申请号:JP31048194

    申请日:1994-12-14

    Abstract: PURPOSE: To provide the operation device of AND logic, which defines the operation rule of AND for operating AND on multi-nary logics while the AND of binary numbers is contained, by containing an operation adder for obtaining a multi-nary logic value fitted to the input of the binary number and the computing element of binary-nary AND for receiving the output of the operation adder and binary input. CONSTITUTION: The AND logic operator 52 receiving the three inputs of multi- nary logic is configured of two AND logic operators 51 receiving two inputs. Such operation device of multi-nary AND logic contains the operation function of existed binary AND and the operation function of binary-multi-nary AND. For calculating the output of the logic circuit by using the binary-multi-nary AND logic operator, the operation circuit is constituted of only one binary- multi-nay AND logic operator and one operation adder. When the multi-nary AND logic operator is used, the configuration of the circuit and the like for operating the multi-nary logic value can be simplified.

    MANUFACTURE OF HIGH-TEMPERATURE SUPERCONDUCTING FIELD-EFFECTTRANSISTOR WITH THICK SUPERCONDUCTING CHANNEL LAYER

    公开(公告)号:JPH08148729A

    公开(公告)日:1996-06-07

    申请号:JP29744094

    申请日:1994-11-30

    Abstract: PURPOSE: To provide the manufacture of a thick superconducting field-effect transistor having a superconducting channel. CONSTITUTION: A template layer 32 and a YBa2 Cu3 O7-x layer 34 are formed successively onto the surface of the crystal substrate 30 of an oxide. A part of the YBa2 Cu3 O7-x layer 34 is removed (an opening section 35), and the layer 32 is exposed. The surfaces are covered with a YBa2 Cu3 O7-x channel layer 36 in thickness of 60-100 mm. An SrTiO3 protective layer 38 and an SrTiO3 insulating layer 40 are formed successively onto the channel layer 36. Parts of the insulation layer 40 and the protective layer 38 are removed by dry etching, and parts of the channel layer 36 are exposed. Source/drain electrodes 44, 46 are formed onto the surface of the cannel layer 36. A gate electrode 42 is formed simultaneously onto the insulating layer 40 in the opening section 35. Accordingly, the productivity and the characteristics of the superconducting FET are improved.

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