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    SYSTEMS AND METHODS FOR PROCESS METRIC AWARE PROCESS CONTROL
    11.
    发明申请
    SYSTEMS AND METHODS FOR PROCESS METRIC AWARE PROCESS CONTROL 审中-公开

    公开(公告)号：WO2021170325A1

    公开(公告)日：2021-09-02

    申请号：PCT/EP2021/051656

    申请日：2021-01-26

    Applicant: ASML NETHERLANDS B.V.

    Inventor： LARRANAGA, Maialen ,  GKOROU, Dimitra ,  YPMA, Alexander

    IPC: G03F7/20 ,  G05B19/418

    Abstract: Described herein is a method comprising: determining a sequence of states of an object, the states determined based on processing information associated with the object, wherein the sequence of states includes one or more future states of the object; determining, based on at least one of the states within the sequence of states and the one or more future states, a process metric associated with the object, the process metric comprising an indication of whether processing requirements for the object are satisfied for individual states in the sequence of states; and initiating an adjustment to processing based on (1) at least one of the states and the one or more future states and (2) the process metric, the adjustment configured to enhance the process metric for the individual states in the sequence of states such that final processing requirements for the object are satisfied.

    APPARATUS AND METHOD FOR PROPERTY JOINT INTERPOLATION AND PREDICTION
    12.
    发明申请
    APPARATUS AND METHOD FOR PROPERTY JOINT INTERPOLATION AND PREDICTION 审中-公开

    公开(公告)号：WO2020156724A1

    公开(公告)日：2020-08-06

    申请号：PCT/EP2019/084923

    申请日：2019-12-12

    Applicant: ASML NETHERLANDS B.V.

    Inventor： HASIBI, Faegheh ,  VAN DIJK, Leon, Paul ,  LARRANAGA, Maialen ,  YPMA, Alexander ,  VAN HAREN, Richard, Johannes, Franciscus

    IPC: G06N3/04 ,  G06N3/08

    Abstract: According to an aspect of the disclosure there is provided a method for predicting a property associated with a product unit. The method may comprise obtaining a plurality of data sets, wherein each of the plurality of data sets comprises data associated with a spatial distribution of a parameter across the product unit, representing each of the plurality of data sets as a multidimensional object, obtaining a convolutional neural network model trained with previously obtained multidimensional objects and properties of previous product units, and applying the convolutional neural network model to the plurality of multidimensional objects representing the plurality of data sets, to predict the property associated with the product unit.

    MAINTAINING A SET OF PROCESS FINGERPRINTS
    13.
    发明申请
    MAINTAINING A SET OF PROCESS FINGERPRINTS 审中-公开

    公开(公告)号：WO2018192789A1

    公开(公告)日：2018-10-25

    申请号：PCT/EP2018/058997

    申请日：2018-04-09

    Applicant: ASML NETHERLANDS B.V.

    Inventor： YPMA, Alexander ,  BASTANI, Vahid ,  SONNTAG, Dag ,  NIJE, Jelle ,  CEKLI, Hakki, Ergun ,  TSIROGIANNIS, Georgios ,  VAN WIJK, Robert Jan

    IPC: G03F7/20

    Abstract: A method of maintaining a set of fingerprints (316) representing variation of one or more process parameters across wafers, has the steps: (a) receiving measurement data (324) of one or more parameters measured on wafers; (b) updating (320) the set of fingerprints based on an expected evolution (322) of the one or more process parameters; and (c) evaluation of the updated set of fingerprints based on decomposition of the received measurement data in terms of the updated set of fingerprints. Each fingerprint may have a stored likelihood of occurrence (316), and the decomposition may involve: estimating, based the received measurement data (324), likelihoods of occurrence of the set of fingerprints in the received measurement data; and updating the stored likelihoods of occurrence based on the estimated likelihoods.

    GENERATING PREDICTED DATA FOR CONTROL OR MONITORING OF A PRODUCTION PROCESS
    14.
    发明申请
    GENERATING PREDICTED DATA FOR CONTROL OR MONITORING OF A PRODUCTION PROCESS 审中-公开

    公开(公告)号：WO2018133999A1

    公开(公告)日：2018-07-26

    申请号：PCT/EP2017/082553

    申请日：2017-12-13

    Applicant: ASML NETHERLANDS B.V.

    Inventor： YPMA, Alexander ,  GKOROU, Dimitra ,  TSIROGIANNIS, Georgios ,  HOOGENBOOM, Thomas, Leo, Maria ,  VAN HAREN, Richard, Johannes, Franciscus

    IPC: G03F7/20 ,  G05B19/418 ,  H01L21/66

    Abstract: The invention generates predicted data for control or monitoring of a production process to improve a parameter of interest. Context data (502) associated with operation of the production process (504) is obtained. Metrology/test (508) is performed on the product (506) of the production process (504), thereby obtaining performance data (510). A context-to-performance model is provided to generate predicted performance data (526) based on labeling of the context data (502) with performance data. This is an instance of semi-supervised learning. The context-to-performance model includes the learner (522) that performs semi-supervised labeling. The context-to-performance model is modified using prediction information related to quality of the context data and/or performance data. Prediction information may comprise relevance information relating to relevance of the obtained context data and/or obtained performance data to the parameter of interest. The prediction information may comprise model uncertainty information relating to uncertainty of the predicted performance data.

    LITHOGRAPHY SYSTEM AND A MACHINE LEARNING CONTROLLER FOR SUCH A LITHOGRAPHY SYSTEM
    15.
    发明申请
    LITHOGRAPHY SYSTEM AND A MACHINE LEARNING CONTROLLER FOR SUCH A LITHOGRAPHY SYSTEM 审中-公开
    LITHOGRAPHY系统和一台机器学习控制器

    公开(公告)号：WO2015024783A1

    公开(公告)日：2015-02-26

    申请号：PCT/EP2014/066919

    申请日：2014-08-06

    Applicant: ASML NETHERLANDS B.V.

    Inventor： SCHMITT-WEAVER, Emil, Peter ,  HENKE, Wolfgang ,  HOOGENBOOM, Thomas, Leo, Maria ,  IZIKSON, Pavel ,  LUEHRMANN, Paul, Frank ,  SLOTBOOM, Daan, Maurits ,  STAECKER, Jens ,  YPMA, Alexander

    IPC: G03F7/20

    CPC classification number: G03F7/70516 ,  G03F7/70491 ,  G03F7/70525 ,  G03F7/70625 ,  G03F7/70633

    Abstract: A lithography system configured to apply a pattern to a substrate, the system including a lithography apparatus configured to expose a layer of the substrate according to the pattern, and a machine learning controller configured to control the lithography system to optimize a property of the pattern, the machine learning controller configured to be trained on the basis of a property measured by a metrology unit configured to measure the property of the exposed pattern in the layer and/or a property associated with exposing the pattern onto the substrate, and to correct lithography system drift by adjusting one or more selected from: the lithography apparatus, a track unit configured to apply the layer on the substrate for lithographic exposure, and/or a control unit configured to control an automatic substrate flow among the track unit, the lithography apparatus, and the metrology unit.

    Abstract translation: 一种光刻系统，被配置为将图案应用于基底，所述系统包括被配置为根据图案暴露基底层的光刻设备，以及机器学习控制器，被配置为控制光刻系统以优化图案的特性， 机器学习控制器被配置为基于由测量单元测量的属性来进行训练，所述测量单元被配置成测量所述层中的暴露图案的性质和/或与将图案暴露于衬底相关联的属性，并且修正光刻系统 通过调整选自以下的一个或多个漂移：光刻设备，被配置为将该层施加在用于光刻曝光的基板上的轨道单元和/或控制单元，被配置为控制轨道单元，光刻设备之间的自动衬底流动， 和计量单位。

    COMPUTER IMPLEMENTED METHOD FOR DIAGNOSING A SYSTEM COMPRISING A PLURALITY OF MODULES
    16.
    发明申请
    COMPUTER IMPLEMENTED METHOD FOR DIAGNOSING A SYSTEM COMPRISING A PLURALITY OF MODULES 审中-公开

    公开(公告)号：WO2023280493A1

    公开(公告)日：2023-01-12

    申请号：PCT/EP2022/065403

    申请日：2022-06-07

    Applicant: ASML NETHERLANDS B.V.

    Inventor： VAN HERTUM, Pieter ,  GKOROU, Dimitra ,  VAN SCHOUBROECK, Joachim, Kinley ,  KAREVAN, Zahra ,  YPMA, Alexander

    IPC: G06N5/04 ,  G06N7/00 ,  G03F7/20 ,  G05B23/02

    Abstract: A computer implemented method for diagnosing a system comprising a plurality of modules. The method comprises: receiving a causal graph, the causal graph defining (i) a plurality of nodes each representing a module of the system, wherein each module is characterized by one or more signals; and (ii) edges connected between the nodes, the edges representing propagation of performance between modules; generating a reasoning tool by augmenting the causal graph with diagnostics knowledge based on historically determined relations between performance, statistical and causal characteristics of at least one module out of the plurality of modules; obtaining a health metric of the at least one module, wherein the health metric is associated with the one or more signals associated with the at least one module; and using the health metric as an input to the reasoning tool to identify a module that is the most likely cause of the behaviour.

    METHOD TO LABEL SUBSTRATES BASED ON PROCESS PARAMETERS
    19.
    发明申请
    METHOD TO LABEL SUBSTRATES BASED ON PROCESS PARAMETERS 审中-公开

    公开(公告)号：WO2019149562A1

    公开(公告)日：2019-08-08

    申请号：PCT/EP2019/051424

    申请日：2019-01-22

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BASTANI, Vahid ,  YPMA, Alexander ,  SONNTAG, Dag ,  MOS, Everhardus, Cornelis ,  CEKLI, Hakki, Ergun ,  LIN, Chenxi

    IPC: G06N5/00 ,  G03F7/20

    Abstract: Substrates to be processed (402) are partitioned based on pre-processing data (404) that is associated with substrates before a process step. The data is partitioned using a partition rule (410, 412, 414) and the substrates are partitioned into subsets (G1-G4) in accordance with subsets of the data obtained by the partitioning. Corrections (COR1-COR4) are applied, specific to each subset. The partition rule is obtained (Fig 5) using decision tree analysis on a training set of substrates (502). The decision tree analysis uses pre-processing data (256, 260) associated with the training substrates before they were processed, and post-processing data (262) associated with the training substrates after being subject to the process step. The partition rule (506) that defines the decision tree is selected from a plurality of partition rules (512) based on a characteristic of subsets of the post-processing data. The associated corrections (508) are obtained implicitly at the same time.

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