公开(公告)号：US20140212815A1

公开(公告)日：2014-07-31

申请号：US13756178

申请日：2013-01-31

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Jimmy Hsiao ,  Ming-Zhang Kuo ,  Ping-Lin Yang ,  Cheng-Chung Lin ,  Osamu Takahashi ,  Sang Hoo Dhong

IPC: H01J29/60 ,  H01J29/62

CPC classification number: H01J29/62 ,  H01J3/12 ,  H01J3/16 ,  H01J3/18 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/31789

Abstract: A system includes an integrated circuit (IC) design data base having a feature, a source configured to generate a radiation beam, a pattern generator (PG) including a mirror array plate and an electrode plate disposed over the mirror array plate, wherein the electrode plate includes a lens let having a first dimension and a second dimension perpendicular to the first dimension with the first dimension larger than the second dimension so that the lens let modifies the radiation beam to form the long shaped radiation beam, and a stage configured secured the substrate. The system further includes an electric field generator connecting the minor array plate. The mirror array plate includes a mirror. The mirror absorbs or reflects the radiation beam. The radiation beam includes electron beam or ion beam. The second dimension is equal to a minimum dimension of the feature.

Abstract translation: 一种系统包括具有特征的集成电路（IC）设计数据库，被配置为产生辐射束的源，包括反射镜阵列板的图案发生器（PG）和设置在所述反射镜阵列板上的电极板，其中所述电极 板包括透镜，其具有垂直于第一尺寸的第一尺寸和第二尺寸，其第一尺寸大于第二尺寸，使得透镜使得辐射束修改以形成长形辐射束，并且被配置为将 基质。 该系统还包括连接小阵列板的电场发生器。 镜阵列板包括镜子。 镜子吸收或反射辐射束。 辐射束包括电子束或离子束。 第二个维度等于该特征的最小尺寸。

公开(公告)号：US08791423B2

公开(公告)日：2014-07-29

申请号：US13806057

申请日：2011-07-26

Applicant: Yoichi Hirayama

Inventor： Yoichi Hirayama

IPC: H01J37/153 ,  H01J3/12 ,  H01J37/28

CPC classification number: H01J37/28 ,  H01J3/12 ,  H01J37/153 ,  H01J37/26 ,  H01J2237/0492 ,  H01J2237/1534 ,  H01J2237/28 ,  H01J2237/2802

Abstract: An aberration correction device includes, between a TEM objective lens and an STEM objective lens, a transfer lens group for transferring a coma-free surface of the TEM objective lens to a multipolar lens, a transfer lens group for transferring the coma-free surface of the TEM objective lens to a multipolar lens, and a transfer lens for correcting fifth-order spherical aberration of the STEM objective lens.

Abstract translation: 一种像差校正装置，在TEM物镜和STEM物镜之间包括用于将TEM物镜的无彗形面传递到多极透镜的转印透镜组，用于将无偏转表面转印的转印透镜组 TEM物镜到多极透镜以及用于校正STEM物镜的五阶球面像差的转印透镜。

公开(公告)号：US20130264477A1

公开(公告)日：2013-10-10

申请号：US13849496

申请日：2013-03-23

Applicant: Frederick Wight Martin

Inventor： Frederick Wight Martin

IPC: H01J3/22 ,  H01J37/141

CPC classification number: H01J3/22 ,  H01J3/12 ,  H01J37/141 ,  H01J37/145 ,  H01J37/153 ,  H01J2237/04926 ,  H01J2237/1534 ,  H01J2237/31749

Abstract: An objective lens for use in probe-forming particle-optical columns such as focused ion beam equipment, scanning electron microscopes, and helium microscopes is described. It comprises two interleaved (quadrupole/octopole) lenses and two or three ancillary octopole lenses, and is capable of simultaneous compensation of spherical (Cs) and chromatic (Cc) aberrations of the objective lens alone or of the complete particle-optical column. Additional apparatus comprising a gridded aperture and position-sensitive detector is specified, together with a method to measure and minimize all of the five independent third-order aberration coefficients of the objective lens.

Abstract translation: 描述了用于探针形成颗粒光学柱的物镜，例如聚焦离子束设备，扫描电子显微镜和氦显微镜。 它包括两个交错（四极/八极）透镜和两个或三个辅助八极透镜，并且能够同时补偿单独的物镜或完整的粒子 - 光学柱的球面（Cs）和彩色（Cc）像差。 规定包括网格孔径和位置敏感检测器的附加装置，以及用于测量和最小化物镜的所有五个独立三阶像差系数的方法。

公开(公告)号：US20130112873A1

公开(公告)日：2013-05-09

申请号：US13806057

申请日：2011-07-26

Applicant: Yoichi Hirayama

Inventor： Yoichi Hirayama

IPC: H01J3/12 ,  H01J37/153

CPC classification number: H01J37/28 ,  H01J3/12 ,  H01J37/153 ,  H01J37/26 ,  H01J2237/0492 ,  H01J2237/1534 ,  H01J2237/28 ,  H01J2237/2802

Abstract: To provide an aberration correction device and a charged particle beam device employing same that are jointly usable with a tunneling electron microscope (TEM) and a scanning tunneling electron microscope (SEM), an aberration correction device (1) comprises, between a TEM objective lens (6a) and an STEM objective lens (6b): a transfer lens group (4, 5), for transferring a coma-free surface (11) of the TEM objective lens (6a) to a multipolar lens (3); a transfer lens group (7, 8) for transferring the coma-free surface of the TEM objective lens to a multipolar lens (2); and a transfer lens (13) for correcting fifth-order spherical aberration of the STEM objective lens (6b).

Abstract translation: 为了提供与隧道电子显微镜（TEM）和扫描隧道电子显微镜（SEM）共同使用的使用其的像差校正装置和带电粒子束装置，像差校正装置（1）包括在TEM物镜 （6a）和STEM物镜（6b）：用于将TEM物镜（6a）的无消耗表面（11）传送到多极透镜（3）的转印透镜组（4,5）; 用于将TEM物镜的无彗形面传递到多极透镜（2）的转印透镜组（7,8）; 以及用于校正STEM物镜（6b）的五阶球面像差的转印透镜（13）。

公开(公告)号：US20100079053A1

公开(公告)日：2010-04-01

申请号：US12239541

申请日：2008-09-26

Applicant: Gregory C. ANDREWS ,  Scott M. CLARK

Inventor： Gregory C. ANDREWS ,  Scott M. CLARK

IPC: H01J1/02

CPC classification number: H01J3/12 ,  H01J3/027 ,  H01J35/06 ,  H01J2235/068

Abstract: A cathode shield comprising a shield body and tabs for defining a focal spot length. The tabs can be integral with the shield body and spaced a distance apart from each other. The tabs can at least partially define the focal spot length of an electron source associated with a cathode shield. The cathode shield can further comprise means for positioning the cathode shield relative to a component in a cathode assembly.

Abstract translation: 一种阴极屏蔽，其包括屏蔽体和用于限定焦斑长度的突片。 翼片可以与屏蔽体成一体并且彼此隔开一段距离。 突片可以至少部分地限定与阴极屏蔽相关联的电子源的焦点长度。 阴极屏蔽件还可以包括用于将阴极屏蔽件相对于阴极组件中的部件定位的装置。

公开(公告)号：US5336891A

公开(公告)日：1994-08-09

申请号：US899433

申请日：1992-06-16

Applicant: Albert V. Crewe

Inventor： Albert V. Crewe

IPC: H01J3/12 ,  H01J37/153 ,  H01J37/10

CPC classification number: H01J3/12 ,  H01J37/153

Abstract: A system for reducing aberration effects in a charged particle beam. The system includes a source of charged particles, such as electrons or ions, and various building blocks for operating on the charged particle beam to generate a desired particle beam pattern. These building blocks can include at least one of a uniform magnetic field component and a uniform electrostatic field component arrangeable in different combinations, enabling coefficients of spherical and chromatic aberration to be canceled out thereby providing a charged particle beam having greatly diminished aberration.

Abstract translation: 一种用于减少带电粒子束中的像差效应的系统。 该系统包括带电粒子的源，例如电子或离子，以及用于在带电粒子束上操作以产生期望的粒子束图案的各种构建块。 这些构造块可以包括均匀的磁场分量和可以以不同组合布置的均匀静电场分量中的至少一个，从而能够抵消球面和色差的系数，从而提供具有大大减小的像差的带电粒子束。

公开(公告)号：EP1766652A2

公开(公告)日：2007-03-28

申请号：EP05758447.6

申请日：2005-06-06

Applicant: MASSACHUSETTS INSTITUTE OF TECHNOLOGY

Inventor： BHATT, Ronak, J. ,  CHEN, Chiping ,  ZHOU, Jing

IPC: H01J37/00

CPC classification number: H01J27/02 ,  G21K1/093 ,  H01J3/02 ,  H01J3/12 ,  H01J3/20 ,  H01J29/64

Abstract: The charged-particle beam system includes a non-axisymmetric diode (2) that forms a non-axisymmetric beam (8) having an elliptic cross-section. A focusing element utilizes a magnetic field for focusing and transporting the non-axisymmetric beam (8), wherein the non-axisymmetric beam (8) is approximately matched with the channel of the focusing element.

公开(公告)号：EP0880791A4

公开(公告)日：1998-12-09

申请号：EP96945292

申请日：1996-12-26

IPC: H01J3/12 ,  H01J33/02 ,  H01J29/70

CPC classification number: H01J3/12 ,  H01J33/02

Abstract: An electron beam device (10) has a cathode (34) that generates a fan-shaped electron beam. A first focusing lens (44, 46, 48, 50) includes first (48) and second (50) plates on opposed sides of a filament. The edges of the plates closest to a positively charged anode (20) are arcuate, so that as individual electrons are accelerated normal to the edge of the charged plates, the beam (60) increases in length with departure from the filament. A second focusing lens includes third (44) and fourth (46) plates on opposed sides of the first focusing lens. Each of the third and fourth plates has an arcuate edge proximate to the positively charged anode. The plates of the first and second focusing lenses provide focusing in a widthwise direction, while defining the increase in the lengthwise direction. The curvature of the plates of the first focusing lens defines a common radius with the plates of the second focusing lens.

Abstract translation: 电子束装置（10）具有产生扇形电子束的阴极（34）。 第一聚焦透镜（44,46,48,50）包括在灯丝的相对侧上的第一（48）和第二（50）板。 最接近带正电荷的阳极（20）的板的边缘是弧形的，从而随着单个电子垂直于带电板的边缘被加速，梁（60）随着离开细丝而在长度上增加。 第二聚焦透镜包括在第一聚焦透镜的相对侧上的第三（44）和第四（46）板。 第三和第四板中的每一个均具有靠近带正电的阳极的弧形边缘。 第一和第二聚焦透镜的板在宽度方向上提供聚焦，同时限定纵向的增加。 第一聚焦透镜的板的曲率与第二聚焦透镜的板限定共同的半径。

公开(公告)号：EP0880791A1

公开(公告)日：1998-12-02

申请号：EP96945292.0

申请日：1996-12-26

Applicant: AMERICAN INTERNATIONAL TECHNOLOGIES, INC

Inventor： WAKALOPULOS, George

IPC: H01J3 ,  H01J33

CPC classification number: H01J3/12 ,  H01J33/02

Abstract: An electron beam device (10) has a cathode (34) that generates a fan-shaped electron beam. A first focusing lens (44, 46, 48, 50) includes first (48) and second (50) plates on opposed sides of a filament. The edges of the plates closest to a positively charged anode (20) are arcuate, so that as individual electrons are accelerated normal to the edge of the charged plates, the beam (60) increases in length with departure from the filament. A second focusing lens includes third (44) and fourth (46) plates on opposed sides of the first focusing lens. Each of the third and fourth plates has an arcuate edge proximate to the positively charged anode. The plates of the first and second focusing lenses provide focusing in a widthwise direction, while defining the increase in the lengthwise direction. The curvature of the plates of the first focusing lens defines a common radius with the plates of the second focusing lens.

公开(公告)号：EP3065161A4

公开(公告)日：2017-08-02

申请号：EP15778595

申请日：2015-01-09

Applicant: FUTURE ADDITIVE MFG TECH RES ASS

Inventor： SATO TAKASHI

IPC: H01J37/06 ,  B29C67/00 ,  H01J1/13 ,  H01J37/04

CPC classification number: H01J37/065 ,  B22F3/1055 ,  B22F2003/1056 ,  B22F2003/1057 ,  B22F2999/00 ,  B33Y30/00 ,  H01J3/08 ,  H01J3/12 ,  H01J37/06 ,  H01J37/304 ,  H01J2237/06308 ,  H01J2237/0653 ,  B22F2203/03 ,  B22F2202/06 ,  B22F2202/11

Abstract: When an emission current is changed, a decrease in brightness of an electron beam is prevented. An electron gun includes a cathode that emits thermoelectrons, a Wehnelt electrode that focuses the thermoelectrons, a control electrode that extracts the thermoelectrons from a distal end of said cathode, an anode that accelerates the thermoelectrons and irradiates a powder with the thermoelectrons as an electron beam, and an optimum condition collection controller that changes at least one of a bias voltage to be applied to the Wehnelt electrode and a control electrode voltage to be applied to the control electrode, and decides a combination of the bias voltage and the control electrode voltage at which the brightness of the electron beam reaches a peak.

Abstract translation: 当发射电流改变时，防止电子束的亮度降低。 电子枪包括发射热电子的阴极，聚焦热电子的Wehnelt电极，从所述阴极的远端提取热电子的控制电极，加速热电子并用热电子作为电子束照射粉末的阳极 以及最佳条件收集控制器，其改变要施加到韦纳特电极的偏置电压和要施加到控制电极的控制电极电压中的至少一个，并且将偏置电压和控制电极电压的组合确定为 其中电子束的亮度达到峰值。