公开(公告)号：US20160064174A1

公开(公告)日：2016-03-03

申请号：US14833447

申请日：2015-08-24

Applicant: NuFlare Technology, Inc.

Inventor： Nobuo MIYAMOTO

IPC: H01J29/02 ,  H01J29/48

CPC classification number: H01J29/025 ,  H01J3/027 ,  H01J3/38 ,  H01J29/02 ,  H01J29/485 ,  H01J29/92 ,  H01J29/96 ,  H01J37/065 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/061 ,  H01J2237/31776

Abstract: An electron gun supporting member includes an insulating supporting member configured such that its one end is connected to a predetermined member having a ground potential and other end is connected to a high-voltage electrode to which a high potential being a negative high potential for emitting electrons from an electron source is applied, so as to support the high-voltage electrode, and a metal film formed in a partial region, which contacts neither the high-voltage electrode nor the predetermined member, on the outer surface of the insulating supporting member.

Abstract translation: 电子枪支撑构件包括绝缘支撑构件，其构造成使得其一端连接到具有接地电位的预定构件，并且另一端连接到高电压电极，高电位是用于发射电子的负高电位 施加电子源，以便在绝缘支撑构件的外表面上支撑高压电极和形成在部分区域中的金属膜，其也不与高压电极或预定构件接触。

公开(公告)号：US09269520B2

公开(公告)日：2016-02-23

申请号：US14621526

申请日：2015-02-13

Applicant: JEOL Ltd.

Inventor： Takashi Satoh

IPC: H01J29/58 ,  H01J3/08 ,  H01J3/02 ,  H01J37/063 ,  H01J37/305 ,  B23K15/00 ,  B23K15/06 ,  B33Y30/00

CPC classification number: H01J3/08 ,  B22F3/1055 ,  B23K15/002 ,  B23K15/0026 ,  B23K15/0086 ,  B23K15/06 ,  B33Y30/00 ,  H01J3/02 ,  H01J3/024 ,  H01J3/027 ,  H01J37/063 ,  H01J37/305 ,  H01J2237/06308 ,  H01J2237/065 ,  H01J2237/3128 ,  Y02P10/295

Abstract: There is disclosed a method of controlling an electron gun without causing decreases in brightness of the electron beam if a current-limiting aperture cannot be used. The electron gun (10) has a cathode (11), a Wehnelt electrode (12), a control electrode (13), an anode (14), and a controller (22). The Wehnelt electrode (12) has a first opening (12c) in which the tip of the cathode is inserted, and focuses thermal electrons emitted from the tip of the cathode (11). The thermal electrons emitted from the tip of the cathode (11) are caused to pass into a second opening (13c) by the control electrode (13). The anode (14) accelerates the thermal electrons emitted from the cathode (11) such that the thermal electrons passed through the second opening (13c) pass through a third opening (14b) and impinge as an electron beam (B1) on a powdered sample (8). The controller (22) sets the bias voltage and the control voltage based on combination conditions of the bias voltage and control voltage to maintain the brightness of the beam constant.

Abstract translation: 如果不能使用限流孔，则公开了一种控制电子枪而不引起电子束亮度降低的方法。 电子枪（10）具有阴极（11），Wehnelt电极（12），控制电极（13），阳极（14）和控制器（22）。 Wehnelt电极（12）具有插入阴极顶端的第一开口（12c），并聚焦从阴极（11）的尖端发射的热电子。 从阴极（11）的顶端发射的热电子被控制电极（13）通入第二开口（13c）。 阳极（14）加速从阴极（11）发射的热电子，使得穿过第二开口（13c）的热电子通过第三开口（14b）并作为电子束（B1）撞击在粉末样品上 （8）。 控制器（22）基于偏置电压和控制电压的组合条件设置偏置电压和控制电压，以保持光束的亮度恒定。

公开(公告)号：US09257253B1

公开(公告)日：2016-02-09

申请号：US14465797

申请日：2014-08-21

Applicant: Curtis G. Allen ,  Christopher P. Ferrari ,  Adam J. Mitchell

Inventor： Curtis G. Allen ,  Christopher P. Ferrari ,  Adam J. Mitchell

IPC: H01J29/70 ,  H01J29/48 ,  H01J29/58 ,  H01J29/56

CPC classification number: H01J29/485 ,  H01J3/027 ,  H01J23/06 ,  H01J29/04 ,  H01J29/484 ,  H01J29/488 ,  H01J29/56 ,  H01J29/58

Abstract: The present invention generally relates to systems and methods for generating controllable beam of electrons using a hollow-cathode triode electron gun that substantially mitigate impact of back-streaming electrons.

Abstract translation: 本发明一般涉及使用中空 - 阴极三极管电子枪产生可控的电子束的系统和方法，其基本上减轻了反向流动电子的影响。

公开(公告)号：US20150187541A1

公开(公告)日：2015-07-02

申请号：US14578525

申请日：2014-12-22

Applicant: MAPPER LITHOGRAPHY IP B.V

Inventor： Laura DINU-GÜRTLER ,  Eric Petrus HOGERVORST

IPC: H01J37/317 ,  H01J1/15 ,  H01J37/075

CPC classification number: H01J37/3174 ,  G03F7/70058 ,  H01J1/15 ,  H01J1/28 ,  H01J3/027 ,  H01J3/029 ,  H01J37/075 ,  H01J37/3177 ,  H01J2229/481 ,  H01J2237/061

Abstract: The invention relates to a cathode arrangement comprising: a thermionic cathode comprising an emission portion provided with an emission surface for emitting electrons, and a reservoir for holding a material, wherein the material, when heated, releases work function lowering particles that diffuse towards the emission portion and emanate at the emission surface at a first evaporation rate; a focusing electrode comprising a focusing surface for focusing the electrons emitted from the emission surface of the cathode; and an adjustable heat source configured for keeping the focusing surface at a temperature at which accumulation of work function lowering particles on the focusing surface is prevented.

Abstract translation: 本发明涉及一种阴极装置，其包括：热离子阴极，其包括具有用于发射电子的发射表面的发射部分和用于保持材料的储存器，其中所述材料在被加热时释放向发射扩散的功函数降低颗粒 以第一蒸发速率发射在发射表面; 聚焦电极，其包括用于聚焦从阴极的发射表面发射的电子的聚焦表面; 以及可调节热源，其被配置为将聚焦表面保持在防止在聚焦表面上降低颗粒的功函数积累的温度。

公开(公告)号：US20150092923A1

公开(公告)日：2015-04-02

申请号：US14385503

申请日：2013-03-14

Applicant: NANOX IMAGING PLC

Inventor： Koichi Iida ,  Hidenori Kenmotsu ,  Jun Yamazaki ,  Hitoshi Masuya

IPC: H01J3/14 ,  G01T1/161 ,  H01J35/14 ,  H01J3/02

CPC classification number: H01J3/14 ,  G01N23/046 ,  G01N2223/204 ,  G01N2223/419 ,  G01T1/161 ,  H01J1/3042 ,  H01J3/021 ,  H01J3/027 ,  H01J29/467 ,  H01J31/127 ,  H01J35/065 ,  H01J35/14 ,  H01J2235/068

Abstract: The disclosure relates to an image capture device comprising an electron receiving construct and an electron emitting construct, and further comprising an inner gap providing an unobstructed space between the electron emitting construct and the electron receiving construct. The disclosure further relates to an x-ray emitting device comprising an x-ray emitting construct and an electron emitting construct, said x-ray emitting construct comprising an anode, the anode being an x-ray target, wherein the x-ray emitting device may comprise an inner gap providing an unobstructed space between the electron emitting construct and the x-ray emitting construct. The disclosure further relates to an x-ray imaging system comprising an image capture device and an x-ray emitting device.

Abstract translation: 本公开涉及包括电子接收构造体和电子发射构造物的图像捕获装置，并且还包括在电子发射构造体和电子接收构造体之间提供无障碍空间的内部间隙。 本发明还涉及一种包括x射线发射结构和电子发射结构的x射线发射器件，所述x射线发射结构包括阳极，阳极是x射线靶，其中x射线发射器件 可以包括提供电子发射构造体和x射线发射结构之间的无障碍空间的内部间隙。 本公开还涉及包括图像捕获装置和x射线发射装置的X射线成像系统。

公开(公告)号：US08913719B2

公开(公告)日：2014-12-16

申请号：US13780131

申请日：2013-02-28

Applicant: Rigaku Corporation

Inventor： Masaru Kuribayashi ,  Masahiro Nonoguchi ,  Masashi Kageyama

IPC: H01J35/06 ,  H01J1/88 ,  H01J3/02 ,  H01J35/14

CPC classification number: H01J1/88 ,  H01J3/027 ,  H01J35/06 ,  H01J35/14

Abstract: An electron gun having: a cathode for emitting electrons; a first Wehnelt electrode equipped with a first aperture through which electrons are allowed to pass; and a second Wehnelt electrode that is equipped with a second aperture disposed at a predetermined position with respect to the cathode and the first aperture, and that is furnished at a position closer to the cathode than the first Wehnelt electrode, wherein: the cathode and the second Wehnelt electrode are included within a single assembly constituting a unitary body; and the assembly is detachably attached to the first Wehnelt electrode. Replacement of the cathode can be performed by detaching the cathode unit from the first Wehnelt electrode, and then ejecting the cathode unit out from the Wehnelt cover. The emitter of the cathode can thereby be reliably positioned with respect to the second aperture.

Abstract translation: 一种具有：用于发射电子的阴极的电子枪; 配备有第一孔的第一个Wehnelt电极，使电子通过该第一孔; 以及第二Wehnelt电极，其配备有相对于阴极和第一孔设置在预定位置处的第二孔，并且设置在比第一Wehnelt电极更靠近阴极的位置，其中：阴极和 第二个Wehnelt电极包含在构成单体的单个组件中; 并且组件可拆卸地附接到第一Wehnelt电极。 可以通过将阴极单元从第一Wehnelt电极分离出来，然后将阴极单元从Wehnelt盖中排出来进行阴极的更换。 因此，阴极的发射极可以相对于第二孔可靠地定位。

公开(公告)号：US08772743B2

公开(公告)日：2014-07-08

申请号：US13122914

申请日：2009-09-25

Applicant: Kurt Holm

Inventor： Kurt Holm

IPC: A61N5/00

CPC classification number: G21K5/04 ,  A61L2/087 ,  A61L2/24 ,  A61L2202/181 ,  H01J3/027 ,  H01J3/08 ,  H01J33/00

Abstract: An electron beam sterilizing device, comprises: an electron-generating filament; a beam-shaper; an output window; a high-voltage supply, capable of creating a high-voltage potential between the electron-generating filament and the output window, for acceleration of electrons; a high-voltage supply for driving current through the electron-generating filament; a control unit for controlling the operation of the electron beam sterilizing device. The electron beam sterilizing device has at least three operational states which include: an OFF-state, where there is no drive current through the electron-generating filament; an ON-state, where the electron-generating filament is kept at a temperature above the emission temperature so as to generate electrons for sterilization; and a standby state, between the OFF-state and ON-state, where the electron-generating filament is kept at a predetermined temperature just below the emission temperature. The control unit controls the device to assume the standby state.

Abstract translation: 一种电子束消毒装置，包括：电子发生丝; 光束整形器 输出窗口 能够在电子发生丝与输出窗之间产生高压电位的高压电源，用于加速电子; 用于驱动通过电子发生丝的电流的高压电源; 用于控制电子束消毒装置的操作的控制单元。 电子束灭菌装置具有至少三种操作状态，包括：通过电子发生丝不存在驱动电流的关闭状态; 导通状态，其中电子发生丝保持在高于发射温度的温度以产生用于灭菌的电子; 以及在OFF状态和ON状态之间的待机状态，其中电子发生灯丝保持在正好低于发射温度的预定温度。 控制单元控制设备处于待机状态。

公开(公告)号：US20130341526A1

公开(公告)日：2013-12-26

申请号：US13915834

申请日：2013-06-12

Applicant: Canon Kabushiki Kaisha

Inventor： Yasuo Ohashi

IPC: H01J3/18

CPC classification number: H01J3/18 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/027 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/032 ,  H01J2237/1205 ,  H01J2237/28

Abstract: Provided is an electrostatic lens array, including multiple substrates arranged with intervals, each of the multiple substrates having an aperture for passing a charged particle beam, in which: in a travelling direction of the charged particle beam, a peripheral contour line formed by any one of surfaces of the multiple substrates other than an upper surface of a most upstream substrate and a lower surface of a most downstream substrate has a protruding portion protruding from a peripheral contour line of one of the upper surface of the most upstream substrate and the lower surface of the most downstream substrate; and a position of the protruding portion is defined by a position regulating member, whereby parallelism is adjustable so that a surface including the protruding portion is parallel to a surface to be irradiated with the charged particle beam after passing through the aperture.

Abstract translation: 本发明提供一种静电透镜阵列，其包括间隔布置的多个基板，所述多个基板中的每一个具有用于使带电粒子束通过的孔，其中：在带电粒子束的行进方向上，由任何一个形成的周边轮廓线 多个基板的除了最上游基板的上表面和最下游基板的下表面以外的多个基板的表面具有从最上游基板的上表面和下游表面的上表面的周边轮廓线突出的突出部 的最下游底物; 并且突出部的位置由位置限制构件限定，由此平行度是可调节的，使得包括突出部分的表面平行于穿过孔之后被带电粒子束照射的表面。

公开(公告)号：US08461525B2

公开(公告)日：2013-06-11

申请号：US13198640

申请日：2011-08-04

Applicant: Alexander Henstra

Inventor： Alexander Henstra

IPC: H01J3/26 ,  H01J40/00

CPC classification number: H01J37/05 ,  H01J3/027 ,  H01J3/04 ,  H01J37/063 ,  H01J2237/045 ,  H01J2237/057 ,  H01J2237/061 ,  H01J2237/08 ,  H01J2237/15 ,  H01J2237/1534

Abstract: A particle source in which energy selection occurs by sending a beam of electrically charged particles eccentrically through a lens so that energy dispersion will occur in an image formed by the lens. By projecting this image onto a slit in an energy selecting diaphragm, it is possible to allow only particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam will have a reduced energy spread. The energy dispersed spot is imaged on the slit by a deflector. When positioning the energy dispersed spot on the slit, central beam is deflected from the axis to such an extent that it is stopped by the energy selecting diaphragm. Hereby reflections and contamination resulting from this beam in the region after the diaphragm are avoided. Also electron-electron interaction resulting from the electrons from the central beam interacting with the energy filtered beam in the area of deflector is avoided.

Abstract translation: 通过使透过透镜偏心地发送带电粒子的束使能量分散发生在由透镜形成的图像中而发生能量选择的粒子源。 通过将该图像投影到能量选择隔膜的狭缝上，可以仅允许能谱范围的有限部分中的粒子通过。 因此，通过的光束将具有减小的能量扩展。 能量分散点通过偏转器在狭缝上成像。 当将能量分散点定位在狭缝上时，中心束从轴线偏转到其被能量选择隔膜停止的程度。 因此避免了在隔膜之后的区域中由该光束产生的反射和污染。 避免了来自中心束的电子的电子 - 电子相互作用，与偏转器区域中的能量过滤光束相互作用。

公开(公告)号：US20130035905A1

公开(公告)日：2013-02-07

申请号：US13622212

申请日：2012-09-18

Applicant: The Board of Trustees of the Leland Stanford Junio

Inventor： Dragos E. Constantin ,  Rebecca Fahrig ,  Paul J. Keall

IPC: G06F17/50

CPC classification number: H01J3/027 ,  H01J3/029 ,  H05H7/08 ,  H05H2007/084

Abstract: A method of configuring an electron gun for generating and injecting an electron beam into a linac accelerating waveguide operating in magnetic fringe fields of an MRI scanner in the absence of a magnetic shield is provided using an appropriately programmed computer to determining an anode drift tube diameter at an injection point of a linac according to a magnetic field value from an MRI scanner and to a predetermined current density, where the magnetic field has an isocenter, determining a transverse diameter of a Type M cathode in an electron gun, according to the anode drift tube diameter and the current density, and minimizing an emittance value in an electron beam of the electron gun at an entry point of the anode drift tube by optimizing the distance between the cathode and the anode, where the electron beam is along an axis of symmetry of the magnetic field.