Abstract:
본 발명은 구조광을 이용하여 거리를 측정하기 위한 시스템에 이용되는 CMOS 센서의 픽셀 구조에 관한 것이다. 본 발명의 CMOS 센서의 픽셀은 빛을 전기적 신호로 출력하는 광 감지부; 출력된 전압을 수신하는 입력 트랜지스터; 입력 트랜지스터에 연결되며, 주변광으로 인하여 발생된 전하를 축적하는 제1 커패시터; 제1 커패시터에 축적된 전하를 유지하기 위하여 전류가 흐르지 않는 가상 접지 노드를 제공하는 증폭기; 레이저 광원이 오프되었을 때 증폭기의 출력 노드와 가상 접지 노드 사이에 제1 피드백 경로를 생성하는 제1 피드백 트랜지스터; 레이저 광원이 온 되었을 때, 증폭기의 출력 노드와 가상 접지 노드 사이에 제2 피드백 경로를 생성하는 제2 피드백 트랜지스터; 및 제2 피드백 경로에 위치하며, 레이저 광원이 오프일 때 입력 트랜지스터에 전달된 전압과 레이저 광원이 온 되었을 때 입력 트랜지스터에 전달된 전압과의 차분 전압에 대응하는 전하를 축적하는 제2 커패시터를 포함한다. 본 발명에 따르면, 강한 주변광이 존재할 경우에도 구조광에 의한 거리 측정을 정확하게 할 수 있다. 구조광, CMOS 센서, 커패시터, 거리 측정, 이동 로봇
Abstract:
According to an embodiment of the present invention, the present invention relates to an image sensor capable of leading two rows among a plurality of rows. The image sensor includes: a pixel array including a plurality of rows and a plurality of columns; a pair of first columns and a pair of second columns among a plurality of columns; a pair of analog-digital converters; and a switch arranging circuit connecting the pair of the first columns and the pair of the analog-digital converters by responding to the first switch control signals.
Abstract:
PURPOSE: A semiconductor device and a manufacturing method thereof are provided to improve electrical characteristics by forming a channel region including a polysilicon layer. CONSTITUTION: A channel region (120) is extended on a substrate in the vertical direction. The channel region includes a semiconductor layer. The semiconductor layer includes nitrogen. Gate electrodes (150) are separated from each other on the sidewall of the channel region in the vertical direction. A gate dielectric layer (140) is formed in the channel region and between the gate electrodes.
Abstract:
PURPOSE: An offset removal circuit and an image sensor including the same are provided to remove a dark current offset which can be generated in a unit pixel by using a different reference signal according to the operation section of the unit pixel. CONSTITUTION: A feedback circuit(130) is connected to a second electrode of a decoupling capacitor(110) and an output terminal of a buffer(120) and respectively receives a first reference voltage and a second reference voltage in a reset section and a data section. In order to charge the decoupling capacitor with a first voltage which is a voltage difference of a reset voltage and the first reference voltage in the reset section, the feedback circuit provides the first reference voltage to the second electrode and provides the second reference voltage to the second electrode in the data section.
Abstract:
PURPOSE: A 3D semiconductor memory device and a manufacturing method thereof are provided to improve the degree of integration of the 3D semiconductor memory device by separating the space between adjacent gate patterns using a dielectric pattern. CONSTITUTION: A common source line(CSL) is arranged on a substrate(100). A buried insulating pattern(120) is filled in a vertical active pattern(118). A string selection transistor(SST) includes a conductive pattern(178) and a dielectric pattern(174). Memory cell transistors(MCT1,MCT2) are separated from each other and stacked in the vertical direction. The memory cell transistor includes gate patterns(176,177) and dielectric patterns(172,173).
Abstract:
PURPOSE: An analog digital converter and an image sensor including the same are provided to implement high speed, high resolution, and low power of an image sensor. CONSTITUTION: A pixel array(110) is arranged in a matrix shape. The pixel array includes a plurality of pixels(111). An EC-ADC(Extended Analog Digital Converter)(140) performs first analog digital conversion for converting an output signal of the pixel array into a digital signal. The EC-ADC obtains residue by using the output signal of the pixel array. The EC-ADC performs second analog digital conversion by using the residue.