公开(公告)号：JP2012138630A

公开(公告)日：2012-07-19

申请号：JP2012087035

申请日：2012-04-06

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSSEN FRANCISCUS JOHANNES JOSEPH ,  SIEBE LANDHEER ,  KOEK YUECEL ,  BECKERS MARCEL ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70891 ,  G03F7/70341 ,  G03F7/70725

Abstract: PROBLEM TO BE SOLVED: To disclose an immersion-type lithographic apparatus.SOLUTION: In an apparatus, a plurality of heating and/or cooling devices are provided in the vicinity of a final element of a projection system, for example, in a barrier member of a liquid handling system. The heating and/or cooling devices can be used, for example, to control temperature gradient in the final element of the projection system and to control aberrations of the projection system.

Abstract translation: 要解决的问题：公开浸没型光刻设备。 解决方案：在装置中，在投影系统的最终元件附近，例如在液体处理系统的阻挡构件中设置多个加热和/或冷却装置。 加热和/或冷却装置可用于例如控制投影系统的最终元件中的温度梯度并且控制投影系统的像差。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011014901A

公开(公告)日：2011-01-20

申请号：JP2010142155

申请日：2010-06-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： PATEL HRISHIKESH ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BERKVENS PAUL PETRUS JOANNES ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE-MARIE ,  BLOKS RUUD HENDRICUS MARTINUS JOHANNES

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/6715 ,  Y10T137/0318 ,  Y10T137/8593

Abstract: PROBLEM TO BE SOLVED: To provide a fluid handling structure that reduces a change in refractive index and a focusing error resulting from a temperature change in a space by reducing a temperature change while in the fluid handling structure of immersion liquid provided to the space by the fluid handling structure.SOLUTION: The fluid handling structure is configured to supply and confine immersion liquid to a space defined between a projection system and a contacting surface facing to the fluid handling structure. The fluid handling structure includes a supply passage formed therein for passing fluid through the fluid handling structure from the outside to the space, and a heat insulator positioned at least partly adjacent to the supply passage in order to thermally insulate fluid in the supply passage from a heat load induced in the fluid handling structure.

Abstract translation: 要解决的问题：提供一种流体处理结构，其通过降低温度变化而在空间中的温度变化引起的折射率变化和聚焦误差减小，同时在由 流体处理结构。解决方案：流体处理结构被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的接触表面之间的空间中。 流体处理结构包括形成在其中的供应通道，用于将流体从外部传递到空间;以及绝热体，其至少部分地邻近供应通道定位，以将供应通道中的流体与 在流体处理结构中引起的热负荷。

公开(公告)号：JP2011003900A

公开(公告)日：2011-01-06

申请号：JP2010137799

申请日：2010-06-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS JOHANNES HENRICUS WILHELMUS ,  JANSEN HANS ,  BRUIJSTENS JEROEN PETER JOHANNES ,  THOMAS IVO ADAM JOHANNES ,  KUSTERS GERARDUS ADRIANUS ANTONIUS MARIA ,  MIRANDA MARCIO ALEXANDRE CANO ,  TANASA GHEORGHE

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic device capable of keeping the position of a liquid as constant as possible by controlling the position of an immersion liquid in the immersion lithographic device.SOLUTION: The immersion lithographic device includes a curved surface that is curved so that drainage force of surface tension acts in a certain direction on a film of an immersion liquid on the curved surface. In relation to a liquid trapping structure constructed or configured to trap a liquid in an immersion space between a final element of a projection system and a board table and/or a board supported to the board table, a liquid trapping structure is also provided including a curved surface that is curved so that drainage force of surface tension acts in a certain direction on a film of an immersion liquid on the curved surface.

Abstract translation: 要解决的问题：提供一种能够通过控制浸没式光刻设备中的浸液的位置来保持液体位置尽可能恒定的浸没式光刻设备。解决方案：浸没式光刻设备包括弯曲的曲面 使得表面张力的排水力在弯曲表面上的浸没液体的膜上沿某一方向作用。 关于构造或构造成将液体捕获到投影系统的最终元件和板台之间的浸没空间中的液体捕获结构和/或支撑在板台上的板，还提供了液体捕获结构，其包括 弯曲的曲面，使得表面张力的排水力在一定方向上作用在弯曲表面上的浸没液体的膜上。

公开(公告)号：JP2010004039A

公开(公告)日：2010-01-07

申请号：JP2009139705

申请日：2009-06-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSSEN FRANCISCUS JOHANNES JOSEPH ,  SIEBE LANDHEER ,  KOEK YUECEL ,  BECKERS MARCEL ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70891 ,  G03F7/70341 ,  G03F7/70725

Abstract: PROBLEM TO BE SOLVED: To disclose an immersion-type lithographic apparatus. SOLUTION: In the apparatus, a plurality of heating and/or cooling devices are provided in the vicinity of a final element of a projection system, for example, in a barrier member of a liquid handling system. The heating and/or cooling devices can be used, for example, to control temperature gradients in the final element of the projection system and control aberrations therein. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：公开浸没型光刻设备。 解决方案：在该装置中，在投影系统的最终元件附近，例如在液体处理系统的阻挡构件中设置多个加热和/或冷却装置。 加热和/或冷却装置可用于例如控制投影系统的最终元件中的温度梯度并控制其中的像差。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：SG158017A1

公开(公告)日：2010-01-29

申请号：SG2009037078

申请日：2009-06-01

Applicant: ASML NETHERLANDS BV

Inventor： JANSSEN FRANCISCUS JOHANNES JOSEPH ,  LANDHEER SIEBE ,  KOEK YUECEL ,  BECKERS MARCEL ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO

Abstract: A lithographic apparatus of the immersion type is disclosed. In the apparatus, a plurality of heating and/or cooling devices are provided in the vicinity of the final element of the projection system, e.g. in a barrier member of a liquid handling system. The heating and/or cooling devices can be used, for example, to control temperature gradients in the final element of the projection system to control aberrations therein.

公开(公告)号：NL1035816A1

公开(公告)日：2009-03-16

申请号：NL1035816

申请日：2008-08-12

Applicant: ASML NETHERLANDS BV

Inventor： BERKVENS PAUL PETRUS JOANNES ,  GRAAF ROELOF FREDERIK DE ,  LIEBREGTS PAULUS MARTINUS MARIA ,  HAM RONALD VAN DER ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIRECKS DANIEL JOZEF MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT-JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE-MARIE

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：SG177192A1

公开(公告)日：2012-01-30

申请号：SG2011090693

申请日：2009-06-01

Applicant: ASML NETHERLANDS BV

Inventor： JANSSEN FRANCISCUS JOHANNES JOSEPH ,  LANDHEER SIEBE ,  KOEK YUECEL ,  BECKERS MARCEL ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO

Abstract: A lithographic apparatus of the immersion type is disclosed. In the apparatus, a plurality of heating and/or cooling devices are provided in the vicinity of the final element of the projection system, e.g. in a barrier member of a liquid handling system. The heating and/or cooling devices can be used, for example, to control temperature gradients in the final element of the projection system to control aberrations therein.Fig. 8