公开(公告)号：DE68928548T2

公开(公告)日：1998-04-23

申请号：DE68928548

申请日：1989-09-25

Applicant: BREWER SCIENCE INC

Inventor： LAMB JAMES ,  BREWER TERRY ,  MORI J

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/085 ,  G03F7/09 ,  H01L21/027

公开(公告)号：DE3856007D1

公开(公告)日：1997-10-02

申请号：DE3856007

申请日：1988-01-12

Applicant: BREWER SCIENCE INC

Inventor： BREWER TERRY ,  HAWLEY DAN ,  LAMB JAMES ,  LATHAM WILLIAM ,  STICHNOTE LYNN

IPC: G02B5/20 ,  G03F7/00 ,  G09F9/00 ,  G09F9/30 ,  H01L31/0216 ,  G03F9/00 ,  G03C5/00

Abstract: Filters (10, 15) suitable for microelectronic uses and the like may be prepared directly on substrates (250) either as monolithically integrated filters (10) or as hybrid filters (50) using a soluble dye material in a resin (252). The resin (252) may be applied to microelectronic substrates (250) and patterned by conventional microphotolitho-graphic processes.

公开(公告)号：DE3485989D1

公开(公告)日：1992-12-24

申请号：DE3485989

申请日：1984-04-13

Applicant: BREWER SCIENCE, INC., ROLLA, MO., US

Inventor： ARNOLD, JOHN W. ,  BREWER, TERRY L. ,  PUNYAKUMLEARD, SUMALEE, ROLLA MISSOURI 65401, US

IPC: G03F7/004 ,  G02B1/10 ,  G02B1/11 ,  G03F7/00 ,  G03F7/09 ,  G03F7/11 ,  G03F7/26 ,  G03F7/30 ,  H01L21/027 ,  H01L21/30

Abstract: A photolithographic resist comprising a substrate (I), a photoresist (II) and a light-absorbing imageable anti-reflective coating (III) between the (I) and (II), the (III) comprising a thin, essentially continuous layer of polybutene sulphone contg. a dye, and the (III) being imageable by light of the same wavelength as the (II) and being developable and removable with the (II).

公开(公告)号：AU5433890A

公开(公告)日：1990-11-05

申请号：AU5433890

申请日：1990-03-30

Applicant: BREWER SCIENCE INC

Inventor： BREWER TERRY ,  FLAIM TONY ,  LAMB JAMES E III ,  BARNES GREGG A

IPC: C08G73/10 ,  C08L63/00 ,  G03F7/09 ,  G03C5/00 ,  G03C1/492 ,  G03C5/12

公开(公告)号：SG10201607603VA

公开(公告)日：2016-11-29

申请号：SG10201607603V

申请日：2012-10-10

Applicant: BREWER SCIENCE INC

Inventor： KRISHNAMURTHY VANDANA ,  SULLIVAN DANIEL M ,  WANG YUBAO ,  LIN QIN ,  SIMMONS SEAN

公开(公告)号：IL206872A

公开(公告)日：2015-07-30

申请号：IL20687210

申请日：2010-07-07

Applicant: BREWER SCIENCE INC

IPC: H01L20060101

公开(公告)号：DE112009000979B4

公开(公告)日：2014-12-11

申请号：DE112009000979

申请日：2009-04-21

Applicant: BREWER SCIENCE INC

Inventor： MERCADO RAMIL-MARCELO L ,  XU HAO ,  GUERRERO DOUGLAS J

IPC: G03F7/20

Abstract: Verfahren zum Bilden einer mikroelektronischen Struktur, bei dem (a) ein Substrat mit einer Oberfläche bereitgestellt wird, (b) gegebenenfalls eine oder mehrere Zwischenschichten auf der Oberfläche gebildet werden, (c) eine Hartmaskenzusammensetzung angrenzend an die Zwischenschichten, falls vorhanden, oder angrenzend an die Substratoberfläche, falls keine Zwischenschichten vorhanden sind, aufgebracht wird, wobei die Hartmaskenzusammensetzung nichtpolymere Nanopartikel enthält, die in einem Lösungsmittelsystem gelöst oder dispergiert sind, (d) die Hartmaskenzusammensetzung gebacken wird, um eine Hartmaskenschicht zu ergeben, (e) die Hartmaskenschicht Strahlung ausgesetzt wird, um einen bestrahlten Teil der Hartmaske zu erhalten und (f) die Hartmaskenschicht mit einem Entwickler in Kontakt gebracht wird, um so den bestrahlten Teil der Hartmaskenschicht zu entfernen.

公开(公告)号：SG173730A1

公开(公告)日：2011-09-29

申请号：SG2011059177

申请日：2010-02-19

Applicant: BREWER SCIENCE INC

Inventor： MEADOR JIM D ,  LOWES JOYCE A ,  MERCADO RAMIL-MARCELO L

Abstract: Acid-sensitive, developer-soluble bottom anti-reflective coating compositions are provided, along with methods of using such compositions and microelectronic structures formed thereof. The compositions preferably comprise a crosslinkable polymer dissolved or dispersed in a solvent system. The polymer preferably comprises recurring monomeric units having adamantyl groups. The compositions also preferably comprise a crosslinker, such as a vinyl ether crosslinking agent, dispersed or dissolved in the solvent system with the polymer. In some embodiments, the composition can also comprise a photoacid generator (PAG) and/or a quencher. The bottom anti-reflective coating compositions are thermally crosslinkable, but can be decrosslinked in the presence of an acid to be rendered developer soluble.

公开(公告)号：AT523263T

公开(公告)日：2011-09-15

申请号：AT05705442

申请日：2005-01-07

Applicant: BREWER SCIENCE INC

Inventor： LI CHENGHONG ,  RUBEN KIMBERLY ,  FLAIM TONY

IPC: B05D1/36 ,  B32B9/04 ,  B81C1/00 ,  C09D125/12 ,  H01L21/308 ,  H01L21/311

Abstract: New protective coating layers for use in wet etch processes during the production of semiconductor and MEMS devices are provided. The layers include a primer layer, a first protective layer, and an optional second protective layer. The primer layer preferably comprises an organo silane compound in a solvent system. The first protective layer includes thermoplastic copolymers prepared from styrene, acrylonitrile, and optionally other addition-polymerizable monomers such as (meth)acrylate monomers, vinylbenzyl chloride, and diesters of maleic acid or fumaric acid. The second protective layer comprises a highly halogenated polymer such as a chlorinated polymer which may or may not be crosslinked upon heating.

公开(公告)号：SG169384A1

公开(公告)日：2011-03-30

申请号：SG2011008075

申请日：2007-01-26

Applicant: BREWER SCIENCE INC US

Inventor： MOORE JOHN C ,  FOWLER MICHELLE R

Abstract: THERMAL-AND CHEMICAL-RESISTANT ACID PROTECTION COATING MATERIAL AND SPIN-ON THERMOPLASTIC ADHESIVE New compositions for use as protective coatings and/or adhesives are provided. The compositions comprise a hydrocarbon resin (e.g., terpene rosin) and a rubber (e.g., EPDM) dispersed or dissolved in a solvent system. The solvent system is preferably a single-solvent system, and the compositions are preferably free of surfactants, dyes, and chromophores. The compositions can be cured or dried to form layers or films that are chemically and thermally resistant, but that can be readily dissolved and removed at the appropriate stage in the fabrication process.