公开(公告)号：JP2010074160A

公开(公告)日：2010-04-02

申请号：JP2009208754

申请日：2009-09-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BRUIJSTENS JEROEN PETER JOHANNES ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  SIEBE LANDHEER ,  JORRITSMA LAURENTIUS CATRINUS ,  MEESTER ARNOUT JOHANNES ,  JANSEN BAUKE ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO ,  VAN DER LEE MAURICE MARTINUS JOHANNES ,  TANASA GHEORGHE ,  NOORDAM LAMBERTUS DOMINICUS

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03B27/52

Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces an influence of a droplet to a final element and/or an influence of gas and liquid to the interface of the final element, or substantially avoids the formation of such a droplet. SOLUTION: This lithography device includes: a projection system PS; and a liquid confinement structure for at least partially confining an immersion liquid in an immersion space demarcated by the projection system, a liquid confinement structure 12, and also a substrate and/or a substrate table. In the lithography device, for example, the influence of the droplet on the final element of the projection system PS is reduced, or the formation of such a droplet is avoided substantially. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种降低液滴对最终元素的影响和/或气体和液体对最终元件的界面的影响的系统，或基本避免形成这样的液滴。 解决方案：该光刻设备包括：投影系统PS; 以及用于至少部分地将浸没液体限制在由投影系统划分的浸没空间中的液体限制结构，液体限制结构12以及基底和/或基底台。 在光刻装置中，例如，液滴对投影系统PS的最终元件的影响减小，或者基本上避免了形成这样的液滴。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2012138631A

公开(公告)日：2012-07-19

申请号：JP2012088182

申请日：2012-04-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BRUIJSTENS JEROEN PETER JOHANNES ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  SIEBE LANDHEER ,  MEESTER ARNOUT JOHANNES ,  JANSEN BAUKE ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO ,  TANASA GHEORGHE

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a system to reduce effect of droplets on a last optical element or substantially to avoid such droplet formation.SOLUTION: A lithographic apparatus comprises a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. A humid gas space is defined between the projection system, the liquid confinement structure and the immersion liquid in the immersion space, the humid gas space being configured to confine humid gas.

Abstract translation: 要解决的问题：提供一种降低液滴对最后一个光学元件的影响或基本上避免这种液滴形成的系统。 解决方案：光刻设备包括投影系统和液体限制结构，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构和衬底和/或衬底台限定的浸没空间中。 在投影系统，液体限制结构和浸没空间中的浸没液体之间限定湿气空间，湿气空间被配置为限制湿气。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011097108A

公开(公告)日：2011-05-12

申请号：JP2011028118

申请日：2011-02-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  HOEKERD KORNELIS TIJMEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which carries out cleaning readily and effectively, and also to provide a method for effectively cleaning an immersion lithographic apparatus. SOLUTION: A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, and the liquid confinement system has an aperture to allow passage of a beam of radiation through the liquid confinement system of an immersion lithographic apparatus. The cleaning tool includes: a sonic transducer; a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned; and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种易于有效地进行清洁的光刻设备，并且还提供一种有效地清洗浸没式光刻设备的方法。 公开了一种用于清洁浸没式光刻设备的液体限制系统的表面的清洁工具，并且液体限制系统具有允许辐射束通过浸没式光刻的液体限制系统的孔 仪器。 清洁工具包括：声音换能器; 储存器，构造成在声音换能器和要清洁的表面之间保持液体; 以及位于孔下方的储存器中的屏障，在使用中形成对声波的屏蔽。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2009177143A

公开(公告)日：2009-08-06

申请号：JP2008318283

申请日：2008-12-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE GRAAF ROELOF FREDERIK ,  JANSEN HANS ,  JANSEN BAUKE ,  HEUSSCHEN HUBERTUS LEONARDUS F

IPC: H01L21/027

CPC classification number: G03F7/70925 ,  G03F7/70341 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To cope with a problem of contamination in a lithographic apparatus. SOLUTION: An immersion type lithographic apparatus includes an immersion system for filling at least partially an immersion space with an immersion liquid. The apparatus includes an indicator for indicating whether the portion of the immersion system should be cleaned or not, and a cleaning liquid supply system for supplying a cleaner to the portion of the lithographic apparatus. The cleaner is at least one of different cleaners. The cleaner or the combination of cleaners is selected to clean the contamination of different types or levels in the portion of the lithographic apparatus. The apparatus also includes a controller for control which of the cleaners should be supplied to the lithographic apparatus based on indication received from the indicator. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了解决光刻设备中的污染问题。 解决方案：浸没式光刻设备包括用于至少部分地用浸没液体填充浸没空间的浸渍系统。 该设备包括用于指示浸没系统的部分是否应被清洁的指示器，以及用于向光刻设备的该部分提供清洁剂的清洁液体供应系统。 清洁剂是不同清洁剂中的至少一种。 选择清洁剂或清洁剂的组合以清洁光刻设备部分中不同类型或水平的污染物。 该装置还包括控制器，用于根据从指示器接收到的指示，控制哪个清洁器应该被提供给光刻设备。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008300824A

公开(公告)日：2008-12-11

申请号：JP2008120654

申请日：2008-05-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  STAVENGA MARCO KOERT ,  JANSEN BAUKE ,  BEEREN RAYMOND GERARDUS MARIUS ,  KORNELIS TIJMEN HOEKERD ,  JANSEN HANS ,  PETER FRANCISCUS WANTEN ,  JOHANNES WILHELMUS JACOBUS LEO

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/304 ,  H01L21/68

CPC classification number: G03F7/70925 ,  B08B3/12 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which can be cleaned easily and effectively, and to provide a method of effectively cleaning an immersion lithographic apparatus. SOLUTION: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of cleaning the immersion lithographic projection apparatus using megasonic waves through a liquid are disclosed. A flow, desirably a radial flow, is induced in the liquid. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供可以容易且有效地清洁的光刻设备，并提供一种有效地清洗浸没式光刻设备的方法。 公开了一种浸没式光刻投影装置，其具有构造成清洁表面的兆声传感器和使用超声波清洗液体的浸没式光刻投影装置的方法。 在液体中诱导流动，期望地是径向流动。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：NL1036306A1

公开(公告)日：2009-06-23

申请号：NL1036306

申请日：2008-12-11

Applicant: ASML NETHERLANDS BV

Inventor： GRAAF ROELOF FREDERIK DE ,  JANSEN HANS ,  JANSEN BAUKE ,  HEUSSCHEN HUBERTUS LEONARDUS FRANCISCUS

IPC: G03F7/20

公开(公告)号：NL2003395A

公开(公告)日：2010-03-18

申请号：NL2003395

申请日：2009-08-26

Applicant: ASML NETHERLANDS BV

Inventor： BRUIJSTENS JEROEN ,  LEE MAURICE ,  TANASA GHEORGHE ,  NOORDAM LAMBERTUS DOMINICUS ,  BRULS RICHARD ,  JANSEN HANS ,  LANDHEER SIEBE ,  JORRITSMA LAURENTIUS ,  MEESTER ARNOUT ,  JANSEN BAUKE ,  THOMAS IVO ,  MIRANDA MARCIO

IPC: G03F7/20

公开(公告)号：NL2004540A

公开(公告)日：2010-11-18

申请号：NL2004540

申请日：2010-04-13

Applicant: ASML NETHERLANDS BV

Inventor： JANSEN BAUKE ,  BRULS RICHARD ,  JANSEN HANS ,  NET ANTONIUS ,  KRAMER PIETER ,  KUIJPER ANTHONIE ,  MARTENS ARJAN ,  CASIMIRI ERIC

IPC: G03F7/20

Abstract: A method of cleaning an immersion lithographic apparatus is disclosed in which a cleaner is added to immersion liquid for use during exposure of a substrate. The cleaner may be a combination of a soap and a solvent. The cleaner maybe present at a concentration of less than 300 ppb.