公开(公告)号：DE69012755D1

公开(公告)日：1994-10-27

申请号：DE69012755

申请日：1990-12-04

Applicant: IBM

Inventor： BUCHWALTER STEPHEN L ,  GOLDBERG MARTIN J ,  IYENGAR REVATHI ,  O'TOOLE TERRENCE R ,  VIEHBECK ALFRED

IPC: G02F1/15 ,  C09K9/00 ,  C09K9/02 ,  G09F9/30 ,  G09G3/38 ,  H01B1/12 ,  G02F1/17

公开(公告)号：DE68916523D1

公开(公告)日：1994-08-04

申请号：DE68916523

申请日：1989-11-17

Applicant: IBM

Inventor： VIEHBECK ALFRED ,  BUCHWALTER STEPHEN L ,  DONSON WILLIAM A ,  GLENNING JOHN J ,  GOLDBERG MARTIN J ,  GREBE KURT R ,  KOVAC CAROLINE A ,  MATTHEW LINDA C ,  PAWLOWSKI WALTER P ,  SCHADT MARK J ,  SCHEUERMANN MICHAEL R ,  TISDALE STEPHEN L

IPC: C23C18/20 ,  C08J5/12 ,  C08J7/00 ,  C23C18/16 ,  C23C18/28 ,  H05K3/38

公开(公告)号：BR8906690A

公开(公告)日：1990-09-11

申请号：BR8906690

申请日：1989-12-22

Applicant: IBM

Inventor： VIEHBECK ALFRED ,  BUCHWALTER STEPHEN LESLIE ,  DONSON WILLIAM ARTHUR ,  GLENNING JOHN JOSEPH ,  GOLDBERG MARTIN JOSEPH ,  GREBE KURT RUDOLPH ,  KOVAC CAROLINE ANN ,  MATTHEW LINDA CROLYN ,  PAWLOWSKI WALTER PAUL ,  SCHADT MARK JEFREY ,  SCHEUERMANN MICHAEL ROY ,  TISDALE STEPHEN LEO

IPC: C23C18/20 ,  C08J5/12 ,  C08J7/00 ,  C23C18/16 ,  C23C18/28 ,  H05K3/38 ,  C08F8/42 ,  C08J7/06

公开(公告)号：MY117278A

公开(公告)日：2004-06-30

申请号：MYPI9403563

申请日：1994-12-29

Applicant: IBM

Inventor： HEDRICK JEFFREY CURTIS ,  LEWIS DAVID ANDREW ,  SHAW JANE MARGARET ,  VIEHBECK ALFRED ,  WHITEHAIR STANLEY JOSEPH

IPC: H05B6/80 ,  H05B6/62 ,  H05B6/78

Abstract: A MICROWAVE PROCESSING SYSTEM IS PROVIDED WHEREIN THE MATERIAL TO BE PROCESSED IS IN THE FORM OF WEB TYPE QUANTITY CONFIGURATION WITH A THICKNESS THAT IS SMALL IN RELATION TO THE WAVELENGTH OF A PARTICULAR MICROWAVE FREQUENCY. THE MATERIAL IS PASSED THROUGH THE FIELD ASSOCIATED WITH A PLURALITY OF MICROWAVE STANDING WAVES OF THE PARTICULAR FREQUENCY, EACH ADJACENT STANDING WAVE BEING OFFSET 1/4 WAVELENGTH ALONG THE DIRECTION OF MOVEMENT OF THE WEB. A CARRIER GAS REMOVES VOLATILE SOLVENTS FROM THE MATERIAL SURFACES.CONTROL IS PROVIDED FOR THE INTERRELATIONSHIP OF TEMPERATURE,RATE OF MOVEMENT, FLOW OF CARRIER GAS, AND MICROWAVE POWER.

公开(公告)号：DE69431394T2

公开(公告)日：2003-06-05

申请号：DE69431394

申请日：1994-12-21

Applicant: IBM

Inventor： HEDRICK JEFFREY CURTIS ,  LEWIS DAVID ANDREW ,  SHAW JANE MARGARET ,  VIEHBECK ALFRED ,  WHITEHAIR STANLEY JOSEPH

IPC: H05B6/80 ,  H05B6/62 ,  H05B6/78

Abstract: A microwave processing system is provided wherein the material to be processed is in the form of a web type quantity configuration with a thickness that is small in relation to the wavelength of a particular microwave frequency. The material is passed through the field associated with a plurality of microwave standing waves of the particular frequency, each adjacent standing wave being offset 1/4 wavelength along the direction of movement of the web. A carrier gas removes volatile solvents from the material surfaces. Control is provided for the interrelationship of temperature, rate of movement, flow of carrier gas, and microwave power.

公开(公告)号：DE69222824D1

公开(公告)日：1997-11-27

申请号：DE69222824

申请日：1992-08-19

Applicant: IBM

Inventor： AFZALI-ARDAKANI ALI ,  BRAREN BODIL E ,  DAIJAVAD SHAHROKH ,  HODGSON RODNEY T ,  MOLIS STEVEN E ,  VIEHBECK ALFRED

IPC: C08K3/04 ,  C08K9/02 ,  H05K1/03 ,  H05K3/10 ,  C08L79/08

公开(公告)号：DE69027374D1

公开(公告)日：1996-07-18

申请号：DE69027374

申请日：1990-07-05

Applicant: IBM

Inventor： GOLDBERG MARTIN J ,  MORRIS DANIEL P ,  VIEHBECK ALFRED

IPC: C25B3/25 ,  C08G73/10 ,  C08G85/00 ,  G03F7/038 ,  H05K1/03 ,  H05K3/18 ,  H05K3/38

Abstract: A process for the synthesis of derivatives of materials containing an imide group conjugated to an aromatic moiety to form an ester, a thioester, an amide, a ketone, and silylesters. Electrons are supplied to redox sites to form a reduced imide material. The reduced imide material is contacted with a nucleophile which opens the imide ring of the reduced imide and chemically combines with a carbonyl carbon atom of the open imide ring to form an imide derivative.

公开(公告)号：DE69025236D1

公开(公告)日：1996-03-21

申请号：DE69025236

申请日：1990-07-05

Applicant: IBM

Inventor： GOLDBERG MARTIN J ,  MORRIS DANIEL P ,  VIEHBECK ALFRED

IPC: C07D209/48 ,  C07B43/00 ,  C07B45/00 ,  C07D471/06 ,  C07D487/04 ,  C07D519/00 ,  C08G73/10 ,  C08G85/00 ,  C25B3/25 ,  H05K1/03 ,  H05K3/00 ,  H05K3/46 ,  C25B3/04

Abstract: Derivatives of compounds containing a carbonyl group conjugated to an aromatic moiety and methods of fabrication thereof consisting of a thioether, an ester, an ether, a phosphate and a silylether. Electrons are supplied to the carbonyl group conjugated to an aromatic moiety to form a reduced material. The reduced material is contacted with an electrophile which attacks and chemically combines with the carbonyl group conjugated to an aromatic moiety. The parent material can be regenerated by hydrolysis of the derivative. A silyl derivative can be selectively formed on a polyimide material surface which can act as a barrier to an RIE etch of the polyimide material. After etch the polyimide material is regenerated from the silyl derivative.

公开(公告)号：DE69114355D1

公开(公告)日：1995-12-14

申请号：DE69114355

申请日：1991-02-27

Applicant: IBM

Inventor： BUCHWALTER LEENA PAIVIKKI ,  BUCHWALTER STEPHEN LESLIE ,  O'TOOLE TERRENCE ROBERT ,  THOMAS RICHARD RONALD ,  VIEHBECK ALFRED

IPC: C08G73/10 ,  C08J7/12 ,  C09D179/08 ,  C09J5/02 ,  C23C18/20 ,  C23C18/22 ,  H05K3/38

Abstract: The surface modification of polyimide materials by a chemical process is disclosed to provide a variety of functional groups on the surface. The surface is treated to produce polyamic acid carboxyl groups which are subsequently reacted with epoxies, hydrazines, or alcohols. The carboxyl groups can also be subjected to other organic reactions, such as reduction with metal hydrides and the like. The versatility and controllability of this process lends itself to promoting adhesion of the polyimide to similarly treated polyimides, other polymers and other substrates as well as combining with metals such as metal catalysts used for depositing conductors on non-conductive surfaces such as circuit boards.

公开(公告)号：CA1335340C

公开(公告)日：1995-04-25

申请号：CA605524

申请日：1989-07-13

Applicant: IBM

Inventor： VIEHBECK ALFRED ,  BUCHWALTER STEPHEN L ,  DONSON WILLIAM A ,  GLENNING JOHN J ,  GOLDBERG MARTIN J ,  GREBE KURT R ,  KOVAC CAROLINE A ,  MATTHEW LINDA C ,  PAWLOWSKI WALTER P ,  SCHADT MARK J ,  SCHEUERMANN MICHAEL R ,  TISDALE STEPHEN L

IPC: C23C18/20 ,  C08J5/12 ,  C08J7/00 ,  C23C18/16 ,  C23C18/28 ,  H05K3/38 ,  B32B31/12 ,  C08J7/14 ,  C25D5/56

Abstract: Certain organic polymeric materials are capable of reversibly accepting or donating electrons from a reducing entity. The redox sites in the polymer accept electrons and, as a result, a change in the properties of the polymer occurs. This change is useful in modifying or etching the polymeric material. The material can be modified by incorporation of metallic seeds into the material at a controlled depth. The seeds are incorporated by interaction of cations of the metals with the redox sites in the polymer, which cause the reduction of the cations to form the neutral metallic seeds. Subsequent exposure of the polymeric material containing the seeds to an electroless bath causes further deposition of metal having the desirable characteristic of good adhesion to the polymeric material. Etching of the polymeric material can be carried out as a result of an increase in solubility of the polymer in aprotic solvents when its redox sites have accepted electrons. The increased solubility allows openings to be etched in certain areas of the polymeric material that have been reduced, leaving other areas unchanged.