Abstract:
Selected dimensions of conductive strips on one or more layers of a multilayer substrate are increased to compensate misregistration effects associated with device fabrication. The increased dimension can be based on one or more factors such as, for example, a likely misregistration distance. In one embodiment, conductive strips from two different conductor layers follow a common path and are electrically connected by a via to provide an overlay inductor. The conductive strip in one conductor layer is made slightly wider that the conductive strip of the other conductor layer to reduce the effects of misregistration on electrical characteristics.
Abstract:
A method of forming an integrated circuit substrate that may be adapted to be attached to one or more electronic components. The method includes applying a resist to a back side of a substrate which includes patterned conductive layers on a front side and a back side of the substrate. The method further includes removing part of the patterned conductive layer from the front side of the substrate to form pads and interconnects on the front side of the substrate and applying another resist to the front side of the substrate. The method also includes forming a pattern in each resist that exposes the pads on the front and back sides of the substrate and applying electrolytic nickel to the pads on the substrate.
Abstract:
Ein Metall-Keramik-Substrat für elektrische Schaltkreise oder Module umfasst eine Keramikschicht mit wenigstens einer auf einer Oberflächenseite dieser Keramikschicht flächig aufgebrachten Metallschicht eines ersten Typs. Auf wenigstens einem Teilbereich einer der Keramikschicht abgewandten Oberflächenseite der Metallschicht des ersten Typs ist eine Isolierschicht aus einem glashaltigen Material aufgebracht und auf diese wenigstens eine Metallschicht eines zweiten Typs, und zwar jeweils mit einer Dicke kleiner als die Dicke der Keramikschicht und der Metallschicht des ersten Typs.
Abstract:
A high density, non-bussed semiconductor package and a full body gold (FBG) method for manufacturing semiconductor packages are provided to improve electrical and mechanical connections with semiconductors and other electronic components and devices. The semiconductor package is fabricated by developing circuitry on the wire bond side of the semiconductor package prior to developing the ball attach side. The copper circuitry on the wire bond side is fully covered and protected from the environment. Solder masks are applied directly to the semiconductor substrat or copper layer to avoid contact with gold. The ball attach area is covered and protected by metallic layers, such as nickel and gold, or an organic solderable material to eliminate weak solder mask-gold connections.
Abstract:
In a printed circuit board comprising a track pattern (L1) and a substrate (DP), an additional layer (L3) of copper is provided, which is electrically insulated from the track pattern by a layer of an insulating material (L2). Both these layers (L2, L3) are situated between the track pattern (L1) and the substrate (DP). During operation of a circuit obtained by making use of the printed circuit board, the additional layer (L3) serves as a heat spreader, resulting in an efficient transport of the heat generated by components (C1, C2) in the circuit.
Abstract:
A printed wiring board and method for producing the same, in which an upper-surface pattern is readily formed, and a lower-surface metal foil is hardly damaged when a blind via hole is made by a laser beam. A lower-surface metal foil (220) is provided over the lower surface of an insulating sheet (5), and an upper-surface metal foil (210) thinner than the lower-surface metal foil (220) is provided over its upper surface. An open hole (213) is made in the upper-surface metal foil in a position corresponding to the area (35) where a blind via hole is formed. A laser beam (8) is projected onto the area (35) through the open hole (213) to make a blind via hole (3) the bottom of which is the lower-surface metal foil. A metal plating film (23) is formed on the inner wall of the blind via hole (3). Upper- and lower-surface patterns (21, 22) are formed by etching.